Do Silicon and Salicylic Acid Attenuate Water Deficit Damage in Talisia esculenta Radlk Seedlings?

Water deficit is one of the factors that most influence plant growth and yield. Thus, this study aimed to evaluate the effect of silicon and salicylic acid application and water deficit on the growth and photosynthetic and osmoregulatory metabolism of Talisia esculenta Radlk. seedlings and their recovery potential after the resumption of irrigation. Six treatments were performed: irrigation, irrigation suspension, irrigation suspension + silicon at 0.5 g L-1, irrigation suspension + silicon at 1.0 g L-1, irrigation suspension + salicylic acid at 50 mg L-1, and irrigation suspension + salicylic acid at 100 mg L-1. The evaluations were carried out at the beginning of the experiment, at 10 and 15 days after irrigation suspension, when the seedlings showed a photosynthetic rate close to zero, and at recovery. The plants were subjected to water restriction for up to 15 days, then re-irrigated until the recovery point, which was monitored based on the photosynthetic rate. Silicon application attenuated the harmful effects of water deficit on gas exchange and initial fluorescence, promoted proline accumulation in the leaf and root, and provided higher seedling quality. Salicylic acid application contributed to the maintenance of the relative water content of leaves during the water deficit period. Silicon and salicylic acid applications can attenuate the harmful effects of water stress, with silicon being the most effective agent in maintaining its growth and metabolism.