1
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Castelló O, Baptista SML, Watanabe K, Taniguchi T, Diez E, Velázquez-Pérez JE, Meziani YM, Caridad JM, Delgado-Notario JA. Impact of device resistances in the performance of graphene-based terahertz photodetectors. FRONTIERS OF OPTOELECTRONICS 2024; 17:19. [PMID: 38862706 PMCID: PMC11166907 DOI: 10.1007/s12200-024-00122-6] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/27/2024] [Accepted: 05/16/2024] [Indexed: 06/13/2024]
Abstract
In recent years, graphene field-effect-transistors (GFETs) have demonstrated an outstanding potential for terahertz (THz) photodetection due to their fast response and high-sensitivity. Such features are essential to enable emerging THz applications, including 6G wireless communications, quantum information, bioimaging and security. However, the overall performance of these photodetectors may be utterly compromised by the impact of internal resistances presented in the device, so-called access or parasitic resistances. In this work, we provide a detailed study of the influence of internal device resistances in the photoresponse of high-mobility dual-gate GFET detectors. Such dual-gate architectures allow us to fine tune (decrease) the internal resistance of the device by an order of magnitude and consequently demonstrate an improved responsivity and noise-equivalent-power values of the photodetector, respectively. Our results can be well understood by a series resistance model, as shown by the excellent agreement found between the experimental data and theoretical calculations. These findings are therefore relevant to understand and improve the overall performance of existing high-mobility graphene photodetectors.
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Affiliation(s)
- O Castelló
- Department of Applied Physics, University of Salamanca, 37008, Salamanca, Spain
- Unidad de Excelencia en Luz y Materia Estructurada (LUMES), University of Salamanca, 37008, Salamanca, Spain
| | | | - K Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - T Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - E Diez
- Nanotechnology Group, USAL-Nanolab, University of Salamanca, 37008, Salamanca, Spain
| | - J E Velázquez-Pérez
- Department of Applied Physics, University of Salamanca, 37008, Salamanca, Spain
- Nanotechnology Group, USAL-Nanolab, University of Salamanca, 37008, Salamanca, Spain
| | - Y M Meziani
- Department of Applied Physics, University of Salamanca, 37008, Salamanca, Spain
- Nanotechnology Group, USAL-Nanolab, University of Salamanca, 37008, Salamanca, Spain
| | - J M Caridad
- Department of Applied Physics, University of Salamanca, 37008, Salamanca, Spain.
- Unidad de Excelencia en Luz y Materia Estructurada (LUMES), University of Salamanca, 37008, Salamanca, Spain.
| | - J A Delgado-Notario
- Department of Applied Physics, University of Salamanca, 37008, Salamanca, Spain.
- Nanotechnology Group, USAL-Nanolab, University of Salamanca, 37008, Salamanca, Spain.
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2
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Caridad J, Castelló Ó, López Baptista SM, Taniguchi T, Watanabe K, Roskos HG, Delgado-Notario JA. Room-Temperature Plasmon-Assisted Resonant THz Detection in Single-Layer Graphene Transistors. NANO LETTERS 2024; 24:935-942. [PMID: 38165655 PMCID: PMC10811671 DOI: 10.1021/acs.nanolett.3c04300] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/07/2023] [Revised: 12/22/2023] [Accepted: 12/27/2023] [Indexed: 01/04/2024]
Abstract
Frequency-selective or even frequency-tunable terahertz (THz) photodevices are critical components for many technological applications that require nanoscale manipulation, control, and confinement of light. Within this context, gate-tunable phototransistors based on plasmonic resonances are often regarded as the most promising devices for the frequency-selective detection of THz radiation. The exploitation of constructive interference of plasma waves in such detectors promises not only frequency selectivity but also a pronounced sensitivity enhancement at target frequencies. However, clear signatures of plasmon-assisted resonances in THz detectors have been revealed only at cryogenic temperatures so far and remain unobserved at application-relevant room-temperature conditions. In this work, we demonstrate the sought-after room-temperature resonant detection of THz radiation in short-channel gated photodetectors made from high-quality single-layer graphene. The survival of this intriguing resonant regime at room temperature ultimately relies on the weak intrinsic electron-phonon scattering in monolayer graphene, which avoids the damping of the plasma oscillations present in the device channel.
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Affiliation(s)
- José
M. Caridad
- Department
of Applied Physics, University of Salamanca, Salamanca 37008, Spain
- Unidad
de Excelencia en Luz y Materia Estructurada (LUMES), Universidad de Salamanca, Salamanca 37008, Spain
| | - Óscar Castelló
- Department
of Applied Physics, University of Salamanca, Salamanca 37008, Spain
- Unidad
de Excelencia en Luz y Materia Estructurada (LUMES), Universidad de Salamanca, Salamanca 37008, Spain
| | | | - Takashi Taniguchi
- Research
Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Kenji Watanabe
- Research
Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Hartmut G. Roskos
- Physikalisches
Institut, Johann Wolfgang Goethe-Universität, Max-von-Laue-Str. 1, Frankfurt am Main D-60438, Germany
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3
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Qian C, Wang R, Shen H, Xia J, Cui D, Sun K, Liu H, Guo C, Yu F, Li J, Bao W. Computational-Guided Design of Photoelectrode Active Materials for Light-Assisted Energy Storage. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2023; 19:e2304045. [PMID: 37485629 DOI: 10.1002/smll.202304045] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/14/2023] [Revised: 07/06/2023] [Indexed: 07/25/2023]
Abstract
The design of a novel photoelectric integrated system is considered to be an efficient way to utilize and store inexhaustible solar energy. However, the mechanism of photoelectrode under illuminate conditions is still unclear. Density functional theory (DFT) provides standardized analysis and becomes a powerful way to explain the photoelectrochemical mechanism. Herein, the feasibility of four metal oxide configurations as photoelectrode materials by using a high throughput calculation method based on DFT are investigated. According to the photoelectrochemical properties, band structure and density of states are calculated, and the intercalate/deintercalate simulation is performed with adsorption configuration. The calculation indicates that the band gap of Fe2 CoO4 (2.404 eV) is narrower than that of Co3 O4 (2.553 eV), as well as stronger adsorption energy (-3.293 eV). The relationship between the electronic structure and the photoelectrochemical performance is analyzed and verified according to the predicted DFT results by subsequent experiments. Results show that the Fe2 CoO4 photoelectrode samples exhibit higher coulombic efficiency (97.4%) than that under dark conditions (94.9%), which is consistent with the DFT results. This work provides a general method for the design of integrated photoelectrode materials and is expected to be enlightening for the adjustment of light-assisted properties of multifunctional materials.
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Affiliation(s)
- Chengfei Qian
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Ronghao Wang
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Hao Shen
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Jingjie Xia
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Dingyu Cui
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Kaiwen Sun
- Australian Centre for Advanced Photovoltaics, School of Photovoltaic and Renewable Energy Engineering, University of New South Wales, Sydney, 2052, Australia
| | - He Liu
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Cong Guo
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Feng Yu
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Jingfa Li
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
| | - Weizhai Bao
- Institute of Advanced Materials and Flexible Electronics (IAMFE), School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ninliu Road, Nanjing, 210044, P. R. China
- Department of Materials Physics, School of Chemistry and Materials Science, Nanjing University of Information Science and Technology, 219 Ningliu Road, Nanjing, 210044, P. R. China
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Han S, Zhou S, Mei L, Guo M, Zhang H, Li Q, Zhang S, Niu Y, Zhuang Y, Geng W, Bi K, Chou X. Nanoelectromechanical Temperature Sensor Based on Piezoresistive Properties of Suspended Graphene Film. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:1103. [PMID: 36985997 PMCID: PMC10058838 DOI: 10.3390/nano13061103] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/18/2023] [Revised: 03/10/2023] [Accepted: 03/11/2023] [Indexed: 06/18/2023]
Abstract
The substrate impurities scattering will lead to unstable temperature-sensitive behavior and poor linearity in graphene temperature sensors. And this can be weakened by suspending the graphene structure. Herein, we report a graphene temperature sensing structure, with suspended graphene membranes fabricated on the cavity and non-cavity SiO2/Si substrate, using monolayer, few-layer, and multilayer graphene. The results show that the sensor provides direct electrical readout from temperature to resistance transduction by the nano piezoresistive effect in graphene. And the cavity structure can weaken the substrate impurity scattering and thermal resistance effect, which results in better sensitivity and wide-range temperature sensing. In addition, monolayer graphene is almost no temperature sensitivity. And the few-layer graphene temperature sensitivity, lower than that of the multilayer graphene cavity structure (3.50%/°C), is 1.07%/°C. This work demonstrates that piezoresistive in suspended graphene membranes can effectively enhance the sensitivity and widen the temperature sensor range in NEMS temperature sensors.
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Affiliation(s)
- Shuqi Han
- School of Instrument Science and Technology, North University of China, Taiyuan 030051, China
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
| | - Siyuan Zhou
- School of Instrument Science and Technology, North University of China, Taiyuan 030051, China
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
| | - Linyu Mei
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
- School of mechanical engineering, North University of China, Taiyuan 030051, China
| | - Miaoli Guo
- School of mechanical engineering, North University of China, Taiyuan 030051, China
| | - Huiyi Zhang
- School of Instrument Science and Technology, North University of China, Taiyuan 030051, China
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
| | - Qiannan Li
- School of mechanical engineering, North University of China, Taiyuan 030051, China
| | - Shuai Zhang
- School of mechanical engineering, North University of China, Taiyuan 030051, China
| | - Yaokai Niu
- School of mechanical engineering, North University of China, Taiyuan 030051, China
| | - Yan Zhuang
- School of Instrument Science and Technology, North University of China, Taiyuan 030051, China
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
| | - Wenping Geng
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
- School of Semiconductors and Physics, North University of China, Taiyuan 030051, China
| | - Kaixi Bi
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
- School of Semiconductors and Physics, North University of China, Taiyuan 030051, China
| | - Xiujian Chou
- School of Instrument Science and Technology, North University of China, Taiyuan 030051, China
- Key Laboratory of National Defense Science and Technology on Electronic Measurement, School of Instrument and Electronics, North University of China, Taiyuan 030051, China
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