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Li K, Zhu J, Duan Q, Hou X. High-efficiency dual-layer grating coupler for vertical fiber-chip coupling in two polarizations. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA. A, OPTICS, IMAGE SCIENCE, AND VISION 2023; 40:1022-1028. [PMID: 37706755 DOI: 10.1364/josaa.487739] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/15/2023] [Accepted: 03/31/2023] [Indexed: 09/15/2023]
Abstract
Efficient coupling between optical fibers and high-index-contrast silicon waveguides is essential for the development of integrated nanophotonics. Herein, a high-efficiency dual-layer grating coupler is demonstrated for vertical polarization-diversity fiber-chip coupling. The two waveguide layers are orthogonally distributed and designed for y- and x-polarized L P 01 fiber modes, respectively. Each layer consists of two 1D stacked gratings, allowing for both perfectly vertical coupling and high coupling directionality. The gratings are optimized using the particle swarm algorithm with a preset varying trend of parameters to thin out the optimization variables. The interlayer thickness is determined to ensure efficient coupling of both polarizations. The optimized results exhibit record highs of 92% (-0.38d B) and 85% (-0.72d B) 3D finite-difference time-domain simulation efficiencies for y and x polarizations, respectively. The polarization-dependent loss (PDL) is below 2 dB in a 160 nm spectral bandwidth with cross talk between the two polarizations less than -24d B. Fabrication imperfections are also investigated. Dimensional offsets of ±10n m in etching width and ±8 nm in lateral shift are tolerated for a 1 dB loss penalty. The proposed structure offers an ultimate solution for polarization diversity coupling schemes in silicon photonics with high directionality, low PDL, and a possibility to vertically couple.
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Ropp C, Zhu W, Yulaev A, Westly D, Simelgor G, Rakholia A, Lunden W, Sheredy D, Boyd MM, Papp S, Agrawal A, Aksyuk V. Integrating planar photonics for multi-beam generation and atomic clock packaging on chip. LIGHT, SCIENCE & APPLICATIONS 2023; 12:83. [PMID: 37009814 PMCID: PMC10068800 DOI: 10.1038/s41377-023-01081-x] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/09/2022] [Revised: 01/17/2023] [Accepted: 01/22/2023] [Indexed: 06/08/2023]
Abstract
The commercialization of atomic technologies requires replacing laboratory-scale laser setups with compact and manufacturable optical platforms. Complex arrangements of free-space beams can be generated on chip through a combination of integrated photonics and metasurface optics. In this work, we combine these two technologies using flip-chip bonding and demonstrate an integrated optical architecture for realizing a compact strontium atomic clock. Our planar design includes twelve beams in two co-aligned magneto-optical traps. These beams are directed above the chip to intersect at a central location with diameters as large as 1 cm. Our design also includes two co-propagating beams at lattice and clock wavelengths. These beams emit collinearly and vertically to probe the center of the magneto-optical trap, where they will have diameters of ≈100 µm. With these devices we demonstrate that our integrated photonic platform is scalable to an arbitrary number of beams, each with different wavelengths, geometries, and polarizations.
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Affiliation(s)
- Chad Ropp
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, MD, 20742, USA
| | - Wenqi Zhu
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
| | - Alexander Yulaev
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, MD, 20742, USA
| | - Daron Westly
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
| | - Gregory Simelgor
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
| | | | | | - Dan Sheredy
- Vector Atomic, Inc., Pleasanton, CA, 94588, USA
| | | | - Scott Papp
- Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, CO, 80305, USA
| | - Amit Agrawal
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
| | - Vladimir Aksyuk
- Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA.
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Wang X, Deng C, Huang Y, Zhang F, Zhang R, Zhang X, Wang T. Spherical concave micro-mirror fabricated using gray-tone optical lithography for vertical coupling. OPTICS EXPRESS 2021; 29:13288-13301. [PMID: 33985066 DOI: 10.1364/oe.424832] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/11/2021] [Accepted: 04/06/2021] [Indexed: 06/12/2023]
Abstract
Based on gray-tone optical lithography technology combined with the overlay alignment method, a spherical concave micro-mirror is fabricated at the end of a rectangular optical waveguide (ROW) for low vertical coupling loss. The optimal structures of the spherical concave micro-mirrors were designed through ray-tracing simulation. The results indicate that the minimal vertical coupling loss is only 1.02 dB for the ROW core size of 20 μm × 20 μm. The surface roughness of the micro-mirror is considered, and it should be less than 106 nm to ensure that the vertical coupling loss is less than 1.5 dB. The radius of the fabricated spherical concave micro-mirror was measured as 263.3 μm and the surface roughness of the micro-mirror is 29.19 nm. The vertical coupling loss induced by the micro-mirror was measured as 1.39 dB. 1-dB tolerances in the direction of x-, y-, and z-axes are calculated to be ± 6.9 μm, ± 6.3 μm, and 46.2 μm, respectively.
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Zhang Z, Huang B, Zhang Z, Cheng C, Bai B, Gao T, Xu X, Gu W, Zhang L, Chen H. Broadband High-Efficiency Grating Couplers for Perfectly Vertical Fiber-to-Chip Coupling Enhanced by Fabry-Perot-like Cavity. MICROMACHINES 2020; 11:mi11090859. [PMID: 32957465 PMCID: PMC7569773 DOI: 10.3390/mi11090859] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 08/14/2020] [Revised: 09/09/2020] [Accepted: 09/16/2020] [Indexed: 11/16/2022]
Abstract
We propose a broadband high-efficiency grating coupler for perfectly vertical fiber-to-chip coupling. The up-reflection is reduced, hence enhanced coupling efficiency is achieved with the help of a Fabry-Perot-like cavity composed of a silicon nitride reflector and the grating itself. With the theory of the Fabry-Perot cavity, the dimensional parameters of the coupler are investigated. With the optimized parameters, up-reflection in the C-band is reduced from 10.6% to 5%, resulting in an enhanced coupling efficiency of 80.3%, with a 1-dB bandwidth of 58 nm, which covers the entire C-band. The minimum feature size of the proposed structure is over 219 nm, which makes our design easy to fabricate through 248 nm deep-UV lithography, and lowers the fabrication cost. The proposed design has potential in efficient and fabrication-tolerant interfacing applications, between off-chip light sources and integrated chips that can be mass-produced.
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Affiliation(s)
- Zan Zhang
- School of Electronics and Control Engineering, Chang’an University, Xi’an 710064, China; (B.B.); (T.G.); (X.X.); (W.G.); (L.Z.)
- Correspondence:
| | - Beiju Huang
- State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (B.H.); (C.C.); (H.C.)
| | - Zanyun Zhang
- School of Electronics and Information Engineering, Tianjin Polytechnic University, Tianjin 300387, China;
| | - Chuantong Cheng
- State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (B.H.); (C.C.); (H.C.)
| | - Bing Bai
- School of Electronics and Control Engineering, Chang’an University, Xi’an 710064, China; (B.B.); (T.G.); (X.X.); (W.G.); (L.Z.)
| | - Tianxi Gao
- School of Electronics and Control Engineering, Chang’an University, Xi’an 710064, China; (B.B.); (T.G.); (X.X.); (W.G.); (L.Z.)
| | - Xiaobo Xu
- School of Electronics and Control Engineering, Chang’an University, Xi’an 710064, China; (B.B.); (T.G.); (X.X.); (W.G.); (L.Z.)
| | - Wenping Gu
- School of Electronics and Control Engineering, Chang’an University, Xi’an 710064, China; (B.B.); (T.G.); (X.X.); (W.G.); (L.Z.)
| | - Lin Zhang
- School of Electronics and Control Engineering, Chang’an University, Xi’an 710064, China; (B.B.); (T.G.); (X.X.); (W.G.); (L.Z.)
| | - Hongda Chen
- State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (B.H.); (C.C.); (H.C.)
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Cheng L, Mao S, Li Z, Han Y, Fu HY. Grating Couplers on Silicon Photonics: Design Principles, Emerging Trends and Practical Issues. MICROMACHINES 2020; 11:E666. [PMID: 32650573 PMCID: PMC7407772 DOI: 10.3390/mi11070666] [Citation(s) in RCA: 43] [Impact Index Per Article: 10.8] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 06/20/2020] [Revised: 07/06/2020] [Accepted: 07/06/2020] [Indexed: 01/19/2023]
Abstract
Silicon photonics is an enabling technology that provides integrated photonic devices and systems with low-cost mass manufacturing capability. It has attracted increasing attention in both academia and industry in recent years, not only for its applications in communications, but also in sensing. One important issue of silicon photonics that comes with its high integration density is an interface between its high-performance integrated waveguide devices and optical fibers or free-space optics. Surface grating coupler is a preferred candidate that provides flexibility for circuit design and reduces effort for both fabrication and alignment. In the past decades, considerable research efforts have been made on in-plane grating couplers to address their insufficiency in coupling efficiency, wavelength sensitivity and polarization sensitivity compared with out-of-plane edge-coupling. Apart from improved performances, new functionalities are also on the horizon for grating couplers. In this paper, we review the current research progresses made on grating couplers, starting from their fundamental theories and concepts. Then, we conclude various methods to improve their performance, including coupling efficiency, polarization and wavelength sensitivity. Finally, we discuss some emerging research topics on grating couplers, as well as practical issues such as testing, packaging and promising applications.
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Affiliation(s)
| | | | | | | | - H. Y. Fu
- Tsinghua-Berkeley Shenzhen Institute (TBSI), Tsinghua University, Shenzhen 518000, China; (L.C.); (S.M.); (Z.L.); (Y.H.)
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Zhang Z, Chen X, Cheng Q, Khokhar AZ, Yan X, Huang B, Chen H, Liu H, Li H, Thomson DJ, Reed GT. High-efficiency apodized bidirectional grating coupler for perfectly vertical coupling. OPTICS LETTERS 2019; 44:5081-5084. [PMID: 31613269 DOI: 10.1364/ol.44.005081] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/18/2019] [Accepted: 09/05/2019] [Indexed: 06/10/2023]
Abstract
We propose and experimentally demonstrate an apodized bidirectional grating coupler for high-efficiency, perfectly vertical coupling. Through grating apodization, the coupling efficiency (CE) can be notably improved, and the parasitic reflections can be minimized. For ease of fabrication, subwavelength gratings are introduced, which are also beneficial for the coupling performance. Simulation shows a record CE of 72%. We found that the coupler is quite robust to the variation of incidence mode field diameter and fiber misalignment. A CE of -1.8 dB is experimentally measured with a 1-dB bandwidth of 37 nm.
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Demeter-Finzi A, Ruschin S. S-matrix absolute optimization method for a perfect vertical waveguide grating coupler. OPTICS EXPRESS 2019; 27:16713-16718. [PMID: 31252893 DOI: 10.1364/oe.27.016713] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/25/2019] [Accepted: 05/07/2019] [Indexed: 06/09/2023]
Abstract
Vertical coupling using a diffraction grating is a convenient way to couple light into an optical waveguide. Several optimization approaches have been suggested in order to design such a coupler; however, most of them are implemented using algorithm-based modelling. In this paper, we suggest an intuitive method based on S-matrix formalism for analytically optimize 3-port vertical grating coupler devices. The suggested method is general and can be applied to any 3-port coupler device in order to achieve an optimal design based on user constrains. The simplicity of the model allows reduction of the optimization to two variables and the location of an absolute optimal operation point in a 2D contour map. Accordingly, in an ideal device near 100% coupling efficiency and insignificant return loss could be achieved. Our model results show good agreement with numerical finite difference time domain (FDTD) simulations and can predict the general tendencies and sensitivities of the device's behavior to changes in design parameters. We further apply our model to a previously reported high contrast uni-directional grating coupler device and show that additional improvement in the coupling efficiency is achievable for that layout.
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Tong Y, Zhou W, Tsang HK. Efficient perfectly vertical grating coupler for multi-core fibers fabricated with 193 nm DUV lithography. OPTICS LETTERS 2018; 43:5709-5712. [PMID: 30499974 DOI: 10.1364/ol.43.005709] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/07/2018] [Accepted: 10/15/2018] [Indexed: 06/09/2023]
Abstract
We propose a novel high-efficiency, low-reflection, and fabrication-tolerant perfectly vertical grating coupler (PVGC) with a minimum feature size >200 nm to allow for fabrication using 193 nm deep-ultraviolet lithography. The structural parameters of PVGC were optimized by a genetic optimization algorithm. Simulations predicted the coupling efficiency to be -2.0 dB (63.0%) and the back reflections to be less than -20 dB in the wavelength range of 1532-1576 nm. The design was fabricated in a multi-project wafer run for silicon photonics, and a coupling efficiency of -2.7 dB (53.7%) with a 1 dB bandwidth of 33 nm is experimentally demonstrated. The measured back reflection is less than -16 dB over the C-band. The PVGC occupies a compact footprint of 30 μm×24 μm and can be interfaced with the multi-core fibers for future space-division-multiplexing networks.
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Gong C, Zhang J, He S. Hybrid unidirectional meta-coupler for vertical incidence to a high-refractive-index waveguide in telecom wavelength. OPTICS LETTERS 2017; 42:5098-5101. [PMID: 29240146 DOI: 10.1364/ol.42.005098] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/16/2017] [Accepted: 11/08/2017] [Indexed: 06/07/2023]
Abstract
Unidirectional optical manipulation, especially the coupling from a vertical light beam to a waveguide unidirectionally, is desirable in photonic integration. We first propose a hybrid unidirectional meta-coupler for vertical incidence to a high-refractive-index waveguide in telecom wavelength, a periodic plasmonic metasurface composed of metal-insulator-metal unit cells is used for phase matching. Three designs are given for devices working around wavelengths 0.85, 1.31, and 1.55 μm. The simulated coupling efficiencies are all around 70%, and the 1 dB coupling bandwidths are 29, 82, and 105 nm, respectively. Our approach paves the way for the applications of optical metasurfaces to planar lightwave circuits.
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Wang S, Hong Y, Zhu Y, Chen J, Gao S, Cai X, Shi Y, Liu L. Compact high-efficiency perfectly-vertical grating coupler on silicon at O-band. OPTICS EXPRESS 2017; 25:22032-22037. [PMID: 29041492 DOI: 10.1364/oe.25.022032] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/03/2017] [Accepted: 08/26/2017] [Indexed: 06/07/2023]
Abstract
A compact, high-efficiency grating coupler is demonstrated for interfacing a silicon waveguide and a perfectly-vertical fiber at O-band. The grating lies on a tilted silicon membrane for minimizing the reflections. Circular grating lines are adopted to shorten the overall device length to about 60μm. 57% peak coupling efficiency and >28nm 1-dB coupling bandwidth are obtained experimentally. Back reflections of 1% to the silicon waveguide and the single mode fiber are theoretically estimated. The processing flow to realize the proposed structure is discussed in detail. The fabrication control over the tilted angle of the silicon membrane is investigated. The approach by applying an oxide cladding to improve the stability of the membrane is also introduced. The present grating coupler is compatible to common fabrication processes for silicon photonic chips.
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