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Wang Z, Nie Y, Ou H, Chen D, Cen Y, Liu J, Wu D, Hong G, Li B, Xing G, Zhang W. Electronic and Optoelectronic Monolayer WSe 2 Devices via Transfer-Free Fabrication Method. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:1368. [PMID: 37110953 PMCID: PMC10145331 DOI: 10.3390/nano13081368] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 03/09/2023] [Revised: 04/06/2023] [Accepted: 04/12/2023] [Indexed: 06/19/2023]
Abstract
Monolayer transition metal dichalcogenides (TMDs) have drawn significant attention for their potential applications in electronics and optoelectronics. To achieve consistent electronic properties and high device yield, uniform large monolayer crystals are crucial. In this report, we describe the growth of high-quality and uniform monolayer WSe2 film using chemical vapor deposition on polycrystalline Au substrates. This method allows for the fabrication of continuous large-area WSe2 film with large-size domains. Additionally, a novel transfer-free method is used to fabricate field-effect transistors (FETs) based on the as-grown WSe2. The exceptional metal/semiconductor interfaces achieved through this fabrication method result in monolayer WSe2 FETs with extraordinary electrical performance comparable to those with thermal deposition electrodes, with a high mobility of up to ≈62.95 cm2 V-1 s-1 at room temperature. In addition, the as-fabricated transfer-free devices can maintain their original performance after weeks without obvious device decay. The transfer-free WSe2-based photodetectors exhibit prominent photoresponse with a high photoresponsivity of ~1.7 × 104 A W-1 at Vds = 1 V and Vg = -60 V and a maximum detectivity value of ~1.2 × 1013 Jones. Our study presents a robust pathway for the growth of high-quality monolayer TMDs thin films and large-scale device fabrication.
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Affiliation(s)
- Zixuan Wang
- Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Avenida da Universidade, Taipa, Macao SAR 999078, China
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Yecheng Nie
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Haohui Ou
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Dao Chen
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Yingqian Cen
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Jidong Liu
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Di Wu
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
| | - Guo Hong
- Department of Materials Science and Engineering & Center of Super-Diamond and Advanced Films, College of Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR 999077, China
| | - Benxuan Li
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
- Electrical Engineering Division, Engineering Department, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK
| | - Guichuan Xing
- Joint Key Laboratory of the Ministry of Education, Institute of Applied Physics and Materials Engineering, University of Macau, Avenida da Universidade, Taipa, Macao SAR 999078, China
| | - Wenjing Zhang
- International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, China
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Kashyap DK, Sharma C, Pappu A, Srivastava AK, Gupta MK. Extremely Reduced Dielectric Constant and Band Gap Enhancement in Few-Layered Tungsten Disulfide Nanosheets. J Phys Chem Lett 2022; 13:10267-10274. [PMID: 36302075 DOI: 10.1021/acs.jpclett.2c02558] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Highly crystalline few-layered tungsten disulfide (WS2) nanosheets were synthesized via a cost-effective, low-temperature hydrothermal route. X-ray diffraction and HR-TEM analysis confirmed the formation of hexagonal nanosheets with thickness of ∼6-8 nm. Raman analysis and AFM results confirmed the few-layered 2H phase of WS2 nanosheets. The UV-vis study shows absorption peaks at 219 and 271 nm with large band gap value of ∼3.12 eV for WS2 nanosheets. Surprisingly, WS2 nanosheets show a dielectric constant of approximately ε' ≈ 5245, whereas bulk WS2 material exhibits a dielectric constant of 7482373. An almost 1426-fold decrease in the value of dielectric constant for the WS2 nanosheet is observed. Such an extreme reduction in dielectric constant and observance of large band gap in WS2 nanosheet were observed for the first time. The present study reveals the excellent and unusual optical and dielectric properties for their potential application in optoelectronic, dielectric, solar, phosphor, and various nanoelectronic devices.
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Affiliation(s)
- Deepak Kumar Kashyap
- Academy of Scientific and Innovative Research (AcSIR), Ghaziabad201002, India
- CSIR-Advanced Materials and Processes Research Institute, Bhopal, Madhya Pradesh462026, India
| | - Charu Sharma
- Academy of Scientific and Innovative Research (AcSIR), Ghaziabad201002, India
- CSIR-Advanced Materials and Processes Research Institute, Bhopal, Madhya Pradesh462026, India
| | - Asokan Pappu
- Academy of Scientific and Innovative Research (AcSIR), Ghaziabad201002, India
- CSIR-Advanced Materials and Processes Research Institute, Bhopal, Madhya Pradesh462026, India
| | - Avanish Kumar Srivastava
- Academy of Scientific and Innovative Research (AcSIR), Ghaziabad201002, India
- CSIR-Advanced Materials and Processes Research Institute, Bhopal, Madhya Pradesh462026, India
| | - Manoj Kumar Gupta
- Academy of Scientific and Innovative Research (AcSIR), Ghaziabad201002, India
- CSIR-Advanced Materials and Processes Research Institute, Bhopal, Madhya Pradesh462026, India
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