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Huang L, Gan Y. A review on SEM imaging of graphene layers. Micron 2024; 187:103716. [PMID: 39276729 DOI: 10.1016/j.micron.2024.103716] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/29/2024] [Revised: 09/03/2024] [Accepted: 09/06/2024] [Indexed: 09/17/2024]
Abstract
Atomic-thick graphene has stimulated great interests for exploring fundamental science and technological applications due to its promising electronic, mechanical and thermal properties. It is important to gain a deeper understanding of geometrical/structural characteristics of graphene and its properties/performance. Scanning electron microscopy (SEM) is indispensable for characterizing graphene layers. This review details SEM imaging of graphene layer, including the SEM image contrast mechanism of graphene layers, imaging parameter-dependent contrast of graphene layers and the influence of polycrystalline substrates on image contrast. Furthermore, a summary of SEM applications in imaging graphene layers is also provided, including layer-number determinations, study of chemical vapor deposition (CVD)-growth mechanism, and reveal of anti-corrosive failure mechanism of graphene layers. This review will provide a systematic and comprehensive understanding on SEM imaging of graphene layers for graphene community.
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Affiliation(s)
- Li Huang
- School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300130, PR China; Tianjin Key Laboratory of Electronic Materials and Devices, Hebei University of Technology, Tianjin 300130, PR China.
| | - Yang Gan
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, PR China; MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and Storage, School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, PR China
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2
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Feng P, Zhang D, Zhang G, Li C, Wang Y, Chen G, Gan Y. SEM Electron-Beam-Induced Ultrathin Carbon Deposition Layer on Cu Substrate: Improved Dry Oxidation Protection Performance than CVD Single Layer Graphene. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2309285. [PMID: 38402441 DOI: 10.1002/smll.202309285] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/13/2023] [Revised: 01/14/2024] [Indexed: 02/26/2024]
Abstract
An amorphous carbon deposition layer (CDL) with nanoscale thickness induced by scanning electron microscope (SEM) electron beam is studied as a carbon-based protective layer on copper (Cu). CDL is prepared by inducing the deposition of pollutants or hydrocarbons in the cavity of SEM through electron beam irradiation (EBI). Wrinkles and cracks will not form and the interfacial spacing of CDL/Cu is smaller than Graphene/Cu (Gr/Cu). The thickness and coverage of the interfacial oxide layer of CDL/Cu are all smaller than that of the Gr/Cu after the same oxidation conditions. Characterization of Raman mapping also demonstrates that CDL shows better oxidation inhibition effects than graphene. The structure of CDL is determined to be C = C and C = O, CH3- and C-O can be loaded vertically on CDL. Density functional theory (DFT) is employed for demonstrating the smaller interfacial gap of CDL/Cu, less wrinkles and cracks and larger adsorbing energy of water/oxygen compared with Gr/Cu. Molecular dynamic (MD) simulation also indicates that the diffusion of water or oxygen into CDL/Cu is more difficult and the oxidation of Cu covered by CDL is well suppressed. This work provides a new approach for the study of carbon-based antioxidant materials on Cu.
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Affiliation(s)
- Panpan Feng
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, P. R. China
- School of Chemistry and Pharmaceutical Engineering, Shandong First Medical University & Shandong Academy of Medical Sciences, Jinan, Shandong, 250117, P. R. China
| | - Dan Zhang
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, P. R. China
| | - Guoxu Zhang
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, P. R. China
| | - Chenwei Li
- School of Chemistry and Pharmaceutical Engineering, Shandong First Medical University & Shandong Academy of Medical Sciences, Jinan, Shandong, 250117, P. R. China
| | - You Wang
- Materials Physics and Chemistry Department, Key Laboratory of Micro-Systems and Micro-Structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin, 150001, P. R. China
| | - Guanying Chen
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, P. R. China
| | - Yang Gan
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, P. R. China
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Feng P, Zhang D, Zhang P, Wang Y, Gan Y. Nanoscale characterization of the heterogeneous interfacial oxidation layer of graphene/Cu based on a SEM electron beam induced reduction effect. Phys Chem Chem Phys 2023; 25:8816-8825. [PMID: 36916298 DOI: 10.1039/d2cp05809j] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/05/2023]
Abstract
Characterization of the interfacial oxidation layer of graphene/metal is a challenging task using conventional spectroscopy techniques because interfacial oxidation is heterogeneous at the nanoscale underneath the graphene. Here we developed a feasible method for nanoscale characterization of the interfacial oxidation layer of graphene/Cu (Gr/Cu) based on scanning electron microscopy (SEM) electron beam irradiation (EBI) induced reduction of interfacial oxides (SEM EBI-RIO method) at room temperature. The change in the thickness and coverage of the interfacial Cu oxide layer induced by EBI is responsible for the observed contrast reversal or change in SEM images of a targeted area with a width down to 200 nm in the EBI time scale of seconds to minutes. This method offers the capability of mapping heterogeneous interfacial oxidation of Gr/Cu with sub-100 nm spatial resolution and determining the range of thickness (1-5 nm) of the interfacial oxide layer. The SEM EBI-RIO method will be a powerful method to complement X-ray photoelectron spectroscopy (XPS), Raman microscopy, and high resolution transmission electron microscopy (HRTEM) for characterization of the interfacial oxidation layer of 2D materials and devices.
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Affiliation(s)
- Panpan Feng
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China.
- MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and Storage, School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China
| | - Dan Zhang
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China.
- MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and Storage, School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China
| | - Peng Zhang
- Manufacturing Engineering for Aviation and Aerospace, School of Mechatronics Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China
| | - You Wang
- Key Laboratory of Micro-Systems and Micro-Structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150001, P. R. China
- Materials Physics and Chemistry Department, Harbin Institute of Technology, Harbin 150001, P. R. China
| | - Yang Gan
- School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China.
- MIIT Key Laboratory of Critical Materials Technology for New Energy Conversion and Storage, School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P. R. China
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Burton OJ, Winter Z, Watanabe K, Taniguchi T, Beschoten B, Stampfer C, Hofmann S. Putting High-Index Cu on the Map for High-Yield, Dry-Transferred CVD Graphene. ACS NANO 2023; 17:1229-1238. [PMID: 36594782 PMCID: PMC9878973 DOI: 10.1021/acsnano.2c09253] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/16/2022] [Accepted: 12/15/2022] [Indexed: 06/17/2023]
Abstract
Reliable, clean transfer and interfacing of 2D material layers are technologically as important as their growth. Bringing both together remains a challenge due to the vast, interconnected parameter space. We introduce a fast-screening descriptor approach to demonstrate holistic data-driven optimization across the entirety of process steps for the graphene-Cu model system. We map the crystallographic dependences of graphene chemical vapor deposition, interfacial Cu oxidation to decouple graphene, and its dry delamination across inverse pole figures. Their overlay enables us to identify hitherto unexplored (168) higher index Cu orientations as overall optimal orientations. We show the effective preparation of such Cu orientations via epitaxial close-space sublimation and achieve mechanical transfer with a very high yield (>95%) and quality of graphene domains, with room-temperature electron mobilities in the range of 40000 cm2/(V s). Our approach is readily adaptable to other descriptors and 2D material systems, and we discuss the opportunities of such a holistic optimization.
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Affiliation(s)
- Oliver J. Burton
- Department
of Engineering, University of Cambridge, CambridgeCB3 0FA, United Kingdom
| | - Zachary Winter
- 2nd
Institute of Physics A and JARA-FIT, RWTH
Aachen University, 52074Aachen, Germany
| | - Kenji Watanabe
- Research
Center for Functional Materials, National
Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki305-0044, Japan
| | - Takashi Taniguchi
- International
Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki305-0044, Japan
| | - Bernd Beschoten
- 2nd
Institute of Physics A and JARA-FIT, RWTH
Aachen University, 52074Aachen, Germany
| | - Christoph Stampfer
- 2nd
Institute of Physics A and JARA-FIT, RWTH
Aachen University, 52074Aachen, Germany
- Peter
Grünberg Institute (PGI-9), Forschungszentrum
Jülich, 52425Jülich, Germany
| | - Stephan Hofmann
- Department
of Engineering, University of Cambridge, CambridgeCB3 0FA, United Kingdom
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Chen S, Hong H, Shen B. Substrate‐dependent enhancement of the durability of EPD graphene coating as a macroscale solid lubricant. SURF INTERFACE ANAL 2022. [DOI: 10.1002/sia.7123] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Sulin Chen
- School of Mechanical Engineering Shanghai Jiao Tong University Shanghai China
| | - Hong Hong
- School of Mechanical Engineering Shanghai Jiao Tong University Shanghai China
| | - Bin Shen
- School of Mechanical Engineering Shanghai Jiao Tong University Shanghai China
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