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For: Keum H, Jiang Y, Park JK, Flanagan JC, Shim M, Kim S. Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers. Micromachines 2017. [PMCID: PMC6189828 DOI: 10.3390/mi8010018] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Number Cited by Other Article(s)
1
Son J, Roh H, Shin HY, Park KW, Park C, Park H, Lee C, Kwak J, Jung BJ, Lee JK. Photo-cleavable perfluoroalkylated copolymers for tailoring quantum dot thin films. Polym Chem 2020. [DOI: 10.1039/d0py01017k] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/25/2023]
2
Keum H, Jiang Y, Park JK, Flanagan JC, Shim M, Kim S. Photoresist Contact Patterning of Quantum Dot Films. ACS NANO 2018;12:10024-10031. [PMID: 30247027 DOI: 10.1021/acsnano.8b04462] [Citation(s) in RCA: 33] [Impact Index Per Article: 5.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/02/2023]
3
Du K, Wathuthanthri I, Choi CH. The Rise of Scalable Micro/Nanopatterning. MICROMACHINES 2017;8:E275. [PMID: 30400465 PMCID: PMC6190113 DOI: 10.3390/mi8090275] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Subscribe] [Scholar Register] [Received: 09/07/2017] [Accepted: 09/07/2017] [Indexed: 11/16/2022]
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