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Zastrau U, Rödel C, Nakatsutsumi M, Feigl T, Appel K, Chen B, Döppner T, Fennel T, Fiedler T, Fletcher LB, Förster E, Gamboa E, Gericke DO, Göde S, Grote-Fortmann C, Hilbert V, Kazak L, Laarmann T, Lee HJ, Mabey P, Martinez F, Meiwes-Broer KH, Pauer H, Perske M, Przystawik A, Roling S, Skruszewicz S, Shihab M, Tiggesbäumker J, Toleikis S, Wünsche M, Zacharias H, Glenzer SH, Gregori G. A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution. Rev Sci Instrum 2018;89:023703. [PMID: 29495844 DOI: 10.1063/1.5007950] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
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