1
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Yang Z, Deng H. Synthesis of Highly Ordered Fluorinated Copolymers with One Polyhydroxystyrene Block for Subsequent Metal Incorporation. J PHOTOPOLYM SCI TEC 2021. [DOI: 10.2494/photopolymer.34.339] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Zhenyu Yang
- School of Micro-Electronics, State Key Laboratory of Molecular Engineering of Polymers Fudan University
| | - Hai Deng
- School of Micro-Electronics, State Key Laboratory of Molecular Engineering of Polymers Fudan University
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2
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Liu W, Zhang L, Chen R, Wu X, Yang S, Wei Y. The Phase Aggregation Behavior of the Blend Materials Block Copolymer Polystyrene‐
b
‐Polycarbonate (PS‐
b
‐PC) and Homopolymer Polystyrene (PS). MACROMOL CHEM PHYS 2021. [DOI: 10.1002/macp.202000432] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/10/2022]
Affiliation(s)
- Weichen Liu
- Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of Sciences (IMECAS) No. 3 Beitucheng West Road Beijing 100029 China
- University of Chinese Academy of Sciences No. 19(A), Yuquan Road Beijing 100049 China
| | - Libin Zhang
- Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of Sciences (IMECAS) No. 3 Beitucheng West Road Beijing 100029 China
| | - Rui Chen
- Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of Sciences (IMECAS) No. 3 Beitucheng West Road Beijing 100029 China
| | - Xin Wu
- Jiangsu HanTop Photo‐Materials Co., Ltd Floor 4‐5, Building No. 9, No. 1158 Zhongxin Rd Shanghai 201621 China
| | - Shang Yang
- Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of Sciences (IMECAS) No. 3 Beitucheng West Road Beijing 100029 China
| | - Yayi Wei
- Integrated Circuit Advanced Process Center Institute of Microelectronics of Chinese Academy of Sciences (IMECAS) No. 3 Beitucheng West Road Beijing 100029 China
- University of Chinese Academy of Sciences No. 19(A), Yuquan Road Beijing 100049 China
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3
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Seguini G, Zanenga F, Cannetti G, Perego M. Thermodynamics and ordering kinetics in asymmetric PS-b-PMMA block copolymer thin films. SOFT MATTER 2020; 16:5525-5533. [PMID: 32500912 DOI: 10.1039/d0sm00441c] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
The ordering kinetics of standing cylinder-forming polystyrene-block-poly(methyl methacrylate) block copolymers (molecular weight: 39 kg mol-1) close to the order-disorder transition is experimentally investigated following the temporal evolution of the correlation length at different annealing temperatures. The growth exponent of the grain-coarsening process is determined to be 1/2, signature of a curvature-driven ordering mechanism. The measured activation enthalpy and the resulting Meyer-Neldel temperature for this specific copolymer along with the data already known for PS-b-PMMA block copolymers in strong segregation limit allow investigation of the interplay between the ordering kinetics and the thermodynamic driving force during the grain coarsening. These findings unveil various phenomena concomitantly occurring during the thermally activated ordering kinetics at segmental, single chain, and collective levels.
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Affiliation(s)
- Gabriele Seguini
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
| | - Fabio Zanenga
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
| | - Gianluca Cannetti
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
| | - Michele Perego
- IMM-CNR, Unit of Agrate Brianza, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy.
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4
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Wang HS, Oh S, Choi J, Jang W, Kim KH, Arellano CL, Huh J, Bang J, Im SG. High-Fidelity, Sub-5 nm Patterns from High-χ Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers. Macromol Rapid Commun 2020; 41:e1900514. [PMID: 31958190 DOI: 10.1002/marc.201900514] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/24/2019] [Revised: 12/09/2019] [Indexed: 12/11/2022]
Abstract
Despite their capability, sub-10 nm periodic nano-patterns formed by strongly segregating block copolymer (BCP) thin films cannot be easily oriented perpendicular to the substrate due to the huge surface energy differences of the constituent blocks. To produce perpendicular nano-patterns, the interfacial energies of both the substrate and free interfaces should be controlled precisely to induce non-preferential wetting. Unfortunately, high-performance surface modification layers are challenging to design, and different kinds of surface modification methods must be devised respectively for each neutral layer and top coat. Furthermore, conventional approaches, largely based on spin-coating processes, are highly prone to defect formation and may readily cause dewetting at sub-10 nm thickness. To date, these obstacles have hampered the development of high-fidelity, sub-5 nm BCP patterns. Herein, an all-vapor phase deposition approach initiated chemical vapor deposition is demonstrated to form 9-nm-thick, uniform neutral bottom layer and top coat with exquisite control of composition and thickness. These layers are employed in BCP films to produce perpendicular cylinders with a diameter of ≈4 nm that propagate throughout a BCP thickness of up to ≈60 nm, corresponding to five natural domain spacings of the BCP. Such a robust approach will serve as an advancement for the reliable generation of sub-10 nm nano-patterns.
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Affiliation(s)
- Hyun Suk Wang
- Department of Chemical and Biological Engineering, Korea University, Seoul, 02841, Republic of Korea
| | - Seula Oh
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Junhwan Choi
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Wontae Jang
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Ki Hyun Kim
- Department of Chemical and Biological Engineering, Korea University, Seoul, 02841, Republic of Korea
| | - Carlos Luis Arellano
- Faculty of Pharmacy and Pharmaceutical Sciences, Monash University, 381 Royal Parade, Parkville, VIC 3052, Australia
| | - June Huh
- Department of Chemical and Biological Engineering, Korea University, Seoul, 02841, Republic of Korea
| | - Joona Bang
- Department of Chemical and Biological Engineering, Korea University, Seoul, 02841, Republic of Korea
| | - Sung Gap Im
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
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5
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Mixed morphology in low molar mass fluorinated block copolymers. POLYMER 2019. [DOI: 10.1016/j.polymer.2019.121657] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
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6
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Hortigüela V, Larrañaga E, Lagunas A, Acosta GA, Albericio F, Andilla J, Loza-Alvarez P, Martínez E. Large-Area Biomolecule Nanopatterns on Diblock Copolymer Surfaces for Cell Adhesion Studies. NANOMATERIALS (BASEL, SWITZERLAND) 2019; 9:E579. [PMID: 30970600 PMCID: PMC6523780 DOI: 10.3390/nano9040579] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/01/2019] [Revised: 04/02/2019] [Accepted: 04/03/2019] [Indexed: 11/16/2022]
Abstract
Cell membrane receptors bind to extracellular ligands, triggering intracellular signal transduction pathways that result in specific cell function. Some receptors require to be associated forming clusters for effective signaling. Increasing evidences suggest that receptor clustering is subjected to spatially controlled ligand distribution at the nanoscale. Herein we present a method to produce in an easy, straightforward process, nanopatterns of biomolecular ligands to study ligand⁻receptor processes involving multivalent interactions. We based our platform in self-assembled diblock copolymers composed of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) that form PMMA nanodomains in a closed-packed hexagonal arrangement. Upon PMMA selective functionalization, biomolecular nanopatterns over large areas are produced. Nanopattern size and spacing can be controlled by the composition of the block-copolymer selected. Nanopatterns of cell adhesive peptides of different size and spacing were produced, and their impact in integrin receptor clustering and the formation of cell focal adhesions was studied. Cells on ligand nanopatterns showed an increased number of focal contacts, which were, in turn, more matured than those found in cells cultured on randomly presenting ligands. These findings suggest that our methodology is a suitable, versatile tool to study and control receptor clustering signaling and downstream cell behavior through a surface-based ligand patterning technique.
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Affiliation(s)
- Verónica Hortigüela
- Institute for Bioengineering of Catalonia (IBEC), The Barcelona Institute of Science and Technology (BIST), 08028 Barcelona, Spain.
| | - Enara Larrañaga
- Institute for Bioengineering of Catalonia (IBEC), The Barcelona Institute of Science and Technology (BIST), 08028 Barcelona, Spain.
| | - Anna Lagunas
- Institute for Bioengineering of Catalonia (IBEC), The Barcelona Institute of Science and Technology (BIST), 08028 Barcelona, Spain.
- Centro de Investigación Biomédica en Red (CIBER), 28029 Madrid, Spain.
| | - Gerardo A Acosta
- Centro de Investigación Biomédica en Red (CIBER), 28029 Madrid, Spain.
- Department of Organic Chemistry, University of Barcelona, 08028 Barcelona, Spain.
| | - Fernando Albericio
- Centro de Investigación Biomédica en Red (CIBER), 28029 Madrid, Spain.
- Department of Organic Chemistry, University of Barcelona, 08028 Barcelona, Spain.
| | - Jordi Andilla
- ICFO-Institut de Ciències Fotòniques, The Barcelona Institute of Science and Technology (BIST), Castelldefels, 08860 Barcelona, Spain.
| | - Pablo Loza-Alvarez
- ICFO-Institut de Ciències Fotòniques, The Barcelona Institute of Science and Technology (BIST), Castelldefels, 08860 Barcelona, Spain.
| | - Elena Martínez
- Institute for Bioengineering of Catalonia (IBEC), The Barcelona Institute of Science and Technology (BIST), 08028 Barcelona, Spain.
- Centro de Investigación Biomédica en Red (CIBER), 28029 Madrid, Spain.
- Department of Electronics and Biomedical Engineering, University of Barcelona, 08028 Barcelona, Spain.
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7
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Aprile G, Ferrarese Lupi F, Fretto M, Enrico E, De Leo N, Boarino L, Volpe FG, Seguini G, Sparnacci K, Gianotti V, Laus M, Garnæs J, Perego M. Toward Lateral Length Standards at the Nanoscale Based on Diblock Copolymers. ACS APPLIED MATERIALS & INTERFACES 2017; 9:15685-15697. [PMID: 28397488 DOI: 10.1021/acsami.7b00509] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
The self-assembly (SA) of diblock copolymers (DBCs) based on phase separation into different morphologies of small and high-density features is widely investigated as a patterning and nanofabrication technique. The integration of conventional top-down approaches with the bottom-up SA of DBCs enables the possibility to address the gap in nanostructured lateral length standards for nanometrology, consequently supporting miniaturization processes in device fabrication. On this topic, we studied the pattern characteristic dimensions (i.e., center-to-center distance L0 and diameter D) of a cylinder-forming polystyrene-b-poly( methyl methacrylate) PS-b-PMMA (54 kg mol-1, styrene fraction 70%) DBC when confined within periodic SiO2 trenches of different widths (W, ranging between 75 and 600 nm) and fixed length (l, 5.7 μm). The characteristic dimensions of the PMMA cylinder structure in the confined configurations were compared with those obtained on a flat surface (L0 = 27.8 ± 0.5 nm, D = 13.0 ± 1.0 nm). The analysis of D as a function of W evolution indicates that the eccentricity of the PMMA cylinders decreases as a result of the deformation of the cylinder in the direction perpendicular to the trenches. The center-to-center distance in the direction parallel to the long side of the trenches (L0l) is equal to L0 measured on the flat surface, whereas the one along the short side (L0w) is subjected to an appreciable variation (ΔL0w = 5 nm) depending on W. The possibility of finely tuning L0w maintaining constant L0l paves the way to the realization of a DBC-based transfer standard for lateral length calibration with periods in the critical range between 20 and 50 nm wherein no commercial transfer standards are available. A prototype transfer standard with cylindrical holes was used to calibrate the linear correction factor c(Δx')xx' of an atomic force microscope for a scan length of Δx' = 1 μm. The relative standard uncertainty of the correction factor was only 1.3%, and the second-order nonlinear correction was found to be significant.
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Affiliation(s)
- Giulia Aprile
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Federico Ferrarese Lupi
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, Agrate Brianza, MB 20846, Italy
| | - Matteo Fretto
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | - Emanuele Enrico
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | - Natascia De Leo
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | - Luca Boarino
- Nanofacility Piemonte, Istituto Nazionale di Ricerca Metrologica , Strada delle Cacce 91, Torino 10135, Italy
| | | | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, Agrate Brianza, MB 20846, Italy
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DIST), Università del Piemonte Orientale "A. Avogadro", INSTM , Viale T. Michel 11, Alessandria 15121, Italy
| | - Jørgen Garnæs
- Danish Institute of Fundamental Metrology (DFM) , Matematiktorvet 307, 1. Sal, Kongens Lyngby 2800, Denmark
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, Agrate Brianza, MB 20846, Italy
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8
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Ferrarese Lupi F, Giammaria TJ, Seguini G, Laus M, Dubček P, Pivac B, Bernstorff S, Perego M. GISAXS Analysis of the In-Depth Morphology of Thick PS-b-PMMA Films. ACS APPLIED MATERIALS & INTERFACES 2017; 9:11054-11063. [PMID: 28263052 DOI: 10.1021/acsami.7b01366] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The morphological evolution of cylinder-forming poly(styrene)-b-poly(methyl methacrylate) block copolymer (BCP) thick films treated at high temperatures in the rapid thermal processing (RTP) machine was monitored by means of in-depth grazing-incidence small-angle X-ray scattering (GISAXS). The use of this nondisruptive technique allowed one to reveal the formation of buried layers composed of both parallel- and perpendicular-oriented cylinders as a function of the film thickness (24 ≤ h ≤ 840 nm) and annealing time (0 ≤ t ≤ 900 s). Three distinct behaviors were observed depending on the film thickness. Up to h ≤ 160 nm, a homogeneous film consisting of perpendicular-oriented cylinders is observed. When h is between 160 and 700 nm, a decoupling process between both the air-BCP and substrate-BCP interfaces takes place, leading to the formation of mixed orientations (parallel and perpendicular) of the cylinders. Finally, for h > 700 nm, the two interfaces are completely decoupled, and the formation of a superficial layer of about 50 nm composed of perpendicular cylinders is observed. Furthermore, the through-film morphology affects the nanodomain long-range order, which substantially decreases in correspondence with the beginning of the decoupling process. When the thick samples are exposed to longer thermal treatments, an increase in the long-range order of the nanodomains occurs, without any sensible variation of the thickness of the superficial layer.
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Affiliation(s)
- Federico Ferrarese Lupi
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Nanoscience and Materials Division, Istituto Nazionale Ricerca Metrologica , Strada delle Cacce 91, 10135 Torino, Italy
| | - Tommaso Jacopo Giammaria
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte Orientale ''A. Avogadro'' , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica, Università del Piemonte Orientale ''A. Avogadro'' , Viale T. Michel 11, 1512 Alessandria, Italy
| | - Pavo Dubček
- Institut Ruđer Bošković , Bijenička cesta 54, 10000 Zagreb, Croatia
| | - Branko Pivac
- Institut Ruđer Bošković , Bijenička cesta 54, 10000 Zagreb, Croatia
| | - Sigrid Bernstorff
- Elettra-Sincrotrone Trieste , SS 14, Km 163.5, in AREA Science Park, 34149 Basovizza (TS), Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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9
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Müller-Buschbaum P. GISAXS and GISANS as metrology technique for understanding the 3D morphology of block copolymer thin films. Eur Polym J 2016. [DOI: 10.1016/j.eurpolymj.2016.04.007] [Citation(s) in RCA: 64] [Impact Index Per Article: 8.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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10
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Giammaria TJ, Ferrarese Lupi F, Seguini G, Perego M, Vita F, Francescangeli O, Wenning B, Ober CK, Sparnacci K, Antonioli D, Gianotti V, Laus M. Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments. ACS APPLIED MATERIALS & INTERFACES 2016; 8:9897-9908. [PMID: 27020526 DOI: 10.1021/acsami.6b02300] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Block copolymer (BCP) self-assembly is expected to complement conventional optical lithography for the fabrication of next-generation microelectronic devices. In this regard, silicon-containing BCPs with a high Flory-Huggins interaction parameter (χ) are extremely appealing because they form high-resolution nanostructures with characteristic dimensions below 10 nm. However, due to their slow self-assembly kinetics and low thermal stability, these silicon-containing high-χ BCPs are usually processed by solvent vapor annealing or in solvent-rich ambient at a low annealing temperature, significantly increasing the complexity of the facilities and of the procedures. In this work, the self-assembly of cylinder-forming polystyrene-block-poly(dimethylsiloxane-random-vinylmethylsiloxane) (PS-b-P(DMS-r-VMS)) BCP on flat substrates is promoted by means of a simple thermal treatment at high temperatures. Homogeneous PS-b-P(DMS-r-VMS) thin films covering the entire sample surface are obtained without any evidence of dewetting phenomena. The BCP arranges in a single layer of cylindrical P(DMS-r-VMS) nanostructures parallel-oriented with respect to the substrate. By properly adjusting the surface functionalization, the heating rate, the annealing temperature, and the processing time, one can obtain correlation length values larger than 1 μm in a time scale fully compatible with the stringent requirements of the microelectronic industry.
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Affiliation(s)
- Tommaso Jacopo Giammaria
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | | | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Francesco Vita
- Dipartimento di Scienze e Ingegneria della Materia, dell'Ambiente ed Urbanistica and CNISM, Universitá Politecnica delle Marche , Via Brecce Bianche, 60131 Ancona, Italy
| | - Oriano Francescangeli
- Dipartimento di Scienze e Ingegneria della Materia, dell'Ambiente ed Urbanistica and CNISM, Universitá Politecnica delle Marche , Via Brecce Bianche, 60131 Ancona, Italy
| | - Brandon Wenning
- Department of Materials Science and Engineering, Cornell University , Bard Hall, Ithaca, New York 14853, United States
| | - Christopher K Ober
- Department of Materials Science and Engineering, Cornell University , Bard Hall, Ithaca, New York 14853, United States
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Diego Antonioli
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
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11
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Seguini G, Zanenga F, Giammaria TJ, Ceresoli M, Sparnacci K, Antonioli D, Gianotti V, Laus M, Perego M. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent. ACS APPLIED MATERIALS & INTERFACES 2016; 8:8280-8288. [PMID: 26959626 DOI: 10.1021/acsami.6b00360] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
The self-assembly of block copolymer (BCP) thin films produces dense and ordered nanostructures. Their exploitation as templates for nanolithography requires the capability to control the lateral order of the nanodomains. Among a multiplicity of polymers, the widely studied all-organic polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP can easily form nanodomains perpendicularly oriented with respect to the substrate, since the weakly unbalanced surface interactions are effectively neutralized by grafting to the substrate an appropriate poly(styrene-random-methyl methacrylate) P(S-r-MMA) random copolymer (RCP). This benefit along with the selective etching of the PMMA component and the chemical similarity with the standard photoresist materials deserved for PS-b-PMMA the role of BCP of choice for the technological implementation in nanolithography. This work demonstrates that the synergic effect of thermal annealing with the initial solvent naturally trapped in the basic RCP + BCP system after the deposition process can be exploited to enhance the lateral order. The solvent content embedded in the total RCP + BCP system can be tuned by changing the molecular weight and thus the thickness of the grafted RCP brush layer, without introducing external reservoirs or dedicated setup and/or systems. The appropriate supply of solvent supports a grain coarsening kinetics following a power law with a 1/3 growth exponent for standing hexagonally ordered cylinders.
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Affiliation(s)
- Gabriele Seguini
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
| | - Fabio Zanenga
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
| | - Tommaso J Giammaria
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Monica Ceresoli
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
- Università degli Studi di Milano , Via Celoria 16, I-20133 Milano, Italy
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Diego Antonioli
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'', INSTM , UdR Alessandria, Viale T. Michel 11, I-15121 Alessandria, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza, Italy
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12
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Sparnacci K, Antonioli D, Gianotti V, Laus M, Lupi FF, Giammaria TJ, Seguini G, Perego M. Ultrathin random copolymer-grafted layers for block copolymer self-assembly. ACS APPLIED MATERIALS & INTERFACES 2015; 7:10944-10951. [PMID: 25954979 DOI: 10.1021/acsami.5b02201] [Citation(s) in RCA: 47] [Impact Index Per Article: 5.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Hydroxyl-terminated P(S-r-MMA) random copolymers (RCPs) with molecular weights (Mn) from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a silicon oxide surface and subsequently used to study the orientation of nanodomains with respect to the substrate, in cylinder-forming PS-b-PMMA block copolymer (BCP) thin films. When the thickness (H) of the grafted layer is greater than 5-6 nm, a perpendicular orientation is always observed because of the efficient decoupling of the BCP film from the polar SiO2 surface. Conversely, if H is less than 5 nm, the critical thickness of the grafted layer, which allows the neutralization of the substrate and promotion of the perpendicular orientation of the nanodomains in the BCP film, is found to depend on the Mn of the RCP. In particular, when Mn = 1700, a 2.0 nm thick grafted layer is sufficient to promote the perpendicular orientation of the PMMA cylinders in the PS-b-PMMA BCP film. A proximity shielding mechanism of the BCP molecules from the polar substrate surface, driven by chain stretching of the grafted RCP molecules, is proposed.
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Affiliation(s)
- Katia Sparnacci
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | - Diego Antonioli
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | - Valentina Gianotti
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | - Michele Laus
- †Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro", Viale T. Michel 11, 15121 Alessandria, Italy
- ‡INSTM, UdR, Alessandria, Italy
| | | | | | - Gabriele Seguini
- §Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Perego
- §Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, Italy
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Wu CP, Wang CC, Chen CY. Influence of asymmetric ratio of polystyrene-block-poly(methyl methacrylate) block copolymer on the crystallization rate of PLA. Eur Polym J 2015. [DOI: 10.1016/j.eurpolymj.2015.02.018] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/24/2022]
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Frascaroli J, Brivio S, Ferrarese Lupi F, Seguini G, Boarino L, Perego M, Spiga S. Resistive switching in high-density nanodevices fabricated by block copolymer self-assembly. ACS NANO 2015; 9:2518-2529. [PMID: 25743480 DOI: 10.1021/nn505131b] [Citation(s) in RCA: 28] [Impact Index Per Article: 3.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Bipolar resistive switching memories based on metal oxides offer a great potential in terms of simple process integration, memory performance, and scalability. In view of ultrahigh density memory applications, a reduced device size is not the only requirement, as the distance between different devices is a key parameter. By exploiting a bottom-up fabrication approach based on block copolymer self-assembling, we obtained the parallel production of bilayer Pt/Ti top electrodes arranged in periodic arrays over the HfO2/TiN surface, building memory devices with a diameter of 28 nm and a density of 5 × 10(10) devices/cm(2). For an electrical characterization, the sharp conducting tip of an atomic force microscope was adopted for a selective addressing of the nanodevices. The presence of devices showing high conductance in the initial state was directly connected with scattered leakage current paths in the bare oxide film, while with bipolar voltage operations we obtained reversible set/reset transitions irrespective of the conductance variability in the initial state. Finally, we disclosed a scalability limit for ultrahigh density memory arrays based on continuous HfO2 thin films, in which a cross-talk between distinct nanodevices can occur during both set and reset transitions.
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Affiliation(s)
- Jacopo Frascaroli
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
- ‡INRiM, NanoFacility, Electromagnetism Division, Strada delle Cacce 91, 10135 Torino, Italy
- §Department of Physics, University of Milan, Via Celoria 16, 20133 Milano, Italy
| | - Stefano Brivio
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
| | | | - Gabriele Seguini
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
| | - Luca Boarino
- ‡INRiM, NanoFacility, Electromagnetism Division, Strada delle Cacce 91, 10135 Torino, Italy
| | - Michele Perego
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
| | - Sabina Spiga
- †Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza (MB), Italy
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Sparnacci K, Antonioli D, Gianotti V, Laus M, Zuccheri G, Ferrarese Lupi F, Giammaria TJ, Seguini G, Ceresoli M, Perego M. Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications. ACS APPLIED MATERIALS & INTERFACES 2015; 7:3920-3930. [PMID: 25664773 DOI: 10.1021/am509088s] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Two strategies are envisioned to improve the thermal stability of the grafted layer and to allow the processing of the random copolymer/block copolymer (RCP/BCP) system at high temperature. From one side, a high-temperature thermal treatment of a commercial α-hydroxyl ω-2,2,6,6-tetramethylpiperidinyloxy functional RCP, namely, TR58, leads to the formation of a stabilized layer able to induce the perpendicular orientation of a symmetric BCP to temperatures higher than 310 °C. On the other side, an α-hydroxyl ω-Br functional RCP, namely, BrR58, with the same molar mass and composition of TR58, was prepared by activator regenerated by electron transfer atom transfer radical polymerization. The resulting brush layer can sustain the self-assembly of the symmetric BCP for processing temperatures as high as 330 °C. In both systems, the disruption of the BCP film, deposited on the grafted RCP layer, occurs because of the formation of bubbles, due to a low-temperature evolution of monomers from the RCP layer. The extent of the low-temperature monomer evolution is higher for TR58 than it is for BrR58 and starts at lower temperatures. For both copolymers, the thermal treatment offsets the low-temperature monomer evolution while still maintaining surface characteristics suitable to induce the perpendicular orientation of the BCPs, thus ultimately extending the range of processing temperatures of the BCP film and consequently speeding the self-organization process.
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Affiliation(s)
- Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Università del Piemonte Orientale ''A. Avogadro'' , Viale T. Michel 11, 15121 Alessandria, Italy
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Ferrarese Lupi F, Giammaria TJ, Volpe FG, Lotto F, Seguini G, Pivac B, Laus M, Perego M. High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications. ACS APPLIED MATERIALS & INTERFACES 2014; 6:21389-21396. [PMID: 25387131 DOI: 10.1021/am506391n] [Citation(s) in RCA: 23] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
The control of the self-assembly (SA) process and nanostructure orientation in diblock copolymer (DBC) thick films is a crucial technological issue. Perpendicular orientation of the nanostructures in symmetric and asymmetric poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer films obtained by means of simple thermal treatments was demonstrated to occur in well-defined thickness windows featuring modest maximum values, thus resulting in low aspect ratio (h/d < 2) of the final lithographic mask. In this manuscript, the thickness window corresponding to the perpendicular orientation of the cylindrical structures in asymmetric DBC is investigated at high temperatures (190 °C ≤ T ≤ 310 °C) using a rapid thermal processing machine. A systematic study of the annealing conditions (temperature and time) of asymmetric PS-b-PMMA (Mn = 67.1, polydispersity index = 1.09) films, with thicknesses ranging from 10 to 400 nm, allowed ordered patterns, with a maximum value of orientational correlation length of 350 nm, to be obtained for film thicknesses up to 200 nm. The complete propagation of the cylindrical structures through the whole film thickness in a high aspect ratio PS template (h/d ≈ 7) is probed by lift-off process. Si nanopillars are obtained having the same lateral ordering and characteristic dimensions of the DBC lithographic mask as further confirmed by grazing-incidence small-angle X-ray scattering experiments.
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Affiliation(s)
- F Ferrarese Lupi
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Monza and Brianza, Italy
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Ceresoli M, Ferrarese Lupi F, Seguini G, Sparnacci K, Gianotti V, Antonioli D, Laus M, Boarino L, Perego M. Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing. NANOTECHNOLOGY 2014; 25:275601. [PMID: 24960172 DOI: 10.1088/0957-4484/25/27/275601] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]
Abstract
This work reports experimental findings about the evolution of lateral ordering of lamellar microdomains in symmetric PS-b-PMMA thin films on featureless substrates. Phase separation and microdomain evolution are explored in a rather wide range of temperatures (190-340 °C) using a rapid thermal processing (RTP) system. The maximum processing temperature that enables the ordering of block copolymers without introducing any significant degradation of macromolecules is identified. The reported results clearly indicate that the range of accessible temperatures in the processing of these self-assembling materials is mainly limited by the thermal instability of the grafted random copolymer layer, which starts to degrade at T > 300 °C, inducing detachment of the block copolymer thin film. For T ⩽ 290 °C, clear dependence of correlation length (ξ) values on temperature is observed. The highest level of lateral order achievable in the current system in a quasi-equilibrium condition was obtained at the upper processing temperature limit after an annealing time as short as 60 s.
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Affiliation(s)
- Monica Ceresoli
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, Agrate Brianza 20864, Italy. Dipartimento di Fisica, Università degli Studi di Milano, Via Celoria 16, Milano 20133, Italy
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Ferrarese Lupi F, Giammaria TJ, Seguini G, Vita F, Francescangeli O, Sparnacci K, Antonioli D, Gianotti V, Laus M, Perego M. Fine tuning of lithographic masks through thin films of PS-b-PMMA with different molar mass by rapid thermal processing. ACS APPLIED MATERIALS & INTERFACES 2014; 6:7180-8. [PMID: 24738855 DOI: 10.1021/am5003074] [Citation(s) in RCA: 42] [Impact Index Per Article: 4.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
The self-assembly of asymmetric polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer based nanoporous thin films over a broad range of molar mass (Mn) between 39 kg·mol(-1) and 205 kg·mol(-1) is obtained by means of a simple thermal treatment. In the case of standard thermal treatments, the self-assembly process of block copolymers is hindered at small Mn by thermodynamic limitations and by a large kinetic barrier at high Mn. We demonstrate that a fine tuning of the annealing parameters, performed by a Rapid Thermal Processing (RTP) machine, permits us to overcome those limitations. Cylindrical features are obtained by varying Mn and properly changing the corresponding annealing temperature, while keeping constant the annealing time (900 s), the film thickness (∼30 nm), and the PS fraction (∼0.7). The morphology, the characteristic dimensions (i.e., the pore diameter d and the pore-to-pore distance L0), and the order parameter (i.e., the lattice correlation length ξ) of the samples are analyzed by scanning electron microscopy and grazing-incidence small-angle X-ray scattering, obtaining values of d ranging between 12 and 30 nm and L0 ranging between 24 and 73 nm. The dependence of L0 as a 0.67 power law of the number of segments places these systems inside the strong segregation limit regime. The experimental results evidence the capability to tailor the self-assembly processes of block copolymers over a wide range of molecular weights by a simple thermal process, fully compatible with the stringent constraints of lithographic applications and industrial manufacturing.
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