Wear comparison of critical dimension-atomic force microscopy tips

Nanoscale wear affects the performance of atomic force microscopy (AFM)-based measurements for all applications including process control measurements and nanoelectronics characterization. As such, methods to prevent or reduce AFM tip wear is an area of active research. However, most prior work has been on conventional AFMs rather than critical dimension AFM (CD-AFM). Hence, less is known about CD-AFM tip-wear. Given that tip-wear directly affects the accuracy of dimensional measurements, a basic understanding of CD-AFM tip wear is needed. Toward this goal, we evaluated the wear performance of electron beam deposited CD-AFM tips. Using a continuous scanning strategy, we evaluated the overall wear rate and tip lifetime and compared these with those of silicon-based CD-AFM tips. Our data show improved tip lifetime of as much as a factor of five and reduced wear rates of more than 17 times. Such improvements in wear rate means less measurement variability and lower cost.

The Expression of Conflict in Computer-Mediated and Face-To-Face Groups

This study integrated the research streams of computer-mediated communication (CMC) and group conflict by comparing the expression of different types of conflict in CMC groups and face-to-face (FTF) groups over time. The main aim of the study was to compare the cues-filtered-out approach against the social information processing theory. A laboratory study was conducted with 39 groups (19 CMC and 20 FTF) in which members were required to work together over three sessions. The frequencies of task, process, and relationship conflict were analyzed. Findings supported the social information processing theory. There was more process and relationship conflict in CMC groups compared to FTF groups on Day 1. However, this difference disappeared on Days 2 and 3. There was no difference between CMC and FTF groups in the amount of task conflict expressed on any day.

Tip characterization method using multi-feature characterizer for CD-AFM

In atomic force microscopy (AFM) metrology, the tip is a key source of uncertainty. Images taken with an AFM show a change in feature width and shape that depends on tip geometry. This geometric dilation is more pronounced when measuring features with high aspect ratios, and makes it difficult to obtain absolute dimensions. In order to accurately measure nanoscale features using an AFM, the tip dimensions should be known with a high degree of precision. We evaluate a new AFM tip characterizer, and apply it to critical dimension AFM (CD-AFM) tips used for high aspect ratio features. The characterizer is made up of comb-shaped lines and spaces, and includes a series of gratings that could be used as an integrated nanoscale length reference. We also demonstrate a simulation method that could be used to specify what range of tip sizes and shapes the characterizer can measure. Our experiments show that for non re-entrant features, the results obtained with this characterizer are consistent to 1nm with the results obtained by using widely accepted but slower methods that are common practice in CD-AFM metrology. A validation of the integrated length standard using displacement interferometry indicates a uniformity of better than 0.75%, suggesting that the sample could be used as highly accurate and SI traceable lateral scale for the whole evaluation process.