Efficient photochemical denitrification by UV/sulfite system: Mechanism and applications

New insights into extracellular polymeric substance degradation during dewaterability of sludge by UV-driven advanced reduction processes: Role of hydrated electron and spectroscopic profiling of dissolved organic components in sludge filtrate

Currently, Advanced Reduction Process (ARP) is gaining popularity as an alternative to Advanced Oxidation Process (AOP). Though UV/Sulfite process is effective in degrading organic compounds, no investigation has been done using ARP to improve sludge dewaterability. Here, effect of two different ARP's (UV/Sulfite; UV/Sulfide) that generates hydrated electron (eaq-) and hydrogen atom (H•) in enhancing sludge dewatering was explored. Based on findings, alkaline pH was favourable for ARP's to improve sludge dewatering. At optimal conditions, CST value was 18 and 23.3 s for UV/Sulfite and UV/Sulfide with raw sludge exhibiting 100 s at pH-7.7 respectively. The mechanism revealed that eaq- was the dominant reducing radical along with H•, based on EPR spectra and quenching experiments. UV-Vis, Gaussian fitting, 3D EEM Fluorescence and Synchronous Fluorescence Spectroscopy exhibited higher release of organic matter and aromaticity which agrees with FTIR analysis. Emission peak around 330-380 nm in all samples exhibited Microbial Soluble Products and aromatic protein II.

Efficient reductive recovery of arsenic from acidic wastewater by a UV/dithionite process

The removal of arsenic (As(III)) from acidic wastewater using neutralization or sulfide precipitation generates substantial arsenic-containing hazardous solid waste, posing significant environmental challenges. This study proposed an advanced ultraviolet (UV)/dithionite reduction method to recover As(III) in the form of valuable elemental arsenic (As(0)) from acidic wastewater, thereby avoiding hazardous waste production. The results showed that more than 99.9 % of As(III) was reduced to As(0) with the residual concentration of arsenic below 25.0 μg L-1 within several minutes when the dithionite/As(III) molar ratio exceeded 1.5:1 and the pH was below 4.0. The content of As(0) in precipitate reached 99.70 wt%, achieving the purity requirements for commercial As(0) products. Mechanistic investigations revealed that SO2·‒ and H· radicals generated by dithionite photolysis under UV irradiation are responsible for reducing As(III) to As(0). Dissolved O2, Fe(III), Fe(II), Mn(II), dissolved organic matter (DOM), and turbidity slightly inhibited As(III) reduction via free radicals scavenging or light blocking effect, whereas other coexisting ions, such as Mg(II), Zn(II), Cd(II), Ni(II), F(-I), and Cl(-I), had limited influence on As(III) reduction. Moreover, the cost of treating real arsenic-containing (250.3 mg L-1) acidic wastewater was estimated to be as low as $0.668 m-3, demonstrating the practical applicability of this method. This work provides a novel method for the reductive recovery of As(III) from acidic wastewater.

Efficient Decomposition of Perfluoroalkyl Substances by Low Concentration Indole: New Insights into the Molecular Mechanisms

Perfluoroalkyl substances (PFAS) are a class of persistent organic pollutants known as "forever chemicals". Currently, the hydrated electron-based advanced reduction process (ARP) holds promise for the elimination of PFAS. However, the efficiency of ARP is often challenged by an oxygen-rich environment, resulting in the consumption of hydrated electron source materials in exchange for the high PFAS decomposition efficiency. Herein, we developed a ternary system constructed by indole and isopropyl alcohol (IPA), and the addition of IPA significantly enhanced the PFOA degradation and defluorination efficiency in the presence of low-concentration indole (<0.4 mM). Meanwhile, opposite results were obtained with a higher amount of indole (>0.4 mM). Further exploring the molecular mechanism of the reaction system, the addition of IPA played two roles. On one hand, IPA built an anaerobic reaction atmosphere and improved the yield and utilization efficiency of hydrated electrons with a low concentration of indole. On the other hand, IPA suppressed the attraction between indole and PFOA, thus reducing the hydrated electron transfer efficiency, especially with more indole. In general, the indole/PFAS/IPA system significantly improved the PFAS destruction efficiency with a small amount of hydrated electron donors, which provided new insights for development of simple and efficient techniques for the treatment of PFAS-contaminated wastewater.

Differences between reductive defluorination of perfluorooctanoic acid by chlorination, bromination, and iodization in the vacuum-ultraviolet/sulfite process

The introduction of iodide (I-) has broad perspectives on the decomposition of perfluorocarboxylates (PFCAs, CnF2n+1COO-). However, the iodinated substances produced are highly toxic synthetic chemicals, hence, it is urgent to find a similar alternative with less toxicity. In this work, the defluorination of perfluorooctanoic acid (PFOA) by I-, bromide (Br-) and chlorine (Cl-) was systematically compared in the VUV/sulfite process. Results indicated that the PFOA defluorination rates increased with increasing nucleophilicity of halogens (I > Br > Cl). Meanwhile, the introduction of I-, Br-, and Cl- reduced the interference of the coexisting water matrix on the degrading influence of PFOA. The in situ produced eaq-, SO3•-, H•, and HO• were recognized, among the addition of I- maximized the relative contribution of eaq- but Br- and Cl- decreased that of H• and other radicals. Additionally, HPLC/MS analysis revealed the presence of I-, Br-, and Cl- had a vital impact on the difference in product concentrations, while they had a negligible effect on the change in the pathway of degradation. Overall, this study demonstrated the similarities and differences between I-, Br-, and Cl-, which has significant implications for further understanding VUV/sulfite degradation.

Degradation of metoprolol by UV/sulfite as an advanced oxidation or reduction process: The significant role of oxygen

The degradation of metoprolol (MTP) by the UV/sulfite with oxygen as an advanced reduction process (ARP) and that without oxygen as an advanced oxidation process (AOP) was comparatively studied herein. The degradation of MTP by both processes followed the first-order rate law with comparable reaction rate constants of 1.50×10^-3sec^-1 and 1.20×10^-3sec^-1, respectively. Scavenging experiments demonstrated that both e_aq^- and H• played a crucial role in MTP degradation by the UV/sulfite as an ARP, while SO₄^•- was the dominant oxidant in the UV/sulfite AOP. The degradation kinetics of MTP by the UV/sulfite as an ARP and AOP shared a similar pH dependence with a minimum rate obtained around pH 8. The results could be well explained by the pH impacts on the MTP speciation and sulfite species. Totally six transformation products (TPs) were identified from MTP degradation by the UV/sulfite ARP, and two additional ones were detected in the UV/sulfite AOP. The benzene ring and ether groups of MTP were proposed as the major reactive sites for both processes based on molecular orbital calculations by density functional theory (DFT). The similar degradation products of MTP by the UV/sulfite process as an ARP and AOP indicated that e_aq^-/H• and SO₄^•- might share similar reaction mechanisms, primarily including hydroxylation, dealkylation, and H abstraction. The toxicity of MTP solution treated by the UV/sulfite AOP was calculated to be higher than that in the ARP by the Ecological Structure Activity Relationships (ECOSAR) software, due to the accumulation of TPs with higher toxicity.

Selective and effective oxidation of ammonium to dinitrogen in MgO/Na2SO3/K2S2O8 system

The oxidation of ammonium (NH₄⁺) to dinitrogen (N₂) with high selectivity and high efficiency is still a challenge. Herein, a novel sunlight induced persulfate (PS)-based AOPs process (MgO/Na₂SO₃/PS/hv) was proposed by introducing solid base (MgO) and hydrated electron (e_aq^-), to selectively oxidize NH₄⁺ to N₂, with high selectivity and high efficiency at a wide range of pH value. The deprotonation of NH₄⁺ into NH₃ by MgO and the generation of •OH and SO₄^-• by PS activation were responsible for the high efficiency of NH₄⁺ oxidation. The buffering capacity provided by MgO to proton released from PS activation made the NH₄⁺ oxidation possible at a wide pH range. The e_aq^- from the Na₂SO₃/hv process was the main active specie to reduce NO₂^-and NO₃^- (NO_x^-) into N₂, responsible for high N₂ selectivity of NH₄⁺ oxidation. 100% NH₄⁺ could be oxidized within 30 min, and N₂ selectivity exceeded 96% at the initial pH range of 3-11 and the initial concentration of NH₄⁺ of 30 mg N/L. This work could offer an efficient AOPs process for selective NH₄⁺ oxidation, which is promising for the chemical denitrification of wastewater ….

Source preventing mechanism of florfenicol resistance risk in water by VUV/UV/sulfite advanced reduction pretreatment

To avoid the inhibition of microbial activity and the emergence of bacterial resistance, effective abiotic pretreatment methods to eliminate the antibacterial activity of target antibiotics before the biotreatment system for antibiotic-containing wastewater are necessary. In this study, the VUV/UV/sulfite system was developed as a pretreatment technique for the source elimination of florfenicol (FLO) resistance risk. Compared with the VUV/UV/persulfate and sole VUV photolysis, the VUV/UV/sulfite system had the highest decomposition rate (0.33 min^‒1) and the highest defluorination (83.0%), resulting in the efficient elimination of FLO antibacterial activity with less than 2.0% mineralization, which would effectively retain the carbon sources for the sludge microorganisms in the subsequent biotreatment process. Furthermore, H• was confirmed to play a more important role in the elimination of FLO antibacterial activity by controlling the environmental conditions for the formation and transformation of reactive species and adding their scavengers. Based on the theoretical calculation and proposed photolytic intermediates, the elimination of FLO antibacterial activity was achieved by dechlorination, defluorination and removal of sulfomethyl groups. When the pretreated FLO-containing wastewater entered the biological treatment unit, the abundance of associated antibiotic resistance genes (ARGs) and the relative abundance of integrons were efficiently prevented by approximately 55.4% and 22.9%, respectively. These results demonstrated that the VUV/UV/sulfite system could be adopted as a promising pretreatment option for the source elimination of FLO resistance risk by target decomposition of its responsible structures before the subsequent biotreatment process.

Nitrate promoted defluorination of perfluorooctanoic acid in UV/sulfite system: Coupling hydrated electron/reactive nitrogen species-mediated reduction and oxidation

A significantly accelerated defluorination of recalcitrant perfluorooctanoic acid (PFOA) was explored with the co-present nitrate (20 mg L^-1) by UV/sulfite treatment (UV/sulfite-nitrate). The deep defluorination of PFOA and complete denitrification of nitrate were simultaneously achieved in UV/sulfite-nitrate system. At the initial 30 min, PFOA defluorination exhibited an induction period, exactly corresponding to the removal of the co-existed nitrate. Upon the induction period passed, an accelerated removal of PFOA (5 mg L^-1) occurred, nearly 100% defluorination ratio reached within 2 h. Compared with those in UV/sulfite, the kinetics of PFOA decay, defluorination, and transformation product formations were greatly enhanced in UV/sulfite-nitrate system. Reactive nitrogen species (RNS) generated from e_aq^--induced reduction of nitrate were found to play significant roles on the promoted defluorination apart from e_aq^--mediated reductive defluorination. The investigations on solution pH (7.0-11.0) confirmed that the reductive defluorination of PFOA was more efficient under alkaline conditions, however, the presence of nitrate can promote the defluorination even under neutral pH. Theoretical calculations of Fukui function demonstrated that RNS could easily launch electrophilic attack toward H-rich moieties of fluorotelomer carboxylates (FTCAs, C_nF_2n+1-(CH₂)_m-COO^-), more persistent intermediates (formed via H/F exchange), and convert FTCAs into shorter-chain perfluorinated carboxylic acids, thus facilitating the deep defluorination. Along with the analysis on the denitrification products, the liberation of fluoride ions and generated intermediates, possible decomposition pathways were proposed. This work highlights the indispensable synergy from e_aq^-/RNS with integrated reduction and oxidation on PFOA defluorination and will advance remediation technologies of perfluorinated compound contaminated water.

Hydrated electron based photochemical processes for water treatment

Hydrated electron (e_aq^-) based photochemical processes have emerged as a promising technology for contaminant removal in water due to the mild operating conditions. This review aims to provide a comprehensive and up-to-date summary on e_aq^- based photochemical processes for the decomposition of various oxidative contaminants. Specifically, the characteristics of different photo-reductive systems are first elaborated, including the environment required to generate sufficient e_aq^-, the advantages and disadvantages of each system, and the comparison of the degradation efficiency of contaminants induced by e_aq^-. In addition, the identification methods of e_aq^- (e.g., laser flash photolysis, scavenging studies, chemical probes and electron spin resonance techniques) are summarized, and the influences of operating conditions (e.g., solution pH, dissolved oxygen, source chemical concentration and UV type) on the performance of contaminants are also discussed. Considering the complexity of contaminated water, particular attention is paid to the influence of water matrix (e.g., coexisting anions, alkalinity and humic acid). Moreover, the degradation regularities of various contaminants (e.g., perfluorinated compounds, disinfection by-products and nitrate) by e_aq^- are summarized. We finally put forward several research prospects for the decomposition of contaminants by e_aq^- based photochemical processes to promote their practical application in water treatment.

Efficient degradation and deiodination of iopamidol by UV/sulfite process: Assessment of typical process parameters and transformation paths

Iopamidol (IPM) is widely used in medical clinical examination and treatment and has immeasurable harm to the ecological environment. The combination of UV and sulfite (UV/sulfite) process was developed to degrade IPM in this study. In contrast to that almost no removal of IPM was observed under sulfite reduction alone, the UV/sulfite process could efficiently reductively degrade IPM with the observed rate constant (k_obs) of 2.08 min^-1, which was nearly 4 times that of UV irradiation alone. The major active species in the UV/sulfite process were identified as hydrated electrons (e_aq^-) by employing active species scavengers. The influence of the initial pH, sulfite dosage, IPM concentration, UV intensity and common water matrix were evaluated. The degradation of IPM reached nearly 100% within only 2.5 min at pH 9, and k_obs increased at higher initial sulfite dosages and greater UV intensities. HCO₃^- had a limited effect on the degradation of IPM, while humic acid (HA) was found to be a strong inhibitor in the UV/sulfite process. With the synergistic action of UV/sulfite, most of the iodine in IPM was found to release in the form of iodide ions (up to approximately 98%), and a few formed iodide-containing organic compounds, reducing significantly the toxicity of degradation products. Under direct UV irradiation and free radical reduction (mainly e_aq^-), 15 transformation intermediates of IPM were produced by amide hydrolysis, deiodination, hydroxyl radical addition and hydrogen abstraction reactions, in which free radical attack accounted for the main part. Consequently, the UV/sulfite process has a strong potential for IPM degradation in aquatic environments.

Reductive removal of As(V) and As(III) from aqueous solution by the UV/sulfite process: Recovery of elemental arsenic

The removal of arsenic (As(V) and As(III)) from contaminated water has attracted great attention. However, the generation of arsenic-containing hazardous waste by traditional methods has become an inevitable environmental problem. Herein, a UV/sulfite advanced reduction method was proposed to remove As(V) and As(III) from aqueous solution in the form of valuable elemental arsenic (As(0)), thus avoiding the generation of arsenic-containing hazardous waste. The results showed that greater than 99.9% of As(V) and As(III) were reduced to the high purity As(0) (> 99.5 wt%) with the residual arsenic concentration below 10 μg L^-1. The hydrated electrons (e_aq^-), H^• and SO₃^•- radicals are generated by the UV/sulfite process, of which e_aq^- and H^• serve as reductants of As(V) and As(III) while the SO₃^•- radicals inhibit arsenic reduction by oxidizing arsenic. The effective quantum efficiency (Φ) for the formation of As(0) in the As(V) and As(III) removal process is approximately 0.0078 and 0.0055 mol/Einstein, respectively. The reduction of arsenic is favorable under alkaline conditions (pH > 9.0) due to the higher photolysis efficiency of SO₃^2- than HSO₃^- (pK_a = 7.2) and higher stability of e_aq^-/H^• under alkaline conditions. The presence of dissolved oxygen (O₂), NO₂^-, NO₃^-, CO₃^2-, PO₄^3- and humic acid (HA) inhibited arsenic reduction through light blocking or e_aq^-/H^• scavenging effects while Cl^-, SO₄^2-, Ca²⁺ and Mg²⁺ had negligible effects on arsenic reduction. The proposed method can effectively remove and recover arsenic from contaminated water at a low cost, demonstrating feasibility for practical application. This study provides a novel technology for the reductive removal and recovery of arsenic from contaminated water.

Quantifying Hydrated Electron Transformation Kinetics in UV-Advanced Reduction Processes Using the Re-,UV Method

Ultraviolet advanced reduction processes (UV-ARP) have garnered significant attention recently for the degradation of several hard to treat contaminants, including recalcitrant per- and polyfluoroalkyl substances (PFAS). The rate of contaminant degradation in UV-ARP is directly related to the available hydrated electron concentration ([e_aq^-]). However, reports of [e_aq^-] and other parameters typically used to characterize photochemical systems are not widely reported in the UV-ARP literature. Deploying monochloroacetate as a probe compound, we developed a method (R_e-,UV) to quantify the time-based hydrated electron concentration ([e_aq]_t) available for contaminant degradation relative to inputted UV fluence. Measured [e_aq]_t was then used to understand the impact of e_aq^- rate of formation and scavenging capacity on the degradation of two contaminants─nitrate and perfluorooctane sulfonate (PFOS)─in four source waters with varying background water quality. The results show that the long-term treatability of PFOS by UV-ARP is not significantly impacted by the initial e_aq^- scavenging conditions but rather is influenced by the presence of e_aq^- scavengers like dissolved organic carbon and bicarbonate. Lastly, using [e_aq]_t, degradation of nitrate and PFOS was modeled in the source waters. We demonstrate that the R_e-,UV method provides an effective tool to assess UV-ARP treatment performance in a variety of source waters.

Reductive Removal and Recovery of As(V) and As(III) from Strongly Acidic Wastewater by a UV/Formic Acid Process

The removal of arsenic (As(V) and As(III)) from strongly acidic wastewater using traditional neutralization or sulfuration precipitation methods produces a large amount of arsenic-containing hazardous wastes, which poses a potential threat to the environment. In this study, an ultraviolet/formic acid (UV/HCOOH) process was proposed to reductively remove and recover arsenic from strongly acidic wastewater in the form of valuable elemental arsenic (As(0)) products to avoid the generation of hazardous wastes. We found that more than 99% of As(V) and As(III) in wastewater was reduced to highly pure solid As(0) (>99.5 wt %) by HCOOH under UV irradiation. As(V) can be efficiently reduced to As(IV) (H₂AsO₃ or H₄AsO₄) by hydrogen radicals (H^•) generated from the photolysis of HCOOH through dehydroxylation or hydrogenation. Then, As(IV) is reduced to As(III) by H^• or through its disproportionation. The reduction of As(V) to H₄AsO₄ by H^• and the disproportionation of H₄AsO₄ are the main reaction processes. Subsequently, As(III) is reduced to As(0) not only by H^• through stepwise dehydroxylation but also through the disproportionation of intermediate arsenic species As(II) and As(I). With additional density functional theory calculations, this study provides a theoretical foundation for the reductive removal of arsenic from acidic wastewater.

Critical Review of UV-Advanced Reduction Processes for the Treatment of Chemical Contaminants in Water

UV-advanced reduction processes (UV-ARP) are an advanced water treatment technology characterized by the reductive transformation of chemical contaminants. Contaminant abatement in UV-ARP is most often accomplished through reaction with hydrated electrons (e_aq ^-) produced from UV photolysis of chemical sensitizers (e.g., sulfite). In this Review, we evaluate the photochemical kinetics, substrate scope, and optimization of UV-ARP. We find that quantities typically reported in photochemical studies of natural and engineered systems are under-reported in the UV-ARP literature, especially the formation rates, scavenging capacities, and concentrations of key reactive species like e_aq ^-. The absence of these quantities has made it difficult to fully evaluate the impact of operating conditions and the role of water matrix components on the efficiencies of UV-ARP. The UV-ARP substrate scope is weighted heavily toward contaminant classes that are resistant to degradation by advanced oxidation processes, like oxyanions and per- and polyfluoroalkyl substances. Some studies have sought to optimize the UV-ARP treatment of these contaminants; however, a thorough evaluation of the impact of water matrix components like dissolved organic matter on these optimization strategies is needed. Overall, the data compilation, analysis, and research recommendations provided in this Review will assist the UV-ARP research community in future efforts toward optimizing UV-ARP systems, modeling the e_aq ^--based chemical transformation kinetics, and developing new UV-ARP systems.

Efficient reductive and oxidative decomposition of haloacetic acids by the vacuum-ultraviolet/sulfite system

Haloacetic acids (HAAs), as a representative category of halogenated disinfection byproducts, are widely detected in disinfected water. In this work, the vacuum ultraviolet (VUV)/sulfite process under N₂ saturated conditions was proposed to eliminate a series of HAAs (i.e., monochloroacetic acid (MCAA), difluoroacetic acid (DFAA), trifluoroacetic acid (TFAA), dichloroacetic acid (DCAA), etc.). The in situ generated hydrated electron (e_aq^-) demonstrated to be the main species to fulfill the initial degradation and dechlorination of MCAA, while hydroxyl radicals (˙OH) were in charge of the mineralization of MCAA. This means that the VUV/sulfite system is a combination of advanced reduction and oxidation processes (ARPs and AOPs). A significant enhancement of MCAA removal was observed with increasing pH values from 6.0 to 10.0, and surprisingly, k_obs correlated well with the proportion of SO₃^2- as the pH changed. This can be explained by the production of e_aq^- from VUV irradiation of SO₃^2- rather than HSO₃^- and also due to e_aq^- being more stable under alkaline conditions. Increasing the sulfite dosage also elevated the degradation of MCAA. However, the addition of certain anions (i.e., chloride (Cl^-), bicarbonate (HCO₃^-), and nitrate (NO₃^-)) and dissolved organic matter (DOM) inhibited the removal of MCAA to varying degrees. The VUV/sulfite system was effective toward various types of halogenated disinfection byproducts, supporting its broad applicability. Nevertheless, even in real waters, the VUV/sulfite system was also promising for the simultaneous abatement of HAAs and other oxyanions.