Coaxial ZnSe/Si nanocables with controlled p-type shell doping

Tunable Band Gap and Conductivity Type of ZnSe/Si Core-Shell Nanowire Heterostructures

The electronic properties of zincblende ZnSe/Si core-shell nanowires (NWs) with a diameter of 1.1-2.8 nm are calculated by means of the first principle calculation. Band gaps of both ZnSe-core/Si-shell and Si-core/ZnSe-shell NWs are much smaller than those of pure ZnSe or Si NWs. Band alignment analysis reveals that the small band gaps of ZnSe/Si core-shell NWs are caused by the interface state. Fixing the ZnSe core size and enlarging the Si shell would turn the NWs from intrinsic to p-type, then to metallic. However, Fixing the Si core and enlarging the ZnSe shell would not change the band gap significantly. The partial charge distribution diagram shows that the conduction band maximum (CBM) is confined in Si, while the valence band maximum (VBM) is mainly distributed around the interface. Our findings also show that the band gap and conductivity type of ZnSe/Si core-shell NWs can be tuned by the concentration and diameter of the core-shell material, respectively.

Doping dependent crystal structures and optoelectronic properties of n-type CdSe:Ga nanowries

Although CdSe nanostructures possess excellent electrical and optical properties, efforts to make nano-optoelectronic devices from CdSe nanostructures have been hampered by the lack of efficient methods to rationally control their structural and electrical characteristics. Here, we report CdSe nanowires (NWs) with doping dependent crystal structures and optoelectronic properties by using gallium (Ga) as the efficient n-type dopant via a simple thermal co-evaporation method. The phase change of CdSe NWs from wurtzite to zinc blende with increased doping level is observed. Systematical measurements on the transport properties of the CdSe:Ga NWs reveal that the NW conductivity could be tuned in a wide range of near nine orders of magnitude by adjusting the Ga doping level and a high electron concentration up to 4.5 × 10(19) cm(-3) is obtained. Moreover, high-performance top-gate field-effect transistors are constructed based on the individual CdSe:Ga NWs by using high-κ HfO(2) as the gate dielectric. The great potential of the CdSe:Ga NWs as high-sensitive photodetectors and nanoscale light emitters is also exploited, revealing the promising applications of the CdSe:Ga NWs in new-generation nano-optoelectronics.

Construction of high-quality CdS:Ga nanoribbon/silicon heterojunctions and their nano-optoelectronic applications

Silicon based optoelectronic integration is restricted by its poor optoelectronic properties arising from the indirect band structure. Here, by combining silicon with another promising optoelectronic material, the CdS nanoribbon (NR), devices with heterojunction structure were constructed. The CdS NRs were also doped with gallium to improve their n-type conductivity. A host of nano-optoelectronic devices, including light emitting diodes, photovoltaic devices, and photodetectors, were successfully constructed on the basis of the CdS:Ga NR/Si heterojunctions. They all exhibited excellent device performances as regards high stability, high efficiency, and fast response speed. It is expected that the CdS NR/Si heterojunctions will have great potential for future applications of Si based optoelectronic integration.