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Shao B, Chen Z, Su H, Peng S, Song M. The Latest Advances in Ink-Based Nanogenerators: From Materials to Applications. Int J Mol Sci 2024; 25:6152. [PMID: 38892343 PMCID: PMC11172637 DOI: 10.3390/ijms25116152] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/09/2024] [Revised: 05/24/2024] [Accepted: 05/28/2024] [Indexed: 06/21/2024] Open
Abstract
Nanogenerators possess the capability to harvest faint energy from the environment. Among them, thermoelectric (TE), triboelectric, piezoelectric (PE), and moisture-enabled nanogenerators represent promising approaches to micro-nano energy collection. These nanogenerators have seen considerable progress in material optimization and structural design. Printing technology has facilitated the large-scale manufacturing of nanogenerators. Although inks can be compatible with most traditional functional materials, this inevitably leads to a decrease in the electrical performance of the materials, necessitating control over the rheological properties of the inks. Furthermore, printing technology offers increased structural design flexibility. This review provides a comprehensive framework for ink-based nanogenerators, encompassing ink material optimization and device structural design, including improvements in ink performance, control of rheological properties, and efficient energy harvesting structures. Additionally, it highlights ink-based nanogenerators that incorporate textile technology and hybrid energy technologies, reviewing their latest advancements in energy collection and self-powered sensing. The discussion also addresses the main challenges faced and future directions for development.
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Affiliation(s)
- Bingqian Shao
- School of Applied Science and Technology, Hainan University, Haikou 570228, China; (B.S.); (Z.C.); (H.S.); (S.P.)
| | - Zhitao Chen
- School of Applied Science and Technology, Hainan University, Haikou 570228, China; (B.S.); (Z.C.); (H.S.); (S.P.)
| | - Hengzhe Su
- School of Applied Science and Technology, Hainan University, Haikou 570228, China; (B.S.); (Z.C.); (H.S.); (S.P.)
| | - Shuzhe Peng
- School of Applied Science and Technology, Hainan University, Haikou 570228, China; (B.S.); (Z.C.); (H.S.); (S.P.)
| | - Mingxin Song
- School of Electronic Science and Technology, Hainan University, Haikou 570228, China
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Zhang D, Ramiah J, Cagirici M, Saglik K, Solco SFD, Cao J, Xu J, Suwardi A. Thermoelectric nanowires for dense 3D printed architectures. MATERIALS HORIZONS 2024; 11:847-854. [PMID: 38037761 DOI: 10.1039/d3mh01646c] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/02/2023]
Abstract
The large-scale employment of 3D printed inorganic thermoelectrics is primarily constrained because of their lower efficiencies as compared to those fabricated from conventional methods such as spark plasma sintering and hot-pressing. This originates from the significant challenge in the densification of printed parts, particularly through the direct-ink-writing fabrication process, which demands a high binder content for printability. To achieve high-density printed thermoelectrics, the ink formulation process often involves the addition of substantial filler content and sintering aids, coupled with prolonged sintering periods. Here, we propose a strategy to resolve the low densification issue of 3D printed thermoelectrics through a binder-less and sintering aid-free thermoelectric nanowire ink system that can achieve dense thermoelectric structures (up to 82.5% theoretical density). The increase in density and corresponding enhancement of thermoelectric material efficiency are attained in a more tunable and controlled manner without compromising the material composition. A high filler-derived density index (FDI) of 2.51 is also achieved, implying the potential to obtain high-density parts with minimal filler content, thus unlocking a cascade of profound impacts. Crucially, this advancement enables the possibilities of anisotropic engineering in thermoelectric materials, thereby shattering the limitations that have hindered the widespread adoption of 3D printed inorganic thermoelectrics.
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Affiliation(s)
- Danwei Zhang
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
| | - Jayanthi Ramiah
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
- School of Chemistry, The University of Sydney, Camperdown, NSW 2050, Australia
| | - Mehmet Cagirici
- Singapore Centre for 3D Printing, Nanyang Technological University, 65 Nanyang Drive, Singapore, 639798
| | - Kivanc Saglik
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
- School of Materials Science and Engineering, College of Engineering, Nanyang Technological University, Singapore, 639798
| | - Samantha Faye Duran Solco
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
| | - Jing Cao
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
| | - Jianwei Xu
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
- Institute of Sustainability for Chemicals, Energy and Environment, Agency for Science, Technology and Research (A*STAR), Singapore, 627833
| | - Ady Suwardi
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore, 138634.
- Department of Materials Science and Engineering, College of Design and Engineering, National University of Singapore, Singapore, 117575
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Schenk FM, Zellweger T, Kumaar D, Bošković D, Wintersteller S, Solokha P, De Negri S, Emboras A, Wood V, Yarema M. Phase-Change Memory from Molecular Tellurides. ACS NANO 2024; 18:1063-1072. [PMID: 38117038 PMCID: PMC10786157 DOI: 10.1021/acsnano.3c10312] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/20/2023] [Revised: 12/13/2023] [Accepted: 12/15/2023] [Indexed: 12/21/2023]
Abstract
Phase-change memory (PCM) is an emerging memory technology based on the resistance contrast between the crystalline and amorphous states of a material. Further development and realization of PCM as a mainstream memory technology rely on innovative materials and inexpensive fabrication methods. Here, we propose a generalizable and scalable solution-processing approach to synthesize phase-change telluride inks in order to meet demands for high-throughput material screening, increased energy efficiency, and advanced device architectures. Bulk tellurides, such as Sb2Te3, GeTe, Sc2Te3, and TiTe2, are dissolved and purified to obtain inks of molecular metal telluride complexes. This allowed us to unlock a wide range of solution-processed ternary tellurides by the simple mixing of binary inks. We demonstrate accurate and quantitative composition control, including prototype materials (Ge-Sb-Te) and emerging rare-earth-metal telluride-doped materials (Sc-Sb-Te). Spin-coating and annealing convert ink formulations into high-quality, phase-pure telluride films with preferred orientation along the (00l) direction. Deposition engineering of liquid tellurides enables thickness-tunable films, infilling of nanoscale vias, and film preparation on flexible substrates. Finally, we demonstrate cyclable and non-volatile prototype memory devices, achieving performance indicators such as resistance contrast and low reset energy on par with state-of-the-art sputtered PCM layers.
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Affiliation(s)
- Florian M Schenk
- Chemistry and Materials Design Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Till Zellweger
- Integrated Systems Laboratory, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Dhananjeya Kumaar
- Chemistry and Materials Design Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Darijan Bošković
- Chemistry and Materials Design Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Simon Wintersteller
- Chemistry and Materials Design Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Pavlo Solokha
- Dipartimento di Chimica e Chimica Industriale, Università degli Studi di Genova, I-16146 Genova, Italy
| | - Serena De Negri
- Dipartimento di Chimica e Chimica Industriale, Università degli Studi di Genova, I-16146 Genova, Italy
| | - Alexandros Emboras
- Integrated Systems Laboratory, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Vanessa Wood
- Materials and Device Engineering Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
| | - Maksym Yarema
- Chemistry and Materials Design Group, Institute for Electronics, Department of Information Technology and Electrical Engineering, ETH Zurich, Gloriastrasse 35, CH-8092 Zurich, Switzerland
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Baek S, Jeong S, Ban HW, Ryu J, Kim Y, Gu DH, Son C, Yoon TS, Lee J, Son JS. Nanoscale Vertical Resolution in Optical Printing of Inorganic Nanoparticles. ACS NANO 2023. [PMID: 38044586 DOI: 10.1021/acsnano.3c09787] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/05/2023]
Abstract
Direct optical printing of functional inorganics shows tremendous potential as it enables the creation of intricate two-dimensional (2D) patterns and affordable design and production of various devices. Although there have been recent advancements in printing processes using short-wavelength light or pulsed lasers, the precise control of the vertical thickness in printed 3D structures has received little attention. This control is vital to the diverse functionalities of inorganic thin films and their devices, as they rely heavily on their thicknesses. This lack of research is attributed to the technical intricacy and complexity involved in the lithographic processes. Herein, we present a generalized optical 3D printing process for inorganic nanoparticles using maskless digital light processing. We develop a range of photocurable inorganic nanoparticle inks encompassing metals, semiconductors, and oxides, combined with photolinkable ligands and photoacid generators, enabling the direct solidification of nanoparticles in the ink medium. Our process creates complex and large-area patterns with a vertical resolution of ∼50 nm, producing 50-nm-thick 2D films and several micrometer-thick 3D architectures with no layer height difference via layer-by-layer deposition. Through fabrication and operation of multilayered switching devices with Au electrodes and Ag-organic resistive layers, the feasibility of our process for cost-effective manufacturing of multilayered devices is demonstrated.
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Affiliation(s)
- Seongheon Baek
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Sanggyun Jeong
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Hyeong Woo Ban
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Jiyeon Ryu
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Yoonkyum Kim
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Da Hwi Gu
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Changil Son
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Tae-Sik Yoon
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology, Ulsan 44919, Republic of Korea
| | - Jiseok Lee
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Jae Sung Son
- Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Gyeongsangbuk-do, 37673, Republic of Korea
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