Neutron reflectivity studies of the surface-induced ordering of diblock copolymer films

Microphase Separation of Poly(2-(Dimethylamino)Ethyl Methacrylate)-b-Poly(Tetrahydropyranyl Methacrylate) Diblock Copolymer Thin Films

The microphase separation in diblock copolymer films comprising two chemically similar methacrylate blocks, poly(2-(dimethylamino)ethyl methacrylate) and poly(tetrahydropyranyl methacrylate), is investigated. Four symmetric diblock copolymers, with Mn's ranging from 4300 to 109 700 g mol-1 and narrow molecular weight distributions, are synthesized by group-transfer polymerization, are spin-coated from ethyl lactate solutions and are subsequently solvent vapor annealed. The two lower Mn copolymers dewet the silicon substrates after annealing, whereas the two higher Mn copolymers reveal the formation of holes and islands by optical microscopy, suggesting their microphase separation into lamellae structures orientated parallel to the substrate. The ordering of these weakly segregated diblock copolymers is verified by X-ray reflectivity (XRR) and grazing-incidence small-angle X-ray scattering (GISAXS). XRR provided the film thickness and lamellae spacing by probing along the direction perpendicular to the sample surface, whereas GISAXS probes the nanoscale morphology along the sample plane and the lateral and vertical correlation lengths of the films by analyzing the diffuse scattering. The lamellae thicknesses determined by XRR and GISAXS are in good agreement with those measured by atomic force microscopy. The results hold great promise for the development of highly functional ordered nanostructures in thin film geometries for applications in energy, catalysis, and others.

Self-Assembly of Lamellar/Micellar Block Copolymers Induced Through Their Rich Exposure to Various Solvent Vapors: An AFM Study

In this work, we have employed an advanced method of solvent vapor annealing to expose spin-cast thin films made from various lamellar and micellar block copolymers to generous amounts of different types of solvent vapors, with the final goal of stimulating the films' self-assembly into (hierarchically) ordered structures. As revealed by atomic force microscopy measurements, periodic lamellar nanostructures of molecular dimensions based on poly(4-vinylpyridine)-b-polybutadiene and poly(2-vinylpyridine)-b-polybutadiene, as well as micellar structures further packed into either (parallel) stripe-like or honeycomb-resembling configurations based on poly(2-vinylpyridine)-b-poly(tert-butyl methacrylate)-b-poly(methacrylate cyclohexyl), were successfully produced through processing.

Equilibrium phase behavior of gyroid-forming diblock polymer thin films

Thin-film confinement of self-assembling block polymers results in materials with myriad potential applications-including membranes and optical devices-and provides design parameters for altering phase behavior that are not available in the bulk, namely, film thickness and preferential wetting. However, most research has been limited to lamella- and cylinder-forming polymers; three-dimensional phases, such as double gyroid (DG), have been observed in thin films, but their phase behavior under confinement is not yet well understood. We use self-consistent field theory to predict the equilibrium morphology of bulk-gyroid-forming AB diblock polymers under thin-film confinement. Phase diagrams reveal that the (211) orientation of DG, often observed in experiments, is stable between nonpreferential boundaries at thicknesses as small as 1.2 times the bulk DG lattice parameter. The (001) orientation is stable between modestly B-preferential boundaries, where B is the majority block, while a different (211)-oriented termination plane is stabilized by strongly B-preferential boundaries, neither of which has been observed experimentally. We then describe two particularly important phenomena for explaining the phase behavior of DG thin films at low film thicknesses. The first is "constructive interference," which arises when distortions due to the top and bottom boundaries overlap and is significant for certain DG orientations. The second is a symmetry-dependent, in-plane unit-cell distortion that arises because the distorted morphology near the boundary has a different preferred unit-cell size and shape than the bulk. These results provide a thermodynamic portrait of the phase behavior of DG thin films.

Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly

While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the creation of a chemically tailored, highly reliable, and practically applicable block copolymer and sub-10-nm line patterns by directed self-assembly. Polystyrene-block-[poly(glycidyl methacrylate)-random-poly(methyl methacrylate)] (PS-b-(PGMA-r-PMMA) or PS-b-PGM), which is based on PS-b-PMMA with an appropriate amount of introduced PGMA (10-33 mol%) is quantitatively post-functionalized with thiols. The use of 2,2,2-trifluoroethanethiol leads to polymers (PS-b-PGFMs) with Flory-Huggins interaction parameters (χ) that are 3.5-4.6-times higher than that of PS-b-PMMA and well-defined higher-order structures with domain spacings of less than 20 nm. This study leads to the smallest perpendicular lamellar domain size of 12.3 nm. Furthermore, thin-film lamellar domain alignment and vertical orientation are highly reliably and reproducibly obtained by directed self-assembly to yield line patterns that correspond to a 7.6 nm half-pitch size.

Boundary Frustration in Double-Gyroid Thin Films

Self-consistent field theory for thin films of AB diblock polymers in the double-gyroid phase reveals that in the absence of preferential wetting of monomer species at the film boundaries, films with the (211) plane oriented parallel to the boundaries are more stable than other orientations, consistent with experimental results. This preferred orientation is explained in the context of boundary frustration. Specifically, the angle of intersection between the A/B interface and the film boundary, the wetting angle, is thermodynamically restricted to a narrow range of values. Most termination planes in the double gyroid cannot accommodate this narrow range of wetting angles without significant local distortion relative to the bulk morphology; the (211)-oriented termination plane with the "double-wave" pattern produces relatively minimal distortion, making it the least frustrated boundary. The principle of boundary frustration provides a framework to understand the relative stability of termination planes for complex ordered block polymer phases confined between flat, nonpreferential boundaries.

Revealing the Kinetic Phase Behavior of Block Copolymer Complexes Using Solvent Vapor Absorption-Desorption Isotherms

Controlling the self-assembled morphologies in block copolymers heavily depends on their molecular architecture and processing conditions. Solvent vapor annealing is a versatile processive pathway to obtain highly periodic self-assemblies from high chi (χ) block copolymers (BCPs) and supramolecular BCP complexes. Despite the importance of navigating the energy landscape, controlled solvent vapor annealing (SVA) has not been investigated in BCP complexes, partly due to its intricate multicomponent nature. We introduce characteristic absorption-desorption solvent vapor isotherms as an effective way to understand swelling behavior and follow the morphological evolution of the polystyrene-block-poly(4-vinylpyridine) block copolymer complexed with pentadecylphenol (PS-b-P4VP(PDP)). Using the sorption isotherms, we identify the glass transition points, polymer-solvent interaction parameters, and bulk modulus. These parameters indicate that complexation completely screens the polymer interchain interactions. Furthermore, we established that the sorption isotherm of the homopolymer blocks serves to deconvolute the intricacy of BCP complexes. We applied our findings by developing annealing pathways for grain coarsening while preventing macroscopic film dewetting under SVA. Here, grain coarsening obeyed a power law and the growth exponent revealed a kinetic transition point for rapid self-assembly. Overall, SVA-based sorption isotherms have emerged as a critical method for understanding and developing annealing pathways for BCP complexes.

Phase Behavior of Charged Star Block Copolymers at Fluids Interface

The phase behavior of block copolymers (BCPs) at the water-oil interface is influenced by the segmental interaction parameter ( χ ${\chi }$ ) and chain architecture. We synthesized a series of star block copolymers (s-BCPs) having polystyrene (PS) as core and poly(2-vinylpyridine) (P2VP) as corona. The interaction parameters of block-block ( χ ${\chi }$ PS-P2VP ) and block-solvent ( χ ${\chi }$ P2VP-solvent ) were varied by adjusting the pH of the aqueous solution. Lowering pH increased the fraction of quaternized-P2VP (Q-P2VP) with enhanced hydrophilicity. By transferring the equilibrated interfacial assemblies, morphologies ranging from bicontinuous films at pH of 7 and 3.1 to nanoporous and nanotubular structure at pH of 0.65 were observed. The nanoporous films formed hexagonally packed pores in s-BCP matrix, while nanotubes comprised Q-P2VP as corona and PS as core. Control over pore size, d-spacing between pores, and nanotube diameters was achieved by varying polymer concentration, molecular weight, volume fraction and arm number of s-BCPs. Large-scale nanoporous films were obtained by freeze-drying emulsions. Remarkably, the morphologies of linear BCPs were inverted, forming hexagonal-packed rigid spherical micelles with Q-P2VP as core and PS as corona in multilayer. This work provides insights of phase behaviors of BCP at fluids interface and offer a facile approach to prepare nanoporous film with well-controlled pore structure.

Functional composites by programming entropy-driven nanosheet growth

Nanomaterials must be systematically designed to be technologically viable1-5. Driven by optimizing intermolecular interactions, current designs are too rigid to plug in new chemical functionalities and cannot mitigate condition differences during integration6,7. Despite extensive optimization of building blocks and treatments, accessing nanostructures with the required feature sizes and chemistries is difficult. Programming their growth across the nano-to-macro hierarchy also remains challenging, if not impossible8-13. To address these limitations, we should shift to entropy-driven assemblies to gain design flexibility, as seen in high-entropy alloys, and program nanomaterial growth to kinetically match target feature sizes to the mobility of the system during processing14-17. Here, following a micro-then-nano growth sequence in ternary composite blends composed of block-copolymer-based supramolecules, small molecules and nanoparticles, we successfully fabricate high-performance barrier materials composed of more than 200 stacked nanosheets (125 nm sheet thickness) with a defect density less than 0.056 µm-2 and about 98% efficiency in controlling the defect type. Contrary to common perception, polymer-chain entanglements are advantageous to realize long-range order, accelerate the fabrication process (<30 min) and satisfy specific requirements to advance multilayered film technology3,4,18. This study showcases the feasibility, necessity and unlimited opportunities to transform laboratory nanoscience into nanotechnology through systems engineering of self-assembly.

The development of neutron reflectometry as a probe of the nanoscale structure of polymer thin film systems - founded on the pioneering work of Professor Thomas P. Russell

Among Professor Russell's numerous, original, and significant contributions to polymer science are those in which he helped pioneer the application of neutron reflectometry to the study of thin film systems. For this groundbreaking work, along with his support of neutron scattering methods in general, he was awarded the 2020 Clifford G. Shull Prize by the Neutron Scattering Society of America, named after and in honor of the Nobel Prize laureate. This article highlights some of the first applications of neutron reflectometry to probe the nanoscale structure of polymer thin film systems that Professor Russell and his colleagues pioneered. A concise account of the subsequent evolution of even more powerful phase-sensitive reflectometry techniques, following the success of their early work, is then presented. In addition to a general description of this current methodology, several particularly relevant and illustrative examples are given.

Phase behavior and interfacial tension of ternary polymer mixtures with block copolymers

The phase behavior and interfacial tension of ternary polymeric mixtures (polystyrene/polystyrene-b-poly(methyl methacrylate)/poly(methyl methacrylate), PS/PS-b-PMMA/PMMA) are investigated by dissipative particle dynamics (DPD) simulations. Our simulation results show that, as the PS-b-PMMA diblock copolymer concentration increases, the interfacial tension decreases due to the decayed correlations between homopolymers PS and PMMA. When the chain lengths of copolymers are fixed, with the increase of the chain lengths of PS and PMMA homopolymers the interfacial width becomes wider and the interfacial tension becomes smaller, due to the copolymers presenting more stretched and swollen structures in the mixtures with the short length of homopolymers. However, with simultaneously increasing chain lengths of both diblock copolymer and homopolymers with a fixed ratio, the interfacial tension increases because the copolymer chains with longer chain length penetrate more deeply into the homopolymer phase and the interactions between diblock copolymers become weaker. These results will provide a way to mix incompatible homopolymers to improve material performances.

Distributions of Deuterated Polystyrene Chains in Perforated Layers of Blend Films of a Symmetric Polystyrene-block-poly(methyl methacrylate)

We have examined the spatial distributions of polymer chains in blend films of weakly segregated polystyrene-block-poly(methyl methacrylate) [P(S-b-MMA)] and deuterated polystyrene (dPS). By fine-tuning the composition (ϕ_PS+dPS = 63.8 vol %) of the total PS/dPS component and annealing temperature (230 and 270 °C), P(S-b-MMA)/dPS blend films mainly form perforated layers with a parallel orientation (hereafter PLs^//). The distributions of dPS in PLs^// were probed by grazing-incidence small-angle neutron scattering (GISANS) and time-of-flight neutron reflectivity (ToF-NR). GISANS and ToF-NR results offer evidence that dPS chains preferentially locate at the free surface and within the PS layers for blend films that were annealed at 230 °C. Upon annealing at 270 °C, dPS chains distribute within PS layers and perforated PMMA layers. Nevertheless, dPS chains still retain a surface preference for thin films. In contrast, such surface segregation of dPS chains is prohibited for thick films when annealed at 270 °C.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Buried Structure in Block Copolymer Films Revealed by Soft X-ray Reflectivity

Interactions between polymers and surfaces can be used to influence properties including mechanical performance in nanocomposites, the glass transition temperature, and the orientation of thin film block copolymers (BCPs). In this work we investigate how specific interactions between the substrate and BCPs with varying substrate affinity impact the interfacial width between polymer components. The interface width is generally assumed to be a function of the BCP properties and independent of the surface affinity or substrate proximity. Using resonant soft X-ray reflectivity the optical constants of the film can be controlled by changing the incident energy, thereby varying the depth sensitivity of the measurement. Resonant soft X-ray reflectivity measurements were conducted on films of polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP) and PS-b-poly(methyl methacrylate) (PS-b-PMMA), where the thickness of the film was varied from half the periodicity (L₀) of the BCP to 5.5 L₀. The results of this measurement on the PS-b-P2VP films show a significant expansion of the interface width immediately adjacent to the surface. This is likely caused by the strong adsorption of P2VP to the substrate, which constrains the mobility of the junction points, preventing them from reaching their equilibrium distribution and expanding the observed interface width. The interface width decays toward equilibrium moving away from the substrate, with the decay rate being a function of film thickness below a critical limit. The PMMA block appears to be more mobile, and the BCP interfaces near the substrate match their equilibrium value.

Effect of Molecular Weight and Layer Thickness on the Dielectric Breakdown Strength of Neat and Homopolymer Swollen Lamellar Block Copolymer Films

Designing next-generation lightweight pulsed power devices hinges on understanding the factors influencing the energy storage performance of dielectric materials. Polymer dielectric films have a quadratic dependence of energy storage on the voltage breakdown strength, and strategies to enhance the breakdown strength are expected to yield a path toward high energy storage densities. Highly stratified lamellar block copolymer (L-BCP) films of model polystyrene-b-polymethylmethacrylate (PS-b-PMMA) exhibited as much as ~50% enhancement in breakdown voltage (E BD ) (225% increase in stored energy density, U ∼ E BD 2 ) compared to unordered as-cast L-BCP films. Such an energy density using amorphous polymer is on par with industry-standard semicrystalline biaxially oriented polypropylene (BOPP) and as such a notable development in the field. This work develops a deeper understanding of the molecular mechanisms ofE BD enhancement in L-BCP films, relatingE BD directly to molecular weight (M n ), with interpretation to effects of chain-end density and distribution, interface formation, layer thickness, and their relative contributions. As-cast disordered L-BCP films show decreasingE BD with decreasingM n similar to homopolymer studies because of the increase of homogeneously distributed chain ends in the film.E BD increases significantly in parallel ordered L-BCP films because of the combination of interface formation and spatial isolation of the chain ends into segregated zones. We further confirm the role of chain ends in the breakdown process blending a lowM n L-BCP with matchedM n homopolymers to attain the same layer spacing as neat L-BCP of higherM n .E BD shows a significant decrease at low homopolymer fractions because of increased net chain-end density within swollen ordered L-BCP domains in wet-brush regime, followed by increasedE BD because of layer thickness increase via segregated "interphase layer" formation by excess homopolymers. Notably,E BD of homopolymer swollen L-BCPs is always lower than that of neat L-BCPs of the same domain spacing because of overall adverse chain-end contribution from homopolymers. These findings provide important selection rules for L-BCPs for designing next-generation flexible electronics with high energy density solid-state BCP film capacitors.

Thomas P. Russell

"My greatest achievement has been successfully introducing students to research and seeing the lightbulb come on in their heads. The most exciting thing about my research is pursuing the unknown …" Find out more about Thomas P. Russell in his Author Profile.

Exploring Disordered Morphologies of Blends and Block Copolymers for Light-Emitting Diodes with Mesoscopic Simulations

Recently, disordered blends of semiconducting and insulating polymers have been used to prepare light-emitting diodes with increased luminous efficiency. Because the thermodynamic stability of the disordered phase in blends is limited, equivalent diblock copolymers (BCPs) could be an alternative. However, the choice between disordered blends and BCPs requires understanding structural differences and their effect on charge carrier transport. Using a hybrid mesoscopic model, we simulate blends and equivalent BCPs of two representative semiconducting and insulating polymers: poly(p-phenylene vinylene) (PPV) and polyacrylate. The immiscibility is varied to mimic annealing at different temperatures. We find stable or metastable disordered morphologies until we reach the mean-field (MF) spinodal. Disordered morphologies are heterogeneous because of thermal fluctuations and local segregation. Near the MF spinodal, segregation is stronger in BCPs than in the blends, even though the immiscibility, normalized by the MF spinodal, is the same. We link the spatial distribution of PPV with electric conductance. We predict that the immiscibility (temperature at which the layer is annealed) affects electrical percolation much stronger in BCPs than in blends. Differences in the local structure and percolation between blends and BCPs are enhanced at a high insulator content.

Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM

Block copolymer (BCP) self-assembly is a promising tool for next generation lithography as microphase separated polymer domains in thin films can act as templates for surface nanopatterning with sub-20 nm features. The replicated patterns can, however, only be as precise as their templates. Thus, the investigation of the morphology of polymer domains is of great importance. Commonly used analytical techniques (neutron scattering, scanning force microscopy) either lack spatial information or nanoscale resolution. Using advanced analytical (scanning) transmission electron microscopy ((S)TEM), we provide real space information on polymer domain morphology and interfaces between polystyrene (PS) and polymethylmethacrylate (PMMA) in cylinder- and lamellae-forming BCPs at highest resolution. This allows us to correlate the internal structure of polymer domains with line edge roughnesses, interface widths and domain sizes. STEM is employed for high-resolution imaging, electron energy loss spectroscopy and energy filtered TEM (EFTEM) spectroscopic imaging for material identification and EFTEM thickness mapping for visualisation of material densities at defects. The volume fraction of non-phase separated polymer species can be analysed by EFTEM. These methods give new insights into the morphology of polymer domains the exact knowledge of which will allow to improve pattern quality for nanolithography.

The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block copolymers (BCPs) is a nanofabrication technique used to reduce the periodicity of patterns prepared with traditional optical methods. BCPs with large interaction parameters (χ eff), provide access to smaller pitches and reduced interface widths. Larger χ eff is also expected to be correlated with reduced line edge roughness (LER), a critical performance parameter in integrated circuits. One approach to increasing χ eff is blending the BCP with a phase selective additive, such as an Ionic liquid (IL). The IL does not impact the etching rates of either phase, and this enables a direct interrogation of whether the change in interface width driven by higher χ eff translates into lower LER. The effect of the IL on the layer thickness and interface width of a BCP are examined, along with the corresponding changes in LER in a DSA patterned sample. The results demonstrate that increased χ eff through additive blending will not necessarily translate to a lower LER, clarifying an important design criterion for future material systems.

Biomimetic Separation of Transport and Matrix Functions in Lamellar Block Copolymer Channel-Based Membranes

Cell membranes control mass, energy, and information flow to and from the cell. In the cell membrane a lipid bilayer serves as the barrier layer, with highly efficient molecular machines, membrane proteins, serving as the transport elements. In this way, highly specialized transport properties are achieved by these composite materials by segregating the matrix function from the transport function using different components. For example, cell membranes containing aquaporin proteins can transport ∼4 billion water molecules per second per aquaporin while rejecting all other molecules including salts, a feat unmatched by any synthetic system, while the impermeable lipid bilayer provides the barrier and matrix properties. True separation of functions between the matrix and the transport elements has been difficult to achieve in conventional solute separation synthetic membranes. In this study, we created membranes with distinct matrix and transport elements through designed coassembly of solvent-stable artificial (peptide-appended pillar[5]arene, PAP5) or natural (gramicidin A) model channels with block copolymers into lamellar multilayered membranes. Self-assembly of a lamellar structure from cross-linkable triblock copolymers was used as a scalable replacement for lipid bilayers, offering better stability and mechanical properties. By coassembly of channel molecules with block copolymers, we were able to synthesize nanofiltration membranes with sharp selectivity profiles as well as uncharged ion exchange membranes exhibiting ion selectivity. The developed method can be used for incorporation of different artificial and biological ion and water channels into synthetic polymer membranes. The strategy reported here could promote the construction of a range of channel-based membranes and sensors with desired properties, such as ion separations, stimuli responsiveness, and high sensitivity.

Self-Assembly Investigations of Sulfonated Poly(methyl methacrylate-block-styrene) Diblock Copolymer Thin Films

Poly(methyl methacrylate-block-styrene) block copolymers (BCs) of low dispersity were selectively sulfonated on the styrenic segment. Several combinations of degree of polymerization and volume fraction of each block were investigated to access different self-assembled morphologies. Thin films of the sulfonated block copolymers were prepared by spin-coating and exposed to solvent vapor (SVA) or thermal annealing (TA) to reach equilibrium morphologies. Atomic force microscopy (AFM) was employed for characterizing the films, which exhibited a variety of nanometric equilibrium and nonequilibrium morphologies. Highly sulfonated samples revealed the formation of a honeycomb-like morphology obtained in solution rather than by the self-assembly of the BC in the solid state. The described morphologies may be employed in applications such as templates for nanomanufacturing and as cover and binder of catalytic particles in fuel cells.

Microphase separation of highly amphiphilic, low N polymers by photoinduced copper-mediated polymerization, achieving sub-2 nm domains at half-pitch

Fluoro-polyacrylic acid block copolymers with vary narrow dispersity are shown to have sub-2 nm domain sizes on phase separation.

Self-Organization of Triblock Copolymer Melt Chains Physisorbed on Non-neutral Surfaces

We here report the self-organization process of poly(styrene-b-ethylene/butadiene-b-styrene) (SEBS) triblock copolymer chains physically adsorbed on a non-neutral surface. Spin-cast SEBS thin films were prepared on silicon (Si) substrates and then annealed at a high temperature far above the bulk glass transition temperatures of the two constituent blocks. To reveal the buried interfacial structure, we utilized solvent rinsing processes and a suite of surface-sensitive techniques including ellipsometry, X-ray reflectivity, atomic force microscopy, and grazing incidence small angle X-ray scattering. We revealed that the SEBS chains form two different chain structures on the substrate simultaneously: (i) "flattened chains" with the average height of 2.5 nm but without forming microdomain structures; (ii) "loosely adsorbed chains" with the average height of 11.0 nm and the formation of perpendicularly oriented cylindrical microdomains to the substrate surface. In addition, the kinetics to form the perpendicular-oriented cylinder was sluggish (∼200 h) and proceeded via multistep processes toward the equilibrium state. We also found that the lateral microdomain structures were distorted, and the characteristic lengths of the microdomains were slightly different from the bulk even after reaching "quasiequilibrium" state within the observed time window. Furthermore, we highlight the vital role of the adsorbed chains in the self-assembling process of the entire SEBS thin film: a long-range perturbation associated with the adsorbed chains propagates into the film interior, overwhelming the free surface effect associated with surface segregation of the lower surface tension of polystyrene blocks.

Directing Block Copolymer Self-Assembly on Patterned Substrates

Self-assembling block copolymer films provide access to a variety of different nanostructured patterns in one, two, and three dimensions. However, in the absence of any templating, these nanostructures suffer from defects, often limiting utility. Directed block copolymer self-assembly uses patterned substrates that effectively suppress defect formation and allow the creation of desired patterns. The two main directed self-assembly techniques, chemoepitaxy and graphoepitaxy, employ chemically and topographically patterned substrates, respectively, to direct the block copolymer assembly in thin films. Their successful application in generating defect-free patterns in films of block copolymers exhibiting particular morphologies is summarized in this concept article. The possible role of directed self-assembly in extending nanostructured patterning from two to three dimensions is also discussed.

Grazing incidence scattering

Reflectometry experiments probe the scattering length density along the normal of interfaces by analysing the specularly scattered intensity. Lateral fluctuations result in intensity scattered away from the specular condition. In this paper the principles and peculiarities of grazing incidence scattering experiments are explained. One specific example, the self assembly of polymer micelles close to interfaces, is taken as a show case in order to introduce the scattering geometry and accessible length scales. The basic idea of the distorted wave Born approximation is lined out and some scientific examples are summarized.

High-Precision Solvent Vapor Annealing for Block Copolymer Thin Films

Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple parameters play in solvent vapor annealing has not been fully established. In solvent vapor annealing a thin polymer film is exposed to a vapor of solvent(s) thus forming a swollen and mobile layer to direct the self-assembly process at the nanoscale. Recent developments in both theory and experiments have directly identified critical parameters that govern this process, but controlling them in any systematic way has proven non-trivial. These identified parameters include vapor pressure, solvent concentration in the film, and the solvent evaporation rate. To explore their role, a purpose-built solvent vapor annealing chamber was designed and constructed. The all-metal chamber is designed to be inert to solvent exposure. Computer-controlled, pneumatically actuated valves allow for precision timing in the introduction and withdrawal of solvent vapor from the film. The mass flow controller-regulated inlet, chamber pressure gauges, in situ spectral reflectance-based thickness monitoring, and low flow micrometer relief valve give real-time monitoring and control during the annealing and evaporation phases with unprecedented precision and accuracy. The reliable and repeatable alignment of polylactide cylinders formed from polystyrene-b-polylactide, where cylinders stand perpendicular to the substrate and span the thickness of the film, provides one illustrative example.

Effect of Preferential Orientation of Lamellae in the Interfacial Region between a Block Copolymer-based Pressure-Sensitive Adhesive and a Solid Substrate on the Peel Strength

We have investigated the relationship between the peel strength of a block copolymer-based pressure-sensitive adhesive comprising of poly(methyl methacrylate) (PMMA) and poly(n-butyl acrylate) (PnBA) components from the substrate and the microdomain orientations in the interfacial region between the adhesive and the substrate. For the PMMA substrate, the PMMA component in the adhesive with a strong affinity for the substrate is attached to the surface of the substrate during an aging process of the sample at 140 °C. Next, the PMMA layer adjacent to the substrate surface is overlaid with a PnBA layer, which gets covalently connected, resulting in the horizontal alignment of the lamellae in the interfacial region. The peel strength of the adhesive substantially increases during aging at 140 °C, which takes the same time as the completion of the horizontally oriented lamellar structure. However, in the case of the polystyrene (PS) substrate, both the components in the adhesive repel the substrate, leading to the formation of the vertically oriented lamellar structure. As a result, the peel strength of the adhesive with respect to its PS substrate does not entirely increase on aging. It is suggested that the peel strength of the adhesive is highly correlated with the interfacial energy between the adhesive and substrate, which can be estimated from the microdomain orientation in the interfacial region.

Molecular Tailoring of Poly(styrene-b-methyl methacrylate) Block Copolymer Toward Perpendicularly Oriented Nanodomains with Sub-10 nm Features

We demonstrate a novel approach for fabricating vertically orientated, sub-10 nm, block copolymer (BCP) nanodomains on a substrate via molecular tailoring of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) BCP, one of the most widely used BCPs for nanopatterning. The idea is to incorporate a short middle block of self-attracting poly(methacrylic acid) (PMAA) between the PS and PMMA blocks, where the PMAA middle block promotes phase separation between PS and PMMA, while maintaining the domain orientation perpendicular to the substrate. The designed PS-b-PMAA-b-PMMA triblock copolymers, which were synthesized via well-controlled anionic polymerization, exhibited order-disorder transition temperatures higher than that of pristine PS-b-PMMA BCPs, indicating the promotion of phase separation by the middle PMAA block. For PS-b-PMAA-b-PMMA BCPs with total molecular weights of 21 and 18 kg/mol, the domain spacing corresponds to 19.3 and 16.7 nm, respectively, allowing us to fabricate sub-10 nm nanodomain structures. More importantly, it was demonstrated that the PMAA middle block, which has a higher surface energy than PS and PMMA, does not significantly alter lateral concentration fluctuations, which are responsible for phase-separation in the lateral direction. This enabled the vertical orientation of microdomains with sub-10 nm feature size on a PS-r-PMMA neutral surface without an additional neutral top layer. We anticipate that this approach provides an important platform for next-generation lithography and nanopatterning applications that require sub-10 nm features over large areas with simple process and reduced cost.

Scaling properties of ageing orientation fluctuations in stripe phases

We investigate the non-equilibrium dynamics of an ordered stripe-forming system free of topological defects. In particular, we study the ageing and the coarsening of orientation fluctuations parallel and perpendicular to the stripes via computer simulations based on a minimal phase-field model (model B with Coulomb interactions). Under the influence of noise, the stripe orientation field develops fluctuations parallel to the stripes, with the dominant modulation length λ*∥ increasing with time t as λ*∥ ∼ t1/4 and the correlation length perpendicular to the stripes ξ⊥θ increasing as ξ⊥θ ∼ t1/2. We explain these anisotropic coarsening dynamics with an analytic theory based on the linear elastic model for stripe displacements first introduced by Landau and Peierls. We thus obtain the scaling forms and the scaling exponents characterizing the correlation functions and the structure factor of the stripe orientation field. Our results reveal how the coarsening of orientation fluctuations prevents a periodically modulated phase free of topological defects from reaching equilibrium.

Morphology, directed self-assembly and pattern transfer from a high molecular weight polystyrene-block-poly(dimethylsiloxane) block copolymer film

The self-assembly of block copolymers with large feature sizes is inherently challenging as the large kinetic barrier arising from chain entanglement of high molecular weight (MW) polymers limits the extent over which long-range ordered microdomains can be achieved. Here, we illustrate the evolution of thin film morphology from a diblock copolymer of polystyrene-block-poly(dimethylsiloxane) exhibiting total number average MW of 123 kg mol^-1, and demonstrate the formation of layers of well-ordered cylindrical microdomains under appropriate conditions of binary solvent mix ratio, commensurate film thickness, and solvent vapor annealing time. Directed self-assembly of the block copolymer within lithographically patterned trenches occurs with alignment of cylinders parallel to the sidewalls. Fabrication of ordered cobalt nanowire arrays by pattern transfer was also implemented, and their magnetic properties and domain wall behavior were characterized.

Överlåtaren: a fast way to transfer and orthogonalize two-dimensional off-specular reflectivity data

Reflectivity measurements offer unique opportunities for the study of surfaces and interfaces, and specular reflectometry has become a standard tool in materials science to resolve structures normal to the surface of a thin film. Off-specular scattering, which probes lateral structures, is more difficult to analyse, because the Fourier space being probed is highly anisotropic and the scattering pattern is truncated by the interface. As a result, scattering patterns collected with (especially time-of-flight) neutron reflectometers are difficult to transform into reciprocal space for comparison with model calculations. A program package is presented for a generic two-dimensional transformation of reflectometry data intoqspace and back. The data are represented on an orthogonal grid, allowing cuts along directions relevant for theoretical modelling. This treatment includes background subtraction as well as a full characterization of the resolution function. The method is optimized for computational performance using repeatable operations and standardized instrument settings.

Order-disorder transition in thin films of horizontally-oriented cylinder-forming block copolymers: thermal fluctuations vs. preferential wetting

We present experimental and theoretical investigations of the order-disorder transition (ODT) in thin films of cylinder-forming diblock copolymers with asymmetric wetting conditions. Grazing incidence small-angle X-ray scattering (GISAXS) was implemented to determine the ODT temperatures (TODT) for poly(styrene-b-2-vinyl pyridine) (PS-P2VP) block copolymer thin films on a P2VP-preferential silicon substrate. Specifically, films consisting of multilayers of horizontally-oriented cylindrical structures (from 1- to 9-layers) were tested. We find that films with more than 2 cylindrical layers have a TODT comparable to the bulk case. However, TODT decreases as the film becomes thinner and the monolayer system has an ODT 30 °C below the bulk. Using self-consistent field theory (SCFT), we studied the ordering in corresponding thin films with asymmetric (top and bottom surface) wetting conditions. Surprisingly, SCFT is found to predict an opposite trend in TODT with film thickness than observed experimentally. Field-theoretic simulations with complex Langevin sampling were employed to resolve this discrepancy and demonstrate that thermal fluctuations in the PS-P2VP thin-film system dominate its ordering behavior in monolayer and bilayer films.

Crystal Morphology of Poly(3-hydroxybutyrate) on Amorphous Poly(vinylphenol) Substrate

The crystalline morphology and orientation of poly(3-hydroxybutyrate) (PHB) thin film on the poly(vinylphenol) (PVPh) sublayer with different thickness was studied by atomic force microscopy, X-ray diffraction, and infrared spectroscopy. PVPh sublayer influences the morphology of PHB greatly. Although edge-on lamellae form on both Si and PVPh surfaces at relatively lower crystallization temperature, the morphology of them is quite different. It appears as sheaflike edge-on lamellar morphology on PVPh sublayer. In addition, the edge-on lamellae prefer to form on the PVPh sublayers at much higher crystallization temperature compared with that on Si wafer. The PVPh layer thickness also influences the crystalline morphology of PHB. On a 30 nm thick PVPh layer, sheaflike edge-on lamellae form in a wide range of crystallization temperatures. When the PVPh thickness increases to 65 nm, fingerlike morphology is observed when the crystallization temperature is lower than 95 °C. The fingerlike morphology is caused by a diffusion-limited aggregation process, and it requires an optimum condition. Thickness ratio between PHB and PVPh sublayer and temperature are two key factors for the formation of fingerlike morphology.

Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors

Emerging needs for fast charge/discharge yet high-power, lightweight, and flexible electronics requires the use of polymer-film-based solid-state capacitors with high energy densities. Fast charge/discharge rates of film capacitors on the order of microseconds are not achievable with slower charging conventional batteries, supercapacitors and related hybrid technologies. However, the current energy densities of polymer film capacitors fall short of rising demand, and could be significantly enhanced by increasing the breakdown strength (EBD) and dielectric permittivity (εr) of the polymer films. Co-extruded two-homopolymer component multilayered films have demonstrated much promise in this regard showing higher EBD over that of component polymers. Multilayered films can also help incorporate functional features besides energy storage, such as enhanced optical, mechanical, thermal and barrier properties. In this work, we report accomplishing multilayer, multicomponent block copolymer dielectric films (BCDF) with soft-shear driven highly oriented self-assembled lamellar diblock copolymers (BCP) as a novel application of this important class of self-assembling materials. Results of a model PS-b-PMMA system show ∼50% enhancement in EBD of self-assembled multilayer lamellar BCP films compared to unordered as-cast films, indicating that the breakdown is highly sensitive to the nanostructure of the BCP. The enhancement in EBD is attributed to the "barrier effect", where the multiple interfaces between the lamellae block components act as barriers to the dielectric breakdown through the film. The increase in EBD corresponds to more than doubling the energy storage capacity using a straightforward directed self-assembly strategy. This approach opens a new nanomaterial paradigm for designing high energy density dielectric materials.

A grazing incident XRD study on the structure of poly(3-hydroxybutyrate) ultrathin films sandwiched between Si wafers and amorphous polymers

The crystallization behavior and morphology of poly(3-hydroxybutyrate) (PHB) ultrathin films sandwiched between Si wafers and amorphous thin polymer layers were studied by using grazing incident X-ray diffraction (GIXD) technology.