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Komesu T, Echtenkamp W, Binek C, Dowben PA. The spin polarization of palladium on magneto-electric Cr 2O 3. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2023; 35:275801. [PMID: 36958044 DOI: 10.1088/1361-648x/acc710] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/05/2022] [Accepted: 03/23/2023] [Indexed: 06/18/2023]
Abstract
While induced spin polarization of a palladium (Pd) overlayer on antiferromagnetic and magneto-electric Cr2O3(0001) is possible because of the boundary polarization at the Cr2O3(0001), in the single domain state, the Pd thin film appears to be ferromagnetic on its own, likely as a result of strain. In the conduction band, we find the experimental evidence of ferromagnetic spin polarized in Pd thin films on a Cr2O3(0001) single crystal, especially in the thin limit, Pd thickness of around 1-4 nm. Indeed there is significant spin polarization in 10 Å thick Pd films on Cr2O3(0001) at 310 K, i.e. above the Néel temperature of bulk Cr2O3. While Cr2O3(0001) has surface moments that tend to align along the surface normal, for Pd on Cr2O3, the spin polarization contains an in-plane component. Strain in the Pd adlayer on Cr2O3(0001) appears correlated to the spin polarization measured in spin polarized inverse photoemission spectroscopy. Further evidence for magnetization of Pd on Cr2O3is provided by measurement of the exchange bias fields in Cr2O3/Pd(buffer)/[Co/Pd]nexchange bias systems. The magnitude of the exchange bias field is, over a wide temperature range, virtually unaffected by the Pd thickness variation between 1 and 2 nm.
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Affiliation(s)
- Takashi Komesu
- Department of Physics and Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Jorgensen Hall 855 North 16th Street, Lincoln, NE 68588-0299, United States of America
| | - Will Echtenkamp
- Department of Physics and Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Jorgensen Hall 855 North 16th Street, Lincoln, NE 68588-0299, United States of America
| | - Christian Binek
- Department of Physics and Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Jorgensen Hall 855 North 16th Street, Lincoln, NE 68588-0299, United States of America
| | - Peter A Dowben
- Department of Physics and Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Jorgensen Hall 855 North 16th Street, Lincoln, NE 68588-0299, United States of America
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Mahmood A, Echtenkamp W, Street M, Wang JL, Cao S, Komesu T, Dowben PA, Buragohain P, Lu H, Gruverman A, Parthasarathy A, Rakheja S, Binek C. Voltage controlled Néel vector rotation in zero magnetic field. Nat Commun 2021; 12:1674. [PMID: 33723249 PMCID: PMC7960997 DOI: 10.1038/s41467-021-21872-3] [Citation(s) in RCA: 11] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/25/2020] [Accepted: 02/11/2021] [Indexed: 11/16/2022] Open
Abstract
Multi-functional thin films of boron (B) doped Cr2O3 exhibit voltage-controlled and nonvolatile Néel vector reorientation in the absence of an applied magnetic field, H. Toggling of antiferromagnetic states is demonstrated in prototype device structures at CMOS compatible temperatures between 300 and 400 K. The boundary magnetization associated with the Néel vector orientation serves as state variable which is read via magnetoresistive detection in a Pt Hall bar adjacent to the B:Cr2O3 film. Switching of the Hall voltage between zero and non-zero values implies Néel vector rotation by 90 degrees. Combined magnetometry, spin resolved inverse photoemission, electric transport and scanning probe microscopy measurements reveal B-dependent TN and resistivity enhancement, spin-canting, anisotropy reduction, dynamic polarization hysteresis and gate voltage dependent orientation of boundary magnetization. The combined effect enables H = 0, voltage controlled, nonvolatile Néel vector rotation at high-temperature. Theoretical modeling estimates switching speeds of about 100 ps making B:Cr2O3 a promising multifunctional single-phase material for energy efficient nonvolatile CMOS compatible memory applications.
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Affiliation(s)
- Ather Mahmood
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Will Echtenkamp
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Mike Street
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Jun-Lei Wang
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Shi Cao
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Takashi Komesu
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Peter A Dowben
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Pratyush Buragohain
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Haidong Lu
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Alexei Gruverman
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA
| | - Arun Parthasarathy
- Department of Electrical Engineering, New York University, Brooklyn, NY, USA
| | - Shaloo Rakheja
- Holonyak Micro and Nanotechnology Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL, USA
| | - Christian Binek
- Department of Physics & Astronomy and the Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, USA.
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Ye S, Shiokawa Y, Pati SP, Sahashi M. Parasitic Magnetism in Magnetoelectric Antiferromagnet. ACS APPLIED MATERIALS & INTERFACES 2020; 12:29971-29978. [PMID: 32490655 DOI: 10.1021/acsami.0c06210] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Parasitic magnetism plays an important role in magnetoelectric spin switching of antiferromagnetic oxides, but its mechanism has not been clearly investigated. Unlike the widely obtained surface boundary magnetization in magnetoelectric Cr2O3 antiferromagnet, we previously reported that Al doping could produce volume-dependent parasitic magnetism (Mpara) in Cr2O3 with the remaining magnetoelectric effect and antiferromagnetic properties. In this work, we systematically investigated the magnetic properties of Mpara in Cr2O3 through its different exchange coupling characteristics with the ferromagnet at various conditions. The columnar grain boundaries cause an antiferromagnetic sublattice breaking to produce uncompensated spins and thus are considered to be responsible for Mpara in both undoped and Al-doped Cr2O3. Finally, a model was proposed for the formation mechanism of the parasitic magnetism in Cr2O3, which explains the reported magnetic characteristics of Cr2O3, and some current topics such as the domain formation and motion in Cr2O3 during magnetoelectric spin switching. This work contributes to a deep understanding of antiferromagnetic spintronics and provides a method to realize the low-energy operation of antiferromagnetic-based magnetic random access memory.
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Affiliation(s)
- Shujun Ye
- Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
| | - Yohei Shiokawa
- Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
| | - Satya Prakash Pati
- Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
| | - Masashi Sahashi
- Graduate School of Engineering, Tohoku University, Sendai 980-8579, Japan
- ImPACT Program, Japan Science and Technology Agency, Tokyo 102-0076, Japan
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Cheng Y, Yu S, Zhu M, Hwang J, Yang F. Evidence of the Topological Hall Effect in Pt/Antiferromagnetic Insulator Bilayers. PHYSICAL REVIEW LETTERS 2019; 123:237206. [PMID: 31868464 DOI: 10.1103/physrevlett.123.237206] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/20/2019] [Revised: 11/04/2019] [Indexed: 06/10/2023]
Abstract
The topological Hall effect has been a primary indicator of nontrivial spin textures in magnetic materials. We observe the evidence of the topological Hall effect in Pt/Cr_{2}O_{3} bilayers grown on Al_{2}O_{3}(0001) and Al_{2}O_{3}(112[over ¯]0), where the Cr_{2}O_{3} epitaxial film is an antiferromagnetic insulator. The Pt/Cr_{2}O_{3} bilayers exhibit topological Hall resistivity for Cr_{2}O_{3} thicknesses below 6 nm near and above room temperature, which is above the Néel temperature of Cr_{2}O_{3}, revealing the key role of thermal fluctuations in the formation of spin textures. The similarity of topological Hall signals in (0001)- and (112[over ¯]0)-oriented Cr_{2}O_{3} films indicates that the emergence of spin textures is insensitive to crystalline orientation.
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Affiliation(s)
- Yang Cheng
- Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA
| | - Sisheng Yu
- Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA
| | - Menglin Zhu
- Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43212, USA
| | - Jinwoo Hwang
- Department of Materials Science and Engineering, The Ohio State University, Columbus, Ohio 43212, USA
| | - Fengyuan Yang
- Department of Physics, The Ohio State University, Columbus, Ohio 43210, USA
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