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Shao Y, Weerdenburg S, Seifert J, Urbach HP, Mosk AP, Coene W. Wavelength-multiplexed multi-mode EUV reflection ptychography based on automatic differentiation. LIGHT, SCIENCE & APPLICATIONS 2024; 13:196. [PMID: 39160154 PMCID: PMC11333750 DOI: 10.1038/s41377-024-01558-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/12/2023] [Revised: 06/29/2024] [Accepted: 07/27/2024] [Indexed: 08/21/2024]
Abstract
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next generationmetrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the nanoscale. This technique has surged attention recently, owing to the significant progress in high-harmonic generation (HHG) EUV sources and advancements in both hardware and software for computation. In this study, a novel algorithm is introduced and tested, which enables wavelength-multiplexed reconstruction that enhances the measurement throughput and introduces data diversity, allowing the accurate characterisation of sample structures. To tackle the inherent instabilities of the HHG source, a modal approach was adopted, which represents the cross-density function of the illumination by a series of mutually incoherent and independent spatial modes. The proposed algorithm was implemented on a mainstream machine learning platform, which leverages automatic differentiation to manage the drastic growth in model complexity and expedites the computation using GPU acceleration. By optimising over 200 million parameters, we demonstrate the algorithm's capacity to accommodate experimental uncertainties and achieve a resolution approaching the diffraction limit in reflection geometry. The reconstruction of wafer samples with 20-nm high patterned gold structures on a silicon substrate highlights our ability to handle complex physical interrelations involving a multitude of parameters. These results establish ptychography as an efficient and accurate metrology tool.
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Affiliation(s)
- Yifeng Shao
- Imaging Physics Department, Applied Science Faculty, Delft University of Technology, Lorentzweg 1, Delft, 2628 CJ, The Netherlands.
- Nanophotonics, Debye Institute for Nanomaterials Science and Center for Extreme Matter and Emergent Phenomena, Utrecht University, P.O. Box 80000, Utrecht, 3508 TA, The Netherlands.
| | - Sven Weerdenburg
- Imaging Physics Department, Applied Science Faculty, Delft University of Technology, Lorentzweg 1, Delft, 2628 CJ, The Netherlands
| | - Jacob Seifert
- Nanophotonics, Debye Institute for Nanomaterials Science and Center for Extreme Matter and Emergent Phenomena, Utrecht University, P.O. Box 80000, Utrecht, 3508 TA, The Netherlands
| | - H Paul Urbach
- Imaging Physics Department, Applied Science Faculty, Delft University of Technology, Lorentzweg 1, Delft, 2628 CJ, The Netherlands
| | - Allard P Mosk
- Nanophotonics, Debye Institute for Nanomaterials Science and Center for Extreme Matter and Emergent Phenomena, Utrecht University, P.O. Box 80000, Utrecht, 3508 TA, The Netherlands
| | - Wim Coene
- Imaging Physics Department, Applied Science Faculty, Delft University of Technology, Lorentzweg 1, Delft, 2628 CJ, The Netherlands
- Research Department, ASML Netherlands B.V, De Run 6501, Veldhoven, 5504 DR, The Netherlands
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Keitel B, Chalupský J, Jelínek Š, Burian T, Dziarzhytski S, Hájková V, Juha L, Kuglerová Z, Kuhlmann M, Mann K, Ruiz-Lopez M, Schäfer B, Vozda V, Wodzinski T, Yurkov MV, Plönjes E. Comparison of wavefront sensing and ablation imprinting for FEL focus diagnostics at FLASH2. OPTICS EXPRESS 2024; 32:21532-21552. [PMID: 38859505 DOI: 10.1364/oe.527418] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/15/2024] [Accepted: 05/18/2024] [Indexed: 06/12/2024]
Abstract
Extreme ultraviolet (EUV) photon beam characterization techniques, Hartmann wavefront sensing and single shot ablation imprinting, were compared along the caustic of a tightly focused free-electron laser (FEL) beam at beamline FL24 of FLASH2, the Free-electron LASer in Hamburg at DESY. The transverse coherence of the EUV FEL was determined by a Young's double pinhole experiment and used in a back-propagation algorithm which includes partial coherence to calculate the beam intensity profiles along the caustic from the wavefront measurements. A very good agreement of the profile structure and size is observed for different wavelengths between the back-propagated profiles, an indirect technique, and ablation imprints. As a result, the Hartmann wavefront sensor including its software MrBeam is a very useful, single shot pulse resolved and fast tool for non-invasive determination of focal spot size and shape and also for beam profiles along the caustic.
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Chalupský J, Vozda V, Hering J, Kybic J, Burian T, Dziarzhytski S, Frantálová K, Hájková V, Jelínek Š, Juha L, Keitel B, Kuglerová Z, Kuhlmann M, Petryshak B, Ruiz-Lopez M, Vyšín L, Wodzinski T, Plönjes E. Deep learning for laser beam imprinting. OPTICS EXPRESS 2023; 31:19703-19721. [PMID: 37381380 DOI: 10.1364/oe.481776] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/30/2022] [Accepted: 05/10/2023] [Indexed: 06/30/2023]
Abstract
Methods of ablation imprints in solid targets are widely used to characterize focused X-ray laser beams due to a remarkable dynamic range and resolving power. A detailed description of intense beam profiles is especially important in high-energy-density physics aiming at nonlinear phenomena. Complex interaction experiments require an enormous number of imprints to be created under all desired conditions making the analysis demanding and requiring a huge amount of human work. Here, for the first time, we present ablation imprinting methods assisted by deep learning approaches. Employing a multi-layer convolutional neural network (U-Net) trained on thousands of manually annotated ablation imprints in poly(methyl methacrylate), we characterize a focused beam of beamline FL24/FLASH2 at the Free-electron laser in Hamburg. The performance of the neural network is subject to a thorough benchmark test and comparison with experienced human analysts. Methods presented in this Paper pave the way towards a virtual analyst automatically processing experimental data from start to end.
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Correa J, Mehrjoo M, Battistelli R, Lehmkühler F, Marras A, Wunderer CB, Hirono T, Felk V, Krivan F, Lange S, Shevyakov I, Vardanyan V, Zimmer M, Hoesch M, Bagschik K, Guerrini N, Marsh B, Sedgwick I, Cautero G, Stebel L, Giuressi D, Menk RH, Greer A, Nicholls T, Nichols W, Pedersen U, Shikhaliev P, Tartoni N, Hyun HJ, Kim SH, Park SY, Kim KS, Orsini F, Iguaz FJ, Büttner F, Pfau B, Plönjes E, Kharitonov K, Ruiz-Lopez M, Pan R, Gang S, Keitel B, Graafsma H. The PERCIVAL detector: first user experiments. JOURNAL OF SYNCHROTRON RADIATION 2023; 30:242-250. [PMID: 36601943 PMCID: PMC9814071 DOI: 10.1107/s1600577522010347] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 08/29/2022] [Accepted: 10/26/2022] [Indexed: 06/17/2023]
Abstract
The PERCIVAL detector is a CMOS imager designed for the soft X-ray regime at photon sources. Although still in its final development phase, it has recently seen its first user experiments: ptychography at a free-electron laser, holographic imaging at a storage ring and preliminary tests on X-ray photon correlation spectroscopy. The detector performed remarkably well in terms of spatial resolution achievable in the sample plane, owing to its small pixel size, large active area and very large dynamic range; but also in terms of its frame rate, which is significantly faster than traditional CCDs. In particular, it is the combination of these features which makes PERCIVAL an attractive option for soft X-ray science.
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Affiliation(s)
- J. Correa
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - M. Mehrjoo
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - R. Battistelli
- Helmholtz Zentrum Berlin HZB, Hahn-Meitner-Platz 1, Berlin, Germany
| | - F. Lehmkühler
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- The Hamburg Centre for Ultrafast Imaging CUI, Luruper Chaussee 149, 22761 Hamburg, Germany
| | - A. Marras
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - C. B. Wunderer
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - T. Hirono
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - V. Felk
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - F. Krivan
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - S. Lange
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - I. Shevyakov
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - V. Vardanyan
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - M. Zimmer
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - M. Hoesch
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - K. Bagschik
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - N. Guerrini
- Science and Technology Faculties STFC, Rutherford Appleton Laboratory RAL, Didcot, United Kingdom
| | - B. Marsh
- Science and Technology Faculties STFC, Rutherford Appleton Laboratory RAL, Didcot, United Kingdom
| | - I. Sedgwick
- Science and Technology Faculties STFC, Rutherford Appleton Laboratory RAL, Didcot, United Kingdom
| | - G. Cautero
- Elettra Sincrotrone Trieste, Trieste, Italy
| | - L. Stebel
- Elettra Sincrotrone Trieste, Trieste, Italy
| | | | - R. H. Menk
- Elettra Sincrotrone Trieste, Trieste, Italy
- University of Saskatchewan, Saskatoon, Saskatchewan, Canada S7N 5A2
| | - A. Greer
- Observatory Sciences Ltd, Cambridge, United Kingdom
| | - T. Nicholls
- Science and Technology Faculties STFC, Rutherford Appleton Laboratory RAL, Didcot, United Kingdom
| | - W. Nichols
- Diamond Light Source, Didcot, United Kingdom
| | - U. Pedersen
- Diamond Light Source, Didcot, United Kingdom
| | | | - N. Tartoni
- Diamond Light Source, Didcot, United Kingdom
| | - H. J. Hyun
- Pohang Accelerator Laboratory PAL, Pohang, Gyeongbuk 37673, Republic of Korea
| | - S. H. Kim
- Pohang Accelerator Laboratory PAL, Pohang, Gyeongbuk 37673, Republic of Korea
| | - S. Y. Park
- Pohang Accelerator Laboratory PAL, Pohang, Gyeongbuk 37673, Republic of Korea
| | - K. S. Kim
- Pohang Accelerator Laboratory PAL, Pohang, Gyeongbuk 37673, Republic of Korea
| | - F. Orsini
- Synchrotron SOLEIL, Saint Aubin, France
| | | | - F. Büttner
- Helmholtz Zentrum Berlin HZB, Hahn-Meitner-Platz 1, Berlin, Germany
| | - B. Pfau
- Max-Born-Institute MBI, Max-Born-Straße 2A, Berlin, Germany
| | - E. Plönjes
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - K. Kharitonov
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - M. Ruiz-Lopez
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - R. Pan
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - S. Gang
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - B. Keitel
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
| | - H. Graafsma
- Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
- Mid Sweden University, Sundsvall, Sweden
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Kharitonov K, Mehrjoo M, Ruiz-Lopez M, Keitel B, Kreis S, Gang SG, Pan R, Marras A, Correa J, Wunderer CB, Plönjes E. Single-shot ptychography at a soft X-ray free-electron laser. Sci Rep 2022; 12:14430. [PMID: 36002577 PMCID: PMC9402553 DOI: 10.1038/s41598-022-18605-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/06/2022] [Accepted: 08/16/2022] [Indexed: 11/05/2022] Open
Abstract
In this work, single-shot ptychography was adapted to the XUV range and, as a proof of concept, performed at the free-electron laser FLASH at DESY to obtain a high-resolution reconstruction of a test sample. Ptychography is a coherent diffraction imaging technique capable of imaging extended samples with diffraction-limited resolution. However, its scanning nature makes ptychography time-consuming and also prevents its application for mapping of dynamical processes. Single-shot ptychography can be realized by collecting the diffraction patterns of multiple overlapping beams in one shot and, in recent years, several concepts based on two con-focal lenses were employed in the visible regime. Unfortunately, this approach cannot be extended straightforwardly to X-ray wavelengths due to the use of refractive optics. Here, a novel single-shot ptychography setup utilizes a combination of X-ray focusing optics with a two-dimensional beam-splitting diffraction grating. It facilitates single-shot imaging of extended samples at X-ray wavelengths.
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Affiliation(s)
- Konstantin Kharitonov
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Masoud Mehrjoo
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Mabel Ruiz-Lopez
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Barbara Keitel
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Svea Kreis
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Seung-gi Gang
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Rui Pan
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Alessandro Marras
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany ,grid.7683.a0000 0004 0492 0453Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Jonathan Correa
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany ,grid.7683.a0000 0004 0492 0453Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Cornelia B. Wunderer
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany ,grid.7683.a0000 0004 0492 0453Center for Free-Electron Laser Science CFEL, Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
| | - Elke Plönjes
- grid.7683.a0000 0004 0492 0453Deutsches Elektronen-Synchrotron DESY, Hamburg, Germany
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Ravandeh M, Mehrjoo M, Kharitonov K, Schäfer J, Quade A, Honnorat B, Ruiz-Lopez M, Keitel B, Kreis S, Pan R, Gang SG, Wende K, Plönjes E. X-ray Ptychographic Imaging and Spectroscopic Studies of Plasma-Treated Plastic Films. Polymers (Basel) 2022; 14:polym14132528. [PMID: 35808574 PMCID: PMC9269290 DOI: 10.3390/polym14132528] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/20/2022] [Revised: 06/15/2022] [Accepted: 06/16/2022] [Indexed: 12/10/2022] Open
Abstract
Polyethylene terephthalate (PET) is a thermoplastic polyester with numerous applications in industry. However, it requires surface modification on an industrial scale for printing and coating processes and plasma treatment is one of the most commonly used techniques to increase the hydrophilicity of the PET films. Systematic improvement of the surface modification by adaption of the plasma process can be aided by a comprehensive understanding of the surface morphology and chemistry. However, imaging large surface areas (tens of microns) with a resolution that allows understanding the surface quality and modification is challenging. As a proof-of-principle, plasma-treated PET films were used to demonstrate the capabilities of X-ray ptychography, currently under development at the soft X-ray free-electron laser FLASH at DESY, for imaging macroscopic samples. In combination with scanning electron microscopy (SEM), this new technique was used to study the effects of different plasma treatment processes on PET plastic films. The studies on the surface morphology were complemented by investigations of the surface chemistry using X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). While both imaging techniques consistently showed an increase in roughness and change in morphology of the PET films after plasma treatment, X-ray ptychography can provide additional information on the three-dimensional morphology of the surface. At the same time, the chemical analysis shows an increase in the oxygen content and polarity of the surface without significant damage to the polymer, which is important for printing and coating processes.
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Affiliation(s)
- Mehdi Ravandeh
- Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Straße 2, 17489 Greifswald, Germany; (M.R.); (J.S.); (A.Q.); (B.H.)
| | - Masoud Mehrjoo
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
- Correspondence: (M.M.); (K.W.)
| | - Konstantin Kharitonov
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
| | - Jan Schäfer
- Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Straße 2, 17489 Greifswald, Germany; (M.R.); (J.S.); (A.Q.); (B.H.)
| | - Antje Quade
- Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Straße 2, 17489 Greifswald, Germany; (M.R.); (J.S.); (A.Q.); (B.H.)
| | - Bruno Honnorat
- Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Straße 2, 17489 Greifswald, Germany; (M.R.); (J.S.); (A.Q.); (B.H.)
| | - Mabel Ruiz-Lopez
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
| | - Barbara Keitel
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
| | - Svea Kreis
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
| | - Rui Pan
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
| | - Seung-gi Gang
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
| | - Kristian Wende
- Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Straße 2, 17489 Greifswald, Germany; (M.R.); (J.S.); (A.Q.); (B.H.)
- Correspondence: (M.M.); (K.W.)
| | - Elke Plönjes
- Deutsches Elektronen-Synchrotron DESY, Notkestraße 85, 22607 Hamburg, Germany; (K.K.); (M.R.-L.); (B.K.); (S.K.); (R.P.); (S.-g.G.); (E.P.)
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