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Sperry B, Kukhta NA, Huang Y, Luscombe CK. Ligand Decomposition during Nanoparticle Synthesis: Influence of Ligand Structure and Precursor Selection. CHEMISTRY OF MATERIALS : A PUBLICATION OF THE AMERICAN CHEMICAL SOCIETY 2023; 35:570-583. [PMID: 36711050 PMCID: PMC9879203 DOI: 10.1021/acs.chemmater.2c03006] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 10/02/2022] [Revised: 12/02/2022] [Indexed: 06/18/2023]
Abstract
Aliphatic amine and carboxylic acid ligands are widely used as organic solvents during the bottom-up synthesis of inorganic nanoparticles (NPs). Although the ligands' ability to alter final NP properties has been widely studied, side reactivity of these ligands is emerging as an important mechanism to consider. In this work, we study the thermal decomposition of common ligands with varying functional groups (amines and carboxylic acids) and bond saturations (from saturated to polyunsaturated). Here, we investigate how these ligand properties influence decomposition in the absence and presence of precursors used in NP synthesis. We show that during the synthesis of inorganic chalcogenide NPs (Cu2ZnSnS4, Cu x S, and SnS x ) with metal acetylacetonate precursors and elemental sulfur, the ligand pyrolyzes, producing alkylated graphitic species. Additionally, there was less to no ligand decomposition observed during the sulfur-free synthesis of ZnO and CuO with metal acetylacetonate precursors. These results will help guide ligand selection for NP syntheses and improve reaction purity, an important factor in many applications.
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Affiliation(s)
- Breena
M. Sperry
- Department
of Materials Science and Engineering, University
of Washington, Seattle, Washington 98195, United States
| | - Nadzeya A. Kukhta
- Department
of Chemistry, University of Washington, Seattle, Washington 98195, United States
| | - Yunping Huang
- Department
of Materials Science and Engineering, University
of Washington, Seattle, Washington 98195, United States
- University
of Colorado Boulder, Boulder, Colorado 80309, United States
| | - Christine K. Luscombe
- Department
of Materials Science and Engineering, University
of Washington, Seattle, Washington 98195, United States
- Department
of Chemistry, University of Washington, Seattle, Washington 98195, United States
- Pi-Conjugated
Polymers Unit, Okinawa Institute of Science
and Technology, Okinawa 904-0495, Japan
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Ali A, Kim SY, Hussain M, Jaffery SHA, Dastgeer G, Hussain S, Anh BTP, Eom J, Lee BH, Jung J. Deep-Ultraviolet (DUV)-Induced Doping in Single Channel Graphene for Pn-Junction. NANOMATERIALS 2021; 11:nano11113003. [PMID: 34835767 PMCID: PMC8623685 DOI: 10.3390/nano11113003] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/10/2021] [Revised: 11/05/2021] [Accepted: 11/07/2021] [Indexed: 11/24/2022]
Abstract
The electronic properties of single-layer, CVD-grown graphene were modulated by deep ultraviolet (DUV) light irradiation in different radiation environments. The graphene field-effect transistors (GFETs), exposed to DUV in air and pure O2, exhibited p-type doping behavior, whereas those exposed in vacuum and pure N2 gas showed n-type doping. The degree of doping increased with DUV exposure time. However, n-type doping by DUV in vacuum reached saturation after 60 min of DUV irradiation. The p-type doping by DUV in air was observed to be quite stable over a long period in a laboratory environment and at higher temperatures, with little change in charge carrier mobility. The p-doping in pure O2 showed ~15% de-doping over 4 months. The n-type doping in pure N2 exhibited a high doping effect but was highly unstable over time in a laboratory environment, with very marked de-doping towards a pristine condition. A lateral pn-junction of graphene was successfully implemented by controlling the radiation environment of the DUV. First, graphene was doped to n-type by DUV in vacuum. Then the n-type graphene was converted to p-type by exposure again to DUV in air. The n-type region of the pn-junction was protected from DUV by a thick double-coated PMMA layer. The photocurrent response as a function of Vg was investigated to study possible applications in optoelectronics.
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Affiliation(s)
- Asif Ali
- HMC (Hybrid Materials Center), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea; (A.A.); (M.H.); (S.H.A.J.); (S.H.); (B.T.P.A.)
| | - So-Young Kim
- Center for Semiconductor Technology Convergence, Department of Electrical Engineering, Pohang University of Science and Technology, Cheongam-ro 77, Nam-gu, Pohang 37673, Korea; (S.-Y.K.); (B.H.L.)
| | - Muhammad Hussain
- HMC (Hybrid Materials Center), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea; (A.A.); (M.H.); (S.H.A.J.); (S.H.); (B.T.P.A.)
| | - Syed Hassan Abbas Jaffery
- HMC (Hybrid Materials Center), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea; (A.A.); (M.H.); (S.H.A.J.); (S.H.); (B.T.P.A.)
| | - Ghulam Dastgeer
- Department of Physics & Astronomy, Graphene Research Institute-Texas Photonics Center International Research Center (GRI–TPC IRC), Sejong University, Seoul 05006, Korea; (G.D.); (J.E.)
| | - Sajjad Hussain
- HMC (Hybrid Materials Center), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea; (A.A.); (M.H.); (S.H.A.J.); (S.H.); (B.T.P.A.)
| | - Bach Thi Phuong Anh
- HMC (Hybrid Materials Center), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea; (A.A.); (M.H.); (S.H.A.J.); (S.H.); (B.T.P.A.)
| | - Jonghwa Eom
- Department of Physics & Astronomy, Graphene Research Institute-Texas Photonics Center International Research Center (GRI–TPC IRC), Sejong University, Seoul 05006, Korea; (G.D.); (J.E.)
| | - Byoung Hun Lee
- Center for Semiconductor Technology Convergence, Department of Electrical Engineering, Pohang University of Science and Technology, Cheongam-ro 77, Nam-gu, Pohang 37673, Korea; (S.-Y.K.); (B.H.L.)
| | - Jongwan Jung
- HMC (Hybrid Materials Center), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea; (A.A.); (M.H.); (S.H.A.J.); (S.H.); (B.T.P.A.)
- Correspondence:
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