Oxidation of silicon

High-Performance CsPbI3 Quantum Dot Photodetector with a Vertical Structure Based on the Frenkel-Poole Emission Effect

The selection of photoactive materials and the design of device structures are critical to the photoelectronic performance of photodetectors. This study reports on a vertically structured photodetector device with rapid, stable, and efficient photoelectric performance across the UV-visible broadband range based on the Si++/SiO2/Au/single-layer graphene/CsPbI3 quantum dots (QDs) configuration. In this specific device structure, a relatively high conductivity Si++/SiO2 wafer was used as the substrate, a CsPbI3 QD film with high light absorption was used as the photoactive layer, and a monolayer graphene with high conductivity was inserted between the substrate and the CsPbI3 QD film to form a heterojunction with the QD film. Based on the Frenkel-Poole emission effect arising from the high trap state density within the SiO2 layer, the device exhibited excellent photoelectric performances. Especially at a wavelength of 365 nm, a photocurrent responsivity of 2319 A/W, a specific detectivity of 1.15 × 1014 Jones, an external quantum efficiency of 7883%, and an on/off time of 39/36 ms at a Si++ terminal voltage of -80 V and an optical power density of 84.03 nW/cm2 can be achieved.

Roles of excess minority carrier recombination and chemisorbed O2 species at SiO2/Si interfaces in Si dry oxidation: Comparison between p-Si(001) and n-Si(001) surfaces

This study provides experimental evidence for the following: (1) Excess minority carrier recombination at SiO₂/Si interfaces is associated with O₂ dissociative adsorption; (2) the x-ray induced enhancement of SiO₂ growth is not caused by the band flattening resulting from the surface photovoltaic effect but by the electron-hole pair creation resulting from core level photoexcitation for the spillover of bulk Si electronic states toward the SiO₂ layer; and (3) a metastable chemisorbed O₂ species plays a decisive role in combining two types of the single- and double-step oxidation reaction loops. Based on experimental results, the unified Si oxidation reaction model mediated by point defect generation [S. Ogawa et al., Jpn. J. Appl. Phys., Part 1 59, SM0801 (2020)] is extended from the viewpoints of (a) the excess minority carrier recombination at the oxidation-induced vacancy site and (b) the trapping-mediated adsorption through the chemisorbed O₂ species at the SiO₂/Si interface.

Density-Functional Theory Molecular Dynamics Simulations and Experimental Characterization of a-Al₂O₃/SiGe Interfaces

Density-functional theory molecular dynamics simulations were employed to investigate direct interfaces between a-Al2O3 and Si0.50Ge0.50 with Si- and Ge-terminations. The simulated stacks revealed mixed interfacial bonding. While Si-O and Ge-O bonds are unlikely to be problematic, bonding between Al and Si or Ge could result in metallic bond formation; however, the internal bonds of a-Al2O3 are sufficiently strong to allow just weak Al bonding to the SiGe surface thereby preventing formation of metallic-like states but leave dangling bonds. The oxide/SiGe band gaps were unpinned and close to the SiGe bulk band gap. The interfaces had SiGe dangling bonds, but they were sufficiently filled that they did not produce midgap states. Capacitance-voltage (C-V) spectroscopy and angle-resolved X-ray photoelectron spectroscopy experimentally confirmed formation of interfaces with low interface trap density via direct bonding between a-Al2O3 and SiGe.

Orientation-dependent interfacial mobility governs the anisotropic swelling in lithiated silicon nanowires

Recent independent experiments demonstrated that the lithiation-induced volume expansion in silicon nanowires, nanopillars, and microslabs is highly anisotropic, with predominant expansion along the <110> direction but negligibly small expansion along the <111> direction. The origin of such anisotropic behavior remains elusive. Here, we develop a chemomechanical model to study the phase evolution and morphological changes in lithiated silicon nanowires. The model couples the diffusive reaction of lithium with the lithiation-induced elasto-plastic deformation. We show that the apparent anisotropic swelling is critically controlled by the orientation-dependent mobility of the core-shell interface, i.e., the lithiation reaction rate at the atomically sharp phase boundary between the crystalline core and the amorphous shell. Our results also underscore the importance of structural relaxation by plastic flow behind the moving phase boundary, which is essential to quantitative prediction of the experimentally observed morphologies of lithiated silicon nanowires. The study sheds light on the lithiation-mediated failure in nanowire-based electrodes, and the modeling framework provides a basis for simulating the morphological evolution, stress generation, and fracture in high-capacity electrodes for the next-generation lithium-ion batteries.

Anisotropic swelling and fracture of silicon nanowires during lithiation

We report direct observation of an unexpected anisotropic swelling of Si nanowires during lithiation against either a solid electrolyte with a lithium counter-electrode or a liquid electrolyte with a LiCoO(2) counter-electrode. Such anisotropic expansion is attributed to the interfacial processes of accommodating large volumetric strains at the lithiation reaction front that depend sensitively on the crystallographic orientation. This anisotropic swelling results in lithiated Si nanowires with a remarkable dumbbell-shaped cross section, which develops due to plastic flow and an ensuing necking instability that is induced by the tensile hoop stress buildup in the lithiated shell. The plasticity-driven morphological instabilities often lead to fracture in lithiated nanowires, now captured in video. These results provide important insight into the battery degradation mechanisms.

Molecular Water in Silica

Both silica (SiO2 ) and water are ubiquitous in our environment and our technologies. They come together in two important processes: the oxidation of silicon by steam, which is a process step in integrated circuit fabrication, and the hydrolytic weakening of quartz, which helps us understand plate tectonics. In the former process water molecules must diffuse through an amorphous silica layer and in the latter they must diffuse through quartz to reach dislocations and bubbles to promote plasticity.

We have taken a molecular fragment of SiO2 based on an a quartz c channel, with a hydrogenated external surface and with an internal water molecule. Ab initio, local density, total energy calculations, relaxing the water molecule and the atoms lining the channel, have been applied to discover the insertion energy of water in quartz. In addition, this quantity has been examined in a c axis dislocation core, in order to evaluate the ease of pipe diffusion in the case of hydrolytic weakening and to better simulate amorphous SiO2 in the case of silicon oxidation.

New linear-parabolic rate equation for thermal oxidation of silicon

We propose a new oxidation rate equation for silicon supposing only a diffusion of oxidizing species but not including any rate-limiting step by interfacial reaction. It is supposed that diffusivity is suppressed in a strained oxide region near SiO(2)/Si the interface. The expression of a parabolic constant in the new equation is the same as that of the Deal-Grove model, while a linear constant makes a clear distinction with that of the model. The estimated thickness using the new expression is close to 1 nm, which compares well with the thickness of the structural transition layers.

Reaction of the oxygen molecule at the Si(100)-SiO2 interface during silicon oxidation

Using constrained ab initio molecular dynamics, we investigate the reaction of the O2 molecule at the Si(100)-SiO2 interface during Si oxidation. The reaction proceeds sequentially through the incorporation of the O2 molecule in a Si-Si bond and the dissociation of the resulting network O2 species. The oxidation reaction occurs nearly spontaneously and is exothermic, irrespective of the O2 spin state or of the amount of excess negative charge available at the interface. The reaction evolves through the generation of network coordination defects associated with charge transfers. Our investigation suggests that the Si oxidation process is fully governed by diffusion.

Ordering in thermally oxidized silicon

We present new evidence and a model for residual ordering of silicon atoms within the oxide of thermally oxidized silicon wafers. X-ray scattering is used to observe the residual order in thermally grown SiO2 on Si(001), (011), and (111) surfaces with thicknesses of 60 to 1000 A, for both on-axis and miscut surfaces. In every case, the scattering position can be predicted using a model which expands the silicon lattice during oxidation without completely disordering it. The amount of expansion and disorder is dependent on the type of oxidation process employed.