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Aymard A, Delplanque E, Dalmas D, Scheibert J. Designing metainterfaces with specified friction laws. Science 2024; 383:200-204. [PMID: 38207035 DOI: 10.1126/science.adk4234] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/21/2023] [Accepted: 11/22/2023] [Indexed: 01/13/2024]
Abstract
Many devices, including touchscreens and robotic hands, involve frictional contacts. Optimizing these devices requires fine control of the interface's friction law. We lack systematic methods to create dry contact interfaces whose frictional behavior satisfies preset specifications. We propose a generic surface design strategy to prepare dry rough interfaces that have predefined relationships between normal and friction forces. Such metainterfaces circumvent the usual multiscale challenge of tribology by considering simplified surface topographies as assemblies of spherical asperities. Optimizing the individual asperities' heights enables specific friction laws to be targeted. Through various centimeter-scaled elastomer-glass metainterfaces, we illustrate three types of achievable friction laws, including linear laws with a specified friction coefficient and unusual nonlinear laws. This design strategy represents a scale- and material-independent, chemical-free pathway toward energy-saving and adaptable smart interfaces.
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Affiliation(s)
- Antoine Aymard
- Université de Lyon, École Centrale de Lyon, CNRS, ENTPE, LTDS, UMR5513, 69130 Ecully, France
| | - Emilie Delplanque
- Université de Lyon, École Centrale de Lyon, CNRS, ENTPE, LTDS, UMR5513, 69130 Ecully, France
| | - Davy Dalmas
- Université de Lyon, École Centrale de Lyon, CNRS, ENTPE, LTDS, UMR5513, 69130 Ecully, France
| | - Julien Scheibert
- Université de Lyon, École Centrale de Lyon, CNRS, ENTPE, LTDS, UMR5513, 69130 Ecully, France
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2
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Choi J, Kim S. Microscopic Projection Lithography for Integrating Metallic Microstructures on Silk Protein for Biodevice Applications. ACS Biomater Sci Eng 2023; 9:6390-6397. [PMID: 37874691 DOI: 10.1021/acsbiomaterials.3c01116] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/26/2023]
Abstract
Precise patterning of metallic micro/nanostructures enables application of silk protein in biomedical devices with a seamless human-machine interface. However, high-quality, expensive equipment and facilities involved in micro/nanofabrication hinder rapid prototyping for explorative laboratory-based research. Here, we report cost-effective and high-resolution light-emitting diode-based projection lithography methods for fabricating a Cr photomask and metallic microstructures on a silk protein layer. After two-step photolithography performed using a commercial camera and microscopic objective lens, inkjet-printed patterns are successfully projected on the silk layers with 100× and 500× demagnification ratios. A lift-off process is conducted to integrate Au patterns on the lithographic-patterned resist/silk layer, and various Au microstructures with sizes <2 μm are generated. In all the processes, the silk protein exhibits a high resistance to chemicals for resist solvent, development, resist strip, and lift-off, as well as a strong adhesion to gold, along with low cytotoxicity. Dopamine sensing and transistor operating capabilities are proved by measuring the changes in the electrical signals through the Au patterns. The proposed method is a cost-effective and simple approach for rapid prototyping of silk-based biomedical devices.
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Affiliation(s)
- Juwan Choi
- Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
| | - Sunghwan Kim
- Department of Electronic Engineering, Hanyang University, Seoul 04763, Republic of Korea
- Department of Biomedical Engineering, Hanyang University, Seoul 04763, Republic of Korea
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3
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Mohanty S, Chen T, Chen IT, So F, Chang CH. Modeling the co-assembly of binary nanoparticles. NANOTECHNOLOGY 2023; 35:035301. [PMID: 37820637 DOI: 10.1088/1361-6528/ad0248] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/18/2023] [Accepted: 10/11/2023] [Indexed: 10/13/2023]
Abstract
In this work, we present a binary assembly model that can predict the co-assembly structure and spatial frequency spectra of monodispersed nanoparticles with two different particle sizes. The approach relies on an iterative algorithm based on geometric constraints, which can simulate the assembly patterns of particles with two distinct diameters, size distributions, and at various mixture ratios on a planar surface. The two-dimensional spatial-frequency spectra of the modeled assembles can be analyzed using fast Fourier transform analysis to examine their frequency content. The simulated co-assembly structures and spectra are compared with assembled nanoparticles fabricated using transfer coating method are in qualitative agreement with the experimental results. The co-assembly model can also be used to predict the peak spatial frequency and the full-width at half-maximum bandwidth, which can lead to the design of the structure spectra by selection of different monodispersed particles. This work can find applications in fabrication of non-periodic nanostructures for functional surfaces, light extraction structures, and broadband nanophotonics.
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Affiliation(s)
- Saurav Mohanty
- Walker Department of Mechanical Engineering, The University of Texas at Austin, TX 78712, United States of America
| | - Timothy Chen
- Department of Mechanical and Aerospace Engineering, North Carolina State University, Raleigh, NC 27606, United States of America
| | - I-Te Chen
- Walker Department of Mechanical Engineering, The University of Texas at Austin, TX 78712, United States of America
| | - Franky So
- Department of Material Science and Engineering, North Carolina State University, Raleigh, NC 27606, United States of America
| | - Chih-Hao Chang
- Walker Department of Mechanical Engineering, The University of Texas at Austin, TX 78712, United States of America
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4
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Yu G, Ma Y, Li X, Yu B, Zhang X, Zhang X, Chen Y, Liang Z, Pang Z, Weng D, Chen L, Wang J. Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2023; 39:14328-14335. [PMID: 37748943 DOI: 10.1021/acs.langmuir.3c01643] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/27/2023]
Abstract
Micro/nanospherical lens photolithography (SLPL) constitutes an efficient and precise micro/nanofabrication methodology. It offers advantages over traditional nanolithography approaches, such as cost-effectiveness and ease of implementation. By using micrometer-sized microspheres, SLPL enables the preparation of subwavelength scale features. This technique has gained attention due to its potential applications. However, the SLPL process has a notable limitation in that it mostly produces simple pattern shapes, mainly consisting of circular arrays. There has been a lack of theoretical analysis regarding the possible shapes that can be created. In our experiments, we successfully prepared annular and ring-with-hole pattern shapes. To address this limitation, we applied the Mie scattering theory to systematically analyze and summarize the various patterns that can be obtained through the SLPL process. We also proposed methods to predict and obtain different patterns. This theoretical analysis enhances the understanding of SLPL and expands its potential applications, making it a valuable area for further research.
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Affiliation(s)
- Guoxu Yu
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Yuan Ma
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Xuan Li
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Bowen Yu
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Xinping Zhang
- Beijing University of Civil Engineering and Architecture, Beijing 102616, P.R. China
| | - Xuanhe Zhang
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Yiqing Chen
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Zhenwei Liang
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Zuobo Pang
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Ding Weng
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Lei Chen
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
| | - Jiadao Wang
- Department of Mechanical Engineering, Tsinghua University, Beijing 100084, P.R. China
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5
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Liu B, Han L, Xu H, Su JJ, Zhan D. Ultrasonic-Assisted Electrochemical Nanoimprint Lithography: Forcing Mass Transfer to Enhance the Localized Etching Rate of GaAs. Chem Asian J 2023; 18:e202300491. [PMID: 37493590 DOI: 10.1002/asia.202300491] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/01/2023] [Revised: 07/25/2023] [Accepted: 07/25/2023] [Indexed: 07/27/2023]
Abstract
Electrochemical nanoimprint lithography (ECNL) has emerged as a promising technique for fabricating three-dimensional micro/nano-structures (3D-MNSs) directly on semiconductor wafers. This technique is based on a localized corrosion reaction induced by the contact potential across the metal/semiconductor boundaries. The anodic etching of semiconductor and the cathodic reduction of electron acceptors occur at the metal/semiconductor/electrolyte interface and the Pt mold surface, respectively. However, the etching rate is limited by the mass transfer of species in the ultrathin electrolyte layer between the mold and the workpiece. To overcome this challenge, we introduce the ultrasonics effect into the ECNL process to facilitate the mass exchange between the ultrathin electrolyte layer and the bulk solution, thereby improving the imprinting efficiency. Experimental investigations demonstrate a positive linear relationship between the reciprocal of the area duty ratio of the mold and the imprinting efficiency. Furthermore, the introduction of ultrasonics improves the imprinting efficiency by approximately 80 %, irrespective of the area duty ratio. The enhanced imprinting efficiency enables the fabrication of 3D-MNSs with higher aspect ratios, resulting in a stronger light trapping effect. These results indicate the prospective applications of ECNL in semiconductor functional devices, such as photoelectric detection and photovoltaics.
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Affiliation(s)
- Bing Liu
- Department of Mechanical and Electrical Engineering, Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen, 361005, Fujian, China
| | - Lianhuan Han
- Department of Mechanical and Electrical Engineering, Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen, 361005, Fujian, China
| | - Hantao Xu
- Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Engineering Research Center of Electrochemical Technologies of Ministry of Education, Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
| | - Jian-Jia Su
- Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Engineering Research Center of Electrochemical Technologies of Ministry of Education, Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
| | - Dongping Zhan
- Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Engineering Research Center of Electrochemical Technologies of Ministry of Education, Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, China
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6
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Ji Z, Liu X, Song Y, Zhong Y, Wang D, Chen B, Fang M, Nie X, Hou J, Ma J, Ma H, Xu X, Yi Z, Xu X. Space-Confined seeding and growth of ordered arrays of TiO2 hierarchical nanostructures. J Colloid Interface Sci 2023; 630:436-443. [DOI: 10.1016/j.jcis.2022.10.125] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/22/2022] [Revised: 10/08/2022] [Accepted: 10/24/2022] [Indexed: 11/06/2022]
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7
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Selective Area Epitaxy of GaN Nanowires on Si Substrates Using Microsphere Lithography: Experiment and Theory. NANOMATERIALS 2022; 12:nano12142341. [PMID: 35889566 PMCID: PMC9320236 DOI: 10.3390/nano12142341] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 06/09/2022] [Revised: 06/29/2022] [Accepted: 07/05/2022] [Indexed: 01/10/2023]
Abstract
GaN nanowires were grown using selective area plasma-assisted molecular beam epitaxy on SiOx/Si(111) substrates patterned with microsphere lithography. For the first time, the temperature–Ga/N2 flux ratio map was established for selective area epitaxy of GaN nanowires. It is shown that the growth selectivity for GaN nanowires without any parasitic growth on a silica mask can be obtained in a relatively narrow range of substrate temperatures and Ga/N2 flux ratios. A model was developed that explains the selective growth range, which appeared to be highly sensitive to the growth temperature and Ga flux, as well as to the radius and pitch of the patterned pinholes. High crystal quality in the GaN nanowires was confirmed through low-temperature photoluminescence measurements.
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8
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Dvoretckaia L, Gridchin V, Mozharov A, Maksimova A, Dragunova A, Melnichenko I, Mitin D, Vinogradov A, Mukhin I, Cirlin G. Light-Emitting Diodes Based on InGaN/GaN Nanowires on Microsphere-Lithography-Patterned Si Substrates. NANOMATERIALS 2022; 12:nano12121993. [PMID: 35745332 PMCID: PMC9230727 DOI: 10.3390/nano12121993] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/10/2022] [Revised: 06/06/2022] [Accepted: 06/07/2022] [Indexed: 12/19/2022]
Abstract
The direct integration of epitaxial III-V and III-N heterostructures on Si substrates is a promising platform for the development of optoelectronic devices. Nanowires, due to their unique geometry, allow for the direct synthesis of semiconductor light-emitting diodes (LED) on crystalline lattice-mismatched Si wafers. Here, we present molecular beam epitaxy of regular arrays n-GaN/i-InGaN/p-GaN heterostructured nanowires and tripods on Si/SiO2 substrates prepatterned with the use of cost-effective and rapid microsphere optical lithography. This approach provides the selective-area synthesis of the ordered nanowire arrays on large-area Si substrates. We experimentally show that the n-GaN NWs/n-Si interface demonstrates rectifying behavior and the fabricated n-GaN/i-InGaN/p-GaN NWs-based LEDs have electroluminescence in the broad spectral range, with a maximum near 500 nm, which can be employed for multicolor or white light screen development.
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Affiliation(s)
- Liliia Dvoretckaia
- Department of Physics, Alferov University, Khlopina 8/3, 194021 St. Petersburg, Russia; (L.D.); (V.G.); (A.M.); (G.C.)
| | - Vladislav Gridchin
- Department of Physics, Alferov University, Khlopina 8/3, 194021 St. Petersburg, Russia; (L.D.); (V.G.); (A.M.); (G.C.)
- Institute of Physics, Saint Petersburg State University, Universitetskaya Emb. 7/9, 199034 St. Petersburg, Russia;
| | - Alexey Mozharov
- Institute of Physics, Saint Petersburg State University, Universitetskaya Emb. 7/9, 199034 St. Petersburg, Russia;
| | - Alina Maksimova
- Department of Physics, Alferov University, Khlopina 8/3, 194021 St. Petersburg, Russia; (L.D.); (V.G.); (A.M.); (G.C.)
| | - Anna Dragunova
- Department of Physics, National Research University Higher School of Economics, Kantemirovskaya 3/1 A, 194100 St. Petersburg, Russia; (A.D.); (I.M.)
| | - Ivan Melnichenko
- Department of Physics, National Research University Higher School of Economics, Kantemirovskaya 3/1 A, 194100 St. Petersburg, Russia; (A.D.); (I.M.)
| | - Dmitry Mitin
- Department of Chemistry, ITMO University, Lomonosova 9, 197101 St. Petersburg, Russia; (D.M.); (A.V.)
| | - Alexandr Vinogradov
- Department of Chemistry, ITMO University, Lomonosova 9, 197101 St. Petersburg, Russia; (D.M.); (A.V.)
| | - Ivan Mukhin
- Department of Physics, Alferov University, Khlopina 8/3, 194021 St. Petersburg, Russia; (L.D.); (V.G.); (A.M.); (G.C.)
- Department of Chemistry, ITMO University, Lomonosova 9, 197101 St. Petersburg, Russia; (D.M.); (A.V.)
- Higher School of Engineering Physics, Peter the Great St. Petersburg Polytechnic University, Polytechnicheskaya 29, 195251 St. Petersburg, Russia
- Correspondence:
| | - Georgy Cirlin
- Department of Physics, Alferov University, Khlopina 8/3, 194021 St. Petersburg, Russia; (L.D.); (V.G.); (A.M.); (G.C.)
- Institute of Physics, Saint Petersburg State University, Universitetskaya Emb. 7/9, 199034 St. Petersburg, Russia;
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9
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Fan X, Walther A. 1D Colloidal chains: recent progress from formation to emergent properties and applications. Chem Soc Rev 2022; 51:4023-4074. [PMID: 35502721 DOI: 10.1039/d2cs00112h] [Citation(s) in RCA: 10] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/12/2022]
Abstract
Integrating nanoscale building blocks of low dimensionality (0D; i.e., spheres) into higher dimensional structures endows them and their corresponding materials with emergent properties non-existent or only weakly existent in the individual building blocks. Constructing 1D chains, 2D arrays and 3D superlattices using nanoparticles and colloids therefore continues to be one of the grand goals in colloid and nanomaterial science. Amongst these higher order structures, 1D colloidal chains are of particular interest, as they possess unique anisotropic properties. In recent years, the most relevant advances in 1D colloidal chain research have been made in novel synthetic methodologies and applications. In this review, we first address a comprehensive description of the research progress concerning various synthetic strategies developed to construct 1D colloidal chains. Following this, we highlight the amplified and emergent properties of the resulting materials, originating from the assembly of the individual building blocks and their collective behavior, and discuss relevant applications in advanced materials. In the discussion of synthetic strategies, properties, and applications, particular attention will be paid to overarching concepts, fresh trends, and potential areas of future research. We believe that this comprehensive review will be a driver to guide the interdisciplinary field of 1D colloidal chains, where nanomaterial synthesis, self-assembly, physical property studies, and material applications meet, to a higher level, and open up new research opportunities at the interface of classical disciplines.
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Affiliation(s)
- Xinlong Fan
- Institute for Macromolecular Chemistry, Albert-Ludwigs-University Freiburg, Stefan-Meier-Str. 31, 79104, Freiburg, Germany.
| | - Andreas Walther
- A3BMS Lab, Department of Chemistry, University of Mainz, Duesbergweg 10-14, 55128 Mainz, Germany.
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10
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Xu H, Han L, Su JJ, Tian ZQ, Zhan D. Spatially-separated and photo-enhanced semiconductor corrosion processes for high-efficient and contamination-free electrochemical nanoimprint lithography. Sci China Chem 2022. [DOI: 10.1007/s11426-021-1194-3] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/31/2022]
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11
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Ushkov AA, Dellea O, Lebaigue O, Poncelet O, Verrier I, Lefkir Y, Jourlin Y. A versatile technology for colloidal crystal transfer using parylene coatings and hydrosoluble polymers. NANOTECHNOLOGY 2022; 33:185301. [PMID: 35062001 DOI: 10.1088/1361-6528/ac4dc3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/01/2021] [Accepted: 01/21/2022] [Indexed: 06/14/2023]
Abstract
We propose a novel versatile colloidal crystal transfer technique compatible with a wide range of water-insoluble substrates regardless of their size, material, and wettability. There are no inherent limitations on colloidal particles material and size. The method possibilities are demonstrated via the colloidal transfer on quartz, glass substrates with a flat and curved surface, and via the fabrication of 3D colloidal structure with 5 overlaid colloidal monolayers. The process occurs at a room temperature in water and is independent from the illumination conditions, which makes it ideal for experimental manipulations with sensitive functional substrates. We performed the nanosphere photolithography process on a photosensitive substrate with a transferred colloidal monolayer. The metallized hexagonal arrays of nanopores demonstrated a clear resonant plasmonic behavior. We believe that due to its high integration possibilities the proposed transfer technique will find applications in a large-area surface nanotexturing, plasmonics, and will speed up a device fabrication process.
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Affiliation(s)
- Andrei A Ushkov
- Laboratoire Hubert Curien UMR 5516, F-42023, Université de Lyon, UJM-Saint-Etienne, CNRS, Institut d'Optique Graduate School, 18 Rue Du Pr. Benot Lauras, 42000, Saint-Etienne, France
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, 9 Institutsky Lane, 141700, Dolgoprudnyy, Russia
| | - Olivier Dellea
- CEA-Liten, Grenoble Alpes Univ, 17 rue des Martyrs, 38054, Grenoble, France
| | - Olivier Lebaigue
- CEA-Liten, Grenoble Alpes Univ, 17 rue des Martyrs, 38054, Grenoble, France
| | - Olivier Poncelet
- CEA-Liten, Grenoble Alpes Univ, 17 rue des Martyrs, 38054, Grenoble, France
| | - Isabelle Verrier
- Laboratoire Hubert Curien UMR 5516, F-42023, Université de Lyon, UJM-Saint-Etienne, CNRS, Institut d'Optique Graduate School, 18 Rue Du Pr. Benot Lauras, 42000, Saint-Etienne, France
| | - Yaya Lefkir
- Laboratoire Hubert Curien UMR 5516, F-42023, Université de Lyon, UJM-Saint-Etienne, CNRS, Institut d'Optique Graduate School, 18 Rue Du Pr. Benot Lauras, 42000, Saint-Etienne, France
| | - Yves Jourlin
- Laboratoire Hubert Curien UMR 5516, F-42023, Université de Lyon, UJM-Saint-Etienne, CNRS, Institut d'Optique Graduate School, 18 Rue Du Pr. Benot Lauras, 42000, Saint-Etienne, France
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12
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Playing with sizes and shapes of colloidal particles via dry etching methods. Adv Colloid Interface Sci 2022; 299:102538. [PMID: 34906837 DOI: 10.1016/j.cis.2021.102538] [Citation(s) in RCA: 14] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/22/2021] [Revised: 09/21/2021] [Accepted: 09/27/2021] [Indexed: 12/17/2022]
Abstract
Monolayers of self-assembled quasi-spherical colloidal particles are essential building blocks in the field of materials science and engineering. More typically, they are used as a template for the fabrication of nanostructures if they serve, for instance, as a mask for deposition of new material on the surface on which particles are assembled or for etching of the material underneath; in this case, they are removed afterwards. This is what occurs in colloidal or nanosphere lithography. In some other cases, they are not used as a sacrificial material but they are incorporated in the final structure because they are inherently interesting for their properties. Independently of their specific use and application, different strategies have been devised in order to modify size and shape of colloidal particles, so as to enrich the variety of attainable patterns and to tailor the properties of the final structures and materials. In this review, we will focus on one of the most widespread methods to shape spherical colloidal particles, i.e. dry etching techniques. We will follow the development of such approaches until recent days, so as to trace an extensive panorama of the diverse parameters that can be harnessed to achieve specific morphological changes and highlight the characteristic features of the variants of this method. We will finally discuss how particles modified via dry etching can be used for patterning or can be resuspended in solvents for very diverse applications.
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Soliman AIA, Wu CT, Utsunomiya T, Ichii T, Sugimura H. Controlled Growth of Organosilane Micropatterns on Hydrophilic and Hydrophobic Surfaces Templated by Vacuum Ultraviolet Photolithography. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2021; 37:13932-13940. [PMID: 34780193 DOI: 10.1021/acs.langmuir.1c02516] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
In this report, micropatterns of (3-aminopropyl)trimethoxysilane (APTMS) were developed on hydrophilic and hydrophobic surfaces after patterning using 172 nm vacuum ultraviolet (VUV) photolithography. Self-assembled monolayers (SAMs) formed on Si substrates through UV hydrosilylation of 1-hexadecene (HD) and 10-undecenoic acid (UDA) were used as hydrophilic and hydrophobic surfaces, respectively. For templating the HD- and UDA-SAMs, the VUV light was exposed to HD- and UDA-SAMs from the slits of photomasks in atmospheric and evacuated environments, respectively. Various oxygenated groups were generated at the exposed domains of HD-SAM, while the COOH groups were trimmed from the irradiated domains of UDA-SAM. The APTMS molecules were immobilized on the domains that were terminated by oxygenated groups after chemical vapor deposition (CVD). The thicknesses of the developed APTMS micropatterns increased significantly by raising the CVD temperature and in the presence of ambient air in the CVD Teflon container as well. The increase in thicknesses was ascribed to the formation of APTMS multilayers, which were mediated by H3N+ ions. Also, the developed APTMS micropatterns on the UDA-SAM patterned by VUV light irradiation in a high-vacuum environment (HV-VUV) were thicker than those on the VUV/(O) patterned HD-SAM due to the presence of inactive oxygenated groups at the surface of VUV/(O)-terminated domains of HD-SAM such as COO-C and C-O-C groups. The presence of water or ambient air facilitated the silane coupling between the silyl groups with the oxygenated and amino groups The combination of VUV photolithography and the CVD method with control of the conditions would enable us to control the thicknesses and shapes of the developed APTMS micropatterns. These findings illustrate the applicability of VUV photolithography for templating hydrophobic and hydrophobic surfaces toward the development of organosilane architectures, which can be feasible for several applications.
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Affiliation(s)
- Ahmed I A Soliman
- Department of Materials Science and Engineering, Kyoto University, Yoshida-hommachi, Sakyo-Ku, Kyoto 606-8501, Japan
- Chemistry Department, Faculty of Science, Assiut University, Assiut 71516, Egypt
| | - Cheng-Tse Wu
- Department of Materials Science and Engineering, Kyoto University, Yoshida-hommachi, Sakyo-Ku, Kyoto 606-8501, Japan
| | - Toru Utsunomiya
- Department of Materials Science and Engineering, Kyoto University, Yoshida-hommachi, Sakyo-Ku, Kyoto 606-8501, Japan
| | - Takashi Ichii
- Department of Materials Science and Engineering, Kyoto University, Yoshida-hommachi, Sakyo-Ku, Kyoto 606-8501, Japan
| | - Hiroyuki Sugimura
- Department of Materials Science and Engineering, Kyoto University, Yoshida-hommachi, Sakyo-Ku, Kyoto 606-8501, Japan
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14
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Ushkov A, Dellea O, Verrier I, Kampfe T, Shcherbakov A, Michalon JY, Jourlin Y. Compensation of disorder for extraordinary optical transmission effect in nanopore arrays fabricated by nanosphere photolithography. OPTICS EXPRESS 2020; 28:38049-38060. [PMID: 33379625 DOI: 10.1364/oe.408772] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/31/2020] [Accepted: 10/23/2020] [Indexed: 06/12/2023]
Abstract
The work considers the effect of extraordinary optical transmission (EOT) in polycrystalline arrays of nanopores fabricated via nanosphere photolithography (NPL). The use of samples with different qualities of polycrystalline structure allows us to reveal the role of disorder for EOT. We propose a phenomenological model which takes the disorder into account in numerical simulations and validate it using experimental data. Due to the NPL flexibility for the structure geometry control, we demonstrate the possiblity to partially compensate the disorder influence on EOT by the nanopore depth adjustments. The proposed experimental and theoretical results are promising to reveal the NPL limits for EOT-based devices and stimulate systematic studies of disorder compensation designs.
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15
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Zhang XA, Chen IT, Chang CH. Recent progress in near-field nanolithography using light interactions with colloidal particles: from nanospheres to three-dimensional nanostructures. NANOTECHNOLOGY 2019; 30:352002. [PMID: 31100738 DOI: 10.1088/1361-6528/ab2282] [Citation(s) in RCA: 23] [Impact Index Per Article: 4.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/03/2023]
Abstract
The advance of nanotechnology is firmly rooted in the development of cost-effective, versatile, and easily accessible nanofabrication techniques. The ability to pattern complex two-dimensional and three-dimensional nanostructured materials are particularly desirable, since they can have novel physical properties that are not found in bulk materials. This review article will report recent progress in utilizing self-assembly of colloidal particles for nanolithography. In these techniques, the near-field interactions of light and colloids are the sole mechanisms employed to generate the intensity distributions for patterning. Based on both 'bottom-up' self-assembly and 'top-down' lithography approaches, these processes are highly versatile and can take advantage of a number of optical effects, allowing the complex 3D nanostructures to be patterned using single exposures. There are several key advantages including low equipment cost, facile structure design, and patterning scalability, which will be discussed in detail. We will outline the underlying optical effects, review the geometries that can be fabricated, discuss key limitations, and highlight potential applications in nanophotonics, optoelectronic devices, and nanoarchitectured materials.
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Affiliation(s)
- Xu A Zhang
- Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, PA 19104, United States of America
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Wang M, Jiang L, Wang S, Guo Q, Tian F, Chu Z, Zhang J, Li X, Lu Y. Multiscale Visualization of Colloidal Particle Lens Array Mediated Plasma Dynamics for Dielectric Nanoparticle Enhanced Femtosecond Laser-Induced Breakdown Spectroscopy. Anal Chem 2019; 91:9952-9961. [PMID: 31266295 DOI: 10.1021/acs.analchem.9b01686] [Citation(s) in RCA: 25] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/01/2023]
Abstract
A multiscale visualization of silica colloidal particle lens array (CPLA) assisted laser ablation of copper is investigated. The distributed holes on a crater of CPLA-deposited Cu (CPLA-Cu) show a near-field effect by the silica nanoparticles (NPs), and the plasma emission signal of CPLA-Cu is 3-5 times as strong as that of Cu. Time-resolved plasma expansion, shockwave propagation, plasma plume emission, and nanoparticle distribution are observed and analyzed for ablations on both Cu and CPLA-Cu substrates. The initial expansion of plasma generated on CPLA-Cu is faster than that of pristine Cu. The shockwave of CPLA-Cu is rounder and its plasma plume is wider than those of Cu. The nanoparticle distribution shows a strong lateral collision during plume ejection for CPLA-Cu. Plasma characterization shows the increased plasma temperature is the key reason for femtosecond laser-induced breakdown spectroscopy (fs-LIBS) signal enhancement. This work demonstrates the signal enhancement effect of dielectric NPs on fs-LIBS and provides insights into hydrodynamics of the fs laser-induced plasma generated on CPLA-deposited substrate.
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Affiliation(s)
- Mengmeng Wang
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Lan Jiang
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Sumei Wang
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China.,Department of Mechanical and Mechatronics Engineering , University of Waterloo , Waterloo , Ontario N2L 3G1 , Canada
| | - Qitong Guo
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Feng Tian
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Zhuyuan Chu
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Jin Zhang
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Xin Li
- Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering , Beijing Institute of Technology , Beijing 100081 , China
| | - Yongfeng Lu
- Department of Electrical and Computer Engineering , University of Nebraska-Lincoln , Lincoln , Nebraska 68588-0511 , United States
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Li Z, Wang G, Zhang C, Wei C, Wang X, Gao Y, Li H, Huang X, Yuan H, Lu G. Silver Nanowire‐Templated Molecular Nanopatterning and Nanoparticle Assembly for Surface‐Enhanced Raman Scattering. Chemistry 2019; 25:10561-10565. [DOI: 10.1002/chem.201901313] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/20/2019] [Indexed: 12/31/2022]
Affiliation(s)
- Zhuoyao Li
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Guilin Wang
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Chengyu Zhang
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Cong Wei
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Xiang Wang
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Yongqian Gao
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Hai Li
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Xiao Huang
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
| | - Haifeng Yuan
- Departement ChemieKU Leuven Celestijnenlaan 200F 3001 Heverlee Belgium
| | - Gang Lu
- Key Laboratory of Flexible Electronics (KLOFE) and Institute of, Advanced Materials (IAM)Jiangsu National Synergistic Innovation Center for Advanced Materials (SICAM)Nanjing Tech University (NanjingTech) 30 South Puzhu Road Nanjing 211816 China
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Abstract
Colloidal transformation based on simple physicochemical processes has produced a wide variety of functional structures for different applications. But the lack of local selectivity of conventional transformation methods makes the fabrication of nanodevices with desired optical properties challenging. Here, we use a laser beam to transform spherical polystyrene (PS) beads into bull's eye-shaped nanopatterns or concentric nanorings, depending on the time of irradiation. The final morphologies are dependent on the size of the PS beads and the dielectric nature of the substrates. The simulated near field features show that it is the selective hollowing of PS beads that results in collapsing and buckling of the shells. This understanding provides a new route towards unconventional colloidal nanostructures and defect engineering in 2D photonic crystals that can be locally and selectively controlled by light.
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Affiliation(s)
- Shuangshuang Wang
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education of China, School of Physics and Technology, Wuhan University, China.
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Mireles M, Gaborski TR. Fabrication techniques enabling ultrathin nanostructured membranes for separations. Electrophoresis 2017; 38:2374-2388. [PMID: 28524241 PMCID: PMC5909070 DOI: 10.1002/elps.201700114] [Citation(s) in RCA: 27] [Impact Index Per Article: 3.9] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/13/2017] [Revised: 05/01/2017] [Accepted: 05/11/2017] [Indexed: 11/09/2022]
Abstract
The fabrication of nanostructured materials is an area of continuous improvement and innovative techniques that fulfill the demand of many fields of research and development. The continuously decreasing size of the smallest patternable feature has expanded the catalog of methods enabling the fabrication of nanostructured materials. Several of these nanofabrication techniques have sprouted from applications requiring nanoporous membranes such as molecular separations, cell culture, and plasmonics. This review summarizes methods that successfully produce through-pores in ultrathin films exhibiting an approximate pore size to thickness ratio of one, which has been shown to be beneficial due to high permeability and improved separation potential. The material reviewed includes large-area, parallel, and affordable approaches such as self-organizing polymers, nanosphere lithography, anodization, nanoimprint lithography as well as others such as solid phase crystallization and nanosphere lens lithography. The aim of this review is to provide a set of inexpensive fabrication techniques to produce nanostructured materials exhibiting pores ranging from 10 to 350 nm and a pore size to thickness ratio close to one. The fabrication methods described in this work have reported the successful manufacture of nanoporous membranes exhibiting the ideal characteristics to improve selectivity and permeability when applied as separation media in ultrafiltration.
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Affiliation(s)
- Marcela Mireles
- Biomedical Engineering Department, Rochester Institute of Technology, Rochester, NY, USA
| | - Thomas R Gaborski
- Biomedical Engineering Department, Rochester Institute of Technology, Rochester, NY, USA
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Lotito V, Zambelli T. Approaches to self-assembly of colloidal monolayers: A guide for nanotechnologists. Adv Colloid Interface Sci 2017; 246:217-274. [PMID: 28669390 DOI: 10.1016/j.cis.2017.04.003] [Citation(s) in RCA: 100] [Impact Index Per Article: 14.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/21/2016] [Revised: 04/04/2017] [Accepted: 04/05/2017] [Indexed: 01/08/2023]
Abstract
Self-assembly of quasi-spherical colloidal particles in two-dimensional (2D) arrangements is essential for a wide range of applications from optoelectronics to surface engineering, from chemical and biological sensing to light harvesting and environmental remediation. Several self-assembly approaches have flourished throughout the years, with specific features in terms of complexity of the implementation, sensitivity to process parameters, characteristics of the final colloidal assembly. Selecting the proper method for a given application amidst the vast literature in this field can be a challenging task. In this review, we present an extensive classification and comparison of the different techniques adopted for 2D self-assembly in order to provide useful guidelines for scientists approaching this field. After an overview of the main applications of 2D colloidal assemblies, we describe the main mechanisms underlying their formation and introduce the mathematical tools commonly used to analyse their final morphology. Subsequently, we examine in detail each class of self-assembly techniques, with an explanation of the physical processes intervening in crystallization and a thorough investigation of the technical peculiarities of the different practical implementations. We point out the specific characteristics of the set-ups and apparatuses developed for self-assembly in terms of complexity, requirements, reproducibility, robustness, sensitivity to process parameters and morphology of the final colloidal pattern. Such an analysis will help the reader to individuate more easily the approach more suitable for a given application and will draw the attention towards the importance of the details of each implementation for the final results.
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Protière S, Josserand C, Aristoff JM, Stone HA, Abkarian M. Sinking a Granular Raft. PHYSICAL REVIEW LETTERS 2017; 118:108001. [PMID: 28339259 DOI: 10.1103/physrevlett.118.108001] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/25/2016] [Indexed: 06/06/2023]
Abstract
We report experiments that yield new insights on the behavior of granular rafts at an oil-water interface. We show that these particle aggregates can float or sink depending on dimensionless parameters taking into account the particle densities and size and the densities of the two fluids. We characterize the raft shape and stability and propose a model to predict its shape and maximum length to remain afloat. Finally we find that wrinkles and folds appear along the raft due to compression by its own weight, which can trigger destabilization. These features are characteristics of an elastic instability, which we discuss, including the limitations of our model.
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Affiliation(s)
- Suzie Protière
- CNRS UMR 7190, Sorbonne Universités, UPMC Univ Paris 06, Institut Jean Le Rond d'Alembert, F-75005 Paris, France
| | - Christophe Josserand
- CNRS UMR 7190, Sorbonne Universités, UPMC Univ Paris 06, Institut Jean Le Rond d'Alembert, F-75005 Paris, France
| | - Jeffrey M Aristoff
- Numerica Corporation, 5042 Technology Parkway, Suite 100, Fort Collins, Colorado 80528, USA
| | - Howard A Stone
- Department of Mechanical and Aerospace Engineering, Princeton University, Princeton, New Jersey 08544, USA
| | - Manouk Abkarian
- CNRS UMR 5048, University Montpellier, Centre de Biochimie Structurale, 34090 Montpellier, France
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