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Wu H, Yang L, Zhang G, Jin W, Xiao B, Zhang W, Chang H. Robust Magnetic Proximity Induced Anomalous Hall Effect in a Room Temperature van der Waals Ferromagnetic Semiconductor Based 2D Heterostructure. SMALL METHODS 2024:e2301524. [PMID: 38295050 DOI: 10.1002/smtd.202301524] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/08/2023] [Revised: 01/04/2024] [Indexed: 02/02/2024]
Abstract
Developing novel high-temperature van der Waals ferromagnetic semiconductor materials and investigating their interface coupling effects with 2D topological semimetals are pivotal for advancing next-generation spintronic and quantum devices. However, most van der Waals ferromagnetic semiconductors exhibit ferromagnetism only at low temperatures, limiting the proximity research on their interfaces with topological semimetals. Here, an intrinsic, van der Waals layered room-temperature ferromagnetic semiconductor crystal, FeCr0.5 Ga1.5 Se4 (FCGS), is reported with a Curie temperature (TC ) as high as 370 K, setting a new record for van der Waals ferromagnetic semiconductors. The saturation magnetization at low temperature (2 K) and room temperature (300 K) reaches 8.2 and 2.7 emu g-1 , respectively. Furthermore, FCGS possesses a bandgap of ≈1.2 eV, which is comparable to the widely used commercial silicon. The FCGS/graphene 2D heterostructure exhibits an impeccably smooth and gapless interface, thereby inducing a robust van der Waals magnetic proximity coupling effect between FCGS and graphene. After the proximity coupling, graphene undergoes a charge carrier transition from electrons to holes, accompanied by a transition from non-magnetic to ferromagnetic transport behavior with robust anomalous Hall effect (AHE). Notably, the van der Waals magnetic proximity-induced AHE remains robust even up to 400 K.
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Affiliation(s)
- Hao Wu
- Center for Joining and Electronic Packaging, State Key Laboratory of Material Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
- Institute for Quantum Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Li Yang
- Center for Joining and Electronic Packaging, State Key Laboratory of Material Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Gaojie Zhang
- Center for Joining and Electronic Packaging, State Key Laboratory of Material Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
- Institute for Quantum Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
- Shenzhen R&D Center of Huazhong University of Science and Technology (HUST), Shenzhen, 518000, China
| | - Wen Jin
- Center for Joining and Electronic Packaging, State Key Laboratory of Material Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Bichen Xiao
- Center for Joining and Electronic Packaging, State Key Laboratory of Material Processing and Die & Mold Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology (HUST), Wuhan, 430074, China
| | - Wenfeng Zhang
- Shenzhen R&D Center of Huazhong University of Science and Technology (HUST), Shenzhen, 518000, China
| | - Haixin Chang
- Shenzhen R&D Center of Huazhong University of Science and Technology (HUST), Shenzhen, 518000, China
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Das C, Kumar A, Kumar S, Dambhare NV, Kumar M, Rath AK, Sahu S. Photogating induced high sensitivity and speed from heterostructure of few-layer MoS 2 and reduced graphene oxide-based photodetector. Phys Chem Chem Phys 2023; 25:30419-30427. [PMID: 37916980 DOI: 10.1039/d3cp03518b] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/03/2023]
Abstract
Over the past few years, two-dimensional transition metal dichalcogenides (2D-TMDC) have attracted huge attention due to their high mobility, high absorbance, and high performance in generating excitons (electron and hole pairs). Especially, 2D molybdenum disulfide (MoS2) has been extensively used in optoelectronic and photovoltaic applications. Due to the low photo-to-dark current ratio (Iphoto/dark) and low speed, pristine MoS2-based devices are unsuitable for these applications. So, they need some improvements, i.e., by adding layers or decorating with materials of complementary majority charges. In this work, we decorated pristine MoS2 with reduced graphene oxide (rGO) and got improved dark current, Iphoto/dark, and response time. When we compared the performance of pristine MoS2 based device and rGO decorated MoS2 based device, the rGO/MoS2-based device showed an improved performance of responsivity of 3.36 A W-1, along with an Iphoto/dark of about 154. The heterojunction device exhibited a detectivity of 4.75 × 1012 Jones, along with a very low response time of 0.184 ms. The stability is also outstanding having the same device performance even after six months.
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Affiliation(s)
- Chayan Das
- Department of Physics, Indian Institute of Technology Jodhpur, Jodhpur 342037, India.
| | - Ashok Kumar
- Department of Electrical Engineering, Indian Institute of Technology Jodhpur, Jodhpur 342037, India
| | - Suresh Kumar
- Department of Physics, Indian Institute of Technology Jodhpur, Jodhpur 342037, India.
| | - Neha V Dambhare
- CSIR-National Chemical Laboratory, Dr Homi Bhabha Road, Pune 411008, India
- Academy of Scientific and Innovative Research, Ghaziabad, 201002, India
| | - Mahesh Kumar
- Department of Electrical Engineering, Indian Institute of Technology Jodhpur, Jodhpur 342037, India
| | - Arup K Rath
- CSIR-National Chemical Laboratory, Dr Homi Bhabha Road, Pune 411008, India
- Academy of Scientific and Innovative Research, Ghaziabad, 201002, India
| | - Satyajit Sahu
- Department of Physics, Indian Institute of Technology Jodhpur, Jodhpur 342037, India.
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