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Meng Q, Lin Q, Wang Z, Wang Y, Jing W, Xian D, Zhao N, Yao K, Zhang F, Tian B, Jiang Z. Numerical Investigation of GaN HEMT Terahertz Detection Model Considering Multiple Scattering Mechanisms. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:632. [PMID: 36838999 PMCID: PMC9961425 DOI: 10.3390/nano13040632] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/07/2023] [Revised: 01/31/2023] [Accepted: 02/03/2023] [Indexed: 06/18/2023]
Abstract
GaN high-electron-mobility transistor (HEMT) terahertz (THz) detectors have been widely studied and applied in the past few decades. However, there are few reports about the influence of GaN/AlGaN heterostructure material properties on the detection model at present. In this paper, a response voltage model for a GaN HEMT THz detector that considers the carrier scattering in a GaN/AlGaN heterostructure is proposed. The phonon scattering, dislocation scattering, and interface roughness scattering mechanisms are taken into account in the classic THz response voltage model; furthermore, the influence of various material parameters on the response voltage is studied. In a low-temperature region, acoustic scattering plays an important role, and the response voltage drops with an increase in temperature. In a high temperature range, optical phonon scattering is the main scattering mechanism, and the detector operates in a non-resonant detection mode. With an increase in carrier surface density, the response voltage decreases and then increases due to piezoelectric scattering and optical phonon scattering. For dislocation and interface roughness scattering, the response voltage is inversely proportional to the dislocation density and root mean square roughness (RMS) but is positively related to lateral correlation length. Finally, a comparison between our model and the reported models shows that our proposed model is more accurate.
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Affiliation(s)
- Qingzhi Meng
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Qijing Lin
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
- Collaborative Innovation Center of High-End State Key Manufacturing Equipment, Xi’an Jiaotong University, Xi’an 710054, China
- Shandong Laboratory of Yantai Advanced Materials and Green Manufacturing, Yantai 265503, China
- Xi’an Jiaotong University (Yantai) Research Institute for Intelligent Sensing Technology and System, Xi’an Jiaotong University, Xi’an 710049, China
| | - Zelin Wang
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Yangtao Wang
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Weixuan Jing
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Dan Xian
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Na Zhao
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Kun Yao
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Fuzheng Zhang
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
| | - Bian Tian
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
- Shandong Laboratory of Yantai Advanced Materials and Green Manufacturing, Yantai 265503, China
- Xi’an Jiaotong University (Yantai) Research Institute for Intelligent Sensing Technology and System, Xi’an Jiaotong University, Xi’an 710049, China
| | - Zhuangde Jiang
- State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
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Kuchuk AV, Kryvyi S, Lytvyn PM, Li S, Kladko VP, Ware ME, Mazur YI, Safryuk NV, Stanchu HV, Belyaev AE, Salamo GJ. The Peculiarities of Strain Relaxation in GaN/AlN Superlattices Grown on Vicinal GaN (0001) Substrate: Comparative XRD and AFM Study. NANOSCALE RESEARCH LETTERS 2016; 11:252. [PMID: 27184965 PMCID: PMC4870488 DOI: 10.1186/s11671-016-1478-6] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/29/2015] [Accepted: 05/10/2016] [Indexed: 05/28/2023]
Abstract
Superlattices (SLs) consisting of symmetric layers of GaN and AlN have been investigated. Detailed X-ray diffraction and reflectivity measurements demonstrate that the relaxation of built-up strain in the films generally increases with an increasing number of repetitions; however, an apparent relaxation for subcritical thickness SLs is explained through the accumulation of Nagai tilt at each interface of the SL. Additional atomic force microscopy measurements reveal surface pit densities which appear to correlate with the amount of residual strain in the films along with the appearance of cracks for SLs which have exceeded the critical thickness for plastic relaxation. These results indicate a total SL thickness beyond which growth may be limited for the formation of high-quality coherent crystal structures; however, they may indicate a growth window for the reduction of threading dislocations by controlled relaxation of the epilayers.
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Affiliation(s)
- Andrian V Kuchuk
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine.
- Institute for Nanoscience and Engineering, University of Arkansas, West Dickson 731, Fayetteville, AR, 72701, USA.
| | - Serhii Kryvyi
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine
| | - Petro M Lytvyn
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine
| | - Shibin Li
- Institute for Nanoscience and Engineering, University of Arkansas, West Dickson 731, Fayetteville, AR, 72701, USA
- State Key Laboratory of Electronic Thin Film and Integrated Devices, University of Electronic Science and Technology of China, 610054, Chengdu, China
| | - Vasyl P Kladko
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine
| | - Morgan E Ware
- Institute for Nanoscience and Engineering, University of Arkansas, West Dickson 731, Fayetteville, AR, 72701, USA
| | - Yuriy I Mazur
- Institute for Nanoscience and Engineering, University of Arkansas, West Dickson 731, Fayetteville, AR, 72701, USA
| | - Nadiia V Safryuk
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine
| | - Hryhorii V Stanchu
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine
| | - Alexander E Belyaev
- V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Pr. Nauky 41, 03680, Kiev, Ukraine
| | - Gregory J Salamo
- Institute for Nanoscience and Engineering, University of Arkansas, West Dickson 731, Fayetteville, AR, 72701, USA
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Lee YJ, Yao YC, Huang CY, Lin TY, Cheng LL, Liu CY, Wang MT, Hwang JM. High breakdown voltage in AlGaN/GaN HEMTs using AlGaN/GaN/AlGaN quantum-well electron-blocking layers. NANOSCALE RESEARCH LETTERS 2014; 9:433. [PMID: 25206318 PMCID: PMC4148684 DOI: 10.1186/1556-276x-9-433] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/06/2014] [Accepted: 08/19/2014] [Indexed: 06/03/2023]
Abstract
In this paper, we numerically study an enhancement of breakdown voltage in AlGaN/GaN high-electron-mobility transistors (HEMTs) by using the AlGaN/GaN/AlGaN quantum-well (QW) electron-blocking layer (EBL) structure. This concept is based on the superior confinement of two-dimensional electron gases (2-DEGs) provided by the QW EBL, resulting in a significant improvement of breakdown voltage and a remarkable suppression of spilling electrons. The electron mobility of 2-DEG is hence enhanced as well. The dependence of thickness and composition of QW EBL on the device breakdown is also evaluated and discussed.
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Affiliation(s)
- Ya-Ju Lee
- Institute of Electro-Optical Science and Technology, National Taiwan Normal University, 88, Sec. 4, Ting-Chou Road, Taipei 116, Taiwan
| | - Yung-Chi Yao
- Institute of Electro-Optical Science and Technology, National Taiwan Normal University, 88, Sec. 4, Ting-Chou Road, Taipei 116, Taiwan
| | - Chun-Ying Huang
- Institute of Electronics Engineering, National Taiwan University, 1, Sec. 4, Roosevelt Road, Taipei 106, Taiwan
| | - Tai-Yuan Lin
- Institute of Optoelectronic Sciences, National Taiwan Ocean University, 2, Pei-Ning Road, Keelung 202, Taiwan
| | - Li-Lien Cheng
- Institute of Electro-Optical Science and Technology, National Taiwan Normal University, 88, Sec. 4, Ting-Chou Road, Taipei 116, Taiwan
| | - Ching-Yun Liu
- Institute of Electro-Optical Science and Technology, National Taiwan Normal University, 88, Sec. 4, Ting-Chou Road, Taipei 116, Taiwan
| | - Mei-Tan Wang
- Solid-State Lighting Systems Department, Green Energy and Environment Research Laboratories, Industrial Technology Research Institute (ITRI), Hsinchu 310, Taiwan
| | - Jung-Min Hwang
- Solid-State Lighting Systems Department, Green Energy and Environment Research Laboratories, Industrial Technology Research Institute (ITRI), Hsinchu 310, Taiwan
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Drumm DW, Budi A, Per MC, Russo SP, L Hollenberg LC. Ab initio calculation of valley splitting in monolayer δ-doped phosphorus in silicon. NANOSCALE RESEARCH LETTERS 2013; 8:111. [PMID: 23445785 PMCID: PMC3606473 DOI: 10.1186/1556-276x-8-111] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/16/2012] [Accepted: 01/26/2013] [Indexed: 05/29/2023]
Abstract
: The differences in energy between electronic bands due to valley splitting are of paramount importance in interpreting transport spectroscopy experiments on state-of-the-art quantum devices defined by scanning tunnelling microscope lithography. Using vasp, we develop a plane-wave density functional theory description of systems which is size limited due to computational tractability. Nonetheless, we provide valuable data for the benchmarking of empirical modelling techniques more capable of extending this discussion to confined disordered systems or actual devices. We then develop a less resource-intensive alternative via localised basis functions in siesta, retaining the physics of the plane-wave description, and extend this model beyond the capability of plane-wave methods to determine the ab initio valley splitting of well-isolated δ-layers. In obtaining an agreement between plane-wave and localised methods, we show that valley splitting has been overestimated in previous ab initio calculations by more than 50%.
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Affiliation(s)
- Daniel W Drumm
- School of Physics, The University of Melbourne, Parkville, Victoria 3010, Australia
- School of Applied Sciences, RMIT University, Melbourne, Victoria 3001, Australia
| | - Akin Budi
- School of Physics, The University of Melbourne, Parkville, Victoria 3010, Australia
- School of Applied Sciences, RMIT University, Melbourne, Victoria 3001, Australia
| | - Manolo C Per
- School of Applied Sciences, RMIT University, Melbourne, Victoria 3001, Australia
- Virtual Nanoscience Laboratory, CSIRO Materials Science and Engineering, Parkville, Victoria 3052, Australia
| | - Salvy P Russo
- School of Applied Sciences, RMIT University, Melbourne, Victoria 3001, Australia
| | - Lloyd C L Hollenberg
- School of Physics, The University of Melbourne, Parkville, Victoria 3010, Australia
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