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Wang Y, Gao X, Yang K, Gu P, Lu X, Zhang S, Gao Y, Ren N, Dong B, Jiang Y, Watanabe K, Taniguchi T, Kang J, Lou W, Mao J, Liu J, Ye Y, Han Z, Chang K, Zhang J, Zhang Z. Quantum Hall phase in graphene engineered by interfacial charge coupling. NATURE NANOTECHNOLOGY 2022; 17:1272-1279. [PMID: 36411376 PMCID: PMC9747608 DOI: 10.1038/s41565-022-01248-4] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/26/2021] [Accepted: 09/29/2022] [Indexed: 06/05/2023]
Abstract
The quantum Hall effect can be substantially affected by interfacial coupling between the host two-dimensional electron gases and the substrate, and has been predicted to give rise to exotic topological states. Yet the understanding of the underlying physics and the controllable engineering of this interaction remains challenging. Here we demonstrate the observation of an unusual quantum Hall effect, which differs markedly from that of the known picture, in graphene samples in contact with an antiferromagnetic insulator CrOCl equipped with dual gates. Two distinct quantum Hall phases are developed, with the Landau levels in monolayer graphene remaining intact at the conventional phase, but largely distorted for the interfacial-coupling phase. The latter quantum Hall phase is even present close to the absence of a magnetic field, with the consequential Landau quantization following a parabolic relation between the displacement field and the magnetic field. This characteristic prevails up to 100 K in a wide effective doping range from 0 to 1013 cm-2.
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Affiliation(s)
- Yaning Wang
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China
- School of Material Science and Engineering, University of Science and Technology of China, Shenyang, China
- Liaoning Academy of Materials, Shenyang, China
| | - Xiang Gao
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China
| | - Kaining Yang
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China
| | - Pingfan Gu
- Collaborative Innovation Center of Quantum Matter, Beijing, China
- State Key Lab for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, China
| | - Xin Lu
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, China
| | - Shihao Zhang
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, China
- ShanghaiTech Laboratory for Topological Physics, ShanghaiTech University, Shanghai, China
| | - Yuchen Gao
- Collaborative Innovation Center of Quantum Matter, Beijing, China
- State Key Lab for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, China
| | - Naijie Ren
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China
| | - Baojuan Dong
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China
| | - Yuhang Jiang
- College of Materials Science and Optoelectronic Technology, University of Chinese Academy of Sciences, Beijing, China
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan
| | - Jun Kang
- Beijing Computational Science Research Center, Beijing, China
| | - Wenkai Lou
- State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China
| | - Jinhai Mao
- School of Physical Sciences and CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing, China.
| | - Jianpeng Liu
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, China.
- ShanghaiTech Laboratory for Topological Physics, ShanghaiTech University, Shanghai, China.
| | - Yu Ye
- Collaborative Innovation Center of Quantum Matter, Beijing, China.
- State Key Lab for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing, China.
| | - Zheng Han
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China.
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China.
- Liaoning Academy of Materials, Shenyang, China.
| | - Kai Chang
- State Key Laboratory for Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China.
| | - Jing Zhang
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Opto-Electronics, Shanxi University, Taiyuan, P. R. China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, P. R. China
| | - Zhidong Zhang
- Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China
- School of Material Science and Engineering, University of Science and Technology of China, Shenyang, China
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2
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Tseng CC, Song T, Jiang Q, Lin Z, Wang C, Suh J, Watanabe K, Taniguchi T, McGuire MA, Xiao D, Chu JH, Cobden DH, Xu X, Yankowitz M. Gate-Tunable Proximity Effects in Graphene on Layered Magnetic Insulators. NANO LETTERS 2022; 22:8495-8501. [PMID: 36279401 DOI: 10.1021/acs.nanolett.2c02931] [Citation(s) in RCA: 8] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
The extreme versatility of van der Waals materials originates from their ability to exhibit new electronic properties when assembled in close proximity to dissimilar crystals. For example, although graphene is inherently nonmagnetic, recent work has reported a magnetic proximity effect in graphene interfaced with magnetic substrates, potentially enabling a pathway toward achieving a high-temperature quantum anomalous Hall effect. Here, we investigate heterostructures of graphene and chromium trihalide magnetic insulators (CrI3, CrBr3, and CrCl3). Surprisingly, we are unable to detect a magnetic exchange field in the graphene but instead discover proximity effects featuring unprecedented gate tunability. The graphene becomes highly hole-doped due to charge transfer from the neighboring magnetic insulator and further exhibits a variety of atypical gate-dependent transport features. The charge transfer can additionally be altered upon switching the magnetic states of the nearest CrI3 layers. Our results provide a roadmap for exploiting proximity effects arising in graphene coupled to magnetic insulators.
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Affiliation(s)
| | | | | | | | | | | | | | | | - Michael A McGuire
- Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee37831, United States
| | - Di Xiao
- Pacific Northwest National Laboratory, Richland, Washington99354, United States
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3
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Pramanik A, Thakur S, Singh B, Willke P, Wenderoth M, Hofsäss H, Di Santo G, Petaccia L, Maiti K. Anomalies at the Dirac Point in Graphene and Its Hole-Doped Compositions. PHYSICAL REVIEW LETTERS 2022; 128:166401. [PMID: 35522498 DOI: 10.1103/physrevlett.128.166401] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/26/2021] [Accepted: 03/28/2022] [Indexed: 06/14/2023]
Abstract
We study the properties of the Dirac states in SiC-graphene and its hole-doped compositions employing angle-resolved photoemission spectroscopy and density functional theory. The symmetry-selective measurements for the Dirac bands reveal their linearly dispersive behavior across the Dirac point which was termed as the anomalous region in earlier studies. No gap is observed even after boron substitution that reduced the carrier concentration significantly from 3.7×10^{13} cm^{-2} in SiC-graphene to 0.8×10^{13} cm^{-2} (5% doping). The anomalies at the Dirac point are attributed to the spectral width arising from the lifetime and momentum broadening in the experiments. The substitution of boron at the graphitic sites leads to a band renormalization and a shift of the Dirac point towards the Fermi level. The internal symmetries appear to be preserved in SiC-graphene even after significant boron substitutions. These results suggest that SiC-graphene is a good platform to realize exotic science as well as advanced technology where the carrier properties like concentration, mobility, etc., can be tuned keeping the Dirac fermionic properties protected.
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Affiliation(s)
- Arindam Pramanik
- Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India
| | - Sangeeta Thakur
- Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India
- Elettra Sincrotrone Trieste, Strada Statale 14 km 163.5, 34149 Trieste, Italy
| | - Bahadur Singh
- Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India
| | - Philip Willke
- IV. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - Martin Wenderoth
- IV. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - Hans Hofsäss
- II. Physikalisches Institut, Georg-August-Universität Göttingen, 37077 Göttingen, Germany
| | - Giovanni Di Santo
- Elettra Sincrotrone Trieste, Strada Statale 14 km 163.5, 34149 Trieste, Italy
| | - Luca Petaccia
- Elettra Sincrotrone Trieste, Strada Statale 14 km 163.5, 34149 Trieste, Italy
| | - Kalobaran Maiti
- Department of Condensed Matter Physics and Materials Science, Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India
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4
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Wang CY, Lin YW, Chuang C, Yang CH, Patel DK, Chen SZ, Yeh CC, Chen WC, Lin CC, Chen YH, Wang WH, Sankar R, Chou FC, Kruskopf M, Elmquist RE, Liang CT. Magnetotransport in hybrid InSe/monolayer graphene on SiC. NANOTECHNOLOGY 2021; 32:155704. [PMID: 33373982 DOI: 10.1088/1361-6528/abd726] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
The magnetotransport properties of a hybrid InSe/monolayer graphene in a SiC system are systematically studied. Compared to those of its bare graphene counterpart, in InSe/graphene, we can effectively modify the carrier density, mobility, effective mass, and electron-electron (e-e) interactions enhanced by weak disorder. We show that in bare graphene and hybrid InSe/graphene systems, the logarithmic temperature (lnT) dependence of the Hall slope R H = δR xy /δB = δρ xy /δB can be used to probe e-e interaction effects at various temperatures even when the measured resistivity does not show a lnT dependence due to strong electron-phonon scattering. Nevertheless, one needs to be certain that the change of R H is not caused by an increase of the carrier density by checking the magnetic field position of the longitudinal resistivity minimum at different temperatures. Given the current challenges in gating graphene on SiC with a suitable dielectric layer, our results suggest that capping a van der Waals material on graphene is an effective way to modify the electronic properties of monolayer graphene on SiC.
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Affiliation(s)
- Chih-Yuan Wang
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
| | - Yun-Wu Lin
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Chiashain Chuang
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Cheng-Hsueh Yang
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
| | - Dinesh K Patel
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
- Physical Measurement Laboratory, National Institute of Standard and Technology (NIST), Gaithersburg, MD 20899, United States of America
| | - Sheng-Zong Chen
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Ching-Chen Yeh
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Wei-Chen Chen
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Chia-Chun Lin
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Yi-Hsun Chen
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Wei-Hua Wang
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Raman Sankar
- Institute of Physics, Academia Sinica, Taipei 115, Taiwan
- Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan
| | - Fang-Cheng Chou
- Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan
| | - Mattias Kruskopf
- Physical Measurement Laboratory, National Institute of Standard and Technology (NIST), Gaithersburg, MD 20899, United States of America
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, United States of America
| | - Randolph E Elmquist
- Physical Measurement Laboratory, National Institute of Standard and Technology (NIST), Gaithersburg, MD 20899, United States of America
| | - Chi-Te Liang
- Graduate Institute of Applied Physics, National Taiwan University, Taipei 106, Taiwan
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
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5
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Hu J, Rigosi AF, Kruskopf M, Yang Y, Wu BY, Tian J, Panna AR, Lee HY, Payagala SU, Jones GR, Kraft ME, Jarrett DG, Watanabe K, Taniguchi T, Elmquist RE, Newell DB. Towards epitaxial graphene p-n junctions as electrically programmable quantum resistance standards. Sci Rep 2018; 8:15018. [PMID: 30301948 PMCID: PMC6177418 DOI: 10.1038/s41598-018-33466-z] [Citation(s) in RCA: 24] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/13/2018] [Accepted: 09/27/2018] [Indexed: 11/18/2022] Open
Abstract
We report the fabrication and measurement of top gated epitaxial graphene p-n junctions where exfoliated hexagonal boron nitride (h-BN) is used as the gate dielectric. The four-terminal longitudinal resistance across a single junction is well quantized at the von Klitzing constant [Formula: see text] with a relative uncertainty of 10-7. After the exploration of numerous parameter spaces, we summarize the conditions upon which these devices could function as potential resistance standards. Furthermore, we offer designs of programmable electrical resistance standards over six orders of magnitude by using external gating.
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Affiliation(s)
- Jiuning Hu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA.
- Joint Quantum Institute, University of Maryland, College Park, MD, 20742, USA.
| | - Albert F Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA.
| | - Mattias Kruskopf
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD, 20742, USA
| | - Yanfei Yang
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD, 20742, USA
| | - Bi-Yi Wu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Graduate Institute of Applied Physics, National Taiwan University, Taipei, 10617, Taiwan
| | - Jifa Tian
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Department of Physics and Astronomy, and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana, 47907, USA
| | - Alireza R Panna
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Hsin-Yen Lee
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
- Theiss Research, La Jolla, CA, 92037, USA
| | - Shamith U Payagala
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - George R Jones
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Marlin E Kraft
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Dean G Jarrett
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - Kenji Watanabe
- National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Takashi Taniguchi
- National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Randolph E Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
| | - David B Newell
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD, 20899, USA
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6
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Kruskopf M, Elmquist RE. Epitaxial graphene for quantum resistance metrology. METROLOGIA 2018; 55:10.1088/1681-7575/aacd23. [PMID: 30996479 PMCID: PMC6463316 DOI: 10.1088/1681-7575/aacd23] [Citation(s) in RCA: 18] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
Graphene-based quantised Hall resistance standards promise high precision for the unit ohm under less exclusive measurement conditions, enabling the use of compact measurement systems. To meet the requirements of metrological applications, national metrology institutes developed large-area monolayer graphene growth methods for uniform material properties and optimized device fabrication techniques. Precision measurements of the quantized Hall resistance showing the advantage of graphene over GaAs-based resistance standards demonstrate the remarkable achievements realized by the research community. This work provides an overview over the state-of-the-art technologies in this field.
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Affiliation(s)
- Mattias Kruskopf
- National Institute of Standards and Technology, Fundamental Electrical Measurements, 100 Bureau Drive, Gaithersburg, MD, United States of America
- University of Maryland, Joint Quantum Institute, College Park, MD, United States of America
| | - Randolph E Elmquist
- National Institute of Standards and Technology, Fundamental Electrical Measurements, 100 Bureau Drive, Gaithersburg, MD, United States of America
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7
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Kudrynskyi ZR, Bhuiyan MA, Makarovsky O, Greener JDG, Vdovin EE, Kovalyuk ZD, Cao Y, Mishchenko A, Novoselov KS, Beton PH, Eaves L, Patanè A. Giant Quantum Hall Plateau in Graphene Coupled to an InSe van der Waals Crystal. PHYSICAL REVIEW LETTERS 2017; 119:157701. [PMID: 29077458 DOI: 10.1103/physrevlett.119.157701] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/06/2017] [Indexed: 05/07/2023]
Abstract
We report on a "giant" quantum Hall effect plateau in a graphene-based field-effect transistor where graphene is capped by a layer of the van der Waals crystal InSe. The giant quantum Hall effect plateau arises from the close alignment of the conduction band edge of InSe with the Dirac point of graphene. This feature enables the magnetic-field- and electric-field-effect-induced transfer of charge carriers between InSe and the degenerate Landau level states of the adjacent graphene layer, which is coupled by a van der Waals heterointerface to the InSe.
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Affiliation(s)
- Z R Kudrynskyi
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - M A Bhuiyan
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - O Makarovsky
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - J D G Greener
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - E E Vdovin
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
- Institute of Microelectronics Technology and High Purity Materials, RAS, Chernogolovka 142432, Russia
| | - Z D Kovalyuk
- Institute for Problems of Materials Science, The National Academy of Sciences of Ukraine, Chernivtsi Branch, Chernivtsi 58001, Ukraine
| | - Y Cao
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
- National Graphene Institute, University of Manchester, Manchester M13 9PL, United Kingdom
| | - A Mishchenko
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
| | - K S Novoselov
- School of Physics and Astronomy, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
| | - P H Beton
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - L Eaves
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
| | - A Patanè
- School of Physics and Astronomy, The University of Nottingham, Nottingham NG7 2RD, United Kingdom
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8
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Parmentier FD, Cazimajou T, Sekine Y, Hibino H, Irie H, Glattli DC, Kumada N, Roulleau P. Quantum Hall effect in epitaxial graphene with permanent magnets. Sci Rep 2016; 6:38393. [PMID: 27922114 PMCID: PMC5138823 DOI: 10.1038/srep38393] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/25/2016] [Accepted: 11/08/2016] [Indexed: 11/09/2022] Open
Abstract
We have observed the well-kown quantum Hall effect (QHE) in epitaxial graphene grown on silicon carbide (SiC) by using, for the first time, only commercial NdFeB permanent magnets at low temperature. The relatively large and homogeneous magnetic field generated by the magnets, together with the high quality of the epitaxial graphene films, enables the formation of well-developed quantum Hall states at Landau level filling factors v = ±2, commonly observed with superconducting electro-magnets. Furthermore, the chirality of the QHE edge channels can be changed by a top gate. These results demonstrate that basic QHE physics are experimentally accessible in graphene for a fraction of the price of conventional setups using superconducting magnets, which greatly increases the potential of the QHE in graphene for research and applications.
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Affiliation(s)
- F D Parmentier
- SPEC, CEA, CNRS, Université Paris-Saclay, CEA Saclay 91191 Gif-sur-Yvette cedex, France
| | - T Cazimajou
- SPEC, CEA, CNRS, Université Paris-Saclay, CEA Saclay 91191 Gif-sur-Yvette cedex, France
| | - Y Sekine
- NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa, Japan
| | - H Hibino
- NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa, Japan
| | - H Irie
- NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa, Japan
| | - D C Glattli
- SPEC, CEA, CNRS, Université Paris-Saclay, CEA Saclay 91191 Gif-sur-Yvette cedex, France
| | - N Kumada
- NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa, Japan
| | - P Roulleau
- SPEC, CEA, CNRS, Université Paris-Saclay, CEA Saclay 91191 Gif-sur-Yvette cedex, France
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9
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Yang M, Couturaud O, Desrat W, Consejo C, Kazazis D, Yakimova R, Syväjärvi M, Goiran M, Béard J, Frings P, Pierre M, Cresti A, Escoffier W, Jouault B. Puddle-Induced Resistance Oscillations in the Breakdown of the Graphene Quantum Hall Effect. PHYSICAL REVIEW LETTERS 2016; 117:237702. [PMID: 27982608 DOI: 10.1103/physrevlett.117.237702] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/30/2016] [Indexed: 06/06/2023]
Abstract
We report on the stability of the quantum Hall plateau in wide Hall bars made from a chemically gated graphene film grown on SiC. The ν=2 quantized plateau appears from fields B≃5 T and persists up to B≃80 T. At high current density, in the breakdown regime, the longitudinal resistance oscillates with a 1/B periodicity and an anomalous phase, which we relate to the presence of additional electron reservoirs. The high field experimental data suggest that these reservoirs induce a continuous increase of the carrier density up to the highest available magnetic field, thus enlarging the quantum plateaus. These in-plane inhomogeneities, in the form of high carrier density graphene pockets, modulate the quantum Hall effect breakdown and decrease the breakdown current.
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Affiliation(s)
- M Yang
- Laboratoire National des Champs Magnétiques Intenses, EMFL-LNCMI, INSA, UPS, CNRS UPR 3228, Université de Toulouse, 143 avenue de Rangueil, 31400 Toulouse, France
| | - O Couturaud
- Laboratoire Charles Coulomb (L2C), UMR 5221 CNRS-Université de Montpellier, 34095 Montpellier, France
| | - W Desrat
- Laboratoire Charles Coulomb (L2C), UMR 5221 CNRS-Université de Montpellier, 34095 Montpellier, France
| | - C Consejo
- Laboratoire Charles Coulomb (L2C), UMR 5221 CNRS-Université de Montpellier, 34095 Montpellier, France
| | - D Kazazis
- Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Sud, Université Paris-Saclay, C2N Marcoussis, 91460 Marcoussis, France
- Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, 5232 Villigen-PSI, Switzerland
| | - R Yakimova
- Department of Physics, Chemistry and Biology, Linköping University, SE-58183 Linköping, Sweden
| | - M Syväjärvi
- Department of Physics, Chemistry and Biology, Linköping University, SE-58183 Linköping, Sweden
| | - M Goiran
- Laboratoire National des Champs Magnétiques Intenses, EMFL-LNCMI, INSA, UPS, CNRS UPR 3228, Université de Toulouse, 143 avenue de Rangueil, 31400 Toulouse, France
| | - J Béard
- Laboratoire National des Champs Magnétiques Intenses, EMFL-LNCMI, INSA, UPS, CNRS UPR 3228, Université de Toulouse, 143 avenue de Rangueil, 31400 Toulouse, France
| | - P Frings
- Laboratoire National des Champs Magnétiques Intenses, EMFL-LNCMI, INSA, UPS, CNRS UPR 3228, Université de Toulouse, 143 avenue de Rangueil, 31400 Toulouse, France
| | - M Pierre
- Laboratoire National des Champs Magnétiques Intenses, EMFL-LNCMI, INSA, UPS, CNRS UPR 3228, Université de Toulouse, 143 avenue de Rangueil, 31400 Toulouse, France
| | - A Cresti
- Université Grenoble Alpes, IMEP-LAHC, F-38000 Grenoble, France
- CNRS, IMEP-LAHC, F-38000 Grenoble, France
| | - W Escoffier
- Laboratoire National des Champs Magnétiques Intenses, EMFL-LNCMI, INSA, UPS, CNRS UPR 3228, Université de Toulouse, 143 avenue de Rangueil, 31400 Toulouse, France
| | - B Jouault
- Laboratoire Charles Coulomb (L2C), UMR 5221 CNRS-Université de Montpellier, 34095 Montpellier, France
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