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Kim C, Yoon MA, Jang B, Kim JH, Lee HJ, Kim KS. Ultimate Control of Rate-Dependent Adhesion for Reversible Transfer Process via a Thin Elastomeric Layer. ACS APPLIED MATERIALS & INTERFACES 2017; 9:12886-12892. [PMID: 28338313 DOI: 10.1021/acsami.7b02214] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Adhesion between a stamp with an elastomeric layer and various devices or substrates is crucial to successfully fabricate flexible electronics using a transfer process. Although various transfer processes using stamps with different adhesion strengths have been suggested, the controllable range of adhesion is still limited to a narrow range. To precisely transfer devices onto selected substrates, however, the difference in adhesion between the picking and placing processes should be large enough to achieve a high yield. Herein, we report a simple way to extend the controllable adhesion range of stamps, which can be achieved by adjusting the thickness of the elastomeric layer and the separation velocity. The adhesion strength increased with decreasing layer thickness on the stamp due to a magnification of the confinement and rate-dependent effects on the adhesion. This enabled the controllable range of the adhesion strength for a 15 μm-thick elastomeric layer to be extended up to 12 times that of the bulk under the same separation conditions. The strategy of designing stamps using simple adhesion tests is also introduced, and the reversible transfer of thin Si chips was successfully demonstrated. Tuning and optimizing the adhesion strength of a stamp according to the design process suggested here can be applied to various materials for the selective transfer and replacement of individual devices.
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Affiliation(s)
- Chan Kim
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Min-Ah Yoon
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Bongkyun Jang
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Jae-Hyun Kim
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Hak-Joo Lee
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Center for Advanced Meta-Materials (CAMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Kwang-Seop Kim
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
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Falconnet D, Csucs G, Grandin HM, Textor M. Surface engineering approaches to micropattern surfaces for cell-based assays. Biomaterials 2006; 27:3044-63. [PMID: 16458351 DOI: 10.1016/j.biomaterials.2005.12.024] [Citation(s) in RCA: 606] [Impact Index Per Article: 33.7] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/17/2005] [Accepted: 12/30/2005] [Indexed: 11/22/2022]
Abstract
The ability to produce patterns of single or multiple cells through precise surface engineering of cell culture substrates has promoted the development of cellular bioassays that provide entirely new insights into the factors that control cell adhesion to material surfaces, cell proliferation, differentiation and molecular signaling pathways. The ability to control shape and spreading of attached cells and cell-cell contacts through the form and dimension of the cell-adhesive patches with high precision is important. Commitment of stem cells to different specific lineages depends strongly on cell shape, implying that controlled microenvironments through engineered surfaces may not only be a valuable approach towards fundamental cell-biological studies, but also of great importance for the design of cell culture substrates for tissue engineering. Furthermore, cell patterning is an important tool for organizing cells on transducers for cell-based sensing and cell-based drug discovery concepts. From a material engineering standpoint, patterning approaches have greatly profited by combining microfabrication technologies, such as photolithography, with biochemical functionalization to present to the cells biological cues in spatially controlled regions where the background is rendered non-adhesive ("non-fouling") by suitable chemical modification. The focus of this review is on the surface engineering aspects of biologically motivated micropatterning of two-dimensional (flat) surfaces with the aim to provide an introductory overview and critical assessment of the many techniques described in the literature. In particular, the importance of non-fouling surface chemistries, the combination of hard and soft lithography with molecular assembly techniques as well as a number of less well known, but useful patterning approaches, including direct cell writing, are discussed.
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Affiliation(s)
- Didier Falconnet
- BioInterfaceGroup, Laboratory for Surface Science and Technology, Department of Materials, Swiss Federal Institute of Technology (ETH) Zurich, Wolfgang-Pauli-Strasse 10, CH-8093 Zurich, Switzerland
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