1
|
Hage FS, Hardcastle TP, Gjerding MN, Kepaptsoglou DM, Seabourne CR, Winther KT, Zan R, Amani JA, Hofsaess HC, Bangert U, Thygesen KS, Ramasse QM. Local Plasmon Engineering in Doped Graphene. ACS Nano 2018; 12:1837-1848. [PMID: 29369611 DOI: 10.1021/acsnano.7b08650] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Single-atom B or N substitutional doping in single-layer suspended graphene, realized by low-energy ion implantation, is shown to induce a dampening or enhancement of the characteristic interband π plasmon of graphene through a high-resolution electron energy loss spectroscopy study using scanning transmission electron microscopy. A relative 16% decrease or 20% increase in the π plasmon quality factor is attributed to the presence of a single substitutional B or N atom dopant, respectively. This modification is in both cases shown to be relatively localized, with data suggesting the plasmonic response tailoring can no longer be detected within experimental uncertainties beyond a distance of approximately 1 nm from the dopant. Ab initio calculations confirm the trends observed experimentally. Our results directly confirm the possibility of tailoring the plasmonic properties of graphene in the ultraviolet waveband at the atomic scale, a crucial step in the quest for utilizing graphene's properties toward the development of plasmonic and optoelectronic devices operating at ultraviolet frequencies.
Collapse
Affiliation(s)
| | - Trevor P Hardcastle
- SuperSTEM Laboratory, SciTech Daresbury Campus, Daresbury WA4 4AD, U.K
- School of Chemical and Process Engineering, University of Leeds , Leeds LS2 9JT, U.K
| | - Morten N Gjerding
- CAMD and Center for Nanostructured Graphene (CNG), Technical University of Denmark , Fysikvej 1, Building 307, 2800 Kgs. Lyngby, Denmark
| | - Demie M Kepaptsoglou
- SuperSTEM Laboratory, SciTech Daresbury Campus, Daresbury WA4 4AD, U.K
- York NanoCentre, University of York , Heslington, York YO10 5BR, U.K
| | - Che R Seabourne
- School of Chemical and Process Engineering, University of Leeds , Leeds LS2 9JT, U.K
| | - Kirsten T Winther
- CAMD and Center for Nanostructured Graphene (CNG), Technical University of Denmark , Fysikvej 1, Building 307, 2800 Kgs. Lyngby, Denmark
| | - Recep Zan
- Nanotechnology Application and Research Center, Niğde Omer Halisdemir University , Niğde 51000, Turkey
| | - Julian Alexander Amani
- II Physikalisches Institut, Georg-August-Universität Göttingen , Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
| | - Hans C Hofsaess
- II Physikalisches Institut, Georg-August-Universität Göttingen , Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
| | - Ursel Bangert
- Bernal Institute and Department of Physics, University of Limerick , Limerick, Ireland
| | - Kristian S Thygesen
- CAMD and Center for Nanostructured Graphene (CNG), Technical University of Denmark , Fysikvej 1, Building 307, 2800 Kgs. Lyngby, Denmark
| | - Quentin M Ramasse
- SuperSTEM Laboratory, SciTech Daresbury Campus, Daresbury WA4 4AD, U.K
- School of Chemical and Process Engineering, University of Leeds , Leeds LS2 9JT, U.K
- School of Physics, University of Leeds , Leeds LS2 9JT, U.K
| |
Collapse
|
2
|
Kepaptsoglou D, Hardcastle TP, Seabourne CR, Bangert U, Zan R, Amani JA, Hofsäss H, Nicholls RJ, Brydson RMD, Scott AJ, Ramasse QM. Electronic Structure Modification of Ion Implanted Graphene: The Spectroscopic Signatures of p- and n-Type Doping. ACS Nano 2015; 9:11398-11407. [PMID: 26446310 DOI: 10.1021/acsnano.5b05305] [Citation(s) in RCA: 32] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
A combination of scanning transmission electron microscopy, electron energy loss spectroscopy, and ab initio calculations is used to describe the electronic structure modifications incurred by free-standing graphene through two types of single-atom doping. The N K and C K electron energy loss transitions show the presence of π* bonding states, which are highly localized around the N dopant. In contrast, the B K transition of a single B dopant atom shows an unusual broad asymmetric peak which is the result of delocalized π* states away from the B dopant. The asymmetry of the B K toward higher energies is attributed to highly localized σ* antibonding states. These experimental observations are then interpreted as direct fingerprints of the expected p- and n-type behavior of graphene doped in this fashion, through careful comparison with density functional theory calculations.
Collapse
Affiliation(s)
- Demie Kepaptsoglou
- SuperSTEM Laboratory , SciTech Daresbury Campus, Daresbury WA4 4AD, United Kingdom
| | - Trevor P Hardcastle
- Institute for Materials Research, SCaPE, University of Leeds , Leeds LS2 9JT, United Kingdom
| | - Che R Seabourne
- Institute for Materials Research, SCaPE, University of Leeds , Leeds LS2 9JT, United Kingdom
| | - Ursel Bangert
- School of Materials, University of Manchester , Manchester M13 9PL, United Kingdom
| | - Recep Zan
- School of Materials, University of Manchester , Manchester M13 9PL, United Kingdom
| | - Julian Alexander Amani
- II. Physikalisches Institut, Georg-August-Universität Göttingen , Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
| | - Hans Hofsäss
- II. Physikalisches Institut, Georg-August-Universität Göttingen , Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
| | - Rebecca J Nicholls
- Deparment of Materials, University of Oxford , Parks Road, Oxford OX1 3PH, United Kingdom
| | - Rik M D Brydson
- Institute for Materials Research, SCaPE, University of Leeds , Leeds LS2 9JT, United Kingdom
| | - Andrew J Scott
- Institute for Materials Research, SCaPE, University of Leeds , Leeds LS2 9JT, United Kingdom
| | - Quentin M Ramasse
- SuperSTEM Laboratory , SciTech Daresbury Campus, Daresbury WA4 4AD, United Kingdom
| |
Collapse
|