Gas-Source CVD Growth of Atomic Layered WS2 from WF6 and H2S Precursors with High Grain Size Uniformity

Frictional resistance and delamination mechanisms in 2D tungsten diselenide revealed by multi-scale scratch andin-situobservations

Friction phenomena in two-dimensional (2D) materials are conventionally studied at atomic length scales in a few layers using low-load techniques. However, the advancement of 2D materials for semiconductor and electronic applications requires an understanding of friction and delamination at a few micrometers length scale and hundreds of layers. To bridge this gap, the present study investigates frictional resistance and delamination mechanisms in 2D tungsten diselenide (WSe2) at 10µm length and 100-500 nm depths using an integrated atomic force microscopy (AFM), high-load nanoscratch, andin-situscanning electron microscopic (SEM) observations. AFM revealed a heterogenous distribution of frictional resistance in a single WSe2layer originating from surface ripples, with the mean increasing from 8.7 to 79.1 nN as the imposed force increased from 20 to 80 nN. High-loadin-situnano-scratch tests delineated the role of the individual layers in the mechanism of multi-layer delamination under an SEM. Delamination during scratch consists of stick-slip motion with friction force increasing in each successive slip, manifested as increasing slope of lateral force curves with scratch depth from 10.9 to 13.0 (× 103) Nm-1. Delamination is followed by cyclic fracture of WSe2layers where the puckering effect results in adherence of layers to the nanoscratch probe, increasing the local maximum of lateral force from 89.3 to 205.6µN. This establishment of the interconnectedness between friction in single-layer and delamination at hundreds of layers harbors the potential for utilizing these materials in semiconductor devices with reduced energy losses and enhanced performance.

Optical spectroscopic detection of Schottky barrier height at a two-dimensional transition-metal dichalcogenide/metal interface

Atomically thin two-dimensional transition-metal dichalcogenides (2D-TMDs) have emerged as semiconductors for next-generation nanoelectronics. As 2D-TMD-based devices typically utilize metals as the contacts, it is crucial to understand the properties of the 2D-TMD/metal interface, including the characteristics of the Schottky barriers formed at the semiconductor-metal junction. Conventional methods for investigating the Schottky barrier height (SBH) at these interfaces predominantly rely on contact-based electrical measurements with complex gating structures. In this study, we introduce an all-optical approach for non-contact measurement of the SBH, utilizing high-quality WS2/Au heterostructures as a model system. Our approach employs a below-bandgap pump to excite hot carriers from the gold into WS2 with varying thicknesses. By monitoring the resultant carrier density changes within the WS2 layers with a broadband probe, we traced the dynamics and magnitude of charge transfer across the interface. A systematic sweep of the pump wavelength enables us to determine the SBH values and unveil an inverse relationship between the SBH and the thickness of the WS2 layers. First-principles calculations reveal the correlation between the probability of injection and the density of states near the conduction band minimum of WS2. The versatile optical methodology for probing TMD/metal interfaces can shed light on the intricate charge transfer characteristics within various 2D heterostructures, facilitating the development of more efficient and scalable nano-electronic and optoelectronic technologies.

Large-Scale 1T'-Phase Tungsten Disulfide Atomic Layers Grown by Gas-Source Chemical Vapor Deposition

The control of crystal polymorphism and exploration of metastable, two-dimensional, 1T'-phase, transition-metal dichalcogenides (TMDs) have received considerable research attention. 1T'-phase TMDs are expected to offer various opportunities for the study of basic condensed matter physics and for its use in important applications, such as devices with topological states for quantum computing, low-resistance contact for semiconducting TMDs, energy storage devices, and as hydrogen evolution catalysts. However, due to the high energy difference and phase change barrier between 1T' and the more stable 2H-phase, there are few methods that can be used to obtain monolayer 1T'-phase TMDs. Here, we report on the chemical vapor deposition (CVD) growth of 1T'-phase WS₂ atomic layers from gaseous precursors, i.e., H₂S and WF₆, with alkali metal assistance. The gaseous nature of the precursors, reducing properties of H₂S, and presence of Na⁺, which acts as a countercation, provided an optimal environment for the growth of 1T'-phase WS₂, resulting in the formation of high-quality submillimeter-sized crystals. The crystal structure was characterized by atomic-resolution scanning transmission electron microscopy, and the zigzag chain structure of W atoms, which is characteristic of the 1T' structure, was clearly observed. Furthermore, the grown 1T'-phase WS₂ showed superconductivity with the transition temperature in the 2.8-3.4 K range and large upper critical field anisotropy. Thus, alkali metal assisted gas-source CVD growth is useful for realizing large-scale, high-quality, phase-engineered TMD atomic layers via a bottom-up synthesis.

Surface Diffusion-Limited Growth of Large and High-Quality Monolayer Transition Metal Dichalcogenides in Confined Space of Microreactor

Transition metal dichalcogenides (TMDCs), including MoS₂ and WS₂, are potential candidates for next-generation semiconducting materials owing to their atomically thin structure and strong optoelectrical responses, which allow for flexible optoelectronic applications. Monolayer TMDCs have been grown utilizing chemical vapor deposition (CVD) techniques. Enhancing the domain size with high crystallinity and forming heterostructures are important topics for practical applications. In this study, the size of monolayer WS₂ increased via the vapor-liquid-solid growth-based CVD technique utilizing the confined space of the substrate-stacked microreactor. The use of spin-coated metal salts (Na₂WO₄ and Na₂MoO₄) and organosulfur vapor allowed us to precisely control the source supply and investigate the growth in a systematic manner. We obtained a relatively low activation energy for growth (1.02 eV), which is consistent with the surface diffusion-limited growth regime observed in the confined space. Through systematic photoluminescence (PL) analysis, we determined that a growth temperature of ∼820 °C is optimal for producing high-quality WS₂ with a narrow PL peak width (∼35 meV). By controlling the source balance of W and S, we obtained large-sized fully monolayered WS₂ (∼560 μm) and monolayer WS₂ with bilayer spots (∼1100 μm). Combining two distinct sources of transition metals, WS₂/MoS₂ lateral heterostructures were successfully created. In electrical transport measurements, the monolayer WS₂ grown under optimal conditions has a high on-current (∼70 μA/μm), on/off ratio (∼5 × 10⁸), and a field-effect mobility of ∼7 cm²/(V s). The field-effect transistor displayed an intrinsic photoresponse with wavelength selectivity that originated from the photoexcited carriers.

Gas-Phase Alkali Metal-Assisted MOCVD Growth of 2D Transition Metal Dichalcogenides for Large-Scale Precise Nucleation Control

Advances in large-area and high-quality 2D transition metal dichalcogenides (TMDCs) growth are essential for semiconductor applications. Here, the gas-phase alkali metal-assisted metal-organic chemical vapor deposition (GAA-MOCVD) of 2D TMDCs is reported. It is determined that sodium propionate (SP) is an ideal gas-phase alkali-metal additive for nucleation control in the MOCVD of 2D TMDCs. The grain size of MoS₂ in the GAA-MOCVD process is larger than that in the conventional MOCVD process. This method can be applied to the growth of various TMDCs (MoS₂ , MoSe₂ , WSe₂ , and WSe₂ ) and the generation of large-scale continuous films. Furthermore, the growth behaviors of MoS₂ under different SP and oxygen injection time conditions are systematically investigated to determine the effects of SP and oxygen on nucleation control in the GAA-MOCVD process. It is found that the combination of SP and oxygen increases the grain size and nucleation suppression of MoS₂ . Thus, the GAA-MOCVD with a precise and controllable supply of a gas-phase alkali metal and oxygen allows achievement of optimum growth conditions that maximizes the grain size of MoS₂ . It is expected that GAA-MOCVD can provide a way for batch fabrication of large-scale atomically thin electronic devices based on 2D semiconductors.

Chemical vapor deposition of 2D materials: A review of modeling, simulation, and machine learning studies

Chemical vapor deposition (CVD) is extensively used to produce large-area two-dimensional (2D) materials. Current research is aimed at understanding mechanisms underlying the nucleation and growth of various 2D materials, such as graphene, hexagonal boron nitride (hBN), and transition metal dichalcogenides (e.g., MoS₂/WSe₂). Herein, we survey the vast literature regarding modeling and simulation of the CVD growth of 2D materials and their heterostructures. We also focus on newer materials, such as silicene, phosphorene, and borophene. We discuss how density functional theory, kinetic Monte Carlo, and reactive molecular dynamics simulations can shed light on the thermodynamics and kinetics of vapor-phase synthesis. We explain how machine learning can be used to develop insights into growth mechanisms and outcomes, as well as outline the open knowledge gaps in the literature. Our work provides consolidated theoretical insights into the CVD growth of 2D materials and presents opportunities for further understanding and improving such processes

Recent Advances in WS2 and Its Based Heterostructures for Water-Splitting Applications

The energy from fossil fuels has been recognized as a main factor of global warming and environmental pollution. Therefore, there is an urgent need to replace fossil fuels with clean, cost-effective, long-lasting, and environmentally friendly fuel to solve the future energy crisis of the world. Therefore, the development of clean, sustainable, and renewable energy sources is a prime concern. In this regard, solar energy-driven hydrogen production is considered as an overriding opening for renewable and green energy by virtue of its high energy efficiency, high energy density, and non-toxicity along with zero emissions. Water splitting is a promising technology for producing hydrogen, which represents a potentially and environmentally clean fuel. Water splitting is a widely known process for hydrogen production using different techniques and materials. Among different techniques of water splitting, electrocatalytic and photocatalytic water splitting using semiconductor materials have been considered as the most scalable and cost-effective approaches for the commercial production of sustainable hydrogen. In order to achieve a high yield of hydrogen from these processes, obtaining a suitable, efficient, and stable catalyst is a significant factor. Among the different types of semiconductor catalysts, tungsten disulfide (WS2) has been widely utilized as a catalytic active material for the water-splitting process, owing to its layered 2D structure and its interesting chemical, physical, and structural properties. However, WS2 suffers from some disadvantages that limit its performance in catalytic water splitting. Among the various techniques and strategies that have been constructed to overcome the limitations of WS2 is heterostructure construction. In this process, WS2 is coupled with another semiconducting material in order to facilitate the charge transfer and prevent the charge recombination, which will enhance the catalytic performance. This review aims to summarize the recent studies and findings on WS2 and its heterostructures as a catalyst in the electrocatalytic and photocatalytic water-splitting processes.

Two-Step Growth of Uniform Monolayer MoS2 Nanosheets by Metal-Organic Chemical Vapor Deposition

To achieve large area growth of transition metal dichalcogenides of uniform monolayer thickness, we demonstrate metal-organic chemical vapor deposition (MOCVD) growth under low pressure followed by a high-temperature sulfurization process under atmospheric pressure (AP). Following sulfurization, the MOCVD-grown continuous MoS₂ film transforms into compact triangular crystals of uniform monolayer thickness as confirmed from the sharp distinct photoluminescence peak at 1.8 eV. Raman and X-ray photoelectron spectroscopies confirm that the structural disorders and chalcogen vacancies inherent to the as-grown MOCVD film are substantially healed and carbon/oxygen contaminations are heavily suppressed. The as-grown MOCVD film has a Mo/S ratio of 1:1.6 and an average defect length of ∼1.56 nm, which improve to 1:1.97 and ∼21 nm, respectively, upon sulfurization. The effect of temperature and duration of the sulfurization process on the morphology and stoichiometry of the grown film is investigated in detail. Compared to the APCVD growth, this two-step growth process shows more homogenous distribution of the triangular monolayer MoS₂ domains across the entire substrate, while demonstrating comparable electrical performance.

Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting

Transition metal dichalcogenides (TMDs) are extensively researched in the past few years due to their two-dimensional layered structure similar to graphite. This group of materials offers tunable optoelectronic properties depending on the number of layers and therefore have a wide range of applications. Tungsten disulfide (WS₂) is one of such TMDs that has been studied relatively less compared to MoS₂. Herein, WS _x thin films are grown on several types of substrates by atomic layer deposition (ALD) using a new metal-organic precursor [tris(hexyne) tungsten monocarbonyl, W(CO)(CH₃CH₂C≡CCH₂CH₃)₃] and H₂S molecules at a relatively low temperature of 300 °C. The typical self-limiting film growth by varying both, precursor and reactant, is obtained with a relatively high growth per cycle value of ∼0.13 nm. Perfect growth linearity with negligible incubation period is also evident in this ALD process. While the as-grown films are amorphous with considerable S-deficiency, they can be crystallized as h-WS₂ film by post-annealing in the H₂S atmosphere above 700 °C as observed from x-ray diffractometry analysis. Several other analyses like Raman and x-ray photoelectron spectroscopy, transmission electron microscopy, UV-vis. spectroscopy are performed to find out the physical, optical, and microstructural properties of as-grown and annealed films. The post-annealing in H₂S helps to promote the S content in the film significantly as confirmed by the Rutherford backscattering spectrometry. Extremely thin (∼4.5 nm), as-grown WS _x films with excellent conformality (∼100% step coverage) are achieved on the dual trench substrate (minimum width: 15 nm, aspect ratio: 6.3). Finally, the thin films of WS _x (as-grown and 600/700 °C annealed) on W/Si and carbon cloth substrate are investigated for electrochemical hydrogen evolution reaction (HER). The as-grown WS _x shows poor performance towards HER and is attributed to the S-deficiency, amorphous character, and oxygen contamination of the WS _x film. Annealing the WS _x film at 700 °C results in the formation of a crystalline layered WS₂ phase, which significantly improves the HER performance of the electrode. The study reveals the importance of sulfur content and crystallinity on the HER performance of W-based sulfides.

Interface Kinetics Assisted Barrier Removal in Large Area 2D-WS2 Growth to Facilitate Mass Scale Device Production

Growth of monolayer WS2 of domain size beyond few microns is a challenge even today; and it is still restricted to traditional exfoliation techniques, with no control over the dimension. Here, we present the synthesis of mono- to few layer WS2 film of centimeter2 size on graphene-oxide (GO) coated Si/SiO2 substrate using the chemical vapor deposition CVD technique. Although the individual size of WS2 crystallites is found smaller, the joining of grain boundaries due to sp 2-bonded carbon nanostructures (~3-6 nm) in GO to reduced graphene-oxide (RGO) transformed film, facilitates the expansion of domain size in continuous fashion resulting in full coverage of the substrate. Another factor, equally important for expanding the domain boundary, is surface roughness of RGO film. This is confirmed by conducting WS2 growth on Si wafer marked with few scratches on polished surface. Interestingly, WS2 growth was observed in and around the rough surface irrespective of whether polished or unpolished. More the roughness is, better the yield in crystalline WS2 flakes. Raman mapping ascertains the uniform mono-to-few layer growth over the entire substrate, and it is reaffirmed by photoluminescence, AFM and HRTEM. This study may open up a new approach for growth of large area WS2 film for device application. We have also demonstrated the potential of the developed film for photodetector application, where the cycling response of the detector is highly repetitive with negligible drift.

Growth and Grain Boundaries in 2D Materials

Grain boundaries (GBs) are a kind of lattice imperfection widely existing in two-dimensional materials, playing a critical role in materials' properties and device performance. Related key issues in this area have drawn much attention and are still under intense investigation. These issues include the characterization of GBs at different length scales, the dynamic formation of GBs during the synthesis, the manipulation of the configuration and density of GBs for specific material functionality, and the understanding of structure-property relationships and device applications. This review will provide a general introduction of progress in this field. Several techniques for characterizing GBs, such as direct imaging by high-resolution transmission electron microscopy, visualization techniques of GBs by optical microscopy, plasmon propagation, or second harmonic generation, are presented. To understand the dynamic formation process of GBs during the growth, a general geometric approach and theoretical consideration are reviewed. Moreover, strategies controlling the density of GBs for GB-free materials or materials with tunable GB patterns are summarized, and the effects of GBs on materials' properties are discussed. Finally, challenges and outlook are provided.