Giant Electroresistive Ferroelectric Diode on 2DEG

Feld-induced modulation of two-dimensional electron gas at LaAlO3/SrTiO3 interface by polar distortion of LaAlO3

Since the discovery of two-dimensional electron gas at the LaAlO3/SrTiO3 interface, its intriguing physical properties have garnered significant interests for device applications. Yet, understanding its response to electrical stimuli remains incomplete. Our in-situ transmission electron microscopy analysis of a LaAlO3/SrTiO3 two-dimensional electron gas device under electrical bias reveals key insights. Inline electron holography visualized the field-induced modulation of two-dimensional electron gas at the interface, while electron energy loss spectroscopy showed negligible electromigration of oxygen vacancies. Instead, atom-resolved imaging indicated that electric fields trigger polar distortion in the LaAlO3 layer, affecting two-dimensional electron gas modulation. This study refutes the previously hypothesized role of oxygen vacancies, underscoring the lattice flexibility of LaAlO3 and its varied polar distortions under electric fields as central to two-dimensional electron gas dynamics. These findings open pathways for advanced oxide nanoelectronics, exploiting the interplay of polar and nonpolar distortions in LaAlO3.

Ferroelectric Tunnel Junctions Enhanced by a Polar Oxide Barrier Layer

Ferroelectric tunnel junctions (FTJs) have recently aroused significant interest due to the interesting physics controlling their properties and potential application in nonvolatile memory devices. In this work, we propose a new concept to design high-performance FTJs based on ferroelectric/polar-oxide composite barriers. Using density functional theory calculations, we model electronic and transport properties of LaNiO₃/PbTiO₃/LaAlO₃/LaNiO₃ tunnel junctions and demonstrate that an ultrathin polar LaAlO₃(001) layer strongly enhances their performance. We predict a tunneling electroresistance (TER) effect in these FTJs with an OFF/ON resistance ratio exceeding a factor of 10⁴ and ON state resistance as low as about 1 kΩμm². Such an enhanced performance is driven by the ionic charge at the PbTiO₃/LaAlO₃ interface, which significantly increases transmission across the FTJ when the ferroelectric polarization of PbTiO₃ is pointing against the intrinsic electric field produced by this ionic charge. This is due to the formation of a two-dimensional (2D) electron or hole gas, depending on the LaAlO₃ termination being (LaO)⁺ or (AlO₂)^-, respectively, which is formed to screen the polarization charge of the nonuniform polarization state. This 2D electron (hole) gas can be switched ON and OFF by the reversal of ferroelectric polarization, resulting in the giant TER effect. The proposed design suggests a new direction for creating FTJs with a stable and reversible ferroelectric polarization, a sizable TER effect, and a low-resistance-area product, as required for memory applications.

A possible superconductor-like state at elevated temperatures near metal electrodes in an LaAlO3/SrTiO3 interface

We experimentally investigated the transport properties near metal electrodes installed on a conducting channel in a LaAlO3/SrTiO3 interface. The local region around the Ti and Al electrodes has a higher electrical conductance than that of other regions, where the upper limits of the temperature and magnetic field can be well defined. Beyond these limits, the conductance abruptly decreases, as in the case of a superconductor. The samples with the Ti- or Al-electrode have an upper-limit temperature of approximately 4 K, which is 10 times higher than the conventional superconducting critical temperature of LaAlO3/SrTiO3 interfaces and delta-doped SrTiO3. This phenomenon is explained by the mechanism of electron transfer between the metal electrodes and electronic d-orbitals in the LaAlO3/SrTiO3 interface. The transferred electrons trigger a phase transition to a superconductor-like state. Our results contribute to the deep understanding of the superconductivity in the LaAlO3/SrTiO3 interface and will be helpful for the development of high-temperature interface superconductors.

Ferroelectric Polarization-Modulated Interfacial Fine Structures Involving Two-Dimensional Electron Gases in Pb(Zr,Ti)O3/LaAlO3/SrTiO3 Heterostructures

Interfacial fine structures of bare LaAlO₃/SrTiO₃ (LAO/STO) heterostructures are compared with those of LAO/STO heterostructures capped with upward-polarized Pb(Zr_0.1,Ti_0.9)O₃ (PZT_up) or downward-polarized Pb(Zr_0.5,Ti_0.5)O₃ (PZT_down) overlayers by aberration-corrected scanning transmission electron microscopy experiments. By combining the acquired electron energy-loss spectroscopy mapping, we are able to directly observe electron transfer from Ti⁴⁺ to Ti³⁺ and ionic displacements at the interface of bare LAO/STO and PZT_down/LAO/STO heterostructure unit cell by unit cell. No evidence of Ti³⁺ is observed at the interface of the PZT_up/LAO/STO samples. Furthermore, the confinement of the two-dimensional electron gas (2DEG) at the interface is determined by atomic-column spatial resolution. Compared with the bare LAO/STO interface, the 2DEG density at the LAO/STO interface is enhanced or depressed by the PZT_down or PZT_up overlayer, respectively. Our microscopy studies shed light on the mechanism of ferroelectric modulation of interfacial transport at polar/nonpolar oxide heterointerfaces, which may facilitate applications of these materials as nonvolatile memory.

First-principles study of interface doping in ferroelectric junctions

Effect of atomic monolayer insertion on the performance of ferroelectric tunneling junction is investigated in SrRuO3/BaTiO3/SrRuO3 heterostrucutures. Based on first-principles calculations, the atomic displacement, orbital occupancy, and ferroelectric polarization are studied. It is found that the ferroelectricity is enhanced when a (AlO2)(-) monolayer is inserted between the electrode SRO and the barrier BTO, where the relatively high mobility of doped holes effectively screen ferroelectric polarization. On the other hand, for the case of (LaO)(+) inserted layer, the doped electrons resides at the both sides of middle ferroelectric barrier, making the ferroelectricity unfavorable. Our findings provide an alternative avenue to improve the performance of ferroelectric tunneling junctions.