Thin Conducting Films: Preparation Methods, Optical and Electrical Properties, and Emerging Trends, Challenges, and Opportunities

Thin conducting films are distinct from bulk materials and have become prevalent over the past decades as they possess unique physical, electrical, optical, and mechanical characteristics. Comprehending these essential properties for developing novel materials with tailored features for various applications is very important. Research on these conductive thin films provides us insights into the fundamental principles, behavior at different dimensions, interface phenomena, etc. This study comprehensively analyzes the intricacies of numerous commonly used thin conducting films, covering from the fundamentals to their advanced preparation methods. Moreover, the article discusses the impact of different parameters on those thin conducting films' electronic and optical properties. Finally, the recent future trends along with challenges are also highlighted to address the direction the field is heading towards. It is imperative to review the study to gain insight into the future development and advancing materials science, thus extending innovation and addressing vital challenges in diverse technological domains.

Additive Manufacturing: A Paradigm Shift in Revolutionizing Catalysis with 3D Printed Photocatalysts and Electrocatalysts Toward Environmental Sustainability

Semiconductor-based materials utilized in photocatalysts and electrocatalysts present a sophisticated solution for efficient solar energy utilization and bias control, a field extensively explored for its potential in sustainable energy and environmental management. Recently, 3D printing has emerged as a transformative technology, offering rapid, cost-efficient, and highly customizable approaches to designing photocatalysts and electrocatalysts with precise structural control and tailored substrates. The adaptability and precision of printing facilitate seamless integration, loading, and blending of diverse photo(electro)catalytic materials during the printing process, significantly reducing material loss compared to traditional methods. Despite the evident advantages of 3D printing, a comprehensive compendium delineating its application in the realm of photocatalysis and electrocatalysis is conspicuously absent. This paper initiates by delving into the fundamental principles and mechanisms underpinning photocatalysts electrocatalysts and 3D printing. Subsequently, an exhaustive overview of the latest 3D printing techniques, underscoring their pivotal role in shaping the landscape of photocatalysts and electrocatalysts for energy and environmental applications. Furthermore, the paper examines various methodologies for seamlessly incorporating catalysts into 3D printed substrates, elucidating the consequential effects of catalyst deposition on catalytic properties. Finally, the paper thoroughly discusses the challenges that necessitate focused attention and resolution for future advancements in this domain.

Thiol-Functionalized Adsorbents through Atomic Layer Deposition and Vapor-Phase Silanization for Heavy Metal Ion Removal

The removal of toxic heavy metal ions from water resources is crucial for environmental protection and public health. In this study, we address this challenge by developing a surface functionalization technique for the selective adsorption of these contaminants. Our approach involves atomic layer deposition (ALD) followed by vapor-phase silanization of porous substrates. We utilized porous silica gel powder (∼100 μm particles, 89 m2/g surface area, ∼30 nm pores) as an initial substrate. This powder was first coated with ∼0.5 nm ALD Al2O3, followed by vapor-phase grafting of a thiol-functional silane. The modified powder, particularly in acidic conditions (pH = 4), showed high selectivity in adsorbing Cd(II), As(V), Pb(II), Hg(II), and Cu(II) heavy metal ions in mixed ion solutions over common benign ions (e.g., Na, K, Ca, and Mg). Langmuir adsorption isotherms and breakthrough adsorption studies were conducted to assess heavy metal binding affinity and revealed the order of Cd(II) < Pb(II) < Cu(II) < As(V) < Hg(II), with a significantly higher affinity for As(V) and Hg(II) ions. Time-dependent uptake studies demonstrated rapid removal of heavy metal ions from aqueous environments, with Hg(II) exhibiting the fastest adsorption kinetics on thiol-modified surfaces. These findings highlight the potential of ALD and vapor-phase silanization to create effective adsorbents for the targeted removal of hazardous contaminants from water.

The surface chemistry of the atomic layer deposition of metal thin films

In this perspective we discuss the progress made in the mechanistic studies of the surface chemistry associated with the atomic layer deposition (ALD) of metal films and the usefulness of that knowledge for the optimization of existing film growth processes and for the design of new ones. Our focus is on the deposition of late transition metals. We start by introducing some of the main surface-sensitive techniques and approaches used in this research. We comment on the general nature of the metallorganic complexes used as precursors for these depositions, and the uniqueness that solid surfaces and the absence of liquid solvents bring to the ALD chemistry and differentiate it from what is known from metalorganic chemistry in solution. We then delve into the adsorption and thermal chemistry of those precursors, highlighting the complex and stepwise nature of the decomposition of the organic ligands that usually ensued upon their thermal activation. We discuss the criteria relevant for the selection of co-reactants to be used on the second half of the ALD cycle, with emphasis on the redox chemistry often associated with the growth of metallic films starting from complexes with metal cations. Additional considerations include the nature of the substrate and the final structural and chemical properties of the growing films, which we indicate rarely retain the homogeneous 2D structure often aimed for. We end with some general conclusions and personal thoughts about the future of this field.

Impact of quantum size effects to the band gap of catalytic materials: a computational perspective

The evolution of nanotechnology has facilitated the development of catalytic materials with controllable composition and size, reaching the sub-nanometer limit. Nowadays, a viable strategy for tailoring and optimizing the catalytic activity involves controlling the size of the catalyst. This strategy is underpinned by the fact that the properties and reactivity of objects with dimensions on the order of nanometers can differ from those of the corresponding bulk material, due to the emergence of quantum size effects. Quantum size effects have a deep influence on the band gap of semiconducting catalytic materials. Computational studies are valuable for predicting and estimating the impact of quantum size effects. This perspective emphasizes the crucial role of modeling quantum size effects when simulating nanostructured catalytic materials. It provides a comprehensive overview of the fundamental principles governing the physics of quantum confinement in various experimentally observable nanostructures. Furthermore, this work may serve as a tutorial for modeling the electronic gap of simple nanostructures, highlighting that when working at the nanoscale, the finite dimensions of the material lead to an increase of the band gap because of the emergence of quantum confinement. This aspect is sometimes overlooked in computational chemistry studies focused on surfaces and nanostructures.

Controlling Pt nanoparticle sintering by sub-monolayer MgO ALD thin films

Metal nanoparticle (NP) sintering is a major cause of catalyst deactivation, as NP growth reduces the surface area available for reaction. A promising route to halt sintering is to deposit a protective overcoat on the catalyst surface, followed by annealing to generate overlayer porosity for gas transport to the NPs. Yet, such a combined deposition-annealing approach lacks structural control over the cracked protection layer and the number of NP surface atoms available for reaction. Herein, we exploit the tailoring capabilities of atomic layer deposition (ALD) to deposit MgO overcoats on archetypal Pt NP catalysts with thicknesses ranging from sub-monolayers to nm-range thin films. Two different ALD processes are studied for the growth of MgO overcoats on Pt NPs anchored on a SiO2 support, using Mg(EtCp)2 and H2O, and Mg(TMHD)2 and O3, respectively. Spectroscopic ellipsometry and X-ray photoelectron spectroscopy measurements reveal significant growth on both SiO2 and Pt for the former process, while the latter exhibits a drastically lower growth per cycle with an initial chemical selectivity towards Pt. These differences in MgO growth characteristics have implications for the availability of uncoated Pt surface atoms at different stages of the ALD process, as probed by low energy ion scattering, and for the sintering behavior during O2 annealing, as monitored in situ with grazing incidence small angle X-ray scattering (in situ GISAXS). The Mg(TMHD)2-O3 ALD process enables exquisite coverage control allowing a balance between physically blocking the Pt surface to prevent sintering and keeping Pt surface atoms free for reaction. This approach avoids the need for post-annealing, hence also safeguarding the structural integrity of the as-deposited overcoat.

An atomic layer deposition diffusion-reaction model for porous media with different particle geometries

This work presents a diffusion-reaction model for atomic layer deposition (ALD), which has been adapted to describe radial direction reactant transport and adsorption kinetics in a porous particle. Specifically, we present the effect of three particle geometries: spherical, cylindrical and a slab in the diffusion-reaction model. The reactant diffusion propagates as a unidimensional front inside the slab particle, whereas with cylinder and spherical particles, the reactant diffusion approaches the particle centre from two and three dimensions, respectively. Due to additional reactant propagation dimensions, cylindrical and spherical particles require less exposure for full particle penetration. In addition to the particle geometry effect, a sensitivity analysis was used to compare the impact of the particles' physical properties on the achieved penetration depth. The analysis evaluates properties, such as the combined porosity and tortuosity factor, mean pore diameter, specific surface area, pore volume, and particle radius. Furthermore, we address the impact of the reactant molar mass, growth-per-cycle (GPC), sticking probability, reactant exposure and deposition temperature on the simulated diffusion and surface coverage profiles. The diffusion-reaction model presented in this work is relevant for the design and optimization of ALD processes in porous media with different particle geometries.

Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors

Atomic layer deposition (ALD) has become the most widely used thin-film deposition technique in various fields due to its unique advantages, such as self-terminating growth, precise thickness control, and excellent deposition quality. In the energy storage domain, ALD has shown great potential for supercapacitors (SCs) by enabling the construction and surface engineering of novel electrode materials. This review aims to present a comprehensive outlook on the development, achievements, and design of advanced electrodes involving the application of ALD for realizing high-performance SCs to date, as organized in several sections of this paper. Specifically, this review focuses on understanding the influence of ALD parameters on the electrochemical performance and discusses the ALD of nanostructured electrochemically active electrode materials on various templates for SCs. It examines the influence of ALD parameters on electrochemical performance and highlights ALD's role in passivating electrodes and creating 3D nanoarchitectures. The relationship between synthesis procedures and SC properties is analyzed to guide future research in preparing materials for various applications. Finally, it is concluded by suggesting the directions and scope of future research and development to further leverage the unique advantages of ALD for fabricating new materials and harness the unexplored opportunities in the fabrication of advanced-generation SCs.

Highly Porous Polymer Beads Coated with Nanometer-Thick Metal Oxide Films for Photocatalytic Oxidation of Bisphenol A

Highly porous metal oxide-polymer nanocomposites are attracting considerable interest due to their unique structural and functional features. A porous polymer matrix brings properties such as high porosity and permeability, while the metal oxide phase adds functionality. For the metal oxide phase to perform its function, it must be fully accessible, and this is possible only at the pore surface, but functioning surfaces require controlled engineering, which remains a challenge. Here, highly porous nanocomposite beads based on thin metal oxide nanocoatings and polymerized high internal phase emulsions (polyHIPEs) are demonstrated. By leveraging the unique properties of polyHIPEs, i.e., a three-dimensional (3D) interconnected network of macropores, and high-precision of the atomic-layer-deposition technique (ALD), we were able to homogeneously coat the entire surface of the pores in polyHIPE beads with TiO2-, ZnO-, and Al2O3-based nanocoatings. Parameters such as nanocoating thickness, growth per cycle (GPC), and metal oxide (MO) composition were systematically controlled by varying the number of deposition cycles and dosing time under specific process conditions. The combination of polyHIPE structure and ALD technique proved advantageous, as MO-nanocoatings with thicknesses between 11 ± 3 and 40 ± 9 nm for TiO2 or 31 ± 6 and 74 ± 28 nm for ZnO and Al2O3, respectively, were successfully fabricated. It has been shown that the number of ALD cycles affects both the thickness and crystallinity of the MO nanocoatings. Finally, the potential of ALD-derived TiO2-polyHIPE beads in photocatalytic oxidation of an aqueous bisphenol A (BPA) solution was demonstrated. The beads exhibited about five times higher activity than nanocomposite beads prepared by the conventional (Pickering) method. Such ALD-derived polyHIPE nanocomposites could find wide application in nanotechnology, sensor development, or catalysis.

Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process with a potentially lower ownership cost of the reactor. In this review, we provide a comprehensive overview of the recent applications and development of ALD approaches emphasizing those based on operation at atmospheric pressure. Each application determines its own specific reactor design. Spatial ALD (s-ALD) has been recently introduced for the commercial production of large-area 2D displays, the surface passivation and encapsulation of solar cells and organic light-emitting diode (OLED) displays. Atmospheric temporal ALD (t-ALD) has opened up new emerging applications such as high-porosity particle coatings, functionalization of capillary columns for gas chromatography, and membrane modification in water treatment and gas purification. The challenges and opportunities for highly conformal coating on porous substrates by atmospheric ALD have been identified. We discuss in particular the pros and cons of both s-ALD and t-ALD in combination with their reactor designs in relation to the coating of 3D and high-porosity materials.

Physical Properties of an Ultrathin Al2O3/HfO2 Composite Film by Atomic Layer Deposition and the Application in Thin-Film Transistors

A high-quality ultrathin dielectric film is important in the field of microelectronics. We designed a composite structure composed of Al₂O₃/HfO₂ with different Al₂O₃/HfO₂ cycles prepared by atomic layer deposition (ALD) to obtain high-quality ultrathin (1-12 nm) dielectric films. Al₂O₃ protected HfO₂ from interacting with the Si substrate and inhibited the crystallization of the HfO₂ film. High permittivity material of HfO₂ was adopted to guarantee the good insulating property of the composite film. We investigated the physical properties as well as the growth mode of the composite film and found that the film exhibited a layer growth mode. The water contact angle and grazing-incidence small-angle X-ray scattering analyses revealed that the film was formed physically at 3 nm, while the thickness of the electrically stable film was 10 nm from grazing-incidence wide-angle X-ray scattering and dielectric constant analyses. The composite film was applied as a dielectric layer in thin-film transistors (TFTs). The threshold voltage was decreased to 0.27 V compared to the organic field-effect transistor with the single HfO₂ dielectric, and the subthreshold swing was as small as 0.05 V/dec with a carrier mobility of 49.2 cm²/V s. The off-current was as low as 10^-11 A, and the on/off ratio was as high as 5.5 × 10⁶. This ALD-prepared composite strategy provides a simple and practical way to obtain the high-quality dielectric film, which shows the potential application in the field of microelectronics.

Metal Sites in Zeolites: Synthesis, Characterization, and Catalysis

Zeolites with ordered microporous systems, distinct framework topologies, good spatial nanoconfinement effects, and superior (hydro)thermal stability are an ideal scaffold for planting diverse active metal species, including single sites, clusters, and nanoparticles in the framework and framework-associated sites and extra-framework positions, thus affording the metal-in-zeolite catalysts outstanding activity, unique shape selectivity, and enhanced stability and recyclability in the processes of Brønsted acid-, Lewis acid-, and extra-framework metal-catalyzed reactions. Especially, thanks to the advances in zeolite synthesis and characterization techniques in recent years, zeolite-confined extra-framework metal catalysts (denoted as metal@zeolite composites) have experienced rapid development in heterogeneous catalysis, owing to the combination of the merits of both active metal sites and zeolite intrinsic properties. In this review, we will present the recent developments of synthesis strategies for incorporating and tailoring of active metal sites in zeolites and advanced characterization techniques for identification of the location, distribution, and coordination environment of metal species in zeolites. Furthermore, the catalytic applications of metal-in-zeolite catalysts are demonstrated, with an emphasis on the metal@zeolite composites in hydrogenation, dehydrogenation, and oxidation reactions. Finally, we point out the current challenges and future perspectives on precise synthesis, atomic level identification, and practical application of the metal-in-zeolite catalyst system.

Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst

Atomic layer deposition (ALD) was used to deposit a protective overcoating (Al₂O₃) on an industrially relevant Co-based Fischer-Tropsch catalyst. A trimethylaluminium/water (TMA/H₂O) ALD process was used to prepare ∼0.7-2.2 nm overcoatings on an incipient wetness impregnated Co-Pt/TiO₂ catalyst. A diffusion-reaction differential equation model was used to predict precursor transport and the resulting deposited overcoating surface coverage inside a catalyst particle. The model was validated against transmission electron (TEM) and scanning electron (SEM) microscopy studies. The prepared model utilised catalyst physical properties and ALD process parameters to estimate achieved overcoating thickness for 20 and 30 deposition cycles (1.36 and 2.04 nm respectively). The TEM analysis supported these estimates, with 1.29 ± 0.16 and 2.15 ± 0.29 nm average layer thicknesses. In addition to layer thickness estimation, the model was used to predict overcoating penetration into the porous catalyst. The model estimated a penetration depth of ∼19 μm, and cross-sectional scanning electron microscopy supported the prediction with a deepest penetration of 15-18 μm. The model successfully estimated the deepest penetration, however, the microscopy study showed penetration depth fluctuation between 0-18 μm, having an average of 9.6 μm.

Growth behavior of Ir metal formed by atomic layer deposition in the nanopores of anodic aluminum oxide

The conformal coating or surface modification in high aspect ratio nanostructures is a tough challenge using traditional physical/chemical vapor deposition, especially for metal deposition. In this work, the growth behavior of iridium (Ir) metal formed by atomic layer deposition (ALD) in anodic aluminum oxide (AAO) templates was explored deeply. It is found that the surface hydrophilicity is crucial for the nucleation of ALD Ir. An in situ ALD Al₂O₃ layer with an ultra-hydrophilic surface can greatly promote the nucleation of ALD Ir in AAO nanopores. The effect of the Ir precursor pulse time, diameter, and length of AAO nanopores on the infiltration depth of ALD Ir was investigated systematically. The results show that the infiltration depth of ALD Ir in AAO nanopores is in proportion to the pore diameter and the square root of the Ir precursor pulse time, which follows a diffusion-limited model. Furthermore, the Ir precursor pulse time to obtain conformal Ir coating throughout all the AAO channels is in proportion to the square of the aspect ratio of AAO templates. In addition, the conformal Ir deposition in AAO nanopores is also related to the Ir precursor purge time and the O₂ partial pressure. Insufficient Ir purge time could cause a CVD-like reaction, leading to the reduction of the infiltration depth in AAO. Higher O₂ partial pressure can facilitate Ir nucleation with more Ir precursor consumption at the entrance of nanopores, decreasing the infiltration depth in AAO nanopores, so appropriate O₂ partial pressure should be chosen for ALD Ir in high aspect ratio materials. Above all, our research is valuable for surface modification or coating of metal by ALD in high aspect ratio nanostructures for 3D microelectronics, nano-fabrication, catalysis and energy fields.

Al2O3-Coated Si-Alloy Prepared by Atomic Layer Deposition as Anodes for Lithium-Ion Batteries

Silicon-based anodes can increase the energy density of Li-ion batteries (LIBs) owing to their large weights and volumetric capacities. However, repeated charging and discharging can rapidly deteriorate the electrochemical properties because of a large volume change in the electrode. In this study, a commercial Fe-Si powder was coated with Al2O3 layers of different thicknesses via atomic layer deposition (ALD) to prevent the volume expansion of Si and suppress the formation of crack-induced solid electrolyte interfaces. The Al2O3 content was controlled by adjusting the trimethyl aluminum exposure time, and higher Al2O3 contents significantly improved the electrochemical properties. In 300 cycles, the capacity retention rate of a pouch full-cell containing the fabricated anodes increased from 69.8% to 72.3% and 79.1% depending on the Al2O3 content. The powder characterization and coin and pouch cell cycle evaluation results confirmed the formation of an Al2O3 layer on the powder surface. Furthermore, the expansion rate observed during the charging/discharging of the pouch cell indicated that the deposited layer suppressed the powder expansion and improved the cell stability. Thus, the performance of an LIB containing Si-alloy anodes can be improved by coating an ALD-synthesized protective Al2O3 layer.

Carbon-Supported Noble-Metal Nanoparticles for Catalytic Applications—A Review

Noble-metal nanoparticles (NMNPs), with their outstanding properties, have been arousing the interest of scientists for centuries. Although our knowledge of them is much more significant today, and we can obtain NMNPs in various sizes, shapes, and compositions, our interest in them has not waned. When talking about noble metals, gold, silver, and platinum come to mind first. Still, we cannot forget about elements belonging to the so-called platinum group, such as ruthenium, rhodium, palladium, osmium, and iridium, whose physical and chemical properties are very similar to those of platinum. It makes them highly demanded and widely used in various applications. This review presents current knowledge on the preparation of all noble metals in the form of nanoparticles and their assembling with carbon supports. We focused on the catalytic applications of these materials in the fuel-cell field. Furthermore, the influence of supporting materials on the electrocatalytic activity, stability, and selectivity of noble-metal-based catalysts is discussed.

Hierarchical COK-X Materials for Applications in Catalysis and Adsorptive Separation and Controlled Release

Over the years, COK has developed a family of silicate materials and metal–organic framework hybrids with hierarchical porosity and functionality, coined zeogrids, zeotiles, and COK-x (stemming from the Flemish name of the laboratory “Centrum voor Oppervlaktechemie en Katalyse”). Several of these materials have unique features relevant to heterogeneous catalysis, molecular separation, and controlled release and found applications in the field of green chemistry, environmental protection, and pharmaceutical formulation. Discovery of a new material typically occurs by serendipity, but the research was always guided by hypothesis. This review provides insight in the process of tuning initial research hypotheses to match material properties to specific applications. This review describes the synthesis, structure, properties, and applications of 12 different materials. Some have simple synthesis protocols, facilitating upscaling and reproduction and rendering them attractive also in this respect.

Designing Sites in Heterogeneous Catalysis: Are We Reaching Selectivities Competitive With Those of Homogeneous Catalysts?

A critical review of different prominent nanotechnologies adapted to catalysis is provided, with focus on how they contribute to the improvement of selectivity in heterogeneous catalysis. Ways to modify catalytic sites range from the use of the reversible or irreversible adsorption of molecular modifiers to the immobilization or tethering of homogeneous catalysts and the development of well-defined catalytic sites on solid surfaces. The latter covers methods for the dispersion of single-atom sites within solid supports as well as the use of complex nanostructures, and it includes the post-modification of materials via processes such as silylation and atomic layer deposition. All these methodologies exhibit both advantages and limitations, but all offer new avenues for the design of catalysts for specific applications. Because of the high cost of most nanotechnologies and the fact that the resulting materials may exhibit limited thermal or chemical stability, they may be best aimed at improving the selective synthesis of high value-added chemicals, to be incorporated in organic synthesis schemes, but other applications are being explored as well to address problems in energy production, for instance, and to design greener chemical processes. The details of each of these approaches are discussed, and representative examples are provided. We conclude with some general remarks on the future of this field.

Design of Ordered Mesoporous CeO2-YSZ Nanocomposite Thin Films with Mixed Ionic/Electronic Conductivity via Surface Engineering

Mixed ionic and electronic conductors represent a technologically relevant materials system for electrochemical device applications in the field of energy storage and conversion. Here, we report about the design of mixed-conducting nanocomposites by facile surface modification using atomic layer deposition (ALD). ALD is the method of choice, as it allows coating of even complex surfaces. Thermally stable mesoporous thin films of 8 mol-% yttria-stabilized zirconia (YSZ) with different pore sizes of 17, 24, and 40 nm were prepared through an evaporation-induced self-assembly process. The free surface of the YSZ films was uniformly coated via ALD with a ceria layer of either 3 or 7 nm thickness. Electrochemical impedance spectroscopy was utilized to probe the influence of the coating on the charge-transport properties. Interestingly, the porosity is found to have no effect at all. In contrast, the thickness of the ceria surface layer plays an important role. While the nanocomposites with a 7 nm coating only show ionic conductivity, those with a 3 nm coating exhibit mixed conductivity. The results highlight the possibility of tailoring the electrical transport properties by varying the coating thickness, thereby providing innovative design principles for the next-generation electrochemical devices.

Aligning time-resolved kinetics (TAP) and surface spectroscopy (AP-XPS) for a more comprehensive understanding of ALD-derived 2D and 3D model catalysts

Spectro-kinetic characterization of complex catalytic materials, i.e. relating the observed reaction kinetics to spectroscopic descriptors of the catalyst state, presents a fundamental challenge with a potentially significant impact on various...

Rhodium nanoparticles confined in titania nanotubes for efficient Hydrogen evolution from Ammonia Borane

Designing efficient catalysts for hydrogen evolution from hydrolysis of ammonia borane (AB) have attracted considerable attention. Rhodium (Rh) based catalysts with rational design present remarkable catalytic performance for the reaction. Herein, we report the confined Rh@TiO₂ catalysts synthesized by atomic layer deposition combining with the sacrificial template approach, in which the Rh nanoparticles are uniformly confined on the inner surface of the porous titania nanotubes. The optimized catalysts show high catalytic activity with a turnover frequency value of 334.1 mol_H2·mol_Rh^-1·min^-1 and better durability. Mechanistic investigation demonstrates that the cleavage of OH bands in water should be the rate determining step, and the appropriate concentration of NaOH can further enhance the hydrogen evolution activity. The catalysts can also achieve the hydrogenation of various organic substrates using AB as the hydrogen source. In addition, our present strategy is general and can be extended to the synthesis of other confined catalysts for various catalytic reactions.

Monolayer Support Control and Precise Colloidal Nanocrystals Demonstrate Metal-Support Interactions in Heterogeneous Catalysts

Electronic and geometric interactions between active and support phases are critical in determining the activity of heterogeneous catalysts, but metal-support interactions are challenging to study. Here, it is demonstrated how the combination of the monolayer-controlled formation using atomic layer deposition (ALD) and colloidal nanocrystal synthesis methods leads to catalysts with sub-nanometer precision of active and support phases, thus allowing for the study of the metal-support interactions in detail. The use of this approach in developing a fundamental understanding of support effects in Pd-catalyzed methane combustion is demonstrated. Uniform Pd nanocrystals are deposited onto Al₂ O₃ /SiO₂ spherical supports prepared with control over morphology and Al₂ O₃ layer thicknesses ranging from sub-monolayer to a ≈4 nm thick uniform coating. Dramatic changes in catalytic activity depending on the coverage and structure of Al₂ O₃ situated at the Pd/Al₂ O₃ interface are observed, with even a single monolayer of alumina contributing an order of magnitude increase in reaction rate. By building the Pd/Al₂ O₃ interface up layer-by-layer and using uniform Pd nanocrystals, this work demonstrates the importance of controlled and tunable materials in determining metal-support interactions and catalyst activity.

Selective Fluoride Transport in Subnanometer TiO2 Pores

Synthesizing nanopores which mimic the functionality of ion-selective biological channels has been a challenging yet promising approach to advance technologies for precise ion-ion separations. Inspired by the facilitated fluoride (F^-) permeation in the biological fluoride channel, we designed a highly fluoride-selective TiO₂ film using the atomic layer deposition (ALD) technique. The subnanometer voids within the fabricated TiO₂ film (4 Å < d < 12 Å, with two distinct peaks at 5.5 and 6.5 Å), created by the hindered diffusion of ALD precursors (d = 7 Å), resulted in more than eight times faster permeation of sodium fluoride compared to other sodium halides. We show that the specific Ti-F interactions compensate for the energy penalty of F^- dehydration during the partitioning of F^- ions into the pore and allow for an intrapore accumulation of F^- ions. Concomitantly, the accumulation of F^- ions on the pore walls also enhances the transport of sodium (Na⁺) cations due to electrostatic interactions. Molecular dynamics simulations probing the ion concentration and mobility within the TiO₂ pore further support our proposed mechanisms for the selective F^- transport and enhanced Na⁺ permeation in the TiO₂ film. Overall, our work provides insights toward the design of ion-selective nanopores using the ALD technique.

Tailoring the Microporosity of Polymers of Intrinsic Microporosity for Advanced Gas Separation by Atomic Layer Deposition

Tailoring the microporosity of intrinsically microporous polymers at the atomic level is one of the biggest challenges in achieving high-performance polymeric gas separation membranes. In this study, for the first time, the Al₂ O₃ atomic layer deposition (ALD) technique was used to modify the microporosity of a typical polymer of intrinsic microporosity (PIM-1) at the atomic level. PIM-1 with six ALD cycles (PIM-1-Al₂ O₃ -6) exhibited simultaneous high thermal, mechanical, pure- and mixed-gas separation, and anti-aging properties. The O₂ /N₂ , H₂ /N₂ , and H₂ /CH₄ separation performances were adequate above the latest trade-off lines. PIM-1-Al₂ O₃ -6 showed CO₂ and O₂ permeabilities of 624 and 188 Barrer, combined with CO₂ /CH₄ and O₂ /N₂ selectivities of 56.2 and 8.8, respectively. This significantly enhanced performance was attributed to the strong size sieving effect induced by the Al₂ O₃ deposition.

Atomic-Scale Designing of Zeolite Based Catalysts by Atomic Layer Deposition

Zeolite-supported catalysts have been widely used in the field of heterogeneous catalysis. Atomic-scale governing the metal or acid sites on zeolites still encounters great challenge in controllable synthesis and developing of novel catalysts. Atomic layer deposition (ALD), owing to its unique character of self-limiting surface reactions, becomes one of the most promising and controllable strategies to tailor the metallic deposition sites in atomic scale precisely. In this review, we present a comprehensive summary and viewpoint of recent research in designing and engineering the structural of zeolite-based catalysts via ALD method. A prior focus is laid on the deposition of metals on the zeolites with emphasis on the isolated states of metals, followed by introducing the selected metals into channels of zeolites associates with identifying the location of metals in and/or out of the channels. Subsequently, detailed analysis of tailoring the acid sites of different zeolites is provided. Assisted synthesis of zeolite and the regioselective deposition of metal on special sites to modify the structures of zeolites are also critically discussed. We further summarize the challenges of ALD with respect to engineering the active sites in heterogeneous zeolite-based catalysts and provide the perspectives on the development in this field.

2D Semiconductor Nanomaterials and Heterostructures: Controlled Synthesis and Functional Applications

Two-dimensional (2D) semiconductors beyond graphene represent the thinnest stable known nanomaterials. Rapid growth of their family and applications during the last decade of the twenty-first century have brought unprecedented opportunities to the advanced nano- and opto-electronic technologies. In this article, we review the latest progress in findings on the developed 2D nanomaterials. Advanced synthesis techniques of these 2D nanomaterials and heterostructures were summarized and their novel applications were discussed. The fabrication techniques include the state-of-the-art developments of the vapor-phase-based deposition methods and novel van der Waals (vdW) exfoliation approaches for fabrication both amorphous and crystalline 2D nanomaterials with a particular focus on the chemical vapor deposition (CVD), atomic layer deposition (ALD) of 2D semiconductors and their heterostructures as well as on vdW exfoliation of 2D surface oxide films of liquid metals.

Reaction mechanism of atomic layer deposition of aluminum sulfide using trimethylaluminum and hydrogen sulfide

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3 and Li2S, have been developed for lithium-ion batteries and solid-state electrolytes. In this work, using density functional theory calculations, the possible reaction pathways of the ALD of Al2S3 using trimethylaluminum (TMA) and H2S were investigated at the M06-2X/6-311G(d, p) level. Al2S3 ALD can be divided into two consecutive and complementary half-reactions involving TMA and H2S, respectively. In the TMA half-reaction, the methyl group can be eliminated through the reaction with the sulfhydryl group on the surface. This process is a ligand exchange reaction between the methyl and sulfhydryl groups via a four-membered ring transition state. TMA half-reaction with the sulfhydrylated surface is more difficult than that with the hydroxylated surface. When the temperature increases, the reaction requires more energy, owing to the contribution of the entropy. In the H2S half-reaction, the methyl group on the surface can further react with the H2S precursor via a four-membered ring transition state. The orientation of H2S and more molecules have minimal effect on the H2S half-reaction. The reaction involving H2S through a six-membered ring transition state is unfavorable. In addition, the methyl and sulfhydryl groups on the surface can both react with the adjacent sulfhydryl group on the subsurface to form and release CH4 or H2S in the two half-reactions. Furthermore, sulfhydryl elimination occurs more easily than methyl elimination on the surface. These findings for the TMA and H2S half-reactions of Al2S3 ALD may be used for studying precursor chemistry and improvements in the preparation of other metal sulfides for emerging applications.

Ordered mesoporous metal oxides for electrochemical applications: correlation between structure, electrical properties and device performance

Ordered mesoporous metal oxides with a high specific surface area, tailored porosity and engineered interfaces are promising materials for electrochemical applications. In particular, the method of evaporation-induced self-assembly allows the formation of nanocrystalline films of controlled thickness on polar substrates. In general, mesoporous materials have the advantage of benefiting from a unique combination of structural, chemical and physical properties. This Perspective article addresses the structural characteristics and the electrical (charge-transport) properties of mesoporous metal oxides and how these affect their application in energy storage, catalysis and gas sensing.

Controlled synthesis of Fe-Pt nanoalloys using atomic layer deposition

We report the phase and size-controlled synthesis of Fe-Pt nanoalloys, prepared via a two-step synthesis procedure. The first step is the deposition of bilayers consisting of iron oxide and Pt films of desired thicknesses using atomic layer deposition, followed by a temperature-programmed reduction treatment of the film under H₂/N₂ atmosphere. This method enables the phase pure synthesis of all three Fe-Pt alloy phases, namely Fe₃Pt, FePt, and FePt₃, as revealed by in situ x-ray diffraction and x-ray fluorescence measurements. It is also demonstrated that by changing the total thickness of the bilayers while keeping the Pt/(Pt + Fe) atomic ratio constant, the size of the resulting bimetallic nanoparticles can be tuned, as confirmed by scanning electron microscopic measurements.

Converting molecular layer deposited alucone films into Al2O3/alucone hybrid multilayers by plasma densification

Alucones are one of the best-known films in the Molecular Layer Deposition (MLD) field. In this work, we prove that alucone/Al2O3 nanolaminate synthesis can be successfully performed by alternating alucone MLD growth with static O2 plasma exposures. Upon plasma treatment, only the top part of the alucone is densified into Al2O3, while the rest of the film remains relatively unaltered. X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) depth profiling show that the process yields a bilayer structure, which remains stable in air. Fourier-transform infrared spectroscopy (FTIR) measurements show that Al2O3 features are generated after plasma treatment, while the original alucone features remain, confirming that plasma treatment results in a bilayer structure. Also, an intermediate carboxylate is created in the interface. Calculations of Al atom density during plasma exposure point towards a partial loss of Al atoms during plasma treatment, in addition to the removal of the glycerol backbone. The effect of different process parameters has been studied. Densification at the highest temperature possible (200 °C) has the best alucone preservation without hindering its thermal stability. In addition, operating at the lowest plasma power is found the most beneficial for the film, but there is a threshold that must be surpassed to achieve successful densification. About 70% of the original alucone film thickness can be expected to remain after densification, but thicker films may result in more diffuse interfaces. Additionally, this process has also been successfully performed in multilayers, showing real potential for encapsulation applications.

Ultralow Loading Ruthenium on Alumina Monoliths for Facile, Highly Recyclable Reduction of p-Nitrophenol

The pervasive use of toxic nitroaromatics in industrial processes and their prevalence in industrial effluent has motivated the development of remediation strategies, among which is their catalytic reduction to the less toxic and synthetically useful aniline derivatives. While this area of research has a rich history with innumerable examples of active catalysts, the majority of systems rely on expensive precious metals and are submicron- or even a few-nanometer-sized colloidal particles. Such systems provide invaluable academic insight but are unsuitable for practical application. Herein, we report the fabrication of catalysts based on ultralow loading of the semiprecious metal ruthenium on 2–4 mm diameter spherical alumina monoliths. Ruthenium loading is achieved by atomic layer deposition (ALD) and catalytic activity is benchmarked using the ubiquitous para-nitrophenol, NaBH4 aqueous reduction protocol. Recyclability testing points to a very robust catalyst system with intrinsic ease of handling.

Flexible to rigid: IR spectroscopic investigation of a rhenium-tricarbonyl-complex at a buried interface

This work explores the solid-liquid interface of a rhenium-tricarbonyl complex embedded in a layer of zirconium oxide deposited by atomic layer deposition (ALD). Time-resolved and steady state infrared spectroscopy were applied to reveal the correlations between the thickness of the ALD layer and the spectroscopic response of the system. We observed a transition of the molecular environment from flexible to rigid, as well as limitations to ligand exchange and excited state quenching on the embedded complexes, when the ALD layer is roughly of the same height as the molecules.

High-Temperature Atomic Layer Deposition of GaN on 1D Nanostructures

Silica nanosprings (NS) were coated with gallium nitride (GaN) by high-temperature atomic layer deposition. The deposition temperature was 800 °C using trimethylgallium (TMG) as the Ga source and ammonia (NH₃) as the reactive nitrogen source. The growth of GaN on silica nanosprings was compared with deposition of GaN thin films to elucidate the growth properties. The effects of buffer layers of aluminum nitride (AlN) and aluminum oxide (Al₂O₃) on the stoichiometry, chemical bonding, and morphology of GaN thin films were determined with X-ray photoelectron spectroscopy (XPS), high-resolution x-ray diffraction (HRXRD), and atomic force microscopy (AFM). Scanning and transmission electron microscopy of coated silica nanosprings were compared with corresponding data for the GaN thin films. As grown, GaN on NS is conformal and amorphous. Upon introducing buffer layers of Al₂O₃ or AlN or combinations thereof, GaN is nanocrystalline with an average crystallite size of 11.5 ± 0.5 nm. The electrical properties of the GaN coated NS depends on whether or not a buffer layer is present and the choice of the buffer layer. In addition, the IV curves of GaN coated NS and the thin films (TF) with corresponding buffer layers, or lack thereof, show similar characteristic features, which supports the conclusion that atomic layer deposition (ALD) of GaN thin films with and without buffer layers translates to 1D nanostructures.

Core-shell nanostructures: perspectives towards drug delivery applications

Nanosystems have shown encouraging outcomes and substantial progress in the areas of drug delivery and biomedical applications. However, the controlled and targeted delivery of drugs or genes can be limited due to their physicochemical and functional properties. In this regard, core-shell type nanoparticles are promising nanocarrier systems for controlled and targeted drug delivery applications. These functional nanoparticles are emerging as a particular class of nanosystems because of their unique advantages, including high surface area, and easy surface modification and functionalization. Such unique advantages can facilitate the use of core-shell nanoparticles for the selective mingling of two or more different functional properties in a single nanosystem to achieve the desired physicochemical properties that are essential for effective targeted drug delivery. Several types of core-shell nanoparticles, such as metallic, magnetic, silica-based, upconversion, and carbon-based core-shell nanoparticles, have been designed and developed for drug delivery applications. Keeping the scope, demand, and challenges in view, the present review explores state-of-the-art developments and advances in core-shell nanoparticle systems, the desired structure-property relationships, newly generated properties, the effects of parameter control, surface modification, and functionalization, and, last but not least, their promising applications in the fields of drug delivery, biomedical applications, and tissue engineering. This review also supports significant future research for developing multi-core and shell-based functional nanosystems to investigate nano-therapies that are needed for advanced, precise, and personalized healthcare systems.

Distance Effect of Ni-Pt Dual Sites for Active Hydrogen Transfer in Tandem Reaction

Unveiling the distance effect between different sites in multifunctional catalysts remains a major challenge. Herein, we investigate the distance effect by constructing a dual-site distance-controlled tandem catalyst with a five-layered TiO₂/Pt/TiO₂/Ni/TiO₂ tubular nanostructure by template-assisted atomic layer deposition. In this catalyst, the Ni and Pt sites are separated by a porous TiO₂ interlayer, and the distance between them can be precisely controlled on the subnanometer scale by altering the thickness of the interlayer, while the inner and outer porous TiO₂ layers are designed for structural stability. The catalyst exhibits superior performance for the tandem hydrazine hydrate decomposition to hydrogen and subsequent nitrobenzene hydrogenation when the Ni and Pt site distance is on the subnanometer level. The performance increases with the decrease of the distance and is better than the catalyst without the TiO₂ interlayer. Isotopic and kinetic experiments reveal that the distance effect controls the transfer of active hydrogen, which is the rate-determining step of the tandem reaction in a water solvent. Reduced Ti species with oxygen vacancies on the TiO₂ interlayer provide the active sites for hydrogen transfer with -Ti-OH surface intermediates via the continuous chemisorption/desorption of water. A smaller distance induces the generation of more active sites for hydrogen transfer and thus higher efficiency in the synergy of Ni and Pt sites. Our work provides new insight for the distance effect of different active sites and the mechanism of intermediate transfer in tandem reactions.

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The distance effect is an interesting and important topic in catalysis

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The distance of Ni-Pt dual sites is precisely controlled in subnanometer scale on a TiO₂/Pt/TiO₂/Ni/TiO₂ five-layer catalyst by ALD

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The distance controls the water-assisted hydrogen transfer, determining the overall efficiency of the tandem reaction

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A close distance in subnanometer induces more active sites for hydrogen transfer and efficient synergy of Ni and Pt sites

Designing Nanoparticles and Nanoalloys for Gas-Phase Catalysis with Controlled Surface Reactivity Using Colloidal Synthesis and Atomic Layer Deposition

Supported nanoparticles are commonly applied in heterogeneous catalysis. The catalytic performance of these solid catalysts is, for a given support, dependent on the nanoparticle size, shape, and composition, thus necessitating synthesis techniques that allow for preparing these materials with fine control over those properties. Such control can be exploited to deconvolute their effects on the catalyst's performance, which is the basis for knowledge-driven catalyst design. In this regard, bottom-up synthesis procedures based on colloidal chemistry or atomic layer deposition (ALD) have proven successful in achieving the desired level of control for a variety of fundamental studies. This review aims to give an account of recent progress made in the two aforementioned synthesis techniques for the application of controlled catalytic materials in gas-phase catalysis. For each technique, the focus goes to mono- and bimetallic materials, as well as to recent efforts in enhancing their performance by embedding colloidal templates in porous oxide phases or by the deposition of oxide overlayers via ALD. As a recent extension to the latter, the concept of area-selective ALD for advanced atomic-scale catalyst design is discussed.

Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry

We find that a five-phase (substrate, mixed native oxide and roughness interface layer, metal oxide thin film layer, surface ligand layer, ambient) model with two-dynamic (metal oxide thin film layer thickness and surface ligand layer void fraction) parameters (dynamic dual box model) is sufficient to explain in-situ spectroscopic ellipsometry data measured within and across multiple cycles during plasma-enhanced atomic layer deposition of metal oxide thin films. We demonstrate our dynamic dual box model for analysis of in-situ spectroscopic ellipsometry data in the photon energy range of 0.7–3.4 eV measured with time resolution of few seconds over large numbers of cycles during the growth of titanium oxide (TiO₂) and tungsten oxide (WO₃) thin films, as examples. We observe cyclic surface roughening with fast kinetics and subsequent roughness reduction with slow kinetics, upon cyclic exposure to precursor materials, leading to oscillations of the metal thin film thickness with small but positive growth per cycle. We explain the cyclic surface roughening by precursor-surface interactions leading to defect creation, and subsequent surface restructuring. Atomic force microscopic images before and after growth, x-ray photoelectron spectroscopy, and x-ray diffraction investigations confirm structural and chemical properties of our thin films. Our proposed dynamic dual box model may be generally applicable to monitor and control metal oxide growth in atomic layer deposition, and we include data for SiO₂ and Al₂O₃ as further examples.

Palladium/Carbon Nanofibers by Combining Atomic Layer Deposition and Electrospinning for Organic Pollutant Degradation

As organic dyes are a major source of pollution, it is important to develop novel and efficient heterogeneous catalysts with high activity for their degradation. In this work, two innovative techniques, atomic layer deposition and electrospinning, were used to prepare palladium nanoparticles (Pd NPs) supported on carbon nanofibers (CNFs). The sample morphology was investigated using scanning and transmission electron microscopy. This showed the presence of nanofibers of several micrometers in length and with a mean diameter of 200 nm. Moreover, the size of the highly dispersed Pd NPs was about 7 nm. X-ray photoelectron spectroscopy visually validated the inclusion of metallic Pd. The prepared nano-catalysts were then used to reduce methyl orange (MO) in the presence of sodium borohydride (NaBH₄). The Freundlich isotherm model was the most suitable model to explain the adsorption equilibrium for MO onto the Pd/CNF catalysts. Using 5 mL MO dye-solution (0.0305 mM) and 1 mL NaBH₄ (0.026 mM), a 98.9% of catalytic activity was achieved in 240 min by 0.01 g of the prepared nano-catalysts Pd/C (0.016 M). Finally, no loss of catalytic activity was observed when such catalysts were used again. These results represent a promising avenue for the degradation of organic pollutants and for heterogeneous catalysis.