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Lamberty ZD, Tran NT, van Engers CD, Karnal P, Knorr DB, Frechette J. Cooperative Tridentate Hydrogen-Bonding Interactions Enable Strong Underwater Adhesion. ACS Appl Mater Interfaces 2023. [PMID: 37450657 PMCID: PMC10375471 DOI: 10.1021/acsami.3c06545] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/18/2023]
Abstract
Multidentate hydrogen-bonding interactions are a promising strategy to improve underwater adhesion. Molecular and macroscale experiments have revealed an increase in underwater adhesion by incorporating multidentate H-bonding groups, but quantitatively relating the macroscale adhesive strength to cooperative hydrogen-bonding interactions remains challenging. Here, we investigate whether tridentate alcohol moieties incorporated in a model epoxy act cooperatively to enhance adhesion. We first demonstrate that incorporation of tridentate alcohol moieties leads to comparable adhesive strength with mica and aluminum in air and in water. We then show that the presence of tridentate groups leads to energy release rates that increase with an increase in crack velocity in air and in water, while materials lacking these groups do not display rate-dependent adhesion. We model the rate-dependent adhesion to estimate the activation energy of the interfacial bonds. Based on our data, we estimate the lifetime of these bonds to be between 2 ms and 6 s, corresponding to an equilibrium activation energy between 23kBT and 31kBT. These values are consistent with tridentate hydrogen bonding, suggesting that the three alcohol groups in the Tris moiety bond cooperatively form a robust adhesive interaction underwater.
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Affiliation(s)
- Zachary D Lamberty
- Chemical and Biomolecular Engineering Department, University of California, Berkeley, Berkeley, California 94760, United States
| | - Ngon T Tran
- DEVCOM U.S. Army Research Laboratory, Aberdeen Proving Ground, Maryland 21005, United States
| | - Christian D van Engers
- Department of Chemical and Biomolecular Engineering, Johns Hopkins University, Baltimore, Maryland 21218, United States
| | - Preetika Karnal
- Department of Chemical and Biomolecular Engineering, Lehigh University, 124 E Morton Street, Building 205, Bethlehem, Pennsylvania 18015, United States
| | - Daniel B Knorr
- DEVCOM U.S. Army Research Laboratory, Aberdeen Proving Ground, Maryland 21005, United States
| | - Joelle Frechette
- Chemical and Biomolecular Engineering Department, University of California, Berkeley, Berkeley, California 94760, United States
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Kim C, Yoon MA, Jang B, Kim JH, Lee HJ, Kim KS. Ultimate Control of Rate-Dependent Adhesion for Reversible Transfer Process via a Thin Elastomeric Layer. ACS Appl Mater Interfaces 2017; 9:12886-12892. [PMID: 28338313 DOI: 10.1021/acsami.7b02214] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Adhesion between a stamp with an elastomeric layer and various devices or substrates is crucial to successfully fabricate flexible electronics using a transfer process. Although various transfer processes using stamps with different adhesion strengths have been suggested, the controllable range of adhesion is still limited to a narrow range. To precisely transfer devices onto selected substrates, however, the difference in adhesion between the picking and placing processes should be large enough to achieve a high yield. Herein, we report a simple way to extend the controllable adhesion range of stamps, which can be achieved by adjusting the thickness of the elastomeric layer and the separation velocity. The adhesion strength increased with decreasing layer thickness on the stamp due to a magnification of the confinement and rate-dependent effects on the adhesion. This enabled the controllable range of the adhesion strength for a 15 μm-thick elastomeric layer to be extended up to 12 times that of the bulk under the same separation conditions. The strategy of designing stamps using simple adhesion tests is also introduced, and the reversible transfer of thin Si chips was successfully demonstrated. Tuning and optimizing the adhesion strength of a stamp according to the design process suggested here can be applied to various materials for the selective transfer and replacement of individual devices.
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Affiliation(s)
- Chan Kim
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Min-Ah Yoon
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Bongkyun Jang
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Jae-Hyun Kim
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Hak-Joo Lee
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Center for Advanced Meta-Materials (CAMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
| | - Kwang-Seop Kim
- Department of Nano-Mechatronics, Korea University of Science & Technology (UST) , 217 Gajeong-ro, Yuseong-gu, Daejeon 34113, Republic of Korea
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery & Materials (KIMM) , 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 34103, Republic of Korea
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