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Khot AC, Nirmal KA, Dongale TD, Kim TG. GeTe/MoTe 2 Van der Waals Heterostructures: Enabling Ultralow Voltage Memristors for Nonvolatile Memory and Neuromorphic Computing Applications. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024:e2400791. [PMID: 38874088 DOI: 10.1002/smll.202400791] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/31/2024] [Revised: 05/14/2024] [Indexed: 06/15/2024]
Abstract
Advanced electronic semiconducting Van der Waals heterostructures (HSs) are promising candidates for exploring next-generation nanoelectronics owing to their exceptional electronic properties, which present the possibility of extending their functionalities to diverse potential applications. In this study, GeTe/MoTe2 HS are explored for nonvolatile memory and neuromorphic-computing applications. Sputter-deposited Ag/GeTe/MoTe2/Pt HS cross-point devices are fabricated, and they demonstrate memristor behavior at ultralow switching voltages (VSET: 0.15 V and VRESET: -0.14 V) with very low energy consumption (≈30 nJ), high memory window, long retention time (104 s), and excellent endurance (105 cycles). Resistive switching is achieved by adjusting the interface between the Ag top electrode and the heterojunction switching layer. Cross-sectional transmission electron microscope images and conductive atomic force microscopy analysis confirm the presence of a conducting filament in the heterojunction switching layer. Further, emulating various synaptic functions of a biological synapse reveals that GeTe/MoTe2 HS can be utilized for energy-efficient neuromorphic-computing applications. A multilayer perceptron is implemented using the synaptic weights of the Ag/GeTe/MoTe2/Pt HS device, revealing high pattern accuracy (81.3%). These results indicate that HS devices can be considered a potential solution for high-density memory and artificial intelligence applications.
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Affiliation(s)
- Atul C Khot
- School of Electrical Engineering, Korea University, Anam-ro 145, Seongbuk-gu, Seoul, 02841, Republic of Korea
| | - Kiran A Nirmal
- School of Electrical Engineering, Korea University, Anam-ro 145, Seongbuk-gu, Seoul, 02841, Republic of Korea
| | - Tukaram D Dongale
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur, 416 004, India
| | - Tae Geun Kim
- School of Electrical Engineering, Korea University, Anam-ro 145, Seongbuk-gu, Seoul, 02841, Republic of Korea
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2
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Qu J, Cheng H, Lan H, Zheng B, Luo Z, Yang X, Yi X, Wu G, Chen S, Pan A. Space-Confined Growth of Ultrathin P-Type GeTe Nanosheets for Broadband Photodetectors. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024:e2309391. [PMID: 38456381 DOI: 10.1002/smll.202309391] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/17/2023] [Revised: 02/18/2024] [Indexed: 03/09/2024]
Abstract
As p-type phase-change degenerate semiconductors, crystalline and amorphous germanium telluride (GeTe) exhibit metallic and semiconducting properties, respectively. However, the massive structural defects and strong interface scattering in amorphous GeTe films significantly reduce their performance. In this work, two-dimensional (2D) p-type GeTe nanosheets are synthesized via a specially designed space-confined chemical vapor deposition (CVD) method, with the thickness of the GeTe nanosheets reduced to 1.9 nm. The space-confined CVD method improves the crystallinity of ultrathin GeTe by lowering the partial pressure of the reactant gas, resulting in GeTe nanosheets with excellent p-type semiconductor properties, such as a satisfactory on/off ratio of 105 . Temperature-dependent electrical measurements demonstrate that variable-range hopping and optical-phonon-assisted hopping mechanisms dominate transport behavior at low and high temperatures, respectively. GeTe devices exhibit significantly high responsivity (6589 and 2.2 A W-1 at 633 and 980 nm, respectively) and detectivity (1.67 × 1011 and 1.3 × 108 Jones at 633 and 980 nm, respectively), making them feasible for broadband photodetectors in the visible to near-infrared range. Furthermore, the fabricated GeTe/WS2 diode exhibits a rectification ratio of 103 at zero gate voltage. These satisfactory p-type semiconductor properties demonstrate that ultrathin GeTe exhibits enormous potential for applications in optoelectronic interconnection circuits.
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Affiliation(s)
- Junyu Qu
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Haodong Cheng
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Huiping Lan
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Biyuan Zheng
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Ziyu Luo
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Xin Yang
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Xiao Yi
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Guangcheng Wu
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Shula Chen
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
| | - Anlian Pan
- Hunan Institute of Optoelectronic Integration, Key Laboratory for Micro-Nano Physics and Technology of Hunan Province, College of Materials Science and Engineering, Hunan University, Changsha, Hunan, 410082, P. R. China
- School of Physics and Electronics, Hunan Normal University, Changsha, Hunan, 410081, P. R. China
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Zhang H, Lu L, Meng W, Cheng SD, Mi SB. Nanoscale fabrication of heterostructures in thermoelectric SnTe. NANOSCALE 2024; 16:2303-2309. [PMID: 38224170 DOI: 10.1039/d3nr04646j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/16/2024]
Abstract
Enhancing the performance of thermoelectric materials is demanded to develop strategies for introducing multidimensional microstructures into materials to induce full-scale phonon scattering while ensuring electrical transport performance. Herein, a previously unreported rhombohedral h-SnTe (R3̄m) has been achieved in the nanoscale dimension by the electron beam irradiation of β-SnTe (Fm3̄m) materials. The h-SnTe structure contains interlayer van der Waals gaps and exhibits metallic behavior evaluated by density-functional theory calculations, which coherently appears in the narrow-band semiconductor β-SnTe matrix. Our results provide a strategy for modifying the properties of SnTe-based thermoelectric materials and designing nanostructured chalcogenide heterostructures via electron beam irradiation.
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Affiliation(s)
- Hu Zhang
- Ji Hua Laboratory, Foshan, 528200, China.
- School of Physics and Information Technology, Shaanxi Normal University, Xi'an, 710119, China
| | - Lu Lu
- Ji Hua Laboratory, Foshan, 528200, China.
| | - Weiwei Meng
- South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China.
| | - Shao-Dong Cheng
- State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an 710049, China
| | - Shao-Bo Mi
- Ji Hua Laboratory, Foshan, 528200, China.
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Cai J, Gao K, Zhao R, Zhu R, Tong H, Miao X. Designing a Multilayered Oxygen Barrier Structure to Tackle Oxidation Challenges in Phase-Change Memory for Improved Reliability. ACS APPLIED MATERIALS & INTERFACES 2023; 15:50499-50507. [PMID: 37862618 DOI: 10.1021/acsami.3c10785] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/22/2023]
Abstract
Phase-change memory (PCM) is considered one of the most promising candidates for universal memory. However, during the manufacturing process of PCM, phase-change materials (PCMs) encounter severe oxidation, which can cause degraded performance and reduced stability of PCM, hindering its industrialization process. In this work, a multilayered oxygen barrier (MOB) structure is proposed to tackle this challenge. Material characterization shows that the MOB structure can significantly reduce the extent of oxidation of PCMs from around 70% to as low as around 10%, achieving a remarkably low level of oxidation. Moreover, the material in the MOB structure exhibits notable enhancements in crystallization temperature and cycling capability. The improved stability is attributed to the oxygen barrier effect and the suppression of elemental segregation within the material, which are both conferred by the MOB structure. In summary, this work provides an effective solution to address the oxidation of PCMs, offering valuable guidance for realizing a high-reliability PCM in practical production.
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Affiliation(s)
- Jingwei Cai
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Ke Gao
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Ruizhe Zhao
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Rongjiang Zhu
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China
| | - Hao Tong
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China
- Hubei Yangtze Memory Laboratories, Wuhan 430205, China
| | - Xiangshui Miao
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China
- Hubei Yangtze Memory Laboratories, Wuhan 430205, China
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Tan Q, Chang Y, He Q, Tong H, Miao X. Enhanced stretchability towards a flexible and wearable reflective display coating using chalcogenide phase change materials. OPTICS EXPRESS 2023; 31:75-85. [PMID: 36606951 DOI: 10.1364/oe.464011] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/16/2022] [Accepted: 11/22/2022] [Indexed: 06/17/2023]
Abstract
Reflective color switching coatings based on chalcogenide phase change material (PCM) is becoming one of the most promising display technologies in the future. However, it is still a challenge to kindly control the stress and enhance the stretchability for flexible display coatings. Here, we report crack-reduced reflective color coatings on a flexible substrate by using buckling structure to regulate the distribution of vacancies in PCM. It significantly suppresses the formation of cracks and improves the robustness of optical and electrical properties during stretching of the display device, which opens the doors of opportunity for phase change display applications in a wide range of flexible and wearable display fields.
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Yoo C, Jeon JW, Yoon S, Cheng Y, Han G, Choi W, Park B, Jeon G, Jeon S, Kim W, Zheng Y, Lee J, Ahn J, Cho S, Clendenning SB, Karpov IV, Lee YK, Choi JH, Hwang CS. Atomic Layer Deposition of Sb 2 Te 3 /GeTe Superlattice Film and Its Melt-Quenching-Free Phase-Transition Mechanism for Phase-Change Memory. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2207143. [PMID: 36271720 DOI: 10.1002/adma.202207143] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/05/2022] [Revised: 10/11/2022] [Indexed: 06/16/2023]
Abstract
Atomic layer deposition (ALD) of Sb2 Te3 /GeTe superlattice (SL) film on planar and vertical sidewall areas containing TiN metal and SiO2 insulator is demonstrated. The peculiar chemical affinity of the ALD precursor to the substrate surface and the 2D nature of the Sb2 Te3 enable the growth of an in situ crystallized SL film with a preferred orientation. The SL film shows a reduced reset current of ≈1/7 of the randomly oriented Ge2 Sb2 Te5 alloy. The reset switching is induced by the transition from the SL to the (111)-oriented face-centered-cubic (FCC) Ge2 Sb2 Te5 alloy and subsequent melt-quenching-free amorphization. The in-plane compressive stress, induced by the SL-to-FCC structural transition, enhances the electromigration of Ge along the [111] direction of FCC structure, which enables such a significant improvement. Set operation switches the amorphous to the (111)-oriented FCC structure.
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Affiliation(s)
- Chanyoung Yoo
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Jeong Woo Jeon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Seungjae Yoon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Yan Cheng
- Key Laboratory of Polar Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Gyuseung Han
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Wonho Choi
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Byongwoo Park
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Gwangsik Jeon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Sangmin Jeon
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Woohyun Kim
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
| | - Yonghui Zheng
- Key Laboratory of Polar Materials and Devices, Department of Electronics, East China Normal University, Shanghai, 200241, China
| | - Jongho Lee
- SK Hynix Inc., Icheon, Gyeonggi, 17336, Republic of Korea
| | - Junku Ahn
- SK Hynix Inc., Icheon, Gyeonggi, 17336, Republic of Korea
| | - Sunglae Cho
- SK Hynix Inc., Icheon, Gyeonggi, 17336, Republic of Korea
| | | | - Ilya V Karpov
- Components Research, Intel Corporation, Hillsboro, OR, 97124, USA
| | - Yoon Kyung Lee
- Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, Jeonbuk, 54896, Republic of Korea
| | - Jung-Hae Choi
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Cheol Seong Hwang
- Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, Seoul National University, Seoul, 08826, Republic of Korea
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Kwon H, Khan AI, Perez C, Asheghi M, Pop E, Goodson KE. Uncovering Thermal and Electrical Properties of Sb 2Te 3/GeTe Superlattice Films. NANO LETTERS 2021; 21:5984-5990. [PMID: 34270270 DOI: 10.1021/acs.nanolett.1c00947] [Citation(s) in RCA: 9] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Superlattice-like phase change memory (SL-PCM) promises lower switching current than conventional PCM based on Ge2Sb2Te5 (GST); however, a fundamental understanding of SL-PCM requires detailed characterization of the interfaces within such an SL. Here we explore the electrical and thermal transport of SLs with deposited Sb2Te3 and GeTe alternating layers of various thicknesses. We find up to an approximately four-fold reduction of the effective cross-plane thermal conductivity of the SL stack (as-deposited polycrystalline) compared with polycrystalline GST (as-deposited amorphous and later annealed) due to the thermal interface resistances within the SL. Thermal measurements with varying periods of our SLs show a signature of phonon coherence with a transition from wave-like to particle-like phonon transport, further described by our modeling. Electrical resistivity measurements of such SLs reveal strong anisotropy (∼2000×) between the in-plane and cross-plane directions due to the weakly interacting van der Waals-like gaps. This work uncovers electrothermal transport in SLs based on Sb2Te3 and GeTe for the improved design of low-power PCM.
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Affiliation(s)
- Heungdong Kwon
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Asir Intisar Khan
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
| | - Christopher Perez
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Mehdi Asheghi
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
| | - Eric Pop
- Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
| | - Kenneth E Goodson
- Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States
- Department of Materials Science & Engineering, Stanford University, Stanford, California 94305, United States
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8
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Ribaldone C, Dragoni D, Bernasconi M. A first-principles study of the switching mechanism in GeTe/InSbTe superlattices. NANOSCALE ADVANCES 2020; 2:5209-5218. [PMID: 36132039 PMCID: PMC9418462 DOI: 10.1039/d0na00577k] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/15/2020] [Accepted: 09/11/2020] [Indexed: 06/15/2023]
Abstract
Interfacial Phase Change Memories (iPCMs) based on (GeTe)2/Sb2Te3 superlattices have been proposed as an alternative candidate to conventional PCMs for the realization of memory devices with superior switching properties. The switching mechanism was proposed to involve a crystalline-to-crystalline structural transition associated with a rearrangement of the stacking sequence of the GeTe bilayers. Density functional theory (DFT) calculations showed that such rearrangement could be achieved by means of a two-step process with an activation barrier for the flipping of Ge and Te atoms which is sensitive to the biaxial strain acting on GeTe bilayers. Within this picture, strain-engineering of GeTe bilayers in the GeTe-chalcogenide superlattice can be exploited to further improve the iPCM switching performance. In this work, we study GeTe-InSbTe superlattices with different compositions by means of DFT, aiming at exploiting the large mismatch (3.8%) in the in-plane lattice parameter between GeTe and In3SbTe2 to reduce the activation barrier for the switching with respect to the (GeTe)2-Sb2Te3 superlattice.
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Affiliation(s)
- Chiara Ribaldone
- Dipartimento di Scienza dei Materiali, Università di Milano-Bicocca Via R. Cozzi 55 I-20125 Milano Italy
| | - Daniele Dragoni
- Dipartimento di Scienza dei Materiali, Università di Milano-Bicocca Via R. Cozzi 55 I-20125 Milano Italy
| | - Marco Bernasconi
- Dipartimento di Scienza dei Materiali, Università di Milano-Bicocca Via R. Cozzi 55 I-20125 Milano Italy
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Han G, Liu F, Li W, Huang Y, Sun N, Ye F. Local structure and phase change behavior in interfacial intermixing GeTe-Sb 2Te 3 superlattices. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2020; 32:255401. [PMID: 32050167 DOI: 10.1088/1361-648x/ab7577] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Ge/Sb atomic intermixing in interfacial cationic layers is a common phenomenon for GeTe-Sb2Te3 superlattice (GST-SL) used in memory devices. In this paper, we explored the effect of Ge/Sb intermixing on the phase change behavior of GST-SL upon the heating-quenching procedure. Four interfacial intermixing models of Kooi, Ferro, Petrov and inverted Petrov with different Ge/Sb intermixing ratios (25/75, 50/50 and 75/25) were developed based on the ab initio molecular dynamics. The structural evolution indicated that the Ge/Sb interfacial intermixing could facilitate the structure changes especially for 50/50 Ge/Sb intermixed models. When quenching from 1500 K, more 4-fold Ge-centered octahedrons were produced than tetrahedrons, and the electron localization function further proved that the distorted of Ge(Sb)-centered 6-fold octahedrons were caused by the asymmetrical interactions of Ge-Ge/Sb and Ge-Te. A relatively large Te p orbital contribution in coexisted Ge/Te layer led to a narrower bandgap. In addition, different Ge/Sb atom intermixed ratio which affected the electronic local structure, led to the discrepancy in the initial atom movement of Sb or Ge movement near the gap. The present studies enrich the understanding of Ge/Sb interfacial atomic intermixing effects in GST-SL structural changes.
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Affiliation(s)
- Gang Han
- Institute of Laser Engineering, Beijing University of Technology, Beijing 100124, People's Republic of China. Beijing Engineering Research Center of Applied Laser Technology, Beijing University of Technology, Beijing 100124, People's Republic of China
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10
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Chen X, Shen J, Jia S, Zheng Y, Lv S, Song Z, Zhu M. Observation of van der Waals reconfiguration in superlattice phase change materials. NANOSCALE 2019; 11:16954-16961. [PMID: 31490513 DOI: 10.1039/c9nr03033f] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Phase change memory (PCM) is a leading candidate for nonvolatile memory applications in the big data era. However, the high power consumption, caused by melting GeTe-Sb2Te3-like phase change materials, hinders their applications. A significant step is the proposal to spatially separate GeTe and Sb2Te3 in the form of a superlattice, enabling a higher operating speed and better cyclability at reduced switching energy. However, the physical origin is under intensive debate. Recently, the swapping of the SbTe terminating layers nearest to the van der Waals (vdWs) gap has been claimed to be the mechanism for the superlattice. Here, we reported a direct atomic-scale chemical identification of two kinds of vdWs reconfigurations together with atomic simulations. The vdWs reconfigurations, which occurred at the GeTe and Sb2Te3 boundary, were demonstrated to change the electrical properties and turn this semiconductor into a conductor, leading to the resistance contrast. Besides, strong intermixing of Ge and Sb atoms was directly observed; in the most severe cases, ∼50% of Ge in the GeTe layer diffused into the adjacent Sb2Te3 layer. Our work paves the way for deeper understanding of the phase transition of the GeTe/Sb2Te3 superlattice and the future design of non-volatile memories towards dynamic random access-like memories.
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Affiliation(s)
- Xin Chen
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.
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11
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Lotnyk A, Dankwort T, Hilmi I, Kienle L, Rauschenbach B. In situ observations of the reversible vacancy ordering process in van der Waals-bonded Ge-Sb-Te thin films and GeTe-Sb 2Te 3 superlattices. NANOSCALE 2019. [PMID: 31135011 DOI: 10.1016/j.scriptamat.2019.03.024] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/09/2023]
Abstract
Chalcogenide-based thin films are employed in data storage and memory technology whereas van der Waals-bonded layered chalcogenide heterostructures are considered to be a main contender for memory devices with low power consumption. The reduction of switching energy is due to the lowering of entropic losses governed by the restricted motion of atoms in one dimension within the crystalline states. The investigations of switching mechanisms in such superlattices have recently attracted much attention and the proposed models are still under debate. This is partially due to the lack of direct observation of atomic scale processes, which might occur in these chalcogenide systems. This work reports direct, nanoscale observations of the order-disorder processes in van der Waals bonded Ge-Sb-Te thin films and GeTe-Sb2Te3-based superlattices using in situ experiments inside an aberration-corrected transmission electron microscope. The findings reveal a reversible self-assembled reconfiguration of the structural order in these materials. This process is associated with the ordering of randomly distributed vacancies within the studied materials into ordered vacancy layers and with readjustment of the lattice plane distances within the newly formed layered structures, indicating the high flexibility of these layered chalcogenide-based systems. Thus, the ordering process results in the formation of vacancy-bonded building blocks intercalated within van der Waals-bonded units. Moreover, vacancy-bonded building blocks can be reconfigured to the initial structure under the influence of an electron beam, while in situ exposure of the recovered layers to a targeted electron beam leads to the reverse process. Overall, the outcomes provide new insights into local structure and switching mechanism in chalcogenide superlattices.
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Affiliation(s)
- Andriy Lotnyk
- Leibniz Institute of Surface Engineering (IOM), Permoserstr. 15, 04318, Leipzig, Germany.
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12
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Lotnyk A, Dankwort T, Hilmi I, Kienle L, Rauschenbach B. In situ observations of the reversible vacancy ordering process in van der Waals-bonded Ge-Sb-Te thin films and GeTe-Sb 2Te 3 superlattices. NANOSCALE 2019; 11:10838-10845. [PMID: 31135011 DOI: 10.1039/c9nr02112d] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/09/2023]
Abstract
Chalcogenide-based thin films are employed in data storage and memory technology whereas van der Waals-bonded layered chalcogenide heterostructures are considered to be a main contender for memory devices with low power consumption. The reduction of switching energy is due to the lowering of entropic losses governed by the restricted motion of atoms in one dimension within the crystalline states. The investigations of switching mechanisms in such superlattices have recently attracted much attention and the proposed models are still under debate. This is partially due to the lack of direct observation of atomic scale processes, which might occur in these chalcogenide systems. This work reports direct, nanoscale observations of the order-disorder processes in van der Waals bonded Ge-Sb-Te thin films and GeTe-Sb2Te3-based superlattices using in situ experiments inside an aberration-corrected transmission electron microscope. The findings reveal a reversible self-assembled reconfiguration of the structural order in these materials. This process is associated with the ordering of randomly distributed vacancies within the studied materials into ordered vacancy layers and with readjustment of the lattice plane distances within the newly formed layered structures, indicating the high flexibility of these layered chalcogenide-based systems. Thus, the ordering process results in the formation of vacancy-bonded building blocks intercalated within van der Waals-bonded units. Moreover, vacancy-bonded building blocks can be reconfigured to the initial structure under the influence of an electron beam, while in situ exposure of the recovered layers to a targeted electron beam leads to the reverse process. Overall, the outcomes provide new insights into local structure and switching mechanism in chalcogenide superlattices.
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Affiliation(s)
- Andriy Lotnyk
- Leibniz Institute of Surface Engineering (IOM), Permoserstr. 15, 04318, Leipzig, Germany.
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