Solubility studies of inorganic-organic hybrid nanoparticle photoresists with different surface functional groups

Theoretical Insights into the Solubility Polarity Switch of Metal-Organic Nanoclusters for Nanoscale Patterning

Metal-organic nanoclusters(MOCs) are being increasingly used as prospective photoresist candidates for advanced nanoscale lithography technologies. However, insight into the irradiation-induced solubility switching process remains unclear. Hereby, the theoretical study employing density functional theory (DFT) calculations of the alkene-containing zirconium oxide MOC photoresists is reported, which is rationally synthesized accordingly, to disclose the mechanism of the nanoscale patterning driven by the switch of solubility from the acid-catalyzed or electron-triggered ligand dissociation. By evaluating the dependence of MOCs' imaging process on photoacid, lithographies of photoresists with and without photoacid generators after exposure to ultraviolet (UV), electron beam, and soft X-ray, it is revealed that photoacid is essential in UV lithography, but it demonstrates little effect on exposure dose in high-energy lithography. Furthermore, theoretical studies using DFT simulations to investigate the plausible photoacid-catalyzed, electron-triggered dissociation, and accompanying radical reaction are performed, and a mechanism is demonstrated that the nanoscale patterning of this type of MOCs is driven by the solubility switch resulting from dissociation-induced strong electrostatic interaction and low-energy barrier radical polymerization with other species. This study can give insights into the chemical mechanisms of patterning, and guide the rational design of photoresists to realize high resolution and high sensitivity.

Exceptional Light Sensitivity by Thiol-Ene Click Lithography

Lithographic patterning, which utilizes the solubility switch of photoresists to convert optical signals into nanostructures on the substrate, is the primary top-down approach for nanoscale fabrication. However, the low light/electron-energy conversion efficiency severely limits the throughput of lithography. Thiol-ene reaction, as a photoinitiated radical addition reaction, is widely known as click reaction in the field of chemistry due to its extremely high efficiency. Here, we introduce a click lithography strategy utilizing the rapid thiol-ene click reaction to realize ultraefficient nanofabrication. This novel approach facilitated by the implementation of ultrahigh-functionality material designs enables high-contrast patterning of metal-containing nanoclusters under an extremely low deep-ultraviolet exposure dose, e.g., 7.5 mJ cm^-2, which is 10-20 times lower than the dose used in the photoacid generator-based photoresist system. Meanwhile, 45 nm dense patterns were also achieved at a low dose using electron beam lithography, revealing the great potential of this approach in high-resolution patterning. Our results demonstrated the high-sensitivity and high-resolution features of click lithography, providing inspiration for future lithography design.

Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography

The line edge roughness (LER) is one of the most critical indicators of photoresist imaging performance, and its measurement using a reliable method is of great significance for lithography. However, most studies only investigate photoresist resolution and sensitivity because LER measurements require an expensive and not widely available critical dimension scanning electron microscopy (SEM) technology; thus, the imaging performance of photoresist has not been adequately evaluated. Here, we report an image processing software developed for offline calculation of LER that can analyze lithographic patterns with resolutions up to ∼15 nm. This software can effectively process all graphic files obtained from commonly used SEM machines by utilizing the adjustable double threshold. To realize the effective detection of high-resolution patterns in advanced lithography, we used SEM images generated from extreme ultraviolet and electron beam lithography to develop and validate the software's graphic recognition algorithm. This image processing software can process typical SEM images and produce reliable LER in an efficient and user-friendly manner, constituting a powerful tool for promoting the development of high-performance photoresist materials.

Thermosensitive textiles made from silver nanoparticle-filled brown cotton fibers

Filling fibers with nanomaterials can create new functions or modify the existing properties. However, as nanocomposite formation for natural cellulosic fibers has been challenging, little information is available on how the embedded nanomaterials alter the properties of cellulosic fibers. Here we filled brown cotton fibers with silver nanoparticles (Ag NPs) to examine their thermosensitive properties. Using naturally present tannins in brown cotton fibers as a reducing agent, Ag NP-filled brown cotton fibers (nanoparticle diameter of about 28 nm, weight fraction of 12 500 mg kg^-1) were produced through a one-step process without using any external agents. The in situ formation of Ag NPs was uniform across the nonwoven cotton fabric and was concentrated in the lumen of the fibers. The insertion of Ag NPs into the fibers shifted the thermal decomposition of cellulose to lower temperatures with increased activation energy and promoted heat release during combustion. Ag NPs lowered the thermal effusivity of the fabric, causing the fabric to feel warmer than the control brown cotton. Ag NP-filled brown cotton was more effectively heated to higher temperatures than control brown cotton under the same heating treatments.

Solvent accommodation effect on dispersibility of metal oxide nanoparticle with chemisorbed organic shell

The dispersibility of nanoparticles in solvents remains difficult to predict and control. In this paper, the dispersibility of organically-modified nanoparticles in various solvents with different solvent properties and molecular sizes are investigated. The study indicates that solvent molecular size, in addition to the affinity between organic modifier and solvent molecules, affects the dispersibility of the nanoparticles. The experimental results imply that solvents with molecular size small enough can disperse nanoparticles more efficiently. In addition, based on the concept that solvent accommodation induces the enhancement of dispersibility, two approaches to improve nanoparticle dispersibility in desired solvents are proposed. One is the addition of a small amount of solvent with the right size and properties to both penetrate the modifier shell and to act as intermediate between the desired solvent and the organic modifier molecules. The other is dual-molecule modification to create additional space at modifier-shell surface for the penetration of the desired solvent molecules. The results of these approaches based on the concept of the solvent accommodation can enhance the dispersibility trends.

Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography

Hybrid metal-organic cluster resist materials, also termed as organo-inorganics, demonstrate their potential for use in next-generation lithography owing to their ability for patterning down to ∼10 nm or below. High-resolution resist patterning is integrally associated with the compatibility of the resist and irradiation of the exposure source. Helium ion beam lithography (HIBL) is an emerging approach for the realization of sub-10 nm patterns at considerably lower line edge/width roughness (LER/LWR) and higher sensitivity as compared to electron beam lithography (EBL). Here, for the first time, a negative tone resist incorporating nickel (Ni)-based metal-organic clusters (Ni-MOCs) was synthesized and patterned using HIBL and EBL at 30 keV. This resist comprises a nickel-based metal building unit covalently linked with the organic ligand: m-toluic acid (C₈H₈O₂). Dynamic light scattering confirmed a narrow size distribution of ∼2 nm for metal-organic cluster (MOC) formulations. High-resolution ∼9 nm HIBL line patterns were well developed at a sensitivity of 22 μC/cm² and at a significantly low LER and LWR of 1.81 ± 0.06 and 2.90 ± 0.06 nm, respectively. Analogous high-resolution patterns were also observed in EBL with a sensitivity of 473 μC/cm². Hence, the Ni-MOC-based resist investigated using HIBL and EBL elucidates the ability of its potential for the sub-10 nm technology node, under standard processing conditions.

Facile Counting of Ligands Capped on Nanoparticles via a Titration Chip of Moving Reaction Boundary Electrophoresis

Absolute quantification of ligand capped on the surface of nanoparticles (NPs) has faced a great challenge without the use of complex inner standards (CIS). Herein, we proposed a facile electrophoresis titration (ET) model, designed an ET device, and developed a relevant method for counting the ligand on NPs without the use of CIS, based on moving reaction boundary (MRB). Furthermore, we conducted the relevant ET runs by using 3-mercaptopropionic acid (MPA) and quantum dots (QDs) as the model ligand and NPs, respectively. The experiments revealed that the ligand content of 1518 ± 295 obtained via an ET was close to the one of 1408 ± 117 determined via NMR, validating the ET model. Moreover, the experiments showed fair stability (RSD < 5.62%) and simplicity of ET without the use of CIS. Evidently, the ET model opens a window for facile assay of ligand capped on NPs.

Bio-inspired synthesis of mesoporous HfO2 nanoframes as reactors for piezotronic polymerization and Suzuki coupling reactions

Complex nanostructures with high compositional and structural tailorability are highly desired in order to meet the material needs in the rapid development of nanoscience and nanotechnology. Therefore, the synthetic technique is of essential importance but currently still suffers from many challenges. Herein, we elaborately explore and demonstrate the flexibility of the anisotropic metallo-organic compound (dihafnium dichloride, Cp2HfCl2) for the fabrication of inorganic architectures by mimicking the assembly behaviors in biomolecules. The open and discrete architectures of mesoporous HfO2 nanoframes were constructed via the self-assembly of precursor with acetone as solvent and ammonia as the basic source, but without any addition of auxiliary organic molecules, like surfactants, DAN or peptides. In addition, the nanostructures (hollow spheres, solid spheres, yolk-shells, aggregations and defect-rich nanoparticles) of HfO2 assemblies can be well manipulated by simply modulating the synthesis parameters. The marked difference in the chemical bonds by the different ligands resulted in discrepant hydrolysis and then specific directional bonds for the diversity of the resultant HfO2 assemblies. Interestingly, the HfO2 nanoframe exhibits enhanced piezoelectricity, and can be used as a microelectrode reactor to trigger the pseudo-electrochemical aniline polymerization reaction by introducing ultrasonic excitation to renew the surface charges. Moreover, as compared with nanoparticle catalysts, the palladium (Pd) loaded nanoframe reactor exhibits obvious enhanced catalytic performance for classical Suzuki coupling, benefiting from the structural advantages of the HfO2 frame. Our findings here can be expected to offer new perspectives to find suitable materials by understanding the analogy between materials chemistry and biomolecule chemistry.

Solution-Based Micro- and Nanoscale Metal Oxide Structures Formed by Direct Patterning for Electro-Optical Applications

Due to their transparency and tunable electrical, optical, and magnetic properties, metal oxide thin films and structures have many applications in electro-optical devices. In recent years, solution processing combined with direct-patterning techniques such as micro-/nanomolding, inkjet printing, e-jet printing, e-beam writing, and photopatterning has drawn much attention because of the inexpensive and simple fabrication process that avoids using capital-intensive vacuum deposition systems and chemical etching. Furthermore, practical applications of solution direct-patterning techniques with metal oxide structures are demonstrated in thin-film transistors and biochemical sensors on a wide range of substrates. Since direct-patterning techniques enable low-cost fabrication of nanoscale metal oxide structures, these methods are expected to accelerate the development of nanoscale devices and systems based on metal oxide components in important application fields such as flexible electronics, the Internet of Things (IoT), and human health monitoring. Here, a review of the fabrication procedures, advantages, limitations, and applications of the main direct-patterning methods for making metal oxide structures is presented. The goal is to highlight the examples with the most promising perspective from the recent literature.

Extreme ultraviolet resist materials for sub-7 nm patterning

Continuous ongoing development of dense integrated circuits requires significant advancements in nanoscale patterning technology.

A novel fabrication approach for three-dimensional hierarchical porous metal oxide/carbon nanocomposites for enhanced solar photocatalytic performance

A novel approach for the fabrication of metal oxide/C composites with a hierarchical porous structure is proposed.

Silver-cotton nanocomposites: Nano-design of microfibrillar structure causes morphological changes and increased tenacity

The interactions of nanoparticles with polymer hosts have important implications for directing the macroscopic properties of composite fibers, yet little is known about such interactions with hierarchically ordered natural polymers due to the difficulty of achieving uniform dispersion of nanoparticles within semi-crystalline natural fiber. In this study we have homogeneously dispersed silver nanoparticles throughout an entire volume of cotton fiber. The resulting electrostatic interaction and distinct supramolecular structure of the cotton fiber provided a favorable environment for the controlled formation of nanoparticles (12 ± 3 nm in diameter). With a high surface-to-volume ratio, the extensive interfacial contacts of the nanoparticles efficiently "glued" the structural elements of microfibrils together, producing a unique inorganic-organic hybrid substructure that reinforced the multilayered architecture of the cotton fiber.