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Khan R, Rahman NU, Hayat MF, Ghernaout D, Salih AAM, Ashraf GA, Samad A, Mahmood MA, Rahman N, Sohail M, Iqbal S, Abdullaev S, Khan A. Unveiling cutting-edge developments: architectures and nanostructured materials for application in optoelectronic artificial synapses. NANOSCALE 2024; 16:14589-14620. [PMID: 39011743 DOI: 10.1039/d4nr00904e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/17/2024]
Abstract
One possible result of low-level characteristics in the traditional von Neumann formulation system is brain-inspired photonics technology based on human brain idea. Optoelectronic neural devices, which are accustomed to imitating the sensory role of biological synapses by adjusting connection measures, can be used to fabricate highly reliable neurologically calculating devices. In this case, nanosized materials and device designs are attracting attention since they provide numerous potential benefits in terms of limited cool contact, rapid transfer fluidity, and the capture of photocarriers. In addition, the combination of classic nanosized photodetectors with recently generated digital synapses offers promising results in a variety of practical applications, such as data processing and computation. Herein, we present the progress in constructing improved optoelectronic synaptic devices that rely on nanomaterials, for example, 0-dimensional (quantum dots), 1-dimensional, and 2-dimensional composites, besides the continuously developing mixed heterostructures. Furthermore, the challenges and potential prospects linked with this field of study are discussed in this paper.
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Affiliation(s)
- Rajwali Khan
- National Water and Energy Center, United Arab Emirates University, Al Ain, 15551, United Arab Emirates.
- Department of Physics, University of Lakki Marwat, Lakki Marwat, 2842, KP, Pakistan
| | - Naveed Ur Rahman
- National Water and Energy Center, United Arab Emirates University, Al Ain, 15551, United Arab Emirates.
- Department of Physics, University of Lakki Marwat, Lakki Marwat, 2842, KP, Pakistan
| | | | - Djamel Ghernaout
- Chemical Engineering Department, College of Engineering, University of Ha'il, PO Box 2440, Ha'il 81441, Saudi Arabia
- Chemical Engineering Department, Faculty of Engineering, University of Blida, PO Box 270, Blida 09000, Algeria
| | - Alsamani A M Salih
- Chemical Engineering Department, College of Engineering, University of Ha'il, PO Box 2440, Ha'il 81441, Saudi Arabia
- Department of Chemical Engineering, Faculty of Engineering, Al Neelain University, Khartoum 12702, Sudan
| | | | - Abdus Samad
- Department of Physics, University of Lakki Marwat, Lakki Marwat, 2842, KP, Pakistan
| | | | - Nasir Rahman
- Department of Physics, University of Lakki Marwat, Lakki Marwat, 2842, KP, Pakistan
| | - Mohammad Sohail
- Department of Physics, University of Lakki Marwat, Lakki Marwat, 2842, KP, Pakistan
| | - Shahid Iqbal
- Department of Physics, University of Wisconsin, La Crosse, WI 54601, USA
| | - Sherzod Abdullaev
- Senior Researcher, Engineering School, Central Asian University, Tashkent, Uzbekistan
- Senior Researcher, Scientific and Innovation Department, Tashkent State Pedagogical University, Uzbekistan
| | - Alamzeb Khan
- Yale University School of Medicine, New Haven, Connecticut, USA
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Yu J, Li Z, Jiang J, Liu W, Guo S, Liang Y, Zhong B, Wang Y, Zou M. Anisotropy study of phonon modes in ReS2 flakes by polarized temperature-dependent Raman spectroscopy. Chem Phys Lett 2022. [DOI: 10.1016/j.cplett.2022.140132] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/01/2022]
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Wang Y, Chen F, Guo X, Liu J, Jiang J, Zheng X, Wang Z, Al-Makeen MM, Ouyang F, Xia Q, Huang H. In-Plane Phonon Anisotropy and Anharmonicity in Exfoliated Natural Black Arsenic. J Phys Chem Lett 2021; 12:10753-10760. [PMID: 34714072 DOI: 10.1021/acs.jpclett.1c03218] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Group-VA two-dimensional layered materials in a puckered honeycomb structure exhibit strong in-plane anisotropy and have emerged as new platforms for novel devices. Here, we report on systematic Raman investigations on exfoliated b-As flakes on the Ag1 and Ag2 polarization dependence on their symmetry, excitation wavelength, and flake thickness. The intensity maximums of both phonons are corrected in the b-As armchair direction under 633 nm excitation regardless of the flake thickness upon considering optical birefringence effects and interference effects. The intensity ratio of Ag1 to Ag2 modes under 532 nm excitation is useful for b-As crystalline orientation identification. Temperature-dependent Raman investigations reveal the linearly anharmonic behaviors of both phonons in the range from 173 to 293 K and a slightly greater first-order temperature coefficient in the zigzag direction. Our findings give deep insight into the in-plane phonon anisotropy and anharmonicity of b-As and provide a step toward future device applications.
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Affiliation(s)
- Yongsong Wang
- School of Physics and Electronics, Hunan Key Laboratory of Nanophotonics and Devices, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Fengming Chen
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Xiao Guo
- School of Physics and Electronics, Hunan Key Laboratory of Nanophotonics and Devices, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Jinxin Liu
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Junjie Jiang
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Xiaoming Zheng
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Zihan Wang
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Mansour M Al-Makeen
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Fangping Ouyang
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Qinglin Xia
- School of Physics and Electronics, Hunan Key Laboratory of Nanophotonics and Devices, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
| | - Han Huang
- School of Physics and Electronics, Hunan Key Laboratory of Nanophotonics and Devices, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
- School of Physics and Electronics, Hunan Key Laboratory of Super-microstructure and Ultrafast Process, Central South University, 932 South Lushan Road, Changsha, Hunan 410083, P. R. China
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Zhong F, Ye J, He T, Zhang L, Wang Z, Li Q, Han B, Wang P, Wu P, Yu Y, Guo J, Zhang Z, Peng M, Xu T, Ge X, Wang Y, Wang H, Zubair M, Zhou X, Gao P, Fan Z, Hu W. Substitutionally Doped MoSe 2 for High-Performance Electronics and Optoelectronics. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2021; 17:e2102855. [PMID: 34647416 DOI: 10.1002/smll.202102855] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/17/2021] [Revised: 08/11/2021] [Indexed: 06/13/2023]
Abstract
2D materials, of which the carrier type and concentration are easily tuned, show tremendous superiority in electronic and optoelectronic applications. However, the achievements are still quite far away from practical applications. Much more effort should be made to further improve their performance. Here, p-type MoSe2 is successfully achieved via substitutional doping of Ta atoms, which is confirmed experimentally and theoretically, and outstanding homojunction photodetectors and inverters are fabricated. MoSe2 p-n homojunction device with a low reverse current (300 pA) exhibits a high rectification ratio (104 ). The analysis of dark current reveals the domination of the Shockley-Read-Hall (SRH) and band-to-band tunneling (BTB) current. The homojunction photodetector exhibits a large open-circuit voltage (0.68 V) and short-circuit currents (1 µA), which is suitable for micro-solar cells. Furthermore, it possesses outstanding responsivity (0.28 A W-1 ), large external quantum efficiency (42%), and a high signal-to-noise ratio (≈107 ). Benefiting from the continuous energy band of homojunction, the response speed reaches up to 20 µs. Besides, the Ta-doped MoSe2 inverter exhibits a high voltage gain (34) and low power consumption (127 nW). This work lays a foundation for the practical application of 2D material devices.
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Affiliation(s)
- Fang Zhong
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Jiafu Ye
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Ting He
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, China
| | - Lili Zhang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Zhen Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Qing Li
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, China
| | - Bo Han
- Electron Microscopy Laboratory and International Center for Quantum Materials, School of Physics, Peking University, Beijing, 100871, China
| | - Peng Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Peisong Wu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Yiye Yu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Jiaxiang Guo
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Zhenhan Zhang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Meng Peng
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Tengfei Xu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Xun Ge
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Yang Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Hailu Wang
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
| | - Muhammad Zubair
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Xiaohao Zhou
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
| | - Peng Gao
- Electron Microscopy Laboratory and International Center for Quantum Materials, School of Physics, Peking University, Beijing, 100871, China
- Collaborative Innovation Centre of Quantum Matter, Beijing, 100871, China
| | - Zhiyong Fan
- Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong, 999077, China
| | - Weida Hu
- State Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China
- School of Electronic, Electrical and Communication Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, 310024, China
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Chang H, Wang H, Song KK, Zhong M, Shi LB, Qian P. Origin of phonon-limited mobility in two-dimensional metal dichalcogenides. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2021; 34:013003. [PMID: 34714257 DOI: 10.1088/1361-648x/ac29e1] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/24/2021] [Accepted: 09/24/2021] [Indexed: 06/13/2023]
Abstract
Metal dichalcogenides are novel two-dimensional (2D) semiconductors after the discovery of graphene. In this article, phonon-limited mobility for six kinds of 2D semiconductors with the composition of MX2is reviewed, in which M (Cr, Mo and W) is the transition metal, and X (S and Se) is the chalcogen element. The review is divided into three parts. In the first part, we briefly introduce the calculation method of mobility, including the empirical model and Boltzmann transport theory (BTE). The application scope, merits and limitations of these methods are summarized. In the second part, we explore empirical models to calculate the mobility of MX2, including longitudinal acoustic phonon, optical phonon (OP) and polar optical phonon (POP) models. The contribution of multi-valley to mobility is reviewed in the calculation. The differences between static and high-frequency dielectric constants (Δϵ) are only 0.13 and 0.03 for MoS2and WS2. Such a low value indicates that the polarization hardly changes in the external field. So, their mobility is not determined by POP, but by deformation potential models. Different from GaAs, POP scattering plays a decisive role in its mobility. Our investigations also reveal that the scattering from POP cannot be ignored in CrSe2, MoSe2and WSe2. In the third parts, we investigate the mobility of MX2using electron-phonon coupling matrix element, which is based on BTE from the framework of a many-body quantum-field theory. Valence band splitting of MoS2and WS2is induced by spin-orbit coupling effect, which leads to the increase of hole mobility. In particular, we review in detail the theoretical and experimental results of MoS2mobility in recent ten years, and its mobility is also compared with other materials to deepen the understanding.
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Affiliation(s)
- Hao Chang
- College of Physical Science and Technology, Bohai University, Jinzhou 121013, People's Republic of China
| | - Hao Wang
- College of Physical Science and Technology, Bohai University, Jinzhou 121013, People's Republic of China
| | - Ke-Ke Song
- Beijing Advanced Innovation Center for Materials Genome Engineering, Beijing Key Laboratory for Magneto-Photoelectrical Composite and Interface Science, School of Mathematics and Physics, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Min Zhong
- Liaoning Key Laboratory of Optoelectronic Functional Materials Testing and Technology, College of Chemical and Material Engineering, Bohai University, Jinzhou 121013, People's Republic of China
| | - Li-Bin Shi
- College of Physical Science and Technology, Bohai University, Jinzhou 121013, People's Republic of China
| | - Ping Qian
- Beijing Advanced Innovation Center for Materials Genome Engineering, Beijing Key Laboratory for Magneto-Photoelectrical Composite and Interface Science, School of Mathematics and Physics, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
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Wei Y, Wei Z, Zheng X, Liu J, Chen Y, Su Y, Luo W, Peng G, Huang H, Cai W, Deng C, Zhang X, Qin S. Stress Effects on Temperature-Dependent In-Plane Raman Modes of Supported Monolayer Graphene Induced by Thermal Annealing. NANOMATERIALS 2021; 11:nano11102751. [PMID: 34685191 PMCID: PMC8538804 DOI: 10.3390/nano11102751] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/14/2021] [Revised: 10/08/2021] [Accepted: 10/13/2021] [Indexed: 11/28/2022]
Abstract
The coupling strength between two-dimensional (2D) materials and substrate plays a vital role on thermal transport properties of 2D materials. Here we systematically investigate the influence of vacuum thermal annealing on the temperature-dependence of in-plane Raman phonon modes in monolayer graphene supported on silicon dioxide substrate via Raman spectroscopy. Intriguingly, raising the thermal annealing temperature can significantly enlarge the temperature coefficient of supported monolayer graphene. The derived temperature coefficient of G band remains mostly unchanged with thermal annealing temperature below 473 K, while it increases from −0.030 cm−1/K to −0.0602 cm−1/K with thermal annealing temperature ranging from 473 K to 773 K, suggesting the great impact of thermal annealing on thermal transport in supported monolayer graphene. Such an impact might reveal the vital role of coupling strength on phonon scattering and on the thermal transport property of supported monolayer graphene. To further interpret the thermal annealing mechanism, the compressive stress in supported monolayer graphene, which is closely related to coupling strength and is studied through the temperature-dependent Raman spectra. It is found that the variation tendency for compressive stress induced by thermal annealing is the same as that for temperature coefficient, implying the intense connection between compressive stress and thermal transport. Actually, 773 K thermal annealing can result in 2.02 GPa compressive stress on supported monolayer graphene due to the lattice mismatch of graphene and substrate. This study proposes thermal annealing as a feasible path to modulate the thermal transport in supported graphene and to design future graphene-based devices.
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Affiliation(s)
- Yuehua Wei
- College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha 410073, China;
| | - Zhenhua Wei
- College of Arts and Sciences, National University of Defense Technology, Changsha 410073, China; (Z.W.); (W.L.); (G.P.)
| | - Xiaoming Zheng
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China; (X.Z.); (J.L.); (Y.C.); (Y.S.); (W.C.)
| | - Jinxin Liu
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China; (X.Z.); (J.L.); (Y.C.); (Y.S.); (W.C.)
| | - Yangbo Chen
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China; (X.Z.); (J.L.); (Y.C.); (Y.S.); (W.C.)
| | - Yue Su
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China; (X.Z.); (J.L.); (Y.C.); (Y.S.); (W.C.)
| | - Wei Luo
- College of Arts and Sciences, National University of Defense Technology, Changsha 410073, China; (Z.W.); (W.L.); (G.P.)
| | - Gang Peng
- College of Arts and Sciences, National University of Defense Technology, Changsha 410073, China; (Z.W.); (W.L.); (G.P.)
| | - Han Huang
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China;
| | - Weiwei Cai
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China; (X.Z.); (J.L.); (Y.C.); (Y.S.); (W.C.)
| | - Chuyun Deng
- College of Arts and Sciences, National University of Defense Technology, Changsha 410073, China; (Z.W.); (W.L.); (G.P.)
- Correspondence: (C.D.); (X.Z.); (S.Q.)
| | - Xueao Zhang
- College of Physical Science and Technology, Xiamen University, Xiamen 361005, China; (X.Z.); (J.L.); (Y.C.); (Y.S.); (W.C.)
- Correspondence: (C.D.); (X.Z.); (S.Q.)
| | - Shiqiao Qin
- College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha 410073, China;
- Correspondence: (C.D.); (X.Z.); (S.Q.)
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Setayeshmehr K, Hashemi M, Ansari N. Photoconversion efficiency in atomically thin TMDC-based heterostructures. OPTICS EXPRESS 2021; 29:32910-32921. [PMID: 34809113 DOI: 10.1364/oe.438386] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/27/2021] [Accepted: 09/16/2021] [Indexed: 06/13/2023]
Abstract
Nowadays, two-dimensional materials such as graphene, phosphorene, and transition metal dichalcogenides (TMDCs) are widely employed in designing photovoltaic devices. Despite their atomically thin (AT) thicknesses, the high absorption of the TMDCs makes them a unique choice in designing solar absorptive heterostructures. In our exploration of finding the most efficient TMDC contacts for generating higher photocurrents, we carefully examined the physics behind the external and internal quantum efficiencies (EQEs and IQEs) of different AT heterostructures at the solar spectrum. By minute examination of the EQEs of the selected TMDC-based heterostructures, we show that the absorption of each consisting TMDC and the gradient of the electronic structure of them at their contact, determine mostly the photocurrent generation efficiency of the solar cells. The promising EQE (IQE) value of 0.5% (1.4%) is achieved in WSe2/MoSe2 contact at the wavelength of 433 nm. In the case of the multilayers of TMDCs, together with the light absorption increase of the multilayers the EQE of the heterostructures generally increases, while the competitive nature of the electronic structure gradient and the absorption makes this increase nonmonotonic. The TMDC-based heterostructures which are investigated in this work, pave a new way in designing miniaturized and efficient optoelectronic devices.
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8
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Jo SS, Singh A, Yang L, Tiwari SC, Hong S, Krishnamoorthy A, Sales MG, Oliver SM, Fox J, Cavalero RL, Snyder DW, Vora PM, McDonnell SJ, Vashishta P, Kalia RK, Nakano A, Jaramillo R. Growth Kinetics and Atomistic Mechanisms of Native Oxidation of ZrS xSe 2-x and MoS 2 Crystals. NANO LETTERS 2020; 20:8592-8599. [PMID: 33180506 DOI: 10.1021/acs.nanolett.0c03263] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
A thorough understanding of native oxides is essential for designing semiconductor devices. Here, we report a study of the rate and mechanisms of spontaneous oxidation of bulk single crystals of ZrSxSe2-x alloys and MoS2. ZrSxSe2-x alloys oxidize rapidly, and the oxidation rate increases with Se content. Oxidation of basal surfaces is initiated by favorable O2 adsorption and proceeds by a mechanism of Zr-O bond switching, that collapses the van der Waals gaps, and is facilitated by progressive redox transitions of the chalcogen. The rate-limiting process is the formation and out-diffusion of SO2. In contrast, MoS2 basal surfaces are stable due to unfavorable oxygen adsorption. Our results provide insight and quantitative guidance for designing and processing semiconductor devices based on ZrSxSe2-x and MoS2 and identify the atomistic-scale mechanisms of bonding and phase transformations in layered materials with competing anions.
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Affiliation(s)
- Seong Soon Jo
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
| | - Akshay Singh
- Department of Physics, Indian Institute of Science, Bengaluru, Karnataka 560012, India
| | - Liqiu Yang
- Collaboratory for Advanced Computing and Simulation, University of Southern California, Los Angeles, California 90089, United States
| | - Subodh C Tiwari
- Collaboratory for Advanced Computing and Simulation, University of Southern California, Los Angeles, California 90089, United States
| | - Sungwook Hong
- Department of Physics and Engineering, California State University, Bakersfield, Bakersfield, California 93311, United States
| | - Aravind Krishnamoorthy
- Collaboratory for Advanced Computing and Simulation, University of Southern California, Los Angeles, California 90089, United States
| | - Maria Gabriela Sales
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Sean M Oliver
- Department of Physics and Astronomy, George Mason University, Fairfax, Virginia 22030, United States
- Quantum Science and Engineering Center, George Mason University, Fairfax, Virginia 22030, United States
| | - Joshua Fox
- Electronic Materials and Devices Department, Applied Research Laboratory and 2-Dimensional Crystal Consortium, Materials Research Institute, Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Randal L Cavalero
- Electronic Materials and Devices Department, Applied Research Laboratory and 2-Dimensional Crystal Consortium, Materials Research Institute, Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - David W Snyder
- Electronic Materials and Devices Department, Applied Research Laboratory and 2-Dimensional Crystal Consortium, Materials Research Institute, Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Patrick M Vora
- Department of Physics and Astronomy, George Mason University, Fairfax, Virginia 22030, United States
- Quantum Science and Engineering Center, George Mason University, Fairfax, Virginia 22030, United States
| | - Stephen J McDonnell
- Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Priya Vashishta
- Collaboratory for Advanced Computing and Simulation, University of Southern California, Los Angeles, California 90089, United States
| | - Rajiv K Kalia
- Collaboratory for Advanced Computing and Simulation, University of Southern California, Los Angeles, California 90089, United States
| | - Aiichiro Nakano
- Collaboratory for Advanced Computing and Simulation, University of Southern California, Los Angeles, California 90089, United States
| | - R Jaramillo
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States
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9
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Cheng Y, Li H, Liu B, Jiang L, Liu M, Huang H, Yang J, He J, Jiang J. Vertical 0D-Perovskite/2D-MoS 2 van der Waals Heterojunction Phototransistor for Emulating Photoelectric-Synergistically Classical Pavlovian Conditioning and Neural Coding Dynamics. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2020; 16:e2005217. [PMID: 33035390 DOI: 10.1002/smll.202005217] [Citation(s) in RCA: 36] [Impact Index Per Article: 9.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/25/2020] [Revised: 09/10/2020] [Indexed: 06/11/2023]
Abstract
Optoelectronic-neuromorphic transistors are vital for next-generation nanoscale brain-like computational systems. However, the hardware implementation of optoelectronic-neuromorphic devices, which are based on conventional transistor architecture, faces serious challenges with respect to the synchronous processing of photoelectric information. This is because mono-semiconductor material cannot absorb adequate light to ensure efficient light-matter interactions. In this work, a novel neuromorphic-photoelectric device of vertical van der Waals heterojunction phototransistors based on a colloidal 0D-CsPbBr3 -quantum-dots/2D-MoS2 heterojunction channel is proposed using a polymer ion gel electrolyte as the gate dielectric. A highly efficient photocarrier transport interface is established by introducing colloidal perovskite quantum dots with excellent light absorption capabilities on the 2D-layered MoS2 semiconductor with strong carrier transport abilities. The device exhibits not only high photoresponsivity but also fundamental synaptic characteristics, such as excitatory postsynaptic current, paired-pulse facilitation, dynamic temporal filter, and light-tunable synaptic plasticity. More importantly, efficiency-adjustable photoelectronic Pavlovian conditioning and photoelectronic hybrid neuronal coding behaviors can be successfully implemented using the optical and electrical synergy approach. The results suggest that the proposed device has potential for applications associated with next-generation brain-like photoelectronic human-computer interactions and cognitive systems.
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Affiliation(s)
- Yongchao Cheng
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Huangjinwei Li
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Biao Liu
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Leyong Jiang
- School of Physics and Electronics, Hunan Normal University, Changsha, 410081, China
| | - Min Liu
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Han Huang
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Junliang Yang
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Jun He
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
| | - Jie Jiang
- Hunan Key Laboratory of Super Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, Hunan, 410083, China
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10
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Zong H, Yu K, Zhu Z. Heterostructure nanohybrids of Ni-doped MoSe2 coupled with Ti2NTx toward efficient overall water splitting. Electrochim Acta 2020. [DOI: 10.1016/j.electacta.2020.136598] [Citation(s) in RCA: 27] [Impact Index Per Article: 6.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/18/2022]
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11
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Xiao J, Zhang L, Zhou H, Shao Z, Liu J, Zhao Y, Li Y, Liu X, Xie H, Gao Y, Sun JT, Wee ATS, Huang H. Type-II Interface Band Alignment in the vdW PbI 2-MoSe 2 Heterostructure. ACS APPLIED MATERIALS & INTERFACES 2020; 12:32099-32105. [PMID: 32603081 DOI: 10.1021/acsami.0c04985] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Energy band alignments at heterostructure interfaces play key roles in device performance, especially between two-dimensional atomically thin materials. Herein, van der Waals PbI2-MoSe2 heterostructures fabricated by in situ PbI2 deposition on monolayer MoSe2 are comprehensively studied using scanning tunneling microscopy/spectroscopy, atomic force microscopy, photoemission spectroscopy, and Raman and photoluminescence (PL) spectroscopy. PbI2 grows on MoSe2 in a quasi layer-by-layer epitaxial mode. A type-II interface band alignment is proposed between PbI2 and MoSe2 with the conduction band minimum (valence band maximum) located at PbI2 (MoSe2), which is confirmed by first-principles calculations and the existence of interfacial excitons revealed using temperature-dependent PL. Our findings provide a scalable method to fabricate PbI2-MoSe2 heterostructures and new insights into the electronic structures for future device design.
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Affiliation(s)
- Junting Xiao
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Lei Zhang
- Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore
| | - Hui Zhou
- Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
| | - Ziyi Shao
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Jinxin Liu
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Yuan Zhao
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Youzhen Li
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Xiaoliang Liu
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Haipeng Xie
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
| | - Yongli Gao
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
- Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627, United States
| | - Jia-Tao Sun
- Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
- School of Information and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing 100081, China
| | - Andrew T S Wee
- Department of Physics, National University of Singapore, 2 Science Drive 3, 117542, Singapore
| | - Han Huang
- Hunan Key Laboratory of Super-Microstructure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, P. R. China
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12
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Liao W, Zhao S, Li F, Wang C, Ge Y, Wang H, Wang S, Zhang H. Interface engineering of two-dimensional transition metal dichalcogenides towards next-generation electronic devices: recent advances and challenges. NANOSCALE HORIZONS 2020; 5:787-807. [PMID: 32129353 DOI: 10.1039/c9nh00743a] [Citation(s) in RCA: 24] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
Over the past decade, two-dimensional (2D) transition metal dichalcogenides (TMDCs) have attracted tremendous research interest for future electronics owing to their atomically thin thickness, compelling properties and various potential applications. However, interface engineering including contact optimization and channel modulations for 2D TMDCs represents fundamental challenges in ultimate performance of ultrathin electronics. This article provides a comprehensive overview of the basic understanding of contacts and channel engineering of 2D TMDCs and emerging electronics benefiting from these varying approaches. In particular, we elucidate multifarious contact engineering approaches such as edge contact, phase engineering and metal transfer to suppress the Fermi level pinning effect at the metal/TMDC interface, various channel treatment avenues such as van der Waals heterostructures, surface charge transfer doping to modulate the device properties, and as well the novel electronics constructed by interface engineering such as diodes, circuits and memories. Finally, we conclude this review by addressing the current challenges facing 2D TMDCs towards next-generation electronics and offering our insights into future directions of this field.
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Affiliation(s)
- Wugang Liao
- Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China.
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13
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Fang L, Yuan X, Liu K, Li L, Zhou P, Ma W, Huang H, He J, Tao S. Direct bilayer growth: a new growth principle for a novel WSe 2 homo-junction and bilayer WSe 2 growth. NANOSCALE 2020; 12:3715-3722. [PMID: 31993600 DOI: 10.1039/c9nr09874g] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Homo-junction and multi-layer structures of transition metal chalcogenide (TMD) materials provide great flexibility for band-structure engineering and designing photoelectric devices. However, the knowledge of van der Waals epitaxy growth limits the development of these heterostructures. Herein, we employed the chemical vapor deposition (CVD) growth strategy to synthesize novel WSe2 homo-junction samples with a triangular monolayer in the center and three AA stacking bilayer flakes connected to the vertexes of the monolayer. The emitted photon energy from the bilayer near the junction showed a blueshift in energy of up to 24 meV compared with bare bilayer WSe2, confirming the charge transfer effect from monolayer to bilayer WSe2. Further growth studies revealed the shape evolution from WSe2 homo-junction to bilayer. The whole homo-junction formation and evolution process cannot be explained by the traditional layer-by-layer growth mechanism. Instead, a direct bilayer growth approach is proposed to explain the bilayer formation and evolution at the vertexes of the bottom layer of WSe2. These findings suggest that the growth of bilayer TMDs is more complex than our previous understanding. This work presents deepens insight into van der Waals epitaxy growth, and thus is valuable for guiding the fabrication of novel homo-junctions for both fundamental science and optoelectronic applications.
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Affiliation(s)
- Long Fang
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
| | - Xiaoming Yuan
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
| | - Kunwu Liu
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
| | - Lin Li
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
| | - Peng Zhou
- Hunan Provincial Key Defense Laboratory of High Temperature Wear-Resisting Materials and Preparation Technology, Hunan University of Science and Technology, Xiangtan, Hunan 411201, China
| | - Wei Ma
- Engineering Research Center of Advanced Functional Material Manufacturing of Ministry of Education, School of Chemical Engineering, Zhengzhou University, Zhengzhou 450001, China
| | - Han Huang
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
| | - Jun He
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
| | - Shaohua Tao
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha 410083, China.
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14
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Feng W, Pang W, Xu Y, Guo A, Gao X, Qiu X, Chen W. Transition Metal Selenides for Electrocatalytic Hydrogen Evolution Reaction. ChemElectroChem 2019. [DOI: 10.1002/celc.201901623] [Citation(s) in RCA: 61] [Impact Index Per Article: 12.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Wenshuai Feng
- School of Physics and ElectronicsCentral South University Changsha Hunan 410083 P. R. China
| | - Wenbin Pang
- School of Physics and ElectronicsCentral South University Changsha Hunan 410083 P. R. China
| | - Yan Xu
- College of Chemistry and Chemical EngineeringCentral South University Changsha Hunan 410083 P. R. China
| | - Aimin Guo
- School of Physics and ElectronicsCentral South University Changsha Hunan 410083 P. R. China
| | - Xiaohui Gao
- School of Physics and ElectronicsCentral South University Changsha Hunan 410083 P. R. China
| | - Xiaoqing Qiu
- School of Physics and ElectronicsCentral South University Changsha Hunan 410083 P. R. China
- College of Chemistry and Chemical EngineeringCentral South University Changsha Hunan 410083 P. R. China
| | - Wei Chen
- State Key Laboratory of Electroanalytical Chemistry Changchun Institute of Applied ChemistryChinese Academy Science Changchun Jilin 130022 P.R. China
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15
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Fang L, Chen H, Yuan X, Huang H, Chen G, Li L, Ding J, He J, Tao S. Quick Optical Identification of the Defect Formation in Monolayer WSe 2 for Growth Optimization. NANOSCALE RESEARCH LETTERS 2019; 14:274. [PMID: 31414230 PMCID: PMC6692796 DOI: 10.1186/s11671-019-3110-z] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/05/2019] [Accepted: 07/29/2019] [Indexed: 05/25/2023]
Abstract
Bottom-up epitaxy has been widely applied for transition metal dichalcogenides (TMDCs) growth. However, this method usually leads to a high density of defects in the crystal, which limits its optoelectronic performance. Here, we show the effect of growth temperature on the defect formation, optical performance, and crystal stability in monolayer WSe2 via a combination of Raman and photoluminescence (PL) spectroscopy study. We found that the defect formation and distribution in monolayer WSe2 are closely related to the growth temperature. These defect density and distribution can be controlled by adjusting the growth temperature. Aging experiments directly demonstrate that these defects are an active center for the decomposition process. Instead, monolayer WSe2 grown under optimal conditions shows a strong and uniform emission dominated by neutral exciton at room temperature. The results provide an effective approach to optimize TMDCs growth.
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Affiliation(s)
- Long Fang
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
| | - Haitao Chen
- College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, 410083 China
| | - Xiaoming Yuan
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
| | - Han Huang
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
| | - Gen Chen
- School of Materials Science and Engineering, Central South University, Changsha, 410083 China
| | - Lin Li
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
| | - Junnan Ding
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
| | - Jun He
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
| | - Shaohua Tao
- Hunan Key Laboratory of Super Micro-structure and Ultrafast Process, School of Physics and Electronics, Central South University, Changsha, 410083 China
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