Quantitative exposure assessment of various chemical substances in a wafer fabrication industry facility

Biomonitoring of Exposures to Solvents and Metals in Electronics Manufacturing Facilities in Batam, Indonesia

Concerns about chemical exposure in the electronics manufacturing industry have long been recognized, but data are lacking in Southeast Asia. We conducted a study in Batam, Indonesia, to evaluate chemical exposures in electronics facilities, using participatory research and biological monitoring approaches. A convenience sample of 36 workers (28 exposed, 8 controls) was recruited, and urine samples were collected before and after shifts. Five solvents (acetone, methyl ethyl ketone, toluene, benzene, and xylenes) were found in 46%-97% of samples, and seven metals (arsenic, cadmium, cobalt, tin, antimony, lead, and vanadium) were detected in 60%-100% of samples. Biological monitoring and participatory research appeared to be useful in assessing workers' exposure when workplace air monitoring is not feasible due to a lack of cooperation from the employer. Several logistical challenges need to be addressed in future biomonitoring studies of electronics workers in Asia in factories where employers are reluctant to track workers' exposure and health.

Semiconductor Work, Leukemia, and Cancer Risk: A Systematic Review and Meta-Analysis

BACKGROUND

With the development of the semiconductor industry over the past 60 years, various occupational diseases have been reported to coincide with rapid industrial growth. Among these occupational diseases, the association between semiconductor work and cancers, including leukemia, remains controversial. Therefore, this systematic review and meta-analysis assesses the associations between semiconductor work, leukemia, and cancer risk.

METHODS

The core research databases, including PubMed, were screened for studies published until 31 July 2022. All eligible studies assessed cancer risk among workers in the semiconductor industry.

RESULTS

Nine studies were selected after a literature review. The employment period of semiconductor workers in each study was between 1965 and 2009. Semiconductor work was not significantly associated with the risk of leukemia (Relative Risk [RR], 1.02; 95% Confidence Interval [CI], 0.74-1.41) or cancer (RR, 1.00; 95% CI, 0.93-1.07).

CONCLUSION

In this meta-analysis, semiconductor work was not significantly associated with leukemia or cancer risk. Internal comparisons, such as non-fab workers, quality of the study, employment period, and healthy worker effect, should be considered for interpretation. Furthermore, a prospective cohort study based on overall semiconductor workers in the industry could be useful to assess occupational disease risk as a mandatory component of health assessment.

Synthesis of Vapochromic Dyes Having Sensing Properties for Vapor Phase of Organic Solvents Used in Semiconductor Manufacturing Processes and Their Application to Textile-Based Sensors

Two vapochromic dyes (DMx and DM) were synthesized to be used for textile-based sensors detecting the vapor phase of organic solvents. They were designed to show sensitive color change properties at a low concentration of vapors at room temperature. They were applied to cotton fabrics as a substrate of the textile-based sensors to examine their sensing properties for nine organic solvents frequently used in semiconductor manufacturing processes, such as trichloroethylene, dimethylacetamide, iso-propanol, methanol, n-hexane, ethylacetate, benzene, acetone, and hexamethyldisilazane. The textile sensor exhibited strong sensing properties of polar solvents rather than non-polar solvents. In particular, the detection of dimethylacetamide was the best, showing a color difference of 15.9 for DMx and 26.2 for DM under 300 ppm exposure. Even at the low concentration of 10 ppm of dimethylacetamide, the color change values reached 7.7 and 13.6, respectively, in an hour. The maximum absorption wavelength of the textile sensor was shifted from 580 nm to 550 nm for DMx and 550 nm to 540 nm for DM, respectively, due to dimethylacetamide exposure. The sensing mechanism was considered to depend on solvatochromism, the aggregational properties of the dyes and the adsorption amounts of the solvent vapors on the textile substrates to which the dyes were applied. Finally, the reusability of the textile sensor was tested for 10 cycles.

Cross-Regional Dynamic Transfer Characteristics of Liquid Oil Contamination Induced by Random Contact in Machining Workshops in Shanghai, China

In industrial sites, the movement and contact behaviors of workers are random, but their frequency and statistical characteristics can be determined. Particularly in machining workshops, metalworking fluids (MWFs) cause liquid oil contamination on the processed workpieces, and the contamination spreads to the entire workshop given the random contact of workers or the handling of workpieces. This study proposes a contact transmission model based on the Markov chain to quantify oil contamination transfer. First, the transfer efficiency between the glove and the workpiece, which is regarded as a key model parameter in this research, was determined through experiments. The model was used to characterize and predict the spread of oil contamination across different regions, including production and assembly areas. Specifically, the oil contamination concentrations on workbench surfaces in seven locations of a machining workshop in Shanghai GKN HUAYU Driveline Systems Co., Ltd. (SDS) were measured on-site. Findings showed that the model could feasibly depict the transfer process of oil contamination across different surfaces. Then, the variation law of oil contamination concentration on the workbench surfaces over time was analyzed, the oil contamination distribution map of the entire workshop plane was drawn, and the effectiveness of two cleaning measures to reduce oil contamination concentrations was compared. The proposed contact transmission model offers a basis for identifying highly polluted surfaces in machining workshops and controlling the spread of liquid oil contamination.

Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990-2010

BACKGROUND

This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents.

METHODS

A systematic patent search was conducted with the Google "Advanced Patent Search" engine using the keywords "semiconductor" and "benzene" combined with all of the words accessed on January 24, 2016.

RESULTS

As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink.

CONCLUSION

Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010.

Occupational Characteristics of Semiconductor Workers with Cancer and Rare Diseases Registered with a Workers' Compensation Program in Korea

Background

The aim of this study was to describe the types of diseases that developed in semiconductor workers who have registered with the Korea Workers' Compensation and Welfare Service (KWCWS) and to identify potential common occupational characteristics by the type of claimed disease.

Methods

A total of 55 semiconductor workers with cancer or rare diseases who claimed to the KWCWS were compared based on their work characteristics and types of claimed diseases. Leukemia, non-Hodgkin lymphoma, and aplastic anemia were grouped into lymphohematopoietic (LHP) disorder.

Results

Leukemia (n = 14) and breast cancer (n = 10) were the most common complaints, followed by brain cancer (n = 6), aplastic anemia (n = 6), and non-Hodgkin lymphoma (n = 4). LHP disorders (n = 24) accounted for 43%. Sixty percent (n = 33) of registered workers (n = 55) were found to have been employed before 2000. Seventy-six percent (n = 42) of registered workers and 79% (n = 19) among the registered workers with LHP (n = 24) were found to be diagnosed at a relatively young age, ≤40 years. A total of 18 workers among the registered semiconductor workers were finally determined to deserve compensation for occupational disease by either the KWCWS (n = 10) or the administrative court (n = 8). Eleven fabrication workers who were compensated responded as having handled wafers smaller than eight inches in size. Eight among the 18 workers compensated (44 %) were found to have ever worked at etching operations.

Conclusion

The distribution of cancer and rare diseases among registered semiconductor workers was closely related to the manufacturing era before 2005, ≤8 inches of wafer size handled, exposure to clean rooms of fabrication and chip assembly operations, and etching operations.

Chemical use in the semiconductor manufacturing industry

BACKGROUND

The semiconductor industry is known to use a number of chemicals, but little is known about the exact chemicals used due to the ingredients being kept as a trade secret.

OBJECTIVES

The objective of this study was to analyze chemical use using a safety data sheet (SDS) and chemical inventory provided by a major semiconductor company, which operated two factories (A and B).

METHODS

Descriptive statistics were obtained on the number of chemical products and ingredients, photoresists, and carcinogens, classified by the International Agency for Research on Cancer (IARC), as well as trade secret ingredients. The total chemical use per year was estimated from chemical inventories mass (kg).

RESULTS

A total of 428 and 432 chemical products were used in factories A and B, respectively. The number of pure chemical ingredients, after removing both trade secret ingredients and multiple counting, was 189 and 157 in factories A and B, respectively. The number of products containing carcinogens, such as sulfuric acid, catechol, and naphthalene was 47/428 (A) and 28/432 (B). Chemicals used in photolithography were 21% (A) and 26% (B) of all chemical products, and more than 97% among them were chemicals containing trade secret ingredients.

CONCLUSIONS

Each year, 4.3 and 8.3 tons of chemicals were used per person in factories A and B, respectively. Because of the high level of commercial secrecy and the use of many unregulated chemicals, more sustainable policies and methods should be implemented to address health and safety issues in the semiconductor industry.

Reproductive Toxic Chemicals at Work and Efforts to Protect Workers' Health: A Literature Review

A huge number of chemicals are produced and used in the world, and some of them can have negative effects on the reproductive health of workers. To date, most chemicals and work environments have not been studied for their potential to have damaging effects on the workers' reproductive system. Because of the lack of information, many workers may not be aware that such problems can be related to occupational exposures. Newly industrialized countries such as Republic of Korea have rapidly amassed chemicals and other toxicants that pose health hazards, especially to the reproductive systems of workers. This literature review provides an overview of peer-reviewed literature regarding the teratogenic impact and need for safe handling of chemicals. Literature searches were performed using PubMed, Google Scholar, and ScienceDirect. Search strategies were narrowed based on author expertise and 100 articles were chosen for detailed analysis. A total of 47 articles met prespecified inclusion criteria. The majority of papers contained studies that were descriptive in nature with respect to the Medical Subject Headings (MeSH) terms and keywords: “reproductive and heath or hazard and/or workplace or workers or occupations.” In the absence of complete information about the safe occupational handling of chemicals in Republic of Korea (other than a material safety data sheet), this review serves as a valuable reference for identifying and remedying potential gaps in relevant regulations. The review also proposes other public health actions including hazard surveillance and primary prevention activities such as reduction, substitution, ventilation, as well as protective equipment.

Normas ocupacionais do benzeno: uma abordagem sobre o risco e exposição nos postos de revenda de combustíveis

Resumo Introdução: trabalhadores estão sujeitos a riscos decorrentes da exposição ambiental e ocupacional ao benzeno, situação ainda mais crítica quando associada a fatores como desigualdade social, múltipla exposição, suscetibilidade individual, degradação ambiental e às possíveis interações entre os contaminantes ambientais. Além disso, nem sempre as regulamentações são estabelecidas e/ou atualizadas apenas a partir de achados científicos, pois são processos permeados por conflitos de interesses. Objetivo: realizar análise crítica sobre a identificação de risco e avaliação da exposição ao benzeno. Métodos: revisão bibliográfica e documental do marco normativo brasileiro e internacional sobre exposição ao benzeno, com relação aos aspectos toxicológicos, de exposição ocupacional e ambiental e de avaliação de risco. Discussão: o controle da exposição ao benzeno permeia o campo da disputa técnico-política de saúde e segurança, constituindo-se em marco regulatório resultante de consenso de entendimentos. Esses entendimentos são marcados pela disputa entre a proteção à saúde e a gestão empresarial das condições de trabalho, em detrimento das evidencias científicas. Em tal contexto, os Limites de Exposição Ocupacional podem variar significativamente entre os países e agências, apesar do reconhecimento universal de que não há limites seguros para exposição ao benzeno, por ser um composto carcinogênico.

Exposure Reconstruction and Risk Analysis for Six Semiconductor Workers With Lymphohematopoietic Cancers

OBJECTIVE

To investigate whether workplace exposures to recognized lymphohematopoietic carcinogens were possibly related to cancers in six semiconductor-manufacturing workers.

METHODS

A job-exposure matrix was developed for chemical and physical process agents and anticipated by-products. Potential cumulative occupational exposures of the six cases were reconstructed. The role of workplace exposures in cancer was evaluated through quantitative risk assessment and by comparison with epidemiological literature.

RESULTS

Two workers were potentially exposed to agents capable of causing their diagnosed cancers. Reconstructed exposures were similar to levels in outdoor environments and lower than exposures associated with increased risks in epidemiological studies. Cancer risks were estimated to be less than 1 in 10,000 persons.

CONCLUSIONS

The development of cancer among the six workers was unlikely to be explained by occupational exposures to recognized lymphohematopoietic carcinogens.

Reproductive Hazards Still Persist in the Microelectronics Industry: Increased Risk of Spontaneous Abortion and Menstrual Aberration among Female Workers in the Microelectronics Industry in South Korea

OBJECTIVES

Despite the global expansion of supply chains and changes to the production process, few studies since the mid-1990 s and 2000s have examined reproductive risks of the microelectronics industry; we examined the reproductive risks among female microelectronics workers in South Korea.

METHODS

Based on claim data from the National Health Insurance (2008-2012), we estimated age-specific rates of spontaneous abortion (SAB) and menstrual aberration (MA) among women aged 20 to 39 years. We compared data between microelectronics workers and three different control groups: economically inactive women, the working population as a whole, and workers employed in the bank industry. For an effect measure, age-stratified relative risks (RRs) were estimated.

RESULTS

Female workers in the microelectronics industry showed significantly higher risk for SAB and MA compared to control groups. The RRs for SAB with reference to economically inactive women, working population, and bank workers in their twenties were 1.57, 1.40, and 1.37, respectively, and the RRs for MA among females in their twenties were 1.54, 1.38, and 1.48, respectively. For women in their thirties, RRs for SAB were 1.58, 1.67, and 1.13, and those for MA were 1.25, 1.35, and 1.23 compared to the three control populations, respectively. All RRs were statistically significant at a level of 0.05, except for the SAB case comparison with bank workers in their thirties.

CONCLUSIONS

Despite technical innovations and health and safety measures, female workers in microelectronics industry in South Korea have high rates of SAB and MA, suggesting continued exposure to reproductive hazards. Further etiologic studies based on primary data collection and careful surveillance are required to confirm these results.

A model to systematically employ professional judgment in the Bayesian Decision Analysis for a semiconductor industry exposure assessment

Bayesian Decision Analysis (BDA) uses Bayesian statistics to integrate multiple types of exposure information and classify exposures within the exposure rating categorization scheme promoted in American Industrial Hygiene Association (AIHA) publications. Prior distributions for BDA may be developed from existing monitoring data, mathematical models, or professional judgment. Professional judgments may misclassify exposures. We suggest that a structured qualitative risk assessment (QLRA) method can provide consistency and transparency in professional judgments. In this analysis, we use a structured QLRA method to define prior distributions (priors) for BDA. We applied this approach at three semiconductor facilities in South Korea, and present an evaluation of the performance of structured QLRA for determination of priors, and an evaluation of occupational exposures using BDA. Specifically, the structured QLRA was applied to chemical agents in similar exposure groups to identify provisional risk ratings. Standard priors were developed for each risk rating before review of historical monitoring data. Newly collected monitoring data were used to update priors informed by QLRA or historical monitoring data, and determine the posterior distribution. Exposure ratings were defined by the rating category with the highest probability--i.e., the most likely. We found the most likely exposure rating in the QLRA-informed priors to be consistent with historical and newly collected monitoring data, and the posterior exposure ratings developed with QLRA-informed priors to be equal to or greater than those developed with data-informed priors in 94% of comparisons. Overall, exposures at these facilities are consistent with well-controlled work environments. That is, the 95th percentile of exposure distributions are ≤50% of the occupational exposure limit (OEL) for all chemical-SEG combinations evaluated; and are ≤10% of the limit for 94% of chemical-SEG combinations evaluated.

Exposure to Volatile Organic Compounds and Possibility of Exposure to By-product Volatile Organic Compounds in Photolithography Processes in Semiconductor Manufacturing Factories

OBJECTIVES

The purpose of this study was to measure the concentration of volatile organic compound (VOC)s originated from the chemicals used and/or derived from the original parental chemicals in the photolithography processes of semiconductor manufacturing factories.

METHODS

A total of four photolithography processes in 4 Fabs at three different semiconductor manufacturing factories in Korea were selected for this study. This study investigated the types of chemicals used and generated during the photolithography process of each Fab, and the concentration levels of VOCs for each Fab.

RESULTS

A variety of organic compounds such as ketone, alcohol, and acetate compounds as well as aromatic compounds were used as solvents and developing agents in the processes. Also, the generation of by-products, such as toluene and phenol, was identified through a thermal decomposition experiment performed on a photoresist. The VOC concentration levels in the processes were lower than 5% of the threshold limit value (TLV)s. However, the air contaminated with chemical substances generated during the processes was re-circulated through the ventilation system, thereby affecting the airborne VOC concentrations in the photolithography processes.

CONCLUSION

Tens of organic compounds were being used in the photolithography processes, though the types of chemical used varied with the factory. Also, by-products, such as aromatic compounds, could be generated during photoresist patterning by exposure to light. Although the airborne VOC concentrations resulting from the processes were lower than 5% of the TLVs, employees still could be exposed directly or indirectly to various types of VOCs.

Cancer mortality and incidence in korean semiconductor workers

Objectives

The purpose of this study was to evaluate cancer risks in the Korean semiconductor industry.

Methods

A retrospective cohort study was performed in eight semiconductor factories between 1998 and 2008. The number of subjects was 113,443 for mortality and 108,443 for incidence. Standardized mortality ratios (SMR) and standardized incidence ratios (SIR) were calculated.

Results

The SMR of leukemia was 0.39 (95% Confidence Interval 0.08-1.14) in males (2 cases) and 1.37 (0.55-2.81) in females (7 cases). The SMR of non-Hodgkin's lymphoma (NHL) was 1.33 (0.43-3.09, 5 cases) in males and 2.5 (0.68-6.40, 4 cases) in females. The SIR of leukemia was 0.69 (0.30-1.37, 8 cases) in males and 1.28 (0.61-2.36, 10 cases) in females. The SIR of NHL in females was 2.31 (1.23-3.95, 13 cases) and that of thyroid cancer in males was 2.11 (1.49-2.89, 38 cases). The excess incidence of NHL was significant in female assembly operators [SIR=3.15 (1.02-7.36, 5 cases)], but not significant in fabrication workers. The SIR of NHL in the group working for 1-5 years was higher than the SIR of NHL for those working for more than five years. The excess incidence of male thyroid cancer was observed in both office and manufacturing workers.

Conclusion

There was no significant increase of leukemia in the Korean semiconductor industry. However, the incidence of NHL in females and thyroid cancer in males were significantly increased even though there was no definite association between work and those diseases in subgroup analysis according to work duration. This result should be interpreted cautiously, because the majority of the cohort was young and the number of cases was small.

Cases series of malignant lymphohematopoietic disorder in korean semiconductor industry

OBJECTIVES

Seven cases of malignant lymphohematopoietic (LHP) disorder were claimed to have developed from occupational exposure at two plants of a semiconductor company from 2007 to 2010. This study evaluated the possibility of exposure to carcinogenic agents for the cases.

METHODS

Clinical courses were reviewed with assessing possible exposure to carcinogenic agents related to LHP cancers. Chemicals used at six major semiconductor companies in Korea were reviewed. Airborne monitoring for chemicals, including benzene, was conducted and the ionizing radiation dose was measured from 2008 to 2010.

RESULTS

The latency of seven cases (five leukemiae, a Non-Hodgkin's lymphoma, and an aplastic anemia) ranged from 16 months to 15 years and 5 months. Most chemical measurements were at levels of less than 10% of the Korean Occupational Exposure Limit value. No carcinogens related to LHP cancers were used or detected. Complete-shielded radiation-generating devices were used, but the ionizing radiation doses were 0.20-0.22 uSv/hr (background level: 0.21 µSv/hr). Airborne benzene was detected at 0.31 ppb when the detection limit was lowered as low as possible. Ethylene oxide and formaldehyde were not found in the cases' processes, while these two were determined to be among the 263 chemicals in the list that was used at the six semiconductor companies at levels lower than 0.1%. Exposures occurring before 2002 could not be assessed because of the lack of information.

CONCLUSION

Considering the possibility of exposure to carcinogenic agents, we could not find any convincing evidence for occupational exposure in all investigated cases. However, further study is needed because the semiconductor industry is a newly developing one.