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Baumann J, Herzog C, Spanier M, Grötzsch D, Lühl L, Witte K, Jonas A, Günther S, Förste F, Hartmann R, Huth M, Kalok D, Steigenhöfer D, Krämer M, Holz T, Dietsch R, Strüder L, Kanngießer B, Mantouvalou I. Laboratory Setup for Scanning-Free Grazing Emission X-ray Fluorescence. Anal Chem 2017; 89:1965-1971. [PMID: 28105807 DOI: 10.1021/acs.analchem.6b04449] [Citation(s) in RCA: 15] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Abstract
Grazing incidence and grazing emission X-ray fluorescence spectroscopy (GI/GE-XRF) are techniques that enable nondestructive, quantitative analysis of elemental depth profiles with a resolution in the nanometer regime. A laboratory setup for soft X-ray GEXRF measurements is presented. Reasonable measurement times could be achieved by combining a highly brilliant laser produced plasma (LPP) source with a scanning-free GEXRF setup, providing a large solid angle of detection. The detector, a pnCCD, was operated in a single photon counting mode in order to utilize its energy dispersive properties. GEXRF profiles of the Ni-Lα,β line of a nickel-carbon multilayer sample, which displays a lateral (bi)layer thickness gradient, were recorded at several positions. Simulations of theoretical profiles predicted a prominent intensity minimum at grazing emission angles between 5° and 12°, depending strongly on the bilayer thickness of the sample. This information was used to retrieve the bilayer thickness gradient. The results are in good agreement with values obtained by X-ray reflectometry, conventional X-ray fluorescence and transmission electron microscopy measurements and serve as proof-of-principle for the realized GEXRF setup. The presented work demonstrates the potential of nanometer resolved elemental depth profiling in the soft X-ray range with a laboratory source, opening, for example, the possibility of in-line or even in situ process control in semiconductor industry.
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Affiliation(s)
- J Baumann
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany.,Humboldt University of Berlin , School of Analytical Sciences Adlershof (IRIS-Building), Unter den Linden 6, D-10099 Berlin, Germany
| | - C Herzog
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - M Spanier
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - D Grötzsch
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - L Lühl
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - K Witte
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - A Jonas
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - S Günther
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - F Förste
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - R Hartmann
- PNSensor GmbH , Otto-Hahn-Ring 6, D-81739 München, Germany
| | - M Huth
- PNSensor GmbH , Otto-Hahn-Ring 6, D-81739 München, Germany
| | - D Kalok
- PNSensor GmbH , Otto-Hahn-Ring 6, D-81739 München, Germany
| | - D Steigenhöfer
- PNSensor GmbH , Otto-Hahn-Ring 6, D-81739 München, Germany
| | - M Krämer
- AXO DRESDEN GmbH , Gasanstaltstraße 8b, D-01237 Dresden, Germany
| | - T Holz
- AXO DRESDEN GmbH , Gasanstaltstraße 8b, D-01237 Dresden, Germany
| | - R Dietsch
- AXO DRESDEN GmbH , Gasanstaltstraße 8b, D-01237 Dresden, Germany
| | - L Strüder
- PNSensor GmbH , Otto-Hahn-Ring 6, D-81739 München, Germany.,University of Siegen , Department of Physics, Walter-Flex-Straße 3, D-57068 Siegen, Germany
| | - B Kanngießer
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
| | - I Mantouvalou
- Technical University of Berlin , Institute of Optics and Atomic Physics, Hardenbergstraße 36, D-10587 Berlin, Germany
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