Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers

Directed Self-Assembly of Polystyrene-Block-Polyhedral Oligomeric Silsesquioxane Monolayer by Nano-Trench for Nanopatterning

This work pioneers to combine fast self-assembly of polyhedral oligomeric silsesquioxanes (POSS) nanocage-based giant surfactants with high etching contrast and directed self-assembly for reliable long-range lateral order to create well-aligned sub-10 nm line nanopatterns via reactive ion etching (RIE). Polystyrene-block-oligo(dimethylsiloxane) substituted POSS (PS-b-oDMS7POSS) with seven oligo(dimethylsiloxane) at the corners of the POSS nanocage and one polystyrene (PS) tail is designed and synthesized as a giant surfactant with self-assembly behaviors like block copolymer (BCP). In contrast to BCP, oDMS7POSS gives a volume-persistent "nanoatom" particle with higher mobility for fast self-assembly and higher segregation strength with PS for smaller feature size. By taking advantage of directed self-assembly using nano-trench fabricated by electron beam lithography, well-ordered nanostructured monolayer with well-aligned parallel oDMS7POSS cylinders can be formed by confined self-assembly within the nano-trench. With the optimization of the RIE treatment using O2 as an etchant, the high etching contrast from the oDMS7POSS and PS gives the formation of well-defined line nanopatterns with sub-10 nm critical dimension that can serve as a mask for pattern transfer in lithography. These results demonstrate a cost-effective approach for nanopatterning by utilizing a creatively designed giant surfactant with sub-10 nm feature size and excellent etching contrast for modern lithographic applications.

Illuminating Recent Progress in Nanotransfer Printing: Core Principles, Emerging Applications, and Future Perspectives

As the demand for diverse nanostructures in physical/chemical devices continues to rise, the development of nanotransfer printing (nTP) technology is receiving significant attention due to its exceptional throughput and ease of use. Over the past decade, researchers have attempted to enhance the diversity of materials and substrates used in transfer processes as well as to improve the resolution, reliability, and scalability of nTP. Recent research on nTP has made continuous progress, particularly using the control of the interfacial adhesion force between the donor mold, target material, and receiver substrate, and numerous practical nTP methods with niche applications have been demonstrated. This review article offers a comprehensive analysis of the chronological advancements in nTP technology and categorizes recent strategies targeted for high-yield and versatile printing based on controlling the relative adhesion force depending on interfacial layers. In detail, the advantages and challenges of various nTP approaches are discussed based on their working mechanisms, and several promising solutions to improve morphological/material diversity are presented. Furthermore, this review provides a summary of potential applications of nanostructured devices, along with perspectives on the outlook and remaining challenges, which are expected to facilitate the continued progress of nTP technology and to inspire future innovations.

Deformation Mechanism of Aluminum, Copper, and Gold in Nanoimprint Lithography Using Molecular Dynamics Simulation

Material deformation during nanoimprinting of aluminum (Al), copper (Cu), and gold (Au) was explored through molecular dynamics simulations. A comparative understanding of the deformation behavior of three substrate materials important for design and high-resolution pattern transfer was highlighted. In this study, we analyzed three metrics, including von Mises stresses, lattice deformation, and spring-back for the chosen materials. Of the three materials, the highest average von Mises stress of 7.80 MPa was recorded for copper, while the lowest value of 4.68 MPa was computed for the gold substrate. Relatively higher von Mises stress was observed for all three materials during the mold penetration stages; however, there was a significant reduction during the mold relaxation and retrieval stages. The Polyhedral Template Matching (PTM) method was adopted for studying the lattice dislocation of the materials. Predominantly Body-Centered Cubic (BCC) structures were observed during the deformation process and the materials regained more than 50% of their original Face-Centered Cubic (FCC) structures after mold retrieval. Gold had the lowest vertical spring-back at 6.54%, whereas aluminum had the highest average spring-back at 24.5%. Of the three materials, aluminum had the lowest imprint quality due to its irregular imprint geometry and low indentation depth after the NIL process. The findings of this research lay a foundation for the design and manufacture of Nanoimprint Lithography (NIL) molds for different applications while ensuring that the replicated structures meet the desired specifications and quality standards.

Atomically Flat, 2D Edge-Directed Self-Assembly of Block Copolymers

Nanoscale shape engineering is an essential requirement for the practical use of 2D materials, aiming at precisely customizing optimal structures and properties. In this work, sub-10-nm-scale block copolymer (BCP) self-assembled nanopatterns finely aligned along the atomic edge of 2D flakes, including graphene, MoS₂ , and h-BN, are exploited for reliable nanopatterning of 2D materials. The underlying mechanism for the alignment of the self-assembled nanodomains is elucidated based on the wetting layer alternation of the BCP film in the presence of intermediate 2D flakes. The resultant highly aligned nanocylinder templates with remarkably low levels of line edge roughness (LER) and line-width roughness (LWR) yield a sub-10-nm-wide graphene nanoribbon (GNR) array with noticeable switching characteristics (on-to-off ratio up to ≈6 × 10⁴ ).

Priming self-assembly pathways by stacking block copolymers

Block copolymers spontaneously self-assemble into well-defined nanoscale morphologies. Yet equilibrium assembly gives rise to a limited set of structures. Non-equilibrium strategies can, in principle, expand diversity by exploiting self-assembly's responsive nature. In this vein, we developed a pathway priming strategy combining control of thin film initial configurations and ordering history. We sequentially coat distinct materials to form prescribed initial states, and use thermal annealing to evolve these manifestly non-equilibrium states through the assembly landscape, traversing normally inaccessible transient structures. We explore the enormous associated hyperspace, spanning processing (annealing temperature and time), material (composition and molecular weight), and layering (thickness and order) dimensions. We demonstrate a library of exotic non-native morphologies, including vertically-oriented perforated lamellae, aqueduct structures (vertical lamellar walls with substrate-pinned perforations), parapets (crenellated lamellae), and networks of crisscrossing lamellae. This enhanced structural control can be used to modify functional properties, including accessing regimes that surpass their equilibrium analogs.

Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~30 nm pitch using electron beam lithography. Here, we demonstrate a nanofabrication technique which allows patterning periodic structures with a pitch down to 16 nm. It is based on focused ion beam milling of suspended membranes, with minimal proximity effects typical to standard electron beam lithography. The membranes are then transferred and used as hard etching masks. We benchmark our technique by electrostatically inducing a superlattice potential in graphene and observe bandstructure modification in electronic transport. Our technique opens the path towards the realization of very short period superlattices in 2D materials, but with the ability to control lattice symmetries and strength. This can pave the way for a versatile solid-state quantum simulator platform and the study of correlated electron phases.

Coupling the chemistry and topography of block copolymer films patterned by soft lithography for nanoparticle organization

Soft lithography techniques have become leading mesoscale approaches for replicating topographic features in polymer films. So far, modified polymer films formed by soft lithography only featured topographic heterogeneity. Here we demonstrate the application of soft lithography techniques to block copolymer films, and show that the preferential affinity of one of the blocks to the stamping material leads to chemical heterogeneity that corresponds to the topographic features. Detailed surface and structural characterization of the patterned films provided information on its three-dimensional structure, revealing insights on the domain reorganization that takes place in the block copolymer film concomitantly with topography formation. The formed structures were utilized for the selective assembly of gold nanoparticles into hierarchical structures. The versatility of this combined nanofabrication/self-assembly approach was demonstrated by the assembly of two types of metallic nanoparticles into two different arrangements with full control over the location of each type of nanoparticles.

Spheres-in-Grating Assemblies with Altered Photoluminescence and Wetting Properties

In this work, we report the fabrication of spheres-in-grating assemblies consisting of equally spaced parallel rectangular grooves filled with fluorescent spheres, by employing embossing and convective self-assembly methods. The developed hierarchical assemblies, when compared to spheres spin-cast on glass, exhibited a blueshift in the photoluminescence spectra, as well as changes in wetting properties induced not only by the patterning process, but also by the nature and size of the utilized spheres. While the patterning process led to increased hydrophobicity, the utilization of spheres with larger diameter improved the hydrophilicity of the fabricated assemblies. Finally, by aiming at the future integration of the spheres-in-grating assemblies as critical components in different technological and medical applications, we report a successful encapsulation of the incorporated spheres within the grating with a top layer of a functional polymer.

Sub-5 nm Anisotropic Pattern Transfer via Colloidal Lithography of a Self-Assembled GdF3 Nanocrystal Monolayer

Patterning materials with nanoscale features opens many research opportunities ranging from fundamental science to technological applications. However, current nanofabrication methods are ill-suited for sub-5 nm patterning and pattern transfer. We demonstrate the use of colloidal lithography to transfer an anisotropic pattern of discrete features into substrates with a critical dimension below 5 nm. The assembly of monodisperse, anisotropic nanocrystals (NCs) with a rhombic-plate morphology spaced by dendrimer ligands results in a well-ordered monolayer that serves as a 2D anisotropic hard mask pattern. This pattern is transferred into the underlying substrate using dry etching followed by removal of the NC mask. We exemplify this approach by fabricating an array of pillars with a rhombic cross-section and edge-to-edge spacing of 4.4 ± 1.1 nm. The fabrication approach enables broader access to patterning materials at the deep nanoscale by implementing innovative processes into well-established fabrication methods while minimizing process complexity.

High-resolution fabrication of nanopatterns by multistep iterative miniaturization of hot-embossed prestressed polymer films and constrained shrinking

The fabrication of nanostructures and nanopatterns is of crucial importance in microelectronics, nanofluidics, and the manufacture of biomedical devices and biosensors. However, the creation of nanopatterns by means of conventional nanofabrication techniques such as electron beam lithography is expensive and time-consuming. Here, we develop a multistep miniaturization approach using prestressed polymer films to generate nanopatterns from microscale patterns without the need of complex nanolithography methods. Prestressed polymer films have been used as a miniaturization technique to fabricate features with a smaller size than the initial imprinted features. However, the height of the imprinted features is significantly reduced after the thermal shrinking of the prestressed films due to the shape memory effect of the polymer, and as a result, the topographical features tend to disappear after shrinking. We have developed a miniaturization approach that controls the material flow and maintains the shrunken patterns by applying mechanical constraints during the shrinking process. The combination of hot embossing and constrained shrinking makes it possible to reduce the size of the initial imprinted features even to the nanoscale. The developed multistep miniaturization approach allows using the shrunken pattern as a master for a subsequent miniaturization cycle. Well-defined patterns as small as 100 nm are fabricated, showing a 10-fold reduction in size from the original master. The developed approach also allows the transfer of the shrunken polymeric patterns to a silicon substrate, which can be used as a functional substrate for many applications or directly as a master for nanoimprint lithography.

Metallic Plasmonic Array Structures: Principles, Fabrications, Properties, and Applications

The vast development of nanofabrication has spurred recent progress for the manipulation of light down to a region much smaller than the wavelength. Metallic plasmonic array structures are demonstrated to be the most powerful platform to realize controllable light-matter interactions and have found wide applications due to their rich and tunable optical performance through the morphology and parameter engineering. Here, various light-management mechanisms that may exist on metallic plasmonic array structures are described. Then, the typical techniques for fabrication of metallic plasmonic arrays are summarized. Next, some recent applications of plasmonic arrays are reviewed, including plasmonic sensing, surface-enhanced spectroscopies, plasmonic nanolasing, and perfect light absorption. Lastly, the existing challenges and perspectives for metallic plasmonic arrays are discussed. The aim is to provide guidance for future development of metallic plasmonic array structures.

Constrained shrinking of nanoimprinted pre-stressed polymer films to achieve programmable, high-resolution, miniaturized nanopatterns

Nanoimprint lithography is an emerging technology to form patterns and features in the nanoscale. Production of nanoscale patterns is challenging particularly in the sub-50 nm range. Pre-stressed polymer films with embedded microscale pattern can be miniaturized by shrinking induced due to thermal stress release. However, when pre-stressed films are thermally nanoimprinted with sub-micron features and shruken, they lose all the topographical features due to material recovery. Here we report a new approach that prevents recovery and allows retention of shrunken patterns even at the scale of <50 nm. We have discovered that when the shrinking process is mechanically constrained in one direction, the thermal treatment only relieves the stress in the orthogonal direction leading to a uniaxial shrinkage in that direction while preserving the topographical features. A second step, with the constraint in the orthogonal direction leads to biaxial shrinkage and preservation of all of the topographical features. This new technique can produce well defined and high resolution nanostructures at dimensions below 50 nm. The process is programmable and the thermal treatment can be tuned to shrink features to various dimension below the original imprint which we use to produce tunable and gradient plasmonic structures.

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

Conductive Thin Films over Large Areas by Supramolecular Self-Assembly

We report a "one-step" method for preparing conductive thin films with cylindrical microdomains oriented normal to the surface over large areas using the supramolecular assembly of poly(styrene-block-4-vinylpyridine) (PS₁₉-b-P4VP₅) and 5,10,15,20-tetrakis(4-hydroxyphenyl)-21H,23H-porphine (HOTPP). HOTPP interacts with the P4VP block by hydrogen bonding between the hydroxyl group of HOTPP and pyridine ring of PS₁₉-b-P4VP₅, forming cylindrical P4VP(HOTPP) domains having an average diameter of ∼17 nm in a PS matrix. Dynamic light scattering, contact angle, and in situ grazing incidence small-angle X-ray scattering measurements show a morphological transition from spherical micelles in solution to cylindrical microdomains oriented normal to the substrate surface during the drying process. From the dependence of current on voltage, an average current of ∼4.0 nA is found to pass through a single microdomain, pointing to a promising route for organic semiconductor device applications.

Oriented thick films of block copolymer made by multiple successive coatings: perforated lamellae versus oriented lamellae

Building 3D ordered nanostructures by copolymer deposition on a substrate implies a full control beyond the thin film regime. We have used here block copolymers (BCPs) forming bulk lamellar phases to form thick, i.e. much thicker than the lamellar period, structured films on a substrate. Films are formed by a simple method of multiple successive coatings. The film structure is controlled using the combined action of surface templating and annealing time. Sections of the thick layers were characterized by scanning electron microscopy (SEM) after etching of one of the BCP moieties. We show that perfect hexagonally perforated films (HPL) with lamellae parallel to the substrate are formed for a wide thickness range up to 300 nm. Grazing incidence small angle X-ray scattering (GISAXS) confirms such an organization by revealing that perforations sit on a hexagonal lattice. A lamellar organization perpendicular to the substrate is shown to take over for thicker films. A scenario consistent with our observations is proposed, where the sequence of phases results from the balance between surface and stretching energy effects.

Numerical implementation of pseudo-spectral method in self-consistent mean field theory for discrete polymer chains

In the standard self-consistent field theory (SCFT), a polymer chain is modeled as an infinitely flexible Gaussian chain, and the partition function is calculated by solving a differential equation in the form of a modified diffusion equation. The Gaussian chain assumption makes the standard SCFT inappropriate for modeling of short polymers, and the discrete chain SCFT in which the partition function is obtained through recursive integrals has recently been suggested as an alternative method. However, the shape of the partition function integral makes this method much slower than the standard SCFT when calculated in the real space. In this paper, we implement the pseudospectral method for the discrete chain SCFT adopting the bead-spring or freely jointed chain (FJC) model, and a few issues such as the accurate discretization of the FJC bond function are settled in this process. With the adoption of the pseudospectral method, our calculation becomes as fast as that of the standard SCFT. The integral equation introduces a new boundary condition, the neutral boundary, which is not available in the standard SCFT solving the differential equation. This interesting physical situation is combined with the finite-range interaction model for the study of symmetric block copolymers within thin films. We find that the surface-perpendicular block copolymer lamellar phase becomes preferable to the surface-parallel one when both the top and bottom surfaces are neutral.

Fabrication of Uniaxially Aligned Silica Nanogrooves with Sub-5 nm Periodicity on Centimeter-Scale Si Substrate Using Poly(dimethylsiloxane) Stamps

The large-area fabrication of aligned nanopatterns with sub-5 nm feature size is crucial for developing nanodevices. Highly ordered nanostructures fabricated through molecular self-assembly exhibit substantial potential for sub-5 nm patterning techniques. Previously, we had reported the fabrication of silica nanogrooves with sub-5 nm periodicity on a Si substrate by using the outermost surfaces of cylindrical surfactant micelles as a template. However, uniaxial alignment of nanogrooves on the entire substrate surface has not yet been achieved. In this study, uniaxially aligned silica nanogrooves were prepared on the entire surface of a Si substrate (2 cm × 2 cm) by utilizing a poly(dimethylsiloxane) (PDMS) stamp with a striped pattern. The PDMS stamp was placed on the surface of a surfactant thin film precoated on the substrate, although the stamp was not in direct contact with the substrate as in the case of the soft nanoimprint technique. The substrate was then exposed to water vapor, during which cylindrical micelles were aligned in the direction of the guide. Subsequently, by exposing the substrate to an NH₃-water vapor mixture, the outermost surfaces of the aligned micelles facing the substrate were replicated with soluble silicate species. The formation of uniaxially aligned nanogrooves on the entire surface of the centimeter-scale substrate was verified by scanning electron microscopy observations and grazing-incidence small-angle X-ray scattering analysis. Thus, herein we provide a simple large-area fabrication method for uniaxially aligned nanopatterns with ultrafine pitch.

Study of the perpendicular self-assembly of a novel high-χ block copolymer without any neutral layer on a silicon substrate

A novel type of high-χ block copolymer, polystyrene-block-polycarbonate (PS-b-PC), which contains an active –NH– group on the polymer backbone between the PS block and the PC block, has been successfully synthesized. Vertical micro-phase separation can be successfully achieved on Si substrates with neutral-layer-free materials with a pitch of 16.8 nm. Water contact angle experiments indicate that PS and PC have approximate surface energy values on Si substrates. A hydrogen bond mechanism has been proposed for the formation of a periodic and lamella-forming phase separation structure, with the domains oriented perpendicular to the substrate. A combination of both theory and experimental verification proves that the hydrogen bonding plays a dominant role as a real driving force to promote vertical micro-phase separation in the absence of a neutral layer. Subsequently, the study of a novel block copolymer on four different types of substrate without any neutral layer further confirms that the newly synthesized material enables greater flexibility and potential applications for the fabrication of various nanostructures and functional electronic devices in a simple, cost-effective and efficient way, which is of considerable importance to contemporary and emerging technology applications.

A novel type of high-χ block copolymer, polystyrene-block-polycarbonate (PS-b-PC), which contains an active –NH– group on the polymer backbone between the PS block and the PC block, has been successfully synthesized.

Reactive two-component monolayers template bottom-up assembly of nanoparticle arrays on HOPG

Two triphenyleneethynylene derivatives, 1OH and 2, self-assemble a patterned monolayer (ML) at the solution-graphite (HOPG) interface. The four molecule unit cell of the ML, (1OH1OH22), spans 19 nm and contains adjacent columns of 1OH molecules spaced by 4.7 nm. Following ML assembly, a disulfide is appended to the alcohol group on each 1OH molecule and used to capture 2.0 nm gold nanoparticles (AuNP). The patterned monolayer directs bottom-up assembly of a 5 nm/19 nm double pitch AuNP pattern.

Flow Behavior of Chain and Star Polymers and Their Mixtures

Star-shaped polymers show a continuous change of properties from flexible linear chains to soft colloids, as the number of arms is increased. To investigate the effect of macromolecular architecture on the flow properties, we employ computer simulations of single chain and star polymers as well as of their mixtures under Poiseuille flow. Hydrodynamic interactions are incorporated through the multi-particle collision dynamics (MPCD) technique, while a bead-spring model is used to describe the polymers. For the ultradilute systems at rest, the polymers are distributed uniformly in the slit channel, with a weak dependence on their number of arms. Once flow is applied, however, we find that the stars migrate much more strongly towards the channel center as the number of arms is increased. In the star-chain mixtures, we find a flow-induced separation between stars and chains, with the stars located in the channel center and the chains closer to the walls. In order to identify the origin of this flow-induced partitioning, we conduct additional simulations without hydrodynamic interactions, and find that the observed cross-stream migration originates from a combination of wall-induced hydrodynamic lift forces and viscoelastic effects. The results from our study give valuable insights for designing microfluidic devices for separating polymers based on their architecture.

Computational Design of High-χ Block Oligomers for Accessing 1 nm Domains

Molecular dynamics simulations are used to design a series of high-χ block oligomers (HCBOs) that can self-assemble into a variety of mesophases with domain sizes as small as 1 nm. The exploration of these oligomers with various chain lengths, volume fractions, and chain architectures at multiple temperatures reveals the presence of ordered lamellae, perforated lamellae, and hexagonally packed cylinders. The achieved periods are as small as 3.0 and 2.1 nm for lamellae and cylinders, respectively, which correspond to polar domains of approximately 1 nm. Interestingly, the detailed phase behavior of these oligomers is distinct from that of either solvent-free surfactants or block polymers. The simulations reveal that the behavior of these HCBOs is a product of an interplay between both "surfactant factors" (headgroup interactions, chain flexibility, and interfacial curvature) and "block polymer factors" (χ, chain length N, and volume fraction f). This insight promotes the understanding of molecular features pivotal for mesophase formation at the sub-5 nm length scale, which facilitates the design of HCBOs tailored toward particular desired morphologies.

Optimizing self-consistent field theory block copolymer models with X-ray metrology

A block copolymer self-consistent field theory (SCFT) model is used for direct analysis of experimental X-ray scattering data obtained from thin films of polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) made from directed self-assembly. In a departure from traditional approaches, which reconstruct the real space structure using simple geometric shapes, we build on recent work that has relied on physics-based models to determine shape profiles and extract thermodynamic processing information from the scattering data. More specifically, an SCFT model, coupled to a covariance matrix adaptation evolutionary strategy (CMAES), is used to find the set of simulation parameters for the model that best reproduces the scattering data. The SCFT model is detailed enough to capture the essential physics of the copolymer self-assembly, but sufficiently simple to rapidly produce structure profiles needed for interpreting the scattering data. The ability of the model to produce a matching scattering profile is assessed, and several improvements are proposed in order to more accurately recreate the experimental observations. The predicted parameters are compared to those extracted from model fits via additional experimental methods and with predicted parameters from direct particle-based simulations of the same model, which incorporate the effects of fluctuations. The Flory-Huggins interaction parameter for PS-b-PMMA is found to be in agreement with reported ranges for this material. These results serve to strengthen the case for relying on physics-based models for direct analysis of scattering and light signal based experiments.

Controlled solvent vapor annealing of a high χ block copolymer thin film

Molecular self-assembling block copolymers (BCPs) have shown promise as a next generation bottom-up lithography technology. However, a critical step in advancing this approach is the elimination of polymer dewetting due to bulk solvent nucleation and thermodynamically driven film rupture that can occur during the solvent vapor annealing process. We report on the pattern formation via phase segregation of spin coated diblock copolymer films through the investigation of annealing parameters in the limit of high solvent vapor saturation conditions that results in wafer-scale patterning without observing polymer dewetting defects. Specifically, the work addresses polymer dewetting in diblock copolymer nanodot templates through the use of a "neutral" functionalization layer and the development of a custom-built solvent vapor annealing chamber to precisely control saturation conditions. Furthermore, the long anneal times (4 h) using a standard static solvent vapor annealing procedure were reduced to ∼15-30 minutes with our dynamic solvent vapor annealing system for the high χ, cylindrical forming poly(styrene)-block-poly(4-vinyl-pyridine) [PS-b-P4VP] diblock copolymer system. We discuss the kinetic mechanism governing the phase segregation process that highlights the small processing window bounded by long phase segregation timescales (≳1 min) on one side and the initiation of polymer film dewetting on the other. These results demonstrate a key step towards realizing a high fidelity, low cost BCP patterning technique for large-scale "bottom-up" feature definition at nanometer length scales.

Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D₃). The number average molecular weight (Mn), polydispersity index (Mw/Mn) and PS volume fraction (φps) of the DBCP were MnPS = 23.0 kg mol-1, MnPDMS = 15.0 kg mol-1, Mw/Mn = 1.06 and φps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (POSS) substrates. The lamellae repeat distance or pitch (λL) and the width of the PDMS features (dL) are ~35 nm and ~17 nm, respectively, as determined by SEM. The chemistry of the POSS substrates was tuned, and the effects on the self-assembly of the DBCP noted. The PDMS nanopatterns were used as etching mask in order to transfer the DBCP pattern to underlying silicon substrate by a complex plasma etch process yielding sub-15 nm silicon features.

Topology-Sensitive Microfluidic Filter for Polymers of Varying Stiffness

The separation of polymers based on their size, rigidity, and topology is an essential but also highly challenging task for nanoscience and engineering. Using hybrid molecular dynamics simulations that correctly take into account hydrodynamics, we have designed microfluidic channels for separating linear from ring polymers in dilute solutions. We establish that the transport velocity of the polymers is independent of their topology and rigidity when the channel walls are smooth and repulsive. However, when the walls are decorated with attractive spots arranged on lines parallel to the flow, ring polymers exhibit an order of magnitude higher transport velocity compared to linear chains. The spots induce a homeotropic-like reorientation of ring polymers close to walls leading to a tank treading motion along them, whereas linear chains are immobilized upon adsorption. This mechanism becomes more enhanced with increasing polymer rigidity. The presented technique holds thus promise for reliably separating nanoparticles based on their topology.

Scaling behavior of nanoimprint and nanoprinting lithography for producing nanostructures of molybdenum disulfide

Top-down lithography techniques are needed for manufacturing uniform device structures based on emerging 2D-layered materials. Mechanical exfoliation approaches based on nanoimprint and nanoprint principles are capable of producing ordered arrays of multilayer transition metal dichalcogenide microstructures with a high uniformity of feature dimensions. In this study, we present a study on the applicability of nanoimprint-assisted shear exfoliation for generating ultrathin monolayer and few-layer MoS₂ structures as well as the critical limits of feature dimensions produced via such nanoimprint and nanoprint-based processes. In particular, this work shows that give a lateral feature size of MoS₂ structures that are pre-patterned on a bulk stamp, there exists a critical thickness or aspect ratio value, below which the exfoliated layered structures exhibit major defects. To exfoliate a high-quality, uniform monolayer or few-layer structures, the characteristic lateral feature sizes of such structures need to be in the sub-100 nm regimes. In addition, the exfoliated MoS₂ flakes of critical thicknesses exhibit prominent interlayer twisting features on their cleaved surfaces. Field-effect transistors made from these MoS₂ flakes exhibit multiple (or quasi-analog-tunable) charge memory states. This work advances the knowledge regarding the limitations and application scope of nanoimprint and nanoprint processes in manufacturing nano/microstructures based on layered materials and provides a method for producing multi-bit charge memory devices.

Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods

Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined "top-down" and "bottom-up" methods: nanoimprint lithography (NIL) and block copolymer (BCP) lithography. Although techniques like those demonstrated here have been developed for nanolithographic application in the microelectronics processing industry, similar approaches could be utilized for sensor, fluidic, and optical-based devices. Thus, this article centers on looking at the possibility of generating isolated silica structures on substrates. NIL was used to create intriguing three-dimensional (3-D) polyhedral oligomeric silsesquioxane (POSS) topographical arrays that guided and confined polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) BCP nanofeatures in isolated regions. A cylinder forming PS-b-PDMS BCP system was successfully etched using a one-step etching process to create line-space arrays with a period of 35 nm in confined POSS arrays. We highlight large-area (>6 μm) coverage of line-space arrays in 3-D topographies that could potentially be utilized, for example, in nanofluidic systems. Aligned features for directed self-assembly application are also demonstrated. The high-density, confined silicon oxide nanofeatures in soft lithographic templates over macroscopic areas illustrate the advantages of integrating distinct lithographic methods for attaining discrete features in the deep nanoscale regime.

Simple and scalable preparation of master mold for nanoimprint lithography

Nanoimprint lithography (NIL) is one of the most prominent bottom-up techniques for duplicating nanostructures with a high throughput. However, fabrication of starting master mold commonly requires expensive equipment of top-down techniques, or additional steps to transfer the fabricated patterns from bottom-up methods. Here we demonstrate that a SiO₂ nanostructure manufactured from a self-assembled block copolymer, polystyrene-b-polydimethylsiloxane (PS-b-PDMS), directly serves as a master mold for NIL without further modification. A hexagonally aligned pattern over the entire substrate is established using a simple technique; solvent annealing and etching. Etching also plays an important role in endowing fluorine on the surface of SiO₂, thus promoting smooth demolding upon imprinting. The obtained pattern of the SiO₂ nanostructure is transferred to a polymer surface using UV nanoimprint. Identical patterns of the SiO₂ nanostructure are elaborately reproduced on Ni and Cu nanodot arrays via electroplating on the polymer transcript, which was verified by morphological observations. The uniformity of the replicated Ni nanodot array is evaluated using spectroscopic ellipsometry. The measured optical response of the Ni nanodot is validated by electromagnetically simulated results, indicating that the pattern transfer is not limited to a small local area. In addition, the durability of the SiO₂ mold pattern is corroborated after the imprinting process, thus guaranteeing the reusability of the fabricated nanostructure as a master mold. The proposed approach does not require any high-end lithographic techniques; this may result in significant cost and time reductions in future nanofabrication.

Mechanistic investigations of confinement effects on the self-assembly of symmetric amphiphilic copolymers in thin films

The self-assembly of a copolymer thin film, whose molecular structure is composed of one hydrophobic branch (denoted in green) and two hydrophilic branches (denoted in red), gives (a) cylindrical structure, (b) micellar structure, and (c) lamellar structure.

A Novel Nanofabrication Technique of Silicon-Based Nanostructures

A novel nanofabrication technique which can produce highly controlled silicon-based nanostructures in wafer scale has been proposed using a simple amorphous silicon (α-Si) material as an etch mask. SiO₂ nanostructures directly fabricated can serve as nanotemplates to transfer into the underlying substrates such as silicon, germanium, transistor gate, or other dielectric materials to form electrically functional nanostructures and devices. In this paper, two typical silicon-based nanostructures such as nanoline and nanofin have been successfully fabricated by this technique, demonstrating excellent etch performance. In addition, silicon nanostructures fabricated above can be further trimmed to less than 10 nm by combing with assisted post-treatment methods. The novel nanofabrication technique will be expected a new emerging technology with low process complexity and good compatibility with existing silicon integrated circuit and is an important step towards the easy fabrication of a wide variety of nanoelectronics, biosensors, and optoelectronic devices.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.

CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask

We propose a CMOS-compatible top-down fabrication technique of highly-ordered and periodic SiO2 nanostructures using a single amorphous silicon (α-Si) mask layer. The α-Si mask pattern is precisely transferred into the underlying SiO2 substrate material with a high fidelity by a novel top-down fabrication. It is the first time for α-Si film used as an etch mask to fabricate SiO2 nanostructures including nanoline, nanotrench, and nanohole arrays. It is observed that the α-Si mask can significantly reduce the pattern edge roughness and achieve highly uniform and smooth sidewalls. This behavior may be attributed to the presence of high concentration of dangling bonds in α-Si mask surface. By controlling the process condition, it is possible to achieve a desired vertical etched profile with a controlled size. Our results demonstrate that SiO2 pattern as small as sub-20 nm may be achievable. The obtained SiO2 pattern can be further used as a nanotemplate to produce periodic or more complex silicon nanostructures. Moreover, this novel top-down approach is a potentially universal method that is fully compatible with the currently existing Si-based CMOS technologies. It offers a greater flexibility for the fabrication of various nanoscale devices in a simple and efficient way.

High χ-Low N Block Polymers: How Far Can We Go?

Block polymers incorporating highly incompatible segments are termed "high χ" polymers, where χ is the Flory-Huggins interaction parameter. These materials have attracted a great deal of interest because low molar mass versions allow for the formation of microphase-separated domains with very small (<10 nm) feature sizes useful for nanopatterning at these extreme dimensions. Given that well-established photolithographic techniques now face difficult challenges of implementation at scales of 10 nm and below, the drive to further develop high χ block polymers is motivated by trends in the microelectronics industry. This Viewpoint highlights our perspective on this niche of block polymer self-assembly. We first briefly review the relevant recent literature, exploring the various block polymer compositions that have been specifically designed for small feature size patterning. We then overview the now standard method for the benchmarking χ values between different pairs of polymers and the consequences of low N and high χ on the thermodynamic aspects of microphase separation. Finally, we comment on restrictions going forward and offer our perspective on the future of this exciting area of block polymer self-assembly.

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.

The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography

We explore the lithographic limits of lamellae-forming PS-b-PMMA block copolymers by performing directed self-assembly and pattern transfer on a range of PS-b-PMMA materials having a full pitch from 27 to 18.5 nm. While directed self-assembly on chemical contrast patterns was successful with all the materials used in this study, clean removal of PMMA domains and subsequent pattern transfer could only be sustained down to 22 nm full pitch. We attribute this limitation to the width of the interface, which may represent more than half of the domain width for materials with a critical dimension below 10 nm. With the limit of pattern transfer for PS-b-PMMA set at ∼11 nm, we propose an integration scheme suitable for bit patterned media for densities above 1.6 Tdot/in(2), which require features below this limit. Directed self-assembly was carried out on chemical contrast patterns made by a rotary e-beam lithography system, and pattern transfer was carried out to demonstrate fabrication of large area (up to 25 mm-wide annular band of circular tracks) nanoimprint templates for bit patterned media. We also demonstrate compatibility with hard disk drive architecture by fabricating patterns with skewed radial lines with constant angular pitch and with servo patterns that are needed in hard disk drives to generate a radial positional error signal (PES).

Mechanistic Influence of Nanometer Length-Scale Surface Chemistry on DNA Hybridization

Hybridization of surface-immobilized oligonucleotides to their complementary counterparts is central to the rational design of novel nanodevices and DNA sensors. In this study, we have adopted a unified approach of combining sensing experiments with molecular dynamics simulations to characterize the hybridization of a 23 nucleotide long single-strand probe DNA tethered to a gold surface. Experiments indicate significant conformational changes of DNA in close vicinity (∼1 nm) of the gold surface upon hybridization and also conformational heterogeneity within hybridized DNA, consistent with simulation results. Simulations show that the conformational heterogeneity on a gold surface arises due to stabilization of surface-adsorbed partial and full duplexes, resulting in impeded hybridization in comparison to what observed on a repulsive surface. Furthermore, these simulations indicate that hybridization could be improved by tuning the nonspecific adsorption on a nanopatterned surface with an optimal patterning length. Simulations were performed on the probe tethered to gold nanodots of varying (2-8 nm) diameter. An improved hybridization of the present probe sequence was only observed for the 6 nm gold dots patterned on a repulsive surface. Results reveal that the 2D nanoconfinement provided by the 6 nm gold dot is optimal for reducing conformational heterogeneity for the specific sequence used in this study. Thus, improved DNA hybridization can be achieved on a gold nanodot patterned repulsive surface, where the optimal dot diameter will depend on the probe length and sequence. In summary, this study provides mechanistic insights onto hybridization on gold and offers a unique method toward improved hybridization on a nanopatterned surface with an optimized patterning length.

Combined epitaxial self-assembly of block copolymer lamellae on a hexagonal pre-pattern within microgrooves

The directed self-assembly (DSA) of block copolymers (BCPs) has emerged as an alternative method to replace or complement conventional photolithography as a result of the approximately 10 nm scale of microdomain ordering, the variety of microstructures that can be obtained and its compatibility with current lithographic processes. In DSA, BCP microdomains are controlled via guide patterns and two main techniques are popular: graphoepitaxy and chemoepitaxy assembly. We have demonstrated a simple and feasible technology for a DSA process by combining graphoepitaxy with "inexpensive" chemoepitaxial assembly to improve the alignment of the lamellar microdomains. For chemoepitaxial assembly, the hexagonal surface patterns from cross-linkable, cylinder-forming BCP were used to guide the graphoepitaxial assembly of the overlying BCP lamellar film. When the guiding patterns were prepared on the hexagonal patterns, it was found that the degree of lamellar alignment was significantly improved compared with the lamellar alignment on the homogeneous neutral layers. Simulation results suggested that the underlying hexagonal pattern can assist the lamellar alignment by reducing the large number of orientation states of the lamellar layers. This strategy is applicable to various nanofabrication processes that require a high degree of fidelity in controlling the nanopatterns over large areas with reduced costs.

Self-Assembly of PS-b-PDMS on a Tunable PDMS Template with Nanoscale Channels and Enhanced Anisotropic Wetting

In this article, we systematically studied the self-assembly of poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) on a poly(dimethylsiloxane) (PDMS) substrate with nanoscale channels. The channeled PDMS substrate was achieved by a simple replica molding method. To decrease the effect that the subsequent solvent treatments had in distorting the soft PDMS substrate, a simple UV/O3 treatment was provided before the self-assembly, resulting in a relatively stable, harder and hydrophilic silicon oxide (SiO2) layer on the channeled PDMS surface. Ultimately, the isotropic SiO2 nanopatterns with spherical and long cylindrical morphologies were successfully fabricated by the self-assembly of two kinds of PS-b-PDMS on the PDMS substrate with nanoscale channels, respectively. In particular, we demonstrated that the introduction of isotropic SiO2 patterns is an effective approach to greatly enhance anisotropic wetting rather than that of the anisotropic structure with channels.