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Wang M, Fang Z, Zhang H, Lin J, Zhou J, Huang T, Zhu Y, Li C, Yu S, Fu B, Qiao L, Cheng Y. Recent Progresses on Hybrid Lithium Niobate External Cavity Semiconductor Lasers. MATERIALS (BASEL, SWITZERLAND) 2024; 17:4453. [PMID: 39336195 PMCID: PMC11432941 DOI: 10.3390/ma17184453] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/04/2024] [Revised: 08/27/2024] [Accepted: 09/02/2024] [Indexed: 09/30/2024]
Abstract
Thin film lithium niobate (TFLN) has become a promising material platform for large scale photonic integrated circuits (PICs). As an indispensable component in PICs, on-chip electrically tunable narrow-linewidth lasers have attracted widespread attention in recent years due to their significant applications in high-speed optical communication, coherent detection, precision metrology, laser cooling, coherent transmission systems, light detection and ranging (LiDAR). However, research on electrically driven, high-power, and narrow-linewidth laser sources on TFLN platforms is still in its infancy. This review summarizes the recent progress on the narrow-linewidth compact laser sources boosted by hybrid TFLN/III-V semiconductor integration techniques, which will offer an alternative solution for on-chip high performance lasers for the future TFLN PIC industry and cutting-edge sciences. The review begins with a brief introduction of the current status of compact external cavity semiconductor lasers (ECSLs) and recently developed TFLN photonics. The following section presents various ECSLs based on TFLN photonic chips with different photonic structures to construct external cavity for on-chip optical feedback. Some conclusions and future perspectives are provided.
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Grants
- 2022YFA1205100, 2019YFA0705000, 2022YFA1404600 National Key R&D Program of China
- N.A. Fundamental Research Funds for the Central Universities
- 12104159, 12334014, 12192251, 12174113, 12174107, 11933005, 12134001, 12274130, 12274133 National Natural Science Foundation of China
- 2021ZD0301403 Innovation Program for Quantum Science and Technology
- 2019SHZDZX01 Shanghai Municipal Science and Technology Major Project
- 2023nmc005 Engineering Research Center for Nanophotonics & Advanced Instrument, Ministry of Education, East China Normal University
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Affiliation(s)
- Min Wang
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- Engineering Research Center for Nanophotonics and Advanced Instrument, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Zhiwei Fang
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- Engineering Research Center for Nanophotonics and Advanced Instrument, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Haisu Zhang
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- Engineering Research Center for Nanophotonics and Advanced Instrument, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Jintian Lin
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Junxia Zhou
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
| | - Ting Huang
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China
| | - Yiran Zhu
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China
| | - Chuntao Li
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China
| | - Shupeng Yu
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Botao Fu
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China
- School of Physical Science and Technology, ShanghaiTech University, Shanghai 200031, China
| | - Lingling Qiao
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China
| | - Ya Cheng
- The Extreme Optoelectromechanics Laboratory (XXL), School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-Intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai 201800, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
- State Key Laboratory of Precision Spectroscopy, East China Normal University, Shanghai 200062, China
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, China
- Collaborative Innovation Center of Light Manipulations and Applications, Shandong Normal University, Jinan 250358, China
- Shanghai Research Center for Quantum Sciences, Shanghai 201315, China
- Hefei National Laboratory, Shanghai 230088, China
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Liu X, Fu G, Song S, Huang Y, Liu M, Liu G, Liu Z. Tunability-selective lithium niobate light modulators via high-Q resonant metasurface. OPTICS LETTERS 2024; 49:1536-1539. [PMID: 38489444 DOI: 10.1364/ol.513631] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/22/2023] [Accepted: 02/21/2024] [Indexed: 03/17/2024]
Abstract
Herein, we propose and demonstrate an efficient light modulator by intercalating the nonlinear thin film into the optical resonator cavities, which introduce the ultra-sharp resonances and simultaneously lead to the spatially overlapped optical field between the nonlinear material and the resonators. Differential field intensity distributions in the geometrical perturbation-assisted optical resonator make the high quality-factor resonant modes and strong field confinement. Multiple channel light modulation is achieved in such layered system, which enables the capability for tunability-selective modulation. The maximal modulation tunability is up to 1.968 nm/V, and the figure of merit (FOM) reaches 65.6 V-1, showing orders of magnitude larger than that of the previous state-of-the-art modulators. The electrical switch voltage is down to 0.015 V, the maximal switching ratio is 833%, and the extinction ratio is also up to 9.70 dB. These features confirm the realization of high-performance modulation and hold potential for applications in switches, communication and information, augmented and virtual reality, etc.
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Zheng JX, Li HY, Tian KS, Yu YH, Liu XQ, Chen QD. Arbitrary fabrication of complex lithium niobate three-dimensional microstructures for second harmonic generation enhancement. OPTICS LETTERS 2024; 49:850-853. [PMID: 38359198 DOI: 10.1364/ol.515576] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/08/2023] [Accepted: 01/12/2024] [Indexed: 02/17/2024]
Abstract
Lithium niobate (LN) crystal plays important roles in future integrated photonics, but it is still a great challenge to efficiently fabricate three-dimensional micro-/nanostructures on it. Here, a femtosecond laser direct writing-assisted liquid back-etching technology (FsLDW-LBE) is proposed to achieve the three-dimensional (3D) microfabrication of lithium niobate (LN) with high surface quality (Ra = 0.422 nm). Various 3D structures, such as snowflakes, graphic arrays, criss-cross arrays, and helix arrays, have been successfully fabricated on the surface of LN crystals. As an example, a microcone array was fabricated on LN crystals, which showed a strong second harmonic signal enhancement with up to 12 times bigger than the flat lithium niobate. The results indicate that the method provides a new approach for the microfabrication of lithium niobate crystals for nonlinear optics.
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Yu S, Fang Z, Wang Z, Zhou Y, Huang Q, Liu J, Wu R, Zhang H, Wang M, Cheng Y. On-chip single-mode thin-film lithium niobate Fabry-Perot resonator laser based on Sagnac loop reflectors. OPTICS LETTERS 2023; 48:2660-2663. [PMID: 37186734 DOI: 10.1364/ol.484387] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/17/2023]
Abstract
We demonstrate an on-chip single-mode Er3+-doped thin-film lithium niobate (Er:TFLN) laser which consists of a Fabry-Perot (FP) resonator based on Sagnac loop reflectors (SLRs). The fabricated Er:TFLN laser has a footprint of 6.5 mm × 1.5 mm with a loaded quality (Q) factor of 1.6 × 105 and a free spectral range (FSR) of 63 pm. We generate the single-mode laser at 1544 nm wavelength with a maximum output power of 44.7 µW and a slope efficiency of 0.18%.
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Song L, Chen J, Wu R, Zheng Y, Liu Z, Wang G, Sun C, Wang M, Cheng Y. Electro-optically tunable optical delay line with a continuous tuning range of ∼220 fs in thin-film lithium niobate. OPTICS LETTERS 2023; 48:2261-2264. [PMID: 37126249 DOI: 10.1364/ol.486117] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/03/2023]
Abstract
We demonstrate fabrication of a 30-cm-long thin-film lithium niobate (TFLN) optical delay line (ODL) incorporated with segmented microelectrodes of 24-cm total length using the femtosecond laser lithography technique. The transmission spectra of the unbalanced Mach-Zehnder interferometers (MZIs) reveal an ultra-low propagation loss of 0.025 dB/cm. The device exhibits a low half-wave voltage of 0.45 V, corresponding to a voltage-length product of 10.8 V·cm, which is equivalent to 5.4 V·cm in the push-pull configuration. We also demonstrate a high electro-optic (EO) tuning efficiency of 3.146 fs/V and a continuous tuning range of 220 fs in the fabricated ODL.
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