Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography

Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes. Several patterning methods have been developed, but all lack the precision and reproducibility required to fabricate precise, complex patterns of less than one micrometer in size, or require specialized crosslinking ligands, limiting their application. In this study, we present a novel approach to directly pattern QD nanopatterns by electron beam lithography using commercially available colloidal QDs without additional modifications. We have successfully generated reliable dot and line QD patterns with dimensions as small as 140 nm. In addition, we have shown that using a 10 nm SiO₂ spacer layer on a 50 nm Au layer substrate can double the fluorescence intensity compared to QDs on the Au layer without SiO₂. This method takes advantage of traditional nanolithography without the need for a resist layer.

Aluminum Hydroxide Nano- and Microstructures Fabricated Using Scanning Probe Lithography with KOH Ink

Using scanning probe lithography (SPL) with KOH ink, this study fabricates aluminum hydroxide (Al(OH)₃) nano- and microfeatures on a gold (Au) film that has been deposited on an aluminum (Al) layer. Hydroxyl ions (OH^-) from the KOH ink loaded onto the Au film can react with the underlying Al layer to form Al(OH)₃ structures due to the decrease in the pH of the reacting solution.¹ In this process, Al(OH)₃ solidification is governed by the pH of the KOH ink solution, which is affected by its volume. Suitably small volumes (down to hundreds of attoliters) of the KOH ink solution can be applied to the substrate surface using dip-pen nanolithography (DPN) and polymer-pen lithography (PPL). Using DPN and PPL printing with the solid (i.e., gel) and liquid phases of KOH ink, sub-micron- (minimum ≈300 nm) and micron-sized (≥4 μm) Al(OH)₃ features can be obtained, respectively. The fabrication of Al(OH)₃ structures using the proposed pH-dependent solidification process can be achieved with relatively small volumes in ambient conditions without requiring a previously reported molding process.^1,2.

Ultrahigh-resolution quantum dot patterning for advanced optoelectronic devices

Quantum dots have attracted significant scientific interest owing to their optoelectronic properties, which are distinct from their bulk counterparts. In order to fully utilize quantum dots for next generation devices with advanced functionalities, it is important to fabricate quantum dot colloids into dry patterns with desired feature sizes and shapes with respect to target applications. In this review, recent progress in ultrahigh-resolution quantum dot patterning technologies will be discussed, with emphasis on the characteristic advantages as well as the limitations of diverse technologies. This will provide guidelines for selecting suitable tools to handle quantum dot colloids throughout the fabrication of quantum dot based solid-state devices. Additionally, epitaxially fabricated single-particle level quantum dot arrays are discussed. These are extreme in terms of pattern resolution, and expand the potential application of quantum dots to quantum information processing.

3D Nanolithography by Means of Lipid Ink Spreading Inhibition

While patterning 2D metallic nanostructures are well established through different techniques, 3D printing still constitutes a major bottleneck on the way to device miniaturization. In this work a fluid phase phospholipid ink is used as a building block for structuring with dip-pen nanolithography. Following a bioinspired approach that relies on ink-spreading inhibition, two processes are presented to build 2D and 3D metallic structures. Serum albumin, a widely used protein with an innate capability to bind to lipids, is the key in both processes. Covering the sample surface with it prior to lipid writing, anchors lipids on the substrate, which ultimately allows the creation of highly stable 3D lipid-based scaffolds to build metallic structures.

Combining printing and nanoparticle assembly: Methodology and application of nanoparticle patterning

Functional nanoparticles (NPs) with unique photoelectric, mechanical, magnetic, and chemical properties have attracted considerable attention. Aggregated NPs rather than individual NPs are generally required for sensing, electronics, and catalysis. However, the transformation of functional NP aggregates into scalable, controllable, and affordable functional devices remains challenging. Printing is a promising additive manufacturing technology for fabricating devices from NP building blocks because of its capabilities for rapid prototyping and versatile multifunctional manufacturing. This paper reviews recent advances in NP patterning based on the combination of self-assembly and printing technologies (including two-, three-, and four-dimensional printing), introduces the basic characteristics of these methods, and discusses various fields of NP patterning applications.

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Nanoparticles (NPs) printing assembly is a good solution for patterned devices

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NPs assembly can be combined with 2D, 3D, and 4D printing technologies

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A variety of ink-dispersed NPs are available for printing assembly

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NPs printing assembly technology is applied for nanosensing, energy storage, photodetector

High resolution patterning of PbS quantum dots/graphene photodetectors with high responsivity via photolithography with a top graphene layer to protect surface ligands

Photodetectors based on colloidal quantum dots (CQDs) and single layer graphene (SLG) have shown high responsivity due to the synergy of strong light absorption from CQDs and high mobility from SLG. However, it is still challenging to achieve high-density and small-footprint devices on a chip to meet the demand for their integration into electronic devices. Even though there are numerous approaches to pattern the chemically fragile CQD films, usually they require non-conventional approaches such as stamping and surface modification that may be non-compatible with semiconductor processing. In this study, we show that conventional lithography and dry etching can be used to pattern QD active films by employing a graphene monolayer passivation/protective layer that protects the surface ligands of CQDs. This protective layer avoids damage induced by lithography process solvents that deteriorate the carrier mobility of CQDs and therefore the photoresponse. Herein we report patterning of CQDs using conventional UV photolithography, achieving reproducible five-micron length PbS CQDs/SLG photodetectors with a responsivity of 10⁸ A W^-1. We have also fabricated thirty-six PbS CQDs/SLG photodetectors on a single chip to establish micron size photodetectors. This process offers an approach to pattern QDs with conventional UV lithography and dry etching semiconductor technology to facilitate their integration into current semiconductor commercial technology.

Evolution and applications of polymer brush hypersurface photolithography

Hypersurface photolithography creates arbitrary polymer brush patterns with independent control over feature diameter, height, and spacing between features, while controlling composition along a polymer chain and between features.

Multi-primary-color quantum-dot down-converting films for display applications

We propose and fabricate a multi-primary-color (MPC) quantum-dot down-converting film (QDDCF). A four-primary-color QDDCF composed of red (R), yellowish green (YG), bluish green (BG), and blue (B) subpixels was fabricated via totally five rounds of photolithographic processes. A verification platform was built up using a laser projector, and the measured results show that the QD film can expand display color gamut to 118.60% of Rec. 2020 and can cover the entire Pointer's gamut. The issues of blue light absorption and film thickness are analyzed in detail. The combination of MPC technology and QDDCF is a potential strategy to realize ultra wide color gamut for emerging display technologies.

Fabrication of diffraction gratings by top-down and bottom-up approaches based on scanning probe lithography

Generation of diffraction gratings by top-down and bottom-up approaches based on scanning probe lithography is demonstrated. With regard to top-down fabrication, silicon nanostructured diffraction gratings are fabricated through one-dimensional (1D) dip-pen-nanolithography (DPN). Nanodot arrays (two-dimensional simple cubic lattice) of alkanethiol self-assembled monolayers (SAMs) are printed by 1D DPN on an Au-film-coated silicon substrate with lattice distances of 700, 1000, and 1200 nm. Silicon nanocircular pillars of length hundreds of nanometers are generated by sequential Au etching and reactive ion etching (RIE) of the 1D DPN printed sample. The performance of the silicon diffraction gratings as a microspectrometer is demonstrated through red, green, and blue color diffraction with white light incident at 45°. Moreover, arrays of zirconia nanoparticles (NPs) with an average diameter of visible wavelength (φ ≈ 470 nm) on an Au substrate are generated via bottom-up fabrication of the diffraction gratings. Microarrays of hydrophilic alkanethiol SAMs are obtained by polymer pen lithography (PPL). Self-assembly of zirconia NPs occurs after the passivation of hydrophobic alkanethiol SAMs of the PPL-printed sample. Fraunhofer diffraction with a square aperture is observed for the zirconia NP diffraction grating fabricated by the bottom-up approach.

Nanocombinatorics with Cantilever-Free Scanning Probe Arrays

The effectiveness of combinatorial experiments is determined by the rate at which distinct experimental conditions can be prepared and interrogated. This has been particularly limiting at the intersection of nanotechnology and soft materials research, where structures are difficult to reliably prepare and materials are incompatible with conventional lithographic techniques. For example, studying nanoparticle-based heterogeneous catalysis or the interaction between biological cells and abiotic surfaces requires precise tuning of materials composition on the nanometer scale. Scanning probe techniques are poised to be major players in the combinatorial nanoscience arena because they allow one to directly deposit materials at high resolution without any harsh processing steps that limit material compatibility. The chief limitation of scanning probe techniques is throughput, as patterning with single probes is prohibitively slow in the context of large-scale combinatorial experiments. A recent paradigm shift circumvents this problem by fundamentally altering the architecture of scanning probes by replacing the conventionally used cantilever with a soft compliant film on a rigid substrate, a substitution that allows a densely packed array of probes to function in parallel in an inexpensive format. This is a major lithographic advance in terms of scalability, throughput, and versatility that, when combined with the development of approaches to actuate individual probes in cantilever-free arrays, sets the stage for scanning-probe-based tools to address scientific questions through nanocombinatorial studies in biology and materials science. In this review, we outline the development of cantilever-free scanning probe lithography and prospects for nanocombinatorial studies enabled by these tools.

Transparent Displays Utilizing Nanopatterned Quantum Dot Films

We report the realization of a transparent display using glass covered by a nanopatterned quantum dot (QD) film with good transmittance. The film was fabricated by nanoimprint lithography (NIL) and spin coating of colloidal QDs with specificexcitation maxima. The produced nanopatterned QD film was attached to transparent glass, enabling active image generation using a laser light source of a specific wavelength. Selective light emission was induced by strongly exciting the laser-exposed film surface, creating desired images, with color modulationenabled by controlling the QD layer (dozens of nanometers in size) via nanopatterning. The nanopatterned QD film used for image generation exhibits excellent transmittance (>80%), and can be used for transparent displays, with image realization in both bright and dark spaces. The fabricated displays have wide viewing anglesowing to their good light emission characteristics, and the fabrication through spin coating renders the fabrication process simple and applicable to large areas.

Polymer Pen Lithography with Lipids for Large-Area Gradient Patterns

Gradient patterns comprising bioactive compounds over comparably (in regard to a cell size) large areas are key for many applications in the biomedical sector, in particular, for cell screening assays, guidance, and migration experiments. Polymer pen lithography (PPL) as an inherent highly parallel and large area technique has a great potential to serve in the fabrication of such patterns. We present strategies for the printing of functional phospholipid patterns via PPL that provide tunable feature size and feature density gradients over surface areas of several square millimeters. By controlling the printing parameters, two transfer modes can be achieved. Each of these modes leads to different feature morphologies. By increasing the force applied to the elastomeric pens, which increases the tip-surface contact area and boosts the ink delivery rate, a switch between a dip-pen nanolithography (DPN) and a microcontact printing (μCP) transfer mode can be induced. A careful inking procedure ensuring a homogeneous and not-too-high ink-load on the PPL stamp ensures a membrane-spreading dominated transfer mode, which, used in combination with smooth and hydrophilic substrates, generates features with constant height, independently of the applied force of the pens. Ultimately, this allows us to obtain a gradient of feature sizes over a mm² substrate, all having the same height on the order of that of a biological cellular membrane. These strategies allow the construction of membrane structures by direct transfer of the lipid mixture to the substrate, without requiring previous substrate functionalization, in contrast to other molecular inks, where structure is directly determined by the printing process itself. The patterns are demonstrated to be viable for subsequent protein binding, therefore adding to a flexible feature library when gradients of protein presentation are desired.

Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers

Colloidal quantum dots (QDs) with properties that can be tuned by size, shape, and composition are promising for the next generation of photonic and electronic devices. However, utilization of these materials in such devices is hindered by the limited compatibility of established semiconductor processing techniques. In this context, patterning of QD films formed from colloidal solutions is a critical challenge and alternative methods are currently being developed for the broader adoption of colloidal QDs in functional devices. Here, we present a solvent-free approach to patterning QD films by utilizing a shape memory polymer (SMP). The high pull-off force of the SMP below glass transition temperature (T_g) in conjunction with the conformal contact at elevated temperatures (above T_g) enables large-area, rate-independent, fine patterning while preserving desired properties of QDs.

Click-Chemistry Based Allergen Arrays Generated by Polymer Pen Lithography for Mast Cell Activation Studies

The profiling of allergic responses is a powerful tool in biomedical research and in judging therapeutic outcome in patients suffering from allergy. Novel insights into the signaling cascades and easier readouts can be achieved by shifting activation studies of bulk immune cells to the single cell level on patterned surfaces. The functionality of dinitrophenol (DNP) as a hapten in the induction of allergic reactions has allowed the activation process of single mast cells seeded on patterned surfaces to be studied following treatment with allergen specific Immunoglobulin E antibodies. Here, a click-chemistry approach is applied in combination with polymer pen lithography (PPL) to pattern DNP-azide on alkyne-terminated surfaces to generate arrays of allergen. The large area functionalization offered by PPL allows an easy incorporation of such arrays into microfluidic chips. In such a setup, easy handling of cell suspension, incubation process, and read-out by fluorescence microscopy will allow immune cell activation screening to be easily adapted for diagnostics and biomedical research.