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Ding R, Luo H, Li Z, Zhou Z, Qu D, Xiong W. Structural Design and Simulation of a Multi-Channel and Dual Working Condition Wafer Defect Inspection Prototype. Micromachines (Basel) 2023; 14:1568. [PMID: 37630105 PMCID: PMC10456950 DOI: 10.3390/mi14081568] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/09/2023] [Revised: 07/31/2023] [Accepted: 08/05/2023] [Indexed: 08/27/2023]
Abstract
Detecting and classifying defects on unpatterned wafers is a key part of wafer front-end inspection. Defect inspection schemes vary depending on the type and location of the defects. In this paper, the structure of the prototype is designed to meet the requirements of wafer surface and edge defect inspection. This prototype has four inspection channels: scattering, reflection, phase, and contour, with two working conditions: surface and edge inspection. The key structure of the prototype was simulated using Ansys. The simulation results show that the maximum deformation of the optical detection subsystem is 19.5 μm and the fundamental frequency of the prototype is 96.9 Hz; thus, these results meet the requirements of optical performance stability and structural design. The experimental results show that the prototype meets the requirements of the inspection sensitivity better than 200 nm equivalent PSL spherical defects.
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Affiliation(s)
- Ruizhe Ding
- Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China; (R.D.)
- Science Island Branch, Graduate School of USTC, Hefei 230026, China
- Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
| | - Haiyan Luo
- Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China; (R.D.)
- Science Island Branch, Graduate School of USTC, Hefei 230026, China
- Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
| | - Zhiwei Li
- Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China; (R.D.)
- Science Island Branch, Graduate School of USTC, Hefei 230026, China
- Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
| | - Zuoda Zhou
- Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China; (R.D.)
- Science Island Branch, Graduate School of USTC, Hefei 230026, China
- Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
| | - Dingjun Qu
- Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China; (R.D.)
- Science Island Branch, Graduate School of USTC, Hefei 230026, China
- Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
| | - Wei Xiong
- Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China; (R.D.)
- Science Island Branch, Graduate School of USTC, Hefei 230026, China
- Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
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