Competing interactions in molecular adsorption: NH(3) on Si(001)

Fabrication of robust and cost-efficient Hoffmann-type MOF sensors for room temperature ammonia detection

The development of fast-response sensors for detecting NH3 at room temperature remains a formidable challenge. Here, to address this challenge, two highly robust Hoffmann-type metal-organic frameworks are rationally applied as the NH3 sensing materials which possess ultra-high static adsorption capacity for NH3, only lower than the current benchmark material. The adsorption mechanism is in-depth unveiled by dynamic adsorption and simulation studies. The assembled interdigital electrode device exhibits low detection limit (25 ppb) and short response time (5 s) at room temperature, which set a record among all electrical signal sensors. Moreover, the sensor exhibits excellent selectivity towards NH3 in the presence of 13 other potential interfering gases. Prominently, the sensor can stably output signals for more than two months at room temperature and can be recovered by simply purging nitrogen at room temperature without heating. This study opens up a way for reasonably designing gas sensing materials for toxic gases.

Multiple Pathways for Dissociative Adsorption of SiCl4 on the Si(100)-c(4×2) Surface

The adsorption of silicon tetrachloride (STC, SiCl4) on the silicon surface is a crucial process in polysilicon manufacture. However, the underlying mechanism for the adsorption remains highly uncertain. Here, new dissociative adsorption (DA) reaction pathways involving a flip of a silicon dimer in the first layer and considering physisorption are identified. Different DA patterns, inter-row (IR), inter-dimer (ID), and on-dimer (OD), are confirmed by the density functional theory (DFT) calculations at the PBE-D3(BJ)/TZVP-MOLOPT-GTH level. The stable structures for all minima are searched by global optimization through the artificial bee colony (ABC) algorithm. Findings reveal that the parent molecules dissociate first by breaking one Si-Cl bond, following which the resulting SiCl3 and Cl fragments are attached to adjacent Si-atom sites. Moreover, dimer flipping significantly reduces the energy barrier for chemisorption, mainly due to the change in electronic structure that enhances the interaction of the site with the SiCl3 radical. Physisorption may also be accompanied by dimer flipping to form a stable adsorption structure.

Adsorption dynamics of bifunctional molecules: Allyl methyl ether on Si(001)

The reaction dynamics of allyl methyl ether (AME) on Si(001) was studied by means of molecular beam techniques. The reaction of this bifunctional molecule comprising an ether and an alkene group was found to proceed via an intermediate state as deduced from the temperature dependence of the initial sticking probability s₀. At constant surface temperature T_s, s₀ decreases continuously with increasing kinetic energy E_kin, indicating a non-activated adsorption channel. Qualitatively and quantitatively, the energy dependence is almost identical to the adsorption dynamics of diethyl ether on Si(001). We attribute this to a similar nature of the intermediate state, which largely determines the adsorption dynamics. In consequence, this indicates a predominant role of the ether group and a minor influence of the C=C double bond on the adsorption dynamics of AME on Si(001).

Dynamics of proton transfer reactions on silicon surfaces: OH-dissociation of methanol and water on Si(001)

The reaction dynamics of methanol and water on Si(001) were investigated by means of molecular beam techniques. The initial sticking probability s₀ was determined as a function of the kinetic energy of the incoming molecules, E_kin, and surface temperature, T_s. For both, methanol and water, a nonactivated reactional channel was observed; the dynamics were found to be determined by the reaction into the datively bonded intermediate state. A low conversion barrier was deduced for the conversion from this intermediate into the final state. It is attributed to the reaction mechanism, which proceeds via proton transfer from the OH-group of the datively bonded molecules to a Si surface atom. Despite this low conversion barrier, adsorption into the intermediate and further reaction via proton transfer were found to be largely decoupled.

Fundamental role of the H-bond interaction in the dissociation of NH3 on Si(001)-(2×1)

Further insight into the dissociative adsorption of NH3 on Si(001) has been obtained using a combined computational and experimental approach. A novel route leading to the dissociation of the chemisorbed NH3 is proposed, based on H-bonding interactions between the gas phase and the chemisorbed NH3 molecules. Our model, complemented by synchrotron radiation photoelectron spectroscopy measurements, demonstrates that the low temperature dissociation of molecular chemisorbed NH3 is driven by the continuous flux of ammonia molecules from the gas phase.