Apertureless cantilever-free pen arrays for scanning photochemical printing

Simultaneous Writing and Erasing Using Probe Lithography Synchronized Erasing and Deposition (PLiSED)

Simultaneous writing and erasing of two and three molecules in one single step at the microscale using Polymeric Lithography Editor (PLE) probes is demonstrated. Simultaneous writing and erasing of three molecules was accomplished by rastering a nanoporous probe that was loaded with rhodamine B and fluorescein over a quinine-coated glass substrate. The solvated quinine molecules were erased and transported into the probe matrix, whereas both rhodamine and fluorescein molecules were simultaneously deposited and aligned with the path of the erased quinine on the substrate. The simultaneous writing and erasing of molecules is referred to as PLiSED. The writing and erasing speed can be easily tuned by adjusting the probe speed to as large as 10,000 μm²/s. The microscale patterns on the orders of square millimeter area were fabricated by erasing fluorescein with an efficiency (η_e) > 95% while simultaneously depositing rhodamine molecules at the erased spots. The roles of the probe porosity, transport medium, and kinetics of solvation for editing were also investigated─the presence of a transport medium at the probe-substrate interface is required for the transport of the molecules into and out of the probe. The physical and mechanical properties of the polymeric probes influenced molecular editing. Young's modulus values of the hydrated hydrogels composed of varying monomer/cross-linker ratios were estimated using atomic force microscopy. Probes with the highest observed erasing capacity were used for further experiments to investigate the effects of relative humidity and erasing time on editing. Careful control over experimental conditions provided high-quality editing of microscale patterns at high editing speed. Combining erasing and deposition of multiple molecules in one single step offers a unique opportunity to significantly improve the efficiency and the accuracy of lithographic editing at the microscale. PLiSED enables rapid on-site lithographic rectification and has considerable application values in high-quality lithography and solid surface modification.

UV- and Visible-Light Photopatterning of Molecular Gradients Using the Thiol-yne Click Reaction

The rational design of chemical coatings is used to control surface interactions with small molecules, biomolecules, nanoparticles, and liquids as well as optical and other properties. Specifically, micropatterned surface coatings have been used in a wide variety of applications, including biosensing, cell growth assays, multiplexed biomolecule interaction arrays, and responsive surfaces. Here, a maskless photopatterning process is studied, using the photocatalyzed thiol-yne "click" reaction to create both binary and gradient patterns on thiolated surfaces. Nearly defect-free patterns are produced by first coating glass surfaces with mercaptopropylsilatrane, a silanizing agent that forms smoother self-assembled monolayers than the commonly used 3-mercaptopropyltrimethoxysilane. Photopatterning is then performed using UV (365 nm) or visible (405 nm) light to graft molecules onto the surface in tunable concentrations based on the local exposure. The technique is demonstrated for multiple types of molecular grafts, including fluorescent dyes, poly(ethylene glycol), and biotin, the latter allowing subsequent deposition of biomolecules via biotin-avidin binding. Patterning is demonstrated in water and dimethylformamide, and the process is repeated to combine molecules soluble in different phases. The combination of arbitrary gradient formation, broad applicability, a low defect rate, and fast prototyping thanks to the maskless nature of the process creates a particularly powerful technique for molecular surface patterning that could be used for a wide variety of micropatterned applications.

Binary-state scanning probe microscopy for parallel imaging

Scanning probe microscopy techniques, such as atomic force microscopy and scanning tunnelling microscopy, are harnessed to image nanoscale structures with an exquisite resolution, which has been of significant value in a variety of areas of nanotechnology. These scanning probe techniques, however, are not generally suitable for high-throughput imaging, which has, from the outset, been a primary challenge. Traditional approaches to increasing the scalability have involved developing multiple probes for imaging, but complex probe design and electronics are required to carry out the detection method. Here, we report a probe-based imaging method that utilizes scalable cantilever-free elastomeric probe design and hierarchical measurement architecture, which readily reconstructs high-resolution and high-throughput topography images. In a single scan, we demonstrate imaging with a 100-tip array to obtain 100 images over a 1-mm² area with 10⁶ pixels in less than 10 min. The potential for large-scale tip integration and the advantage of a simple probe array suggest substantial promise for our approach to high-throughput imaging far beyond what is currently possible.

High-throughput imaging has generally been challenging for scanning probe microscopy techniques. Here, the authors introduce binary-state scanning probe microscopy, which uses a cantilever-free elastomeric probes and a hierarchical measurement architecture for parallel topography imaging.

Evolution and applications of polymer brush hypersurface photolithography

Hypersurface photolithography creates arbitrary polymer brush patterns with independent control over feature diameter, height, and spacing between features, while controlling composition along a polymer chain and between features.

Recent progress in creating complex and multiplexed surface-grafted macromolecular architectures

Surface-grafted macromolecules, including polymers, DNA, peptides, etc., are versatile modifications to tailor the interfacial functions in a wide range of fields. In this review, we aim to provide an overview of the most recent progress in engineering surface-grafted chains for the creation of complex and multiplexed surface architectures over micro- to macro-scopic areas. A brief introduction to surface grafting is given first. Then the fabrication of complex surface architectures is summarized with a focus on controlled chain conformations, grafting densities and three-dimensional structures. Furthermore, recent advances are highlighted for the generation of multiplexed arrays with designed chemical composition in both horizontal and vertical dimensions. The applications of such complicated macromolecular architectures are then briefly discussed. Finally, some perspective outlooks for future studies and challenges are suggested. We hope that this review will be helpful to those just entering this field and those in the field requiring quick access to useful reference information about the progress in the properties, processing, performance, and applications of functional surface-grafted architectures.

Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

The development of a simple and cost-effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost-effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion-bombardment technique was reported as a new method to create high-resolution and high-aspect-ratio structures. Recent progress in simple and cost-effective top-down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.

Nanostructured High-Performance Thin-Film Transistors and Phototransistors Fabricated by a High-Yield and Versatile Near-Field Nanolithography Strategy

Thin-film transistors (TFTs) and field-effect transistors (FETs) are basic units to build functional electronic circuits and investigate transport physics. In conventional TFTs or FETs, performance in terms of current level, on-off ratio, and the sensitivity of detection is limited by homogeneous semiconducting layers. In this paper, we develop TFTs with submicron heterostructures by using a strategy based on near-field photolithography. We use an array of total-reflective polydimethylsiloxane pyramids or trenches as a soft photomask in photolithography to induce multiple reflections and diffractions to focus the light. The textured feature enables the generation of gaps, dots, and grids at the nanoscale, with dimensions as small as sub-100 nm on substrates at the centimeter scale. We demonstrated the very high performance oxide TFTs on the nanoscale and periodic degenerately doped heterojunctions, and they yielded a nearly 20-fold increase in transconductance and apparent device mobility. The on-off ratio was higher than 10⁹, with notably enhanced output current and clear scaling effect with channel length. We also built nanostructured wide-gap/narrow-gap heterojunctions to balance the high on-off ratio and sensitive photoresponse in a unidirectional phototransistor. This study shows the viability of programming a variety of nanoscale submicron patterns or interfaces in TFTs and FETs to significantly enlarge the scope of research on multifunctional TFTs and FETs.

Development of Dip-Pen Nanolithography (DPN) and Its Derivatives

Dip-pen nanolithography (DPN) is a unique nanofabrication tool that can directly write a variety of molecular patterns on a surface with high resolution and excellent registration. Over the past 20 years, DPN has experienced a tremendous evolution in terms of applicable inks, a remarkable improvement in fabrication throughput, and the development of various derivative technologies. Among these developments, polymer pen lithography (PPL) is the most prominent one that provides a large-scale, high-throughput, low-cost tool for nanofabrication, which significantly extends DPN and beyond. These developments not only expand the scope of the wide field of scanning probe lithography, but also enable DPN and PPL as general approaches for the fabrication or study of nanostructures and nanomaterials. In this review, a focused summary and historical perspective of the technological development of DPN and its derivatives, with a focus on PPL, in one timeline, are provided and future opportunities for technological exploration in this field are proposed.

Nanocombinatorics with Cantilever-Free Scanning Probe Arrays

The effectiveness of combinatorial experiments is determined by the rate at which distinct experimental conditions can be prepared and interrogated. This has been particularly limiting at the intersection of nanotechnology and soft materials research, where structures are difficult to reliably prepare and materials are incompatible with conventional lithographic techniques. For example, studying nanoparticle-based heterogeneous catalysis or the interaction between biological cells and abiotic surfaces requires precise tuning of materials composition on the nanometer scale. Scanning probe techniques are poised to be major players in the combinatorial nanoscience arena because they allow one to directly deposit materials at high resolution without any harsh processing steps that limit material compatibility. The chief limitation of scanning probe techniques is throughput, as patterning with single probes is prohibitively slow in the context of large-scale combinatorial experiments. A recent paradigm shift circumvents this problem by fundamentally altering the architecture of scanning probes by replacing the conventionally used cantilever with a soft compliant film on a rigid substrate, a substitution that allows a densely packed array of probes to function in parallel in an inexpensive format. This is a major lithographic advance in terms of scalability, throughput, and versatility that, when combined with the development of approaches to actuate individual probes in cantilever-free arrays, sets the stage for scanning-probe-based tools to address scientific questions through nanocombinatorial studies in biology and materials science. In this review, we outline the development of cantilever-free scanning probe lithography and prospects for nanocombinatorial studies enabled by these tools.

Towards scanning probe lithography-based 4D nanoprinting by advancing surface chemistry, nanopatterning strategies, and characterization protocols

Biointerfaces direct some of the most complex biological events, including cell differentiation, hierarchical organization, and disease progression, or are responsible for the remarkable optical, electronic, and biological behavior of natural materials. Chemical information encoded within the 4D nanostructure of biointerfaces - comprised of the three Cartesian coordinates (x, y, z), and chemical composition of each molecule within a given volume - dominates their interfacial properties. As such, there is a strong interest in creating printing platforms that can emulate the 4D nanostructure - including both the chemical composition and architectural complexity - of biointerfaces. Current nanolithography technologies are unable to recreate 4D nanostructures with the chemical or architectural complexity of their biological counterparts because of their inability to position organic molecules in three dimensions and with sub-1 micrometer resolution. Achieving this level of control over the interfacial structure requires transformational advances in three complementary research disciplines: (1) the scope of organic reactions that can be successfully carried out on surfaces must be increased, (2) lithography tools are needed that are capable of positioning soft organic and biologically active materials with sub-1 micrometer resolution over feature diameter, feature-to-feature spacing, and height, and (3) new techniques for characterizing the 4D structure of interfaces should be developed and validated. This review will discuss recent advances in these three areas, and how their convergence is leading to a revolution in 4D nanomanufacturing.

Solution-Phase Photochemical Nanopatterning Enabled by High-Refractive-Index Beam Pen Arrays

A high-throughput, solution-based, scanning-probe photochemical nanopatterning approach, which does not require the use of probes with subwavelength apertures, is reported. Specifically, pyramid arrays made from high-refractive-index polymeric materials were constructed and studied as patterning tools in a conventional liquid-phase beam pen lithography experiment. Two versions of the arrays were explored with either metal-coated or metal-free tips. Importantly, light can be channeled through both types of tips and the appropriate solution phase (e.g., H₂O or CH₃OH) and focused on subwavelength regions of a substrate to effect a photoreaction in solution that results in localized patterning of a self-assembled monolayer (SAM)-coated Au thin film substrate. Arrays with as many as 4500 pyramid-shaped probes were used to simultaneously initiate thousands of localized free-radical photoreactions (decomposition of a lithium acylphosphinate photoinitiator in an aqueous solution) that result in oxidative removal of the SAM. The technique is attractive since it allows one to rapidly generate features less than 200 nm in diameter, and the metal-free tips afford more than 10-fold higher intensity than the tips with nanoapertures over a micrometer propagation length. In principle, this mask-free method can be utilized as a versatile tool for performing a wide variety of photochemistries across multiple scales that may be important in high-throughput combinatorial screening applications related to chemistry, biology, and materials science.

Size-tunable, highly sensitive microelectrode arrays enabled by polymer pen lithography

By combining polymer pen lithography (PPL) patterning with in situ polymerization, we report a straightforward and bottom-up approach for bench-top fabrication of microelectrode arrays (MEAs) with well-controlled dimensions. The as-fabricated MEAs can be used to electrodeposit prussian blue in situ and work as a biosensor for H₂O₂ with a detection limit as low as 5 nM at a sensitivity of 0.7 A cm^-2 M^-1.

Tip-Based Nanofabrication for Scalable Manufacturing

Tip-based nanofabrication (TBN) is a family of emerging nanofabrication techniques that use a nanometer scale tip to fabricate nanostructures. In this review, we first introduce the history of the TBN and the technology development. We then briefly review various TBN techniques that use different physical or chemical mechanisms to fabricate features and discuss some of the state-of-the-art techniques. Subsequently, we focus on those TBN methods that have demonstrated potential to scale up the manufacturing throughput. Finally, we discuss several research directions that are essential for making TBN a scalable nano-manufacturing technology.

Biomimicking Nano-Micro Binary Polymer Brushes for Smart Cell Orientation and Adhesion Control

A new biomimetic surface named nano-micro binary polymer brushes is fabricated by large-area bench-top dip-pen nanodisplacement lithography technique. It is composed of gelatin-modified poly(glycidyl methacrylate) nanolines which are spaced by microstripes of poly(N-isopropylacrylamide). Cells are not only adhered and oriented well on the re-used surface, but also detachable from the surface with well-preserved extracellular matrix and aligned morphology.

Large-Area Sub-Wavelength Optical Patterning via Long-Range Ordered Polymer Lens Array

Fabrication of large-area, highly orderly, and high-resolution nanostructures in a cost-effective fashion prompts advances in nanotechnology. Herein, for the first time, we demonstrate a unique strategy to prepare a long-range highly regular polymer lens from photoresist nanotrenches based templates, which are obtained from underexposure. The relationship between exposure dose and the cross-sectional morphology of produced photoresist nanostructures is revealed for the first time. The polymer lens arrays are repeatedly used for rapid generation of sub-100 nm nanopatterns across centimeter-scale areas. The light focusing properties of the nanoscale polymer lens are investigated by both simulation and experiment. It is found that the geometry, size of the lens, and the exposure dose can be deployed to adjust the produced feature size, spacing, and shapes. Because the polymer lenses are derived from top-down photolithography, the nearly perfect long-range periodicity of produced nanopatterns is ensured, and the feature shapes can be flexibly designed. Because this nanolithographic strategy enables subwavelength periodical nanopatterns with controllable feature size, geometry, and composition in a cost-effective manner, it can be optimized as a viable and potent nanofabrication tool for various technological applications.

Hard Transparent Arrays for Polymer Pen Lithography

Patterning nanoscale features across macroscopic areas is challenging due to the vast range of length scales that must be addressed. With polymer pen lithography, arrays of thousands of elastomeric pyramidal pens can be used to write features across centimeter-scales, but deformation of the soft pens limits resolution and minimum feature pitch, especially with polymeric inks. Here, we show that by coating polymer pen arrays with a ∼175 nm silica layer, the resulting hard transparent arrays exhibit a force-independent contact area that improves their patterning capability by reducing the minimum feature size (∼40 nm), minimum feature pitch (<200 nm for polymers), and pen to pen variation. With these new arrays, patterns with as many as 5.9 billion features in a 14.5 cm(2) area were written using a four hundred thousand pyramid pen array. Furthermore, a new method is demonstrated for patterning macroscopic feature size gradients that vary in feature diameter by a factor of 4. Ultimately, this form of polymer pen lithography allows for patterning with the resolution of dip-pen nanolithography across centimeter scales using simple and inexpensive pen arrays. The high resolution and density afforded by this technique position it as a broad-based discovery tool for the field of nanocombinatorics.

Liquid-Phase Beam Pen Lithography

Beam pen lithography (BPL) in the liquid phase is evaluated. The effect of tip-substrate gap and aperture size on patterning performance is systematically investigated. As a proof-of-concept experiment, nanoarrays of nucleotides are synthesized using BPL in an organic medium, pointing toward the potential of using liquid phase BPL to perform localized photochemical reactions that require a liquid medium.

Seeing is believing: atomic force microscopy imaging for nanomaterial research

Atomic force microscopy can image nanomaterial properties such as the topography, elasticity, adhesion, friction, electrical properties, and magnetism.

Optimization of 4D polymer printing within a massively parallel flow-through photochemical microreactor

Brush polymer patterns, where the position (x,y), height (z), and chemical composition of each feature in an array were controlled independently, were prepared by combining massively parallel tip-based photolithography, microfluidics, and photochemical radical polymerizations.

Ultrahigh resolution, serial fabrication of three dimensionally-patterned protein nanostructures by liquid-mediated non-contact scanning probe lithography

Sub-100 nm and 3D-patterned structures of protein are fabricated on Au surface in solution by liquid-mediated non-contact scanning probe lithography.

Arbitrary and Parallel Nanofabrication of 3D Metal Structures with Polymer Brush Resists

3D polymer brushes are reported for the first time as ideal resists for the alignment-free nanofabrication of complex 3D metal structures with sub-100 nm lateral resolution and sub-10 nm vertical resolution. Since 3D polymer brushes can be serially fabricated in parallel, this method is effective to generate arbitrary 3D metal structures over a large area at a high throughput.

Combination of Universal Mechanical Testing Machine with Atomic Force Microscope for Materials Research

Surface deformation and fracture processes of materials under external force are important for understanding and developing materials. Here, a combined horizontal universal mechanical testing machine (HUMTM)-atomic force microscope (AFM) system is developed by modifying UMTM to combine with AFM and designing a height-adjustable stabilizing apparatus. Then the combined HUMTM-AFM system is evaluated. Finally, as initial demonstrations, it is applied to analyze the relationship among macroscopic mechanical properties, surface nanomorphological changes under external force, and fracture processes of two kinds of representative large scale thin film materials: polymer material with high strain rate (Parafilm) and metal material with low strain rate (aluminum foil). All the results demonstrate the combined HUMTM-AFM system overcomes several disadvantages of current AFM-combined tensile/compression devices including small load force, incapability for large scale specimens, disability for materials with high strain rate, and etc. Therefore, the combined HUMTM-AFM system is a promising tool for materials research in the future.

Strong Coupling between Plasmonic Gap Modes and Photonic Lattice Modes in DNA-Assembled Gold Nanocube Arrays

Control of both photonic and plasmonic coupling in a single optical device represents a challenge due to the distinct length scales that must be manipulated. Here, we show that optical metasurfaces with such control can be constructed using an approach that combines top-down and bottom-up processes, wherein gold nanocubes are assembled into ordered arrays via DNA hybridization events onto a gold film decorated with DNA-binding regions defined using electron beam lithography. This approach enables one to systematically tune three critical architectural parameters: (1) anisotropic metal nanoparticle shape and size, (2) the distance between nanoparticles and a metal surface, and (3) the symmetry and spacing of particles. Importantly, these parameters allow for the independent control of two distinct optical modes, a gap mode between the particle and the surface and a lattice mode that originates from cooperative scattering of many particles in an array. Through reflectivity spectroscopy and finite-difference time-domain simulation, we find that these modes can be brought into resonance and coupled strongly. The high degree of synthetic control enables the systematic study of this coupling with respect to geometry, lattice symmetry, and particle shape, which together serve as a compelling example of how nanoparticle-based optics can be useful to realize advanced nanophotonic structures that hold implications for sensing, quantum plasmonics, and tunable absorbers.

Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls

By coating polydimethylsiloxane (PDMS) relief structures with a layer of opaque metal such as gold, the incident light is strictly allowed to pass through the nanoscopic apertures at the sidewalls of PDMS reliefs to expose underlying photoresist at nanoscale regions, thus producing subwavelength nanopatterns covering centimeter-scale areas. It was found that the sidewalls were a little oblique, which was the key to form the nanoscale apertures. Two-sided and one-sided subwavelength apertures can be constructed by employing vertical and oblique metal evaporation directions, respectively. Consequently, two-line and one-line subwavelength nanopatterns with programmable feature shapes, sizes, and periodicities could be produced using the obtained photomasks. The smallest aperture size and line width of 80 nm were achieved. In contrast to the generation of raised positive photoresist nanopatterns in phase shifting photolithography, the recessed positive photoresist nanopatterns produced in this study provide a convenient route to transfer the resist nanopatterns to metal nanopatterns. This nanolithography methodology possesses the distinctive advantages of simplicity, low cost, high throughput, and nanoscale feature size and shape controllability, making it a potent nanofabrication technique to enable functional nanostructures for various potential applications.

Production of centimeter-scale gradient patterns by graded elastomeric tip array

Large-area patterned surfaces with chemical and/or morphological gradients have significant applications in biology, chemistry, and materials science. In this work, we developed a unique lithographic strategy to fabricate 2D and 3D gradient patterns with gradually varying feature size or height over centimeter-scale areas by utilizing a large-area polydimethylsiloxane (PDMS) tip array with programmable tip apex as a conformal photomask in near-field photolithography. Meanwhile, a new strategy was developed to create the PDMS tip array with graded apex size, which was employed to fabricate gradient patterns with the lateral feature sizes changing from sub-100 nm to several microns on one single substrate over macroscopic (square centimeter) areas. Furthermore, 3D gradient patterns with spatially varying feature height were enabled by employing gradient exposure dose. The formation of gradient feature size was ascribed either to gradient contact areas between tips and substrates or to exposure dose gradient. This lithography strategy combines the advantages of a wide range of feature sizes, simplicity, high-throughput, low-cost and diversified feature shapes, making it a facile and flexible approach to manufacture various functional gradient structures.

Self-propelled screen-printable catalytic swimmers

A highly versatile 2D screen-printing fabrication of nature-inspired fish swimmers is described.