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Shi L, Zhong X, Wu T, Bian Q, Liu X, Miao H, Deng Y, Yin B, Zhou T. The electrodynamics of rod‐like microparticles based on optically induced dielectrophoresis. Electrophoresis 2022; 43:2175-2183. [DOI: 10.1002/elps.202200102] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/22/2022] [Revised: 09/03/2022] [Accepted: 09/06/2022] [Indexed: 11/07/2022]
Affiliation(s)
- Liuyong Shi
- Mechanical and Electrical Engineering College Hainan University Haikou P. R. China
| | - Xiangtao Zhong
- Mechanical and Electrical Engineering College Hainan University Haikou P. R. China
| | - Tao Wu
- Mechanical and Electrical Engineering College Hainan University Haikou P. R. China
| | - Qin Bian
- Mechanical and Electrical Engineering College Hainan University Haikou P. R. China
| | - Xiaomei Liu
- Mechanical and Electrical Engineering College Hainan University Haikou P. R. China
| | - Huaqing Miao
- Shenzhen Academy of Metrology & Quality Inspection Shenzhen P. R. China
| | - Yongbo Deng
- Changchun Institute of Optics Fine Mechanics and Physics (CIOMP) Chinese Academy of Science Changchun P. R. China
| | - Binfeng Yin
- School of Mechanical Engineering Yangzhou University Yangzhou P. R. China
| | - Teng Zhou
- Mechanical and Electrical Engineering College Hainan University Haikou P. R. China
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Gao M, Hu J, Wang J, Liu M, Zhu X, Saeed S, Hu C, Song Z, Xu H, Wang Z. Self-Assembly of DNA molecules in magnetic Fields. NANOTECHNOLOGY 2021; 33:065603. [PMID: 34087806 DOI: 10.1088/1361-6528/ac084f] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/15/2021] [Accepted: 06/03/2021] [Indexed: 06/12/2023]
Abstract
In this work, a rich variety of self-assembled DNA patterns were obtained in the magnetic field. Herein, atomic force microscopy (AFM) was utilized to investigate the effects of the concentration of DNA solution, intensity and direction of magnetic field and modification of mica surface by different cations on the self-assembly of DNA molecules. It was found that owning to the change of the DNA concentration, even under the same magnetic field, the DNA self-assembly results were different. Thein situtest results showed that the DNA self-assembly in an magnetic field was more likely to occur in liquid phase than in gas phase. In addition, whether in a horizontal or vertical magnetic field, a single stretched dsDNA was obtained in a certain DNA concentration and magnetic field intensity. Besides, the modification of cations on the mica surface significantly increased the force between the DNA molecules and mica surface, and further changed the self-assembly of DNA molecules under the action of magnetic field.
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Affiliation(s)
- Mingyan Gao
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Jing Hu
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Jianfei Wang
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Mengnan Liu
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Xiaona Zhu
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Sadaf Saeed
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Cuihua Hu
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Zhengxun Song
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Hongmei Xu
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
| | - Zuobin Wang
- International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun 130022, People's Republic of China
- JR3CN & IRAC, University of Bedfordshire, Luton LU1 3JU, United Kingdom
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Chlorine disinfection facilitates natural transformation through ROS-mediated oxidative stress. THE ISME JOURNAL 2021; 15:2969-2985. [PMID: 33941886 PMCID: PMC8091644 DOI: 10.1038/s41396-021-00980-4] [Citation(s) in RCA: 75] [Impact Index Per Article: 25.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/09/2020] [Accepted: 04/08/2021] [Indexed: 02/01/2023]
Abstract
The bacterial infection that involves antimicrobial resistance is a rising global threat to public health. Chlorine-based water disinfection processes can inactivate antibiotic resistant bacteria. However, at the same time, these processes may cause the release of antibiotic resistance genes into the water as free DNA, and consequently increase the risk to disseminate antibiotic resistance via natural transformation. Presently, little is known about the contribution of residual chlorine affecting the transformation of extracellular antibiotic resistance genes (ARGs). This study investigates whether chloramine and free chlorine promote the transformation of ARGs and how this may occur. We reveal that both chloramine and free chlorine, at practically relevant concentrations, significantly stimulated the transformation of plasmid-encoded ARGs by the recipient Acinetobacter baylyi ADP1, by up to a 10-fold increase. The underlying mechanisms underpinning the increased transformations were revealed. Disinfectant exposure induced a series of cell responses, including increased levels of reactive oxygen species (ROS), bacterial membrane damage, ROS-mediated DNA damage, and increased stress response. These effects thus culminated in the enhanced transformation of ARGs. This promoted transformation was observed when exposing disinfectant-pretreated A. baylyi to free plasmid. In contrast, after pretreating free plasmid with disinfectants, the transformation of ARGs decreased due to the damage of plasmid integrity. These findings provide important insight on the roles of disinfectants affecting the horizontal transfer of ARGs, which could be crucial in the management of antibiotic resistance in our water systems.
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Ahmed Y, Lu J, Yuan Z, Bond PL, Guo J. Efficient inactivation of antibiotic resistant bacteria and antibiotic resistance genes by photo-Fenton process under visible LED light and neutral pH. WATER RESEARCH 2020; 179:115878. [PMID: 32417561 DOI: 10.1016/j.watres.2020.115878] [Citation(s) in RCA: 72] [Impact Index Per Article: 18.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/09/2020] [Revised: 04/18/2020] [Accepted: 04/22/2020] [Indexed: 06/11/2023]
Abstract
Antibiotic resistance has been recognized as a major threat to public health worldwide. Inactivation of antibiotic resistant bacteria (ARB) and degradation of antibiotic resistance genes (ARGs) are critical to prevent the spread of antibiotic resistance in the environment. Conventional disinfection processes are effective to inactivate water-borne pathogens, yet they are unable to completely eliminate the antibiotic resistance risk. This study explored the potential of the photo-Fenton process to inactivate ARB, and to degrade both extracellular and intracellular ARGs (e-ARGs and i-ARGs, respectively). Using Escherichia coli DH5α with two plasmid-encoded ARGs (tetA and blaTEM-1) as a model ARB, a 6.17 log ARB removal was achieved within 30 min of applying photo-Fenton under visible LED and neutral pH conditions. In addition, no ARB regrowth occurred after 48-h, demonstrating that this process is very effective to induce permanent disinfection on ARB. The photo-Fenton process was validated under various water matrices, including ultrapure water (UPW), simulated wastewater (SWW) and phosphate buffer (PBS). The higher inactivation efficiency was observed in SWW as compared to other matrices. The photo-Fenton process also caused a 6.75 to 8.56-log reduction in eARGs based on quantitative real-time PCR of both short- and long amplicons. Atomic force microscopy (AFM) further confirmed that the extracellular DNA was sheared into short DNA fragments, thus eliminating the risk of the transmission of antibiotic resistance. As compared with e-ARGs, a higher dosage of Fenton reagent was required to damage i-ARGs. In addition, the tetA gene was more easily degraded than the blaTEM-1 gene. Collectively, our results demonstrate the photo-Fenton process is a promising technology for disinfecting water to prevent the spread of antibiotic resistance.
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Affiliation(s)
- Yunus Ahmed
- Advanced Water Management Centre (AWMC), The University of Queensland, St Lucia, Brisbane, QLD, 4072, Australia; Department of Chemistry, Chittagong University of Engineering & Technology, Chittagong, 4349, Bangladesh
| | - Ji Lu
- Advanced Water Management Centre (AWMC), The University of Queensland, St Lucia, Brisbane, QLD, 4072, Australia
| | - Zhiguo Yuan
- Advanced Water Management Centre (AWMC), The University of Queensland, St Lucia, Brisbane, QLD, 4072, Australia
| | - Philip L Bond
- Advanced Water Management Centre (AWMC), The University of Queensland, St Lucia, Brisbane, QLD, 4072, Australia
| | - Jianhua Guo
- Advanced Water Management Centre (AWMC), The University of Queensland, St Lucia, Brisbane, QLD, 4072, Australia.
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Gao M, Hu J, Wang Y, Liu M, Wang J, Song Z, Xu H, Hu C, Wang Z. Controlled Self-Assembly of λ-DNA Networks with the Synergistic Effect of a DC Electric Field. J Phys Chem B 2019; 123:9809-9818. [PMID: 31682443 DOI: 10.1021/acs.jpcb.9b08891] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/15/2023]
Abstract
Large-scale and morphologically controlled self-assembled λ-DNA networks were successfully constructed by the synergistic effect of a DC electric field. The effect of DNA concentration, direction, and intensity of the electric field, even the modification of the mica surface using Mg2+ on the characteristics of the as-prepared DNA networks, were investigated in detail by atomic force microscopy (AFM). It was found that the horizontal electric field was more advantageous to the formation of DNA networks with more regular structures. At the same concentration, the height of DNA network was not affected significantly by the intensity change of the horizontal electric field. The modification of Mg2+ on mica surface increased the aggregation of DNA molecules, which contributed to the morphological change of the DNA networks. Furthermore, DNA molecules were obviously stretched in both horizontal and vertical electric fields at low DNA concentrations.
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Affiliation(s)
- Mingyan Gao
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Jing Hu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Ying Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Mengnan Liu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Jianfei Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Zhengxun Song
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Hongmei Xu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Cuihua Hu
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China
| | - Zuobin Wang
- Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing , Changchun University of Science and Technology , Changchun 130022 , China.,International Research Centre for Nano Handling and Manufacturing of China , Changchun University of Science and Technology , Changchun 130022 , China.,JR3CN & IRAC , University of Bedfordshire , Luton LU1 3JU , U.K
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Tauran Y, Kumemura M, Tarhan MC, Perret G, Perret F, Jalabert L, Collard D, Fujita H, Coleman AW. Direct measurement of the mechanical properties of a chromatin analog and the epigenetic effects of para-sulphonato-calix[4]arene. Sci Rep 2019; 9:5816. [PMID: 30967623 PMCID: PMC6456576 DOI: 10.1038/s41598-019-42267-x] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/03/2018] [Accepted: 03/25/2019] [Indexed: 02/06/2023] Open
Abstract
By means of Silicon Nano Tweezers (SNTs) the effects on the mechanical properties of λ-phage DNA during interaction with calf thymus nucleosome to form an artificial chromatin analog were measured. At a concentration of 100 nM, a nucleosome solution induced a strong stiffening effect on DNA (1.1 N m-1). This can be compared to the effects of the histone proteins, H1, H2A, H3 where no changes in the mechanical properties of DNA were observed and the complex of the H3/H4 proteins where a smaller increase in the stiffness is observed (0.2 N m-1). Para-sulphonato-calix[4]arene, SC4, known for epigenetic activity by interacting specifically with the lysine groups of histone proteins, was studied for its effect on an artificial chromatin. Using a microfluidic SNT device, SC4 was titrated against the artificial chromatin, at a concentration of 1 mM in SC4 a considerable increase in stiffness, 15 N m-1, was observed. Simultaneously optical microscopy showed a physical change in the DNA structure between the tips of the SNT device. Electronic and Atomic Force microscopy confirmed this structural re-arrangement. Negative control experiments confirmed that these mechanical and physical effects were induced neither by the acidity of SC4 nor through nonspecific interactions of SC4 on DNA.
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Affiliation(s)
- Yannick Tauran
- LMI CNRS UMR 5615, Université Lyon 1, Villeurbanne, 69622, France.
- LIMMS/CNRS-IIS UMI 2820, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan.
| | - Momoko Kumemura
- LIMMS/CNRS-IIS UMI 2820, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
- CIRMM, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
- Graduate School of Life Science and Systems Engineering, Kyushu Institute of Technology, Fukuoka, 808-0196, Japan
| | - Mehmet C Tarhan
- Univ. Lille, CNRS, Centrale Lille, ISEN, Univ. Valenciennes, UMR 8520-IEMN, Lille, F59000, France
- CNRS/IIS/COL/Lille 1 SMMiL-E project, 59046, Lille Cedex, France
| | - Grégoire Perret
- LIMMS/CNRS-IIS UMI 2820, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
- CNRS/IIS/COL/Lille 1 SMMiL-E project, 59046, Lille Cedex, France
| | - Florent Perret
- ICBMS, CNRS UMR 5246, Université Lyon 1, Villeurbanne, 69622, France
| | - Laurent Jalabert
- LIMMS/CNRS-IIS UMI 2820, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
- CIRMM, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
| | - Dominique Collard
- LIMMS/CNRS-IIS UMI 2820, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
- CNRS/IIS/COL/Lille 1 SMMiL-E project, 59046, Lille Cedex, France
| | - Hiroyuki Fujita
- LIMMS/CNRS-IIS UMI 2820, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
- CIRMM, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
| | - Anthony W Coleman
- CIRMM, Institute of Industrial Science, The University of Tokyo, Tokyo, 153-8505, Japan
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