Growth and characterization of Sc2O3 doped Ta2O5 thin films

Amorphous dielectric optical coatings deposited by plasma ion-assisted electron beam evaporation for gravitational wave detectors

Coating thermal noise (CTN) in amorphous coatings is a drawback hindering their application in precision experiments such as gravitational wave detectors (GWDs). Mirrors for GWDs are Bragg's reflectors consisting of a bilayer-based stack of high- and low-refractive-index materials showing high reflectivity and low CTN. In this paper, we report the characterization of morphological, structural, optical, and mechanical properties of high-index materials such as scandium sesquioxide and hafnium dioxide and a low-index material such as magnesium fluoride deposited by plasma ion-assisted electron beam evaporation. We also evaluate their properties under different annealing treatments and discuss their potential for GWDs.

Optical bandgap control in Al2O3/TiO2 heterostructures by plasma enhanced atomic layer deposition: Toward quantizing structures and tailored binary oxides

Atomically thin heterostructures and superlattices are promising candidates for various optoelectronic and photonic applications. Different combinations of Al₂O₃/TiO₂ composites are obtained by plasma enhanced atomic layer deposition (PEALD). Their growth, composition, dispersion relation, and optical bandgap are systematically studied by means of UV/VIS spectrophotometry, spectroscopic ellipsometry (SE), x-ray reflectometry (XRR), scanning transmission electron microscopy(STEM) and x-ray photoelectron spectroscopy (XPS). Besides, an effective medium approximation (EMA) approach is applied to model the heterostructures theoretically. The refractive index and the indirect bandgap of the heterostructures depend on the ratio of the two oxides, while the bandgap is very sensitive to the thicknesses of the barrier and quantum well layers. A large blue shift of the absorption edge from 400 nm to 320 nm is obtained by changing the TiO₂ (quantum well) thickness from ~2 nm to ~0.1 nm separated by ~2 nm of Al₂O₃ (barrier) layers. PEALD unfolds the possibility of achieving optical quantizing effects within complex heterostructures enabling control of their structures down to atomic scale. It enables a path towards atomic scale processing of new 'artificial' materials with desired refractive indices and bandgap combinations by precise control of their compositions.