Atmospheric-pressure plasma-enhanced chemical vapor deposition of microporous silica membranes for gas separation

Enhanced Corrosion Protection of Printed Circuit Board Electronics using Cold Atmospheric Plasma-Assisted SiOx Coatings

The miniaturization and widespread deployment of electronic devices across diverse environments have heightened their vulnerability to corrosion, particularly affecting copper traces within printed circuit boards (PCBs). Conventional protective methods, such as conformal coatings, face challenges including the necessity for a critical thickness to ensure effective barrier properties and the requirement for multiple steps of drying and curing to eliminate solvent entrapment within polymer coatings. This study investigates cold atmospheric plasma (CAP) as an innovative technique for directly depositing ultrathin silicon oxide (SiOx) coatings onto copper surfaces to enhance corrosion protection in PCBs. A systematic investigation was undertaken to examine how the scanning speed of the CAP deposition head impacts the film quality and corrosion resistance. The research aims to determine the optimal scanning speed of the CAP deposition head that achieves complete surface coverage while promoting effective cross-linking and minimizing unreacted precursor entrapment, resulting in superior electrical barrier and mechanical properties. The CAP coating process demonstrated the capability of depositing SiOx onto copper surfaces at various thicknesses ranging from 70 to 1110 nm through a single deposition process by simply adjusting the scanning speed of the plasma head (5-75 mm/s). Evaluation of material corrosion barrier characteristics revealed that scanning speeds of 45 mm/s of the plasma deposition head provided an effective coating thickness of 140 nm, exhibiting superior corrosion resistance (30-fold) compared to that of uncoated copper. As a proof of concept, the efficacy of CAP-deposited SiOx coatings was demonstrated by protecting an LED circuit in saltwater and by coating printed circuits for potential agricultural sensor applications. These CAP-deposited coatings offer performance comparable to or superior to traditional conformal polymeric coatings. This research presents CAP-deposited SiOx coatings as a promising approach for effective and scalable corrosion protection in miniaturized electronics.

Synergic Antitumor Effect of Photodynamic Therapy and Chemotherapy Mediated by Nano Drug Delivery Systems

This review provides a summary of recent progress in the development of different nano-platforms for the efficient synergistic effect between photodynamic therapy and chemotherapy. In particular, this review focuses on various methods in which photosensitizers and chemotherapeutic agents are co-delivered to the targeted tumor site. In many cases, the photosensitizers act as drug carriers, but this review, also covers different types of appropriate nanocarriers that aid in the delivery of photosensitizers to the tumor site. These nanocarriers include transition metal, silica and graphene-based materials, liposomes, dendrimers, polymers, metal–organic frameworks, nano emulsions, and biologically derived nanocarriers. Many studies have demonstrated various benefits from using these nanocarriers including enhanced water solubility, stability, longer circulation times, and higher accumulation of therapeutic agents/photosensitizers at tumor sites. This review also describes novel approaches from different research groups that utilize various targeting strategies to increase treatment efficacy through simultaneous photodynamic therapy and chemotherapy.

The Evaluation of Counter Diffusion CVD Silica Membrane Formation Process by In Situ Analysis of Diffusion Carrier Gas

A new evaluation method for preparing silica membranes by counter diffusion chemical vapor deposition (CVD) was proposed. This is the first attempt to provide new insights, such as the decomposition products, membrane selectivity, and precursor reactivity. The permeation of the carrier gas used for supplying a silica precursor was quantified during the deposition reaction by using a mass spectrometer. Membrane formation processes were evaluated by the decrease of the permeation of the carrier gas derived from pore blocking of the silica deposition. The membrane formation processes were compared for each deposition condition and precursor, and the apparent silica deposition rates from the precursors such as tetramethoxysilane (TMOS), hexyltrimethoxysilane (HTMOS), or tetraethoxysilane (TEOS) were investigated by changing the deposition temperature at 400–600 °C. The apparent deposition rates increased with the deposition temperature. The apparent activation energies of the carrier gas through the TMOS, HTMOS, and TEOS derived membranes were 44.3, 49.4, and 71.0 kJ mol⁻¹, respectively. The deposition reaction of the CVD silica membrane depends on the alkoxy group of the silica precursors.

Plasma and Polymers: Recent Progress and Trends

Plasma-enhanced synthesis and modification of polymers is a field that continues to expand and become increasingly more sophisticated. The highly reactive processing environments afforded by the inherently dynamic nature of plasma media are often superior to ambient or thermal environments, offering substantial advantages over other processing methods. The fluxes of energy and matter toward the surface enable rapid and efficient processing, whereas the charged nature of plasma-generated particles provides a means for their control. The range of materials that can be treated by plasmas is incredibly broad, spanning pure polymers, polymer-metal, polymer-wood, polymer-nanocarbon composites, and others. In this review, we briefly outline some of the recent examples of the state-of-the-art in the plasma-based polymer treatment and functionalization techniques.

TiO2 Coatings Via Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition for Enhancing the UV-Resistant Properties of Transparent Plastics

Herein, TiO₂ coatings were deposited on photodegradable polymers for protection from UV irradiation using the atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) technique. Polymethylmethacrylate (PMMA) and polycarbonate (PC) substrates were coated with titanium tetraisopropoxide as the precursor in an open-air atmospheric-pressure nonequilibrium argon plasma jet. The AP-PECVD-derived TiO₂ coatings exhibited good adhesion to PMMA and PC. The TiO₂ coatings could shield more than 99% of UV light in the wavelength range of 200-300 nm, without affecting the transmittance of visible light. UV irradiation tests on polymer films demonstrated that the degradation rates of PMMA and PC were significantly reduced by one-tenth after they were coated with TiO₂ films.

Ultrafast Synthesis of Silica-Based Molecular Sieve Membranes in Dielectric Barrier Discharge at Low Temperature and Atmospheric Pressure

Microporous silica membranes have shown promise as potential candidates for energy-efficient chemical separation. Herein, we report the ultrafast synthesis of silica membranes, on the order of minutes, in atmospheric-pressure, low-temperature plasma. Direct deposition in the discharge region of atmospheric-pressure plasma enables the immediate formation of a thin silica layer on a porous substrate. The plasma-deposited layer had a thickness of ∼13 nm and was confined to the immediate surface of the substrate. With an increase in deposition temperature, we observed an increase in the inorganic nature of the plasma-deposited layer and simultaneous improvement in the membrane performance. Consequently, the resulting membranes exhibited outstanding permeance for small-sized gas molecules, such as H₂ (>10^-6 mol m^-2 s^-1 Pa^-1), with a high H₂/SF₆ permeance ratio of ∼6300, providing a nonthermal alternative for the fabrication of silica-based membranes.

Role of the Plasma Activation Degree on Densification of Organosilicon Films

The possibility of controlling the density of organosilicon films was investigated by tuning the plasma activation degree without providing extra energy to the structure, as usually reported in the literature. For this purpose, thin films were deposited in plasmas fed with hexamethyldisiloxane/Ar mixtures at a total pressure of 9.5 Pa. The power of the radiofrequency excitation signal, P, ranged from 50 to 300 W to alter the average energy of the plasma species while the electrical configuration was chosen to avoid direct ion bombardment of the growing films. In this way, it was possible to evaluate the effect of P on the film properties. Thickness and deposition rate were derived from profilometry data. X-ray energy dispersive and infrared spectroscopies were, respectively, applied to analyze the chemical composition and molecular structure of the layers. Surface topography and roughness were determined by atomic force microscopy while nanoindentation was used to evaluate the mechanical properties of the films. From electrochemical impedance spectroscopy the total resistance to the flow of electrolyte species was derived. The main alteration observed in the structure with changing P is related to the proportion of the methyl functional which remains connected to the Si backbone. Chain crosslinking and film density are affected by this structural modification induced by homogeneous and heterogeneous plasma reactions. The density increase resulted in a film with hardness comparable to that of the silica and more resistant to the permeation of oxidative species, but preserving the organosilicon nature of the structure.

Organosilica-Based Membranes in Gas and Liquid-Phase Separation

Organosilica membranes are a type of novel materials derived from organoalkoxysilane precursors. These membranes have tunable networks, functional properties and excellent hydrothermal stability that allow them to maintain high levels of separation performance for extend periods of time in either a gas-phase with steam or a liquid-phase under high temperature. These attributes make them outperform pure silica membranes. In this review, types of precursors, preparation method, and synthesis factors for the construction of organosilica membranes are covered. The effects that these factors exert on characteristics and performance of these membranes are also discussed. The incorporation of metals, alkoxysilanes, or other functional materials into organosilica membranes is an effective and simple way to improve their hydrothermal stability and achieve preferable chemical properties. These hybrid organosilica membranes have demonstrated effective performance in gas and liquid-phase separation.

Tailoring Ultramicroporosity To Maximize CO2 Transport within Pyrimidine-Bridged Organosilica Membranes

Amine-functionalized organosilica membranes have attracted an increasing amount of attention because of significant potential for the capture of postcombustion CO₂. The appealing separation performance of these membranes, however, is generally obtained via compromises to gas permeance. In the present study, a novel, ultramicroporosity-tailored composite (organo)silica membrane with high flux was synthesized via sol-gel cocondensation of a pyrimidine-bridged organoalkoxysilane precursor 4,6-bis(3-(triethoxysilyl)-1-propoxy)-1,3-pyrimidine (BTPP) with a second intrinsically rigid network precursor (1,2-bis(triethoxysilyl)ethane or tetraethylorthosilicate). The surface chemistry, ultramicroporosity, and chain-packing state of the initial BTPP-derived membranes can be carefully tuned, which has been verified via Fourier transform infrared spectroscopy, water-contact angle measurement, X-ray diffraction, and positron annihilation lifetime spectroscopy. The composite (organo)silica xerogel specimens presented a slightly improved ultramicroporosity with noticeable increases in gas adsorption (CO₂ and N₂). However, a surprising increase in CO₂ permeance (>2000 GPU), with moderate CO₂/N₂ selectivity (∼20), was observed in the resultant composite (organo)silica membranes. Furthermore, gas permeance of the composite membranes far surpassed the values based on Maxwell predictions, indicating a possible molecular-scale dispersion of the composite networks. This novel, porosity-tailored, high-flux membrane holds great potential for use in industrial postcombustion CO₂ capture.

UV-Protective TiO2 Thin Films with High Transparency in Visible Light Region Fabricated via Atmospheric-Pressure Plasma-Enhanced Chemical Vapor Deposition

This article focuses on control of film thickness and roughness to improve the ultraviolet (UV)-protective performance of TiO₂ films prepared by atmospheric-pressure plasma-enhanced chemical vapor deposition using titanium(IV) isopropoxide (TTIP) as the precursor and argon as the plasma working gas. The relationship between the film morphology and UV-protective performance suggested that a decrease in roughness is the key factor to achieve performance improvement. The effects of substrate temperature and precursor concentration were investigated, and the results showed that an increase in both substrate temperature and precursor concentration reduced the roughness and improved the transparency to visible light without reducing the ability to block UV light. Finally, a TiO₂ film with greater than 99% UV light blockage and greater than 95% transmittance of visible light was obtained.

Plasma Modification and Synthesis of Membrane Materials-A Mechanistic Review

Although commercial membranes are well established materials for water desalination and wastewater treatment, modification on commercial membranes is still necessary to deliver high-performance with enhanced flux and/or selectivity and fouling resistance. A modification method with plasma techniques has been extensively applied for high-performance membrane production. The paper presents a mechanistic review on the impact of plasma gas and polymerization, at either low pressure or atmospheric pressure on the material properties and performance of the modified membranes. At first, plasma conditions at low-pressure such as plasma power, gas or monomer flow rate, reactor pressure, and treatment duration which affect the chemical structure, surface hydrophilicity, morphology, as well as performance of the membranes have been discussed. The underlying mechanisms of plasma gas and polymerization have been highlighted. Thereafter, the recent research in plasma techniques toward membrane modification at atmospheric environment has been critically evaluated. The research focuses of future plasma-related membrane modification, and fabrication studies have been predicted to closely relate with the implementation of the atmospheric-pressure processes at the large-scale.