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Su Y, Zong A, Kogar A, Lu D, Hong SS, Freelon B, Rohwer T, Wang BY, Hwang HY, Gedik N. Delamination-Assisted Ultrafast Wrinkle Formation in a Freestanding Film. NANO LETTERS 2023. [PMID: 37988604 DOI: 10.1021/acs.nanolett.3c02898] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/23/2023]
Abstract
Freestanding films provide a versatile platform for materials engineering thanks to additional structural motifs not found in films with a substrate. A ubiquitous example is wrinkles, yet little is known about how they can develop over as fast as a few picoseconds due to a lack of experimental probes to visualize their dynamics in real time on the nanoscopic scale. Here, we use time-resolved electron diffraction to directly observe light-activated wrinkling formation in freestanding La2/3Ca1/3MnO3 films. Via a "lock-in" analysis of oscillations in the diffraction peak position, intensity, and width, we quantitatively reconstructed how wrinkles develop on the time scale of lattice vibration. Contrary to the common assumption of fixed boundary conditions, we found that wrinkle development is associated with ultrafast delamination at the film boundaries. Our work provides a generic protocol to quantify wrinkling dynamics in freestanding films and highlights the importance of the film-substrate interaction in determining the properties of freestanding structures.
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Affiliation(s)
- Yifan Su
- Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts 02139, United States
| | - Alfred Zong
- Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts 02139, United States
- University of California at Berkeley, Department of Chemistry, Berkeley, California 94720, United States
| | - Anshul Kogar
- Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts 02139, United States
| | - Di Lu
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
- SIMES, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States
| | - Seung Sae Hong
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
- SIMES, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States
| | - Byron Freelon
- Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts 02139, United States
| | - Timm Rohwer
- Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts 02139, United States
| | - Bai Yang Wang
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
- SIMES, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States
| | - Harold Y Hwang
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
- SIMES, SLAC National Accelerator Laboratory, Menlo Park, California 94025, United States
| | - Nuh Gedik
- Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts 02139, United States
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2
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Yang G, Dong G, Zhang B, Xu X, Zhao Y, Hu Z, Liu M. Twisted Integration of Complex Oxide Magnetoelectric Heterostructures via Water-Etching and Transfer Process. NANO-MICRO LETTERS 2023; 16:19. [PMID: 37975933 PMCID: PMC10656404 DOI: 10.1007/s40820-023-01233-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/26/2023] [Accepted: 10/09/2023] [Indexed: 11/19/2023]
Abstract
HIGHLIGHTS The (001)-oriented ferromagnetic La0.67Sr0.33MnO3 films are stuck onto the (011)-oriented ferroelectric single-crystal 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 substrate with 0° and 45° twist angle. By applying a 7.2 kV cm-1 electric field, the coexistence of uniaxial and fourfold in-plane magnetic anisotropy is observed in 45° Sample, while a typical uniaxial anisotropy is found in 0° Sample. Manipulating strain mode and degree that can be applied to epitaxial complex oxide thin films have been a cornerstone of strain engineering. In recent years, lift-off and transfer technology of the epitaxial oxide thin films have been developed that enabled the integration of heterostructures without the limitation of material types and crystal orientations. Moreover, twisted integration would provide a more interesting strategy in artificial magnetoelectric heterostructures. A specific twist angle between the ferroelectric and ferromagnetic oxide layers corresponds to the distinct strain regulation modes in the magnetoelectric coupling process, which could provide some insight in to the physical phenomena. In this work, the La0.67Sr0.33MnO3 (001)/0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 (011) (LSMO/PMN-PT) heterostructures with 45º and 0º twist angles were assembled via water-etching and transfer process. The transferred LSMO films exhibit a fourfold magnetic anisotropy with easy axis along LSMO < 110 >. A coexistence of uniaxial and fourfold magnetic anisotropy with LSMO [110] easy axis is observed for the 45° Sample by applying a 7.2 kV cm-1 electrical field, significantly different from a uniaxial anisotropy with LSMO [100] easy axis for the 0° Sample. The fitting of the ferromagnetic resonance field reveals that the strain coupling generated by the 45° twist angle causes different lattice distortion of LSMO, thereby enhancing both the fourfold and uniaxial anisotropy. This work confirms the twisting degrees of freedom for magnetoelectric coupling and opens opportunities for fabricating artificial magnetoelectric heterostructures.
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Affiliation(s)
- Guannan Yang
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China
| | - Guohua Dong
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China.
| | - Butong Zhang
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China
| | - Xu Xu
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China
| | - Yanan Zhao
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China
| | - Zhongqiang Hu
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China.
| | - Ming Liu
- State Key Laboratory for Manufacturing Systems Engineering, Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, Engineering Research Center of Spin Quantum Sensor Chips, Universities of Shaanxi Province, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an, 710049, People's Republic of China
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3
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Sheeraz M, Jung MH, Kim YK, Lee NJ, Jeong S, Choi JS, Jo YJ, Cho S, Kim IW, Kim YM, Kim S, Ahn CW, Yang SM, Jeong HY, Kim TH. Freestanding Oxide Membranes for Epitaxial Ferroelectric Heterojunctions. ACS NANO 2023. [PMID: 37406362 DOI: 10.1021/acsnano.3c01974] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/07/2023]
Abstract
Since facile routes to fabricate freestanding oxide membranes were previously established, tremendous efforts have been made to further improve their crystallinity, and fascinating physical properties have been also reported in heterointegrated freestanding membranes. Here, we demonstrate our synthetic recipe to manufacture highly crystalline perovskite SrRuO3 freestanding membranes using new infinite-layer perovskite SrCuO2 sacrificial layers. To accomplish this, SrRuO3/SrCuO2 bilayer thin films are epitaxially grown on SrTiO3 (001) substrates, and the topmost SrRuO3 layer is chemically exfoliated by etching the SrCuO2 template layer. The as-exfoliated SrRuO3 membranes are mechanically transferred to various nonoxide substrates for the subsequent BaTiO3 film growth. Finally, freestanding heteroepitaxial junctions of ferroelectric BaTiO3 and metallic SrRuO3 are realized, exhibiting robust ferroelectricity. Intriguingly, the enhancement of piezoelectric responses is identified in freestanding BaTiO3/SrRuO3 heterojunctions with mixed ferroelectric domain states. Our approaches will offer more opportunities to develop heteroepitaxial freestanding oxide membranes with high crystallinity and enhanced functionality.
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Affiliation(s)
- Muhammad Sheeraz
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Min-Hyoung Jung
- Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea
| | - Yoon Ki Kim
- Department of Physics, Sogang University, Seoul 04107, Republic of Korea
| | - Nyun-Jong Lee
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Seyeop Jeong
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Jin San Choi
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Yong Jin Jo
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Shinuk Cho
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Ill Won Kim
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Young-Min Kim
- Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea
| | - Sanghoon Kim
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Chang Won Ahn
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
| | - Sang Mo Yang
- Department of Physics, Sogang University, Seoul 04107, Republic of Korea
| | - Hu Young Jeong
- Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Republic of Korea
| | - Tae Heon Kim
- Department of Physics and Energy Harvest-Storage Research Center (EHSRC), University of Ulsan, Ulsan 44610, Republic of Korea
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Nian L, Li J, Wang Z, Zhang T, Sun H, Li Y, Gao T, Deng Y, Nie Y, Hao Y. Synthesis of Oxide Interface-Based Two-Dimensional Electron Gas on Si. ACS APPLIED MATERIALS & INTERFACES 2022; 14:53442-53449. [PMID: 36383755 DOI: 10.1021/acsami.2c18934] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Two-dimensional electron gas (2DEG) at the interface of amorphous Al2O3/SrTiO3 (aAO/STO) heterostructures has received considerable attention owing to its convenience of fabrication and relatively high mobility. The integration of these 2DEG heterostructures on a silicon wafer is highly desired for electronic applications but remains challanging up to date. Here, conductive aAO/STO heterostructures have been synthesized on a silicon wafer via a growth-and-transfer method. A scanning transmission electron microscopy image shows flat and close contact between STO membranes and a Si wafer. Electron energy loss spectroscopic measurements reveal the interfacial Ti valence state evolution, which identifies the formation of 2D charge carriers confined at the interface of aAO/STO. This work provides a feasible strategy for the integration of 2DEG on a silicon wafer and other desired substrates for potential functional and flexible electronic devices.
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Affiliation(s)
- Leyan Nian
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Jiayi Li
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Zhichao Wang
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Tingting Zhang
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Haoying Sun
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Yueying Li
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Tianyi Gao
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Yu Deng
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Yuefeng Nie
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
| | - Yufeng Hao
- National Laboratory of Solid State Microstructures, Jiangsu Key Laboratory of Artificial Functional Materials, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing, Jiangsu 210023, People's Republic of China
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5
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Huang J, Chen W. Flexible strategy of epitaxial oxide thin films. iScience 2022; 25:105041. [PMID: 36157575 PMCID: PMC9489952 DOI: 10.1016/j.isci.2022.105041] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/03/2022] Open
Abstract
Applying functional oxide thin films to flexible devices is of great interests within the rapid development of information technology. The challenges involve the contradiction between the high-temperature growth of high-quality oxide films and low melting point of the flexible supports. This review summarizes the developed methods to fabricate high-quality flexible oxide thin films with novel functionalities and applications. We start from the fabrication methods, e.g. direct growth on flexible buffered metal foils and layered mica, etching and transfer approach, as well as remote epitaxy technique. Then, various functionalities in flexible oxide films will be introduced, specifically, owing to the mechanical flexibility, some unique properties can be induced in flexible oxide films. Taking the advantages of the excellent physical properties, the flexible oxide films have been employed in various devices. Finally, future perspectives in this research field will be proposed to further develop this field from fabrication, functionality to device.
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Affiliation(s)
- Jijie Huang
- School of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, China
- Guangdong Provincial Key Laboratory of Magnetoelectric Physics and Devices, School of Physics, Sun Yat-sen University, Guangzhou 510275, China
- Centre for Physical Mechanics and Biophysics, School of Physics, Sun Yat-sen University, Guangzhou 510275, China
| | - Weijin Chen
- School of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, China
- Guangdong Provincial Key Laboratory of Magnetoelectric Physics and Devices, School of Physics, Sun Yat-sen University, Guangzhou 510275, China
- Centre for Physical Mechanics and Biophysics, School of Physics, Sun Yat-sen University, Guangzhou 510275, China
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6
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Manca N, Remaggi F, Plaza AE, Varbaro L, Bernini C, Pellegrino L, Marré D. Stress Analysis and Q-Factor of Free-Standing (La,Sr)MnO 3 Oxide Resonators. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2202768. [PMID: 35931457 DOI: 10.1002/smll.202202768] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/04/2022] [Revised: 06/14/2022] [Indexed: 06/15/2023]
Abstract
High-sensitivity nanomechanical sensors are mostly based on silicon technology and related materials. The use of functional materials, such as complex oxides having strong interplay between structural, electronic, and magnetic properties, may open possibilities for developing new mechanical transduction schemes and for further enhancement of the device performances. The integration of these materials into micro/nano-electro-mechanical systems (MEMS/NEMS) is still at its very beginning and critical basic aspects related to the stress state and the quality factors of mechanical resonators made from epitaxial oxide thin films need to be investigated. Here, suspended micro-bridges are realized from single-crystal thin films of (La0.7 ,Sr0.3 )MnO3 (LSMO), a prototypical complex oxide showing ferromagnetic ground state at room temperature. These devices are characterized in terms of resonance frequency, stress state, and Q-factor. LSMO resonators are highly stressed, with a maximum value of ≈260 MPa. The temperature dependence of their mechanical resonance is discussed considering both thermal strain and the temperature-dependent Young's modulus. The measured Q-factors reach few tens of thousands at room temperature, with indications of further improvements by optimizing the fabrication protocols. These results demonstrate that complex oxides are suitable to realize high Q-factor mechanical resonators, paving the way toward the development of full-oxide MEMS/NEMS sensors.
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Affiliation(s)
- Nicola Manca
- CNR-SPIN, C.so F. M. Perrone, 24, Genova, 16152, Italy
| | - Federico Remaggi
- CNR-SPIN, C.so F. M. Perrone, 24, Genova, 16152, Italy
- Dipartimento di Fisica, Universitá degli Studi di Genova, Genova, 16146, Italy
| | | | - Lucia Varbaro
- Dipartimento di Fisica, Universitá degli Studi di Genova, Genova, 16146, Italy
| | | | | | - Daniele Marré
- CNR-SPIN, C.so F. M. Perrone, 24, Genova, 16152, Italy
- Dipartimento di Fisica, Universitá degli Studi di Genova, Genova, 16146, Italy
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7
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Cheng Y, Dong G, Li Y, Yang G, Zhang B, Guan M, Zhou Z, Liu M. Strain Modulation of Perpendicular Magnetic Anisotropy in Wrinkle-Patterned (Co/Pt) 5/BaTiO 3 Magnetoelectric Heterostructures. ACS NANO 2022; 16:11291-11299. [PMID: 35848713 DOI: 10.1021/acsnano.2c04754] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
The rapid development of spintronics requires the devices to be flexible, to be used in wearable electronics, and controllable, to be used with magnetoelectric (ME) structures. However, the clamping effect inevitably leads to a decreased ME effect on the rigid substrate, and it remains challenging to directly prepare high-quality ferroelectric (FE) membranes on the widely used flexible substrate such as MICA or polyimide (PI). Here, periodic wrinkle-patterned flexible (Co/Pt)5/BaTiO3 (BTO) perpendicular magnetic anisotropy (PMA) heterostructures were prepared using the water-soluble method. The high-quality single-crystal BTO membrane ensures that intricate wrinkles do not fracture and a high ME coefficient is achievable. The transferred sample that is released from the clamping effect shows an enhanced ME effect in both in-plane and out-of-plane directions, with the ME coefficient reaching up to 68 Oe °C-1. The ferromagnetic resonance (FMR) field of the flexible sample can be tuned by tensile strain up to 272 Oe. The finely controlled wrinkle shows periodic strain variations at peak and valley regions that switch the PMA magnetic domain motion as an effective control method. The proposed ultraflexible wrinkle sample shows great potential for combining multiple magnetization tuning approaches, allowing it to potentially serve as a tunable high-density 3D storage prototype.
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Affiliation(s)
- Yuxin Cheng
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Guohua Dong
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Yaojin Li
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Guannan Yang
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Butong Zhang
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Mengmeng Guan
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Ziyao Zhou
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
| | - Ming Liu
- The Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, State Key Laboratory for Mechanical Behavior of Materials, the International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, Xi'an Jiaotong University, Xi'an 710049, China
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8
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Pesquera D, Fernández A, Khestanova E, Martin LW. Freestanding complex-oxide membranes. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2022; 34:383001. [PMID: 35779514 DOI: 10.1088/1361-648x/ac7dd5] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/22/2022] [Accepted: 07/01/2022] [Indexed: 06/15/2023]
Abstract
Complex oxides show a vast range of functional responses, unparalleled within the inorganic solids realm, making them promising materials for applications as varied as next-generation field-effect transistors, spintronic devices, electro-optic modulators, pyroelectric detectors, or oxygen reduction catalysts. Their stability in ambient conditions, chemical versatility, and large susceptibility to minute structural and electronic modifications make them ideal subjects of study to discover emergent phenomena and to generate novel functionalities for next-generation devices. Recent advances in the synthesis of single-crystal, freestanding complex oxide membranes provide an unprecedented opportunity to study these materials in a nearly-ideal system (e.g. free of mechanical/thermal interaction with substrates) as well as expanding the range of tools for tweaking their order parameters (i.e. (anti-)ferromagnetic, (anti-)ferroelectric, ferroelastic), and increasing the possibility of achieving novel heterointegration approaches (including interfacing dissimilar materials) by avoiding the chemical, structural, or thermal constraints in synthesis processes. Here, we review the recent developments in the fabrication and characterization of complex-oxide membranes and discuss their potential for unraveling novel physicochemical phenomena at the nanoscale and for further exploiting their functionalities in technologically relevant devices.
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Affiliation(s)
- David Pesquera
- Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST Campus UAB, Bellaterra, Barcelona 08193, Spain
| | - Abel Fernández
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, United States of America
| | | | - Lane W Martin
- Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, United States of America
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States of America
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9
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Fernandez A, Acharya M, Lee HG, Schimpf J, Jiang Y, Lou D, Tian Z, Martin LW. Thin-Film Ferroelectrics. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2108841. [PMID: 35353395 DOI: 10.1002/adma.202108841] [Citation(s) in RCA: 8] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/02/2021] [Revised: 03/03/2022] [Indexed: 06/14/2023]
Abstract
Over the last 30 years, the study of ferroelectric oxides has been revolutionized by the implementation of epitaxial-thin-film-based studies, which have driven many advances in the understanding of ferroelectric physics and the realization of novel polar structures and functionalities. New questions have motivated the development of advanced synthesis, characterization, and simulations of epitaxial thin films and, in turn, have provided new insights and applications across the micro-, meso-, and macroscopic length scales. This review traces the evolution of ferroelectric thin-film research through the early days developing understanding of the roles of size and strain on ferroelectrics to the present day, where such understanding is used to create complex hierarchical domain structures, novel polar topologies, and controlled chemical and defect profiles. The extension of epitaxial techniques, coupled with advances in high-throughput simulations, now stands to accelerate the discovery and study of new ferroelectric materials. Coming hand-in-hand with these new materials is new understanding and control of ferroelectric functionalities. Today, researchers are actively working to apply these lessons in a number of applications, including novel memory and logic architectures, as well as a host of energy conversion devices.
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Affiliation(s)
- Abel Fernandez
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Megha Acharya
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Han-Gyeol Lee
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Jesse Schimpf
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Yizhe Jiang
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Djamila Lou
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Zishen Tian
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Lane W Martin
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
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10
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Heterogeneous integration of single-crystalline rutile nanomembranes with steep phase transition on silicon substrates. Nat Commun 2021; 12:5019. [PMID: 34408136 PMCID: PMC8373986 DOI: 10.1038/s41467-021-24740-2] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/24/2020] [Accepted: 06/29/2021] [Indexed: 11/28/2022] Open
Abstract
Unrestricted integration of single-crystal oxide films on arbitrary substrates has been of great interest to exploit emerging phenomena from transition metal oxides for practical applications. Here, we demonstrate the release and transfer of a freestanding single-crystalline rutile oxide nanomembranes to serve as an epitaxial template for heterogeneous integration of correlated oxides on dissimilar substrates. By selective oxidation and dissolution of sacrificial VO2 buffer layers from TiO2/VO2/TiO2 by H2O2, millimeter-size TiO2 single-crystalline layers are integrated on silicon without any deterioration. After subsequent VO2 epitaxial growth on the transferred TiO2 nanomembranes, we create artificial single-crystalline oxide/Si heterostructures with excellent sharpness of metal-insulator transition (\documentclass[12pt]{minimal}
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\begin{document}$$\triangle \rho /\rho$$\end{document}△ρ/ρ > 103) even in ultrathin (<10 nm) VO2 films that are not achievable via direct growth on Si. This discovery offers a synthetic strategy to release the new single-crystalline oxide nanomembranes and an integration scheme to exploit emergent functionality from epitaxial oxide heterostructures in mature silicon devices. Unrestricted integration of single-crystal oxide films on Si substrates allows for exploitation of emerging functionality of new materials in mature silicon devices. Here the authors integrate epitaxial oxide films with sharp metal-insulator transition on Si substrates by epitaxial lift-off of a freestanding nanomembrane.
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11
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Le PTP, Ten Elshof JE, Koster G. Epitaxial lift-off of freestanding (011) and (111) SrRuO 3 thin films using a water sacrificial layer. Sci Rep 2021; 11:12435. [PMID: 34127715 PMCID: PMC8203781 DOI: 10.1038/s41598-021-91848-2] [Citation(s) in RCA: 11] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/20/2021] [Accepted: 05/31/2021] [Indexed: 11/09/2022] Open
Abstract
Two-dimensional freestanding thin films of single crystalline oxide perovskites are expected to have great potential in integration of new features to the current Si-based technology. Here, we showed the ability to create freestanding single crystalline (011)- and (111)-oriented SrRuO3 thin films using Sr3Al2O6 water-sacrificial layer. The epitaxial Sr3Al2O6(011) and Sr3Al2O6(111) layers were realized on SrTiO3(011) and SrTiO3(111), respectively. Subsequently, SrRuO3 films were epitaxially grown on these sacrificial layers. The freestanding single crystalline SrRuO3(011)pc and SrRuO3(111)pc films were successfully transferred on Si substrates, demonstrating possibilities to transfer desirable oriented oxide perovskite films on Si and arbitrary substrates.
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Affiliation(s)
- Phu T P Le
- MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE, Enschede, The Netherlands
| | - Johan E Ten Elshof
- MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE, Enschede, The Netherlands
| | - Gertjan Koster
- MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE, Enschede, The Netherlands.
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12
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Harbola V, Crossley S, Hong SS, Lu D, Birkhölzer YA, Hikita Y, Hwang HY. Strain Gradient Elasticity in SrTiO 3 Membranes: Bending versus Stretching. NANO LETTERS 2021; 21:2470-2475. [PMID: 33689379 DOI: 10.1021/acs.nanolett.0c04787] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Young's modulus determines the mechanical loads required to elastically stretch a material and also the loads required to bend it, given that bending stretches one surface while compressing the opposite one. Flexoelectric materials have the additional property of becoming electrically polarized when bent. The associated energy cost can additionally contribute to elasticity via strain gradients, particularly at small length scales where they are geometrically enhanced. Here, we present nanomechanical measurements of freely suspended SrTiO3 crystalline membrane drumheads. We observe an unexpected nonmonotonic thickness dependence of Young's modulus upon small deflections. Furthermore, the modulus inferred from a predominantly bending deformation is three times larger than that of a predominantly stretching deformation for membranes thinner than 20 nm. In this regime we extract a strain gradient elastic coupling of ∼2.2 μN, which could be used in new operational regimes of nanoelectro-mechanics.
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Affiliation(s)
- Varun Harbola
- Department of Physics, Stanford University, Stanford, California 94305, United States
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States
| | - Samuel Crossley
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
| | - Seung Sae Hong
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
| | - Di Lu
- Department of Physics, Stanford University, Stanford, California 94305, United States
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States
| | - Yorick A Birkhölzer
- Department of Inorganic Materials Science, Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
| | - Yasuyuki Hikita
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States
| | - Harold Y Hwang
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States
- Department of Applied Physics, Stanford University, Stanford, California 94305, United States
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13
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Zhang B, Yun C, MacManus-Driscoll JL. High Yield Transfer of Clean Large-Area Epitaxial Oxide Thin Films. NANO-MICRO LETTERS 2021; 13:39. [PMID: 34138235 PMCID: PMC8187697 DOI: 10.1007/s40820-020-00573-4] [Citation(s) in RCA: 9] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/18/2020] [Accepted: 11/19/2020] [Indexed: 06/12/2023]
Abstract
In this work, we have developed a new method for manipulating and transferring up to 5 mm × 10 mm epitaxial oxide thin films. The method involves fixing a PET frame onto a PMMA attachment film, enabling transfer of epitaxial films lifted-off by wet chemical etching of a Sr3Al2O6 sacrificial layer. The crystallinity, surface morphology, continuity, and purity of the films are all preserved in the transfer process. We demonstrate the applicability of our method for three different film compositions and structures of thickness ~ 100 nm. Furthermore, we show that by using epitaxial nanocomposite films, lift-off yield is improved by ~ 50% compared to plain epitaxial films and we ascribe this effect to the higher fracture toughness of the composites. This work shows important steps towards large-scale perovskite thin-film-based electronic device applications.
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Affiliation(s)
- Bowen Zhang
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge, CB3 0FS, UK
| | - Chao Yun
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge, CB3 0FS, UK
| | - Judith L MacManus-Driscoll
- Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge, CB3 0FS, UK.
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14
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Pesquera D, Parsonnet E, Qualls A, Xu R, Gubser AJ, Kim J, Jiang Y, Velarde G, Huang YL, Hwang HY, Ramesh R, Martin LW. Beyond Substrates: Strain Engineering of Ferroelectric Membranes. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e2003780. [PMID: 32964567 DOI: 10.1002/adma.202003780] [Citation(s) in RCA: 27] [Impact Index Per Article: 6.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/02/2020] [Revised: 08/19/2020] [Indexed: 06/11/2023]
Abstract
Strain engineering in perovskite oxides provides for dramatic control over material structure, phase, and properties, but is restricted by the discrete strain states produced by available high-quality substrates. Here, using the ferroelectric BaTiO3 , production of precisely strain-engineered, substrate-released nanoscale membranes is demonstrated via an epitaxial lift-off process that allows the high crystalline quality of films grown on substrates to be replicated. In turn, fine structural tuning is achieved using interlayer stress in symmetric trilayer oxide-metal/ferroelectric/oxide-metal structures fabricated from the released membranes. In devices integrated on silicon, the interlayer stress provides deterministic control of ordering temperature (from 75 to 425 °C) and releasing the substrate clamping is shown to dramatically impact ferroelectric switching and domain dynamics (including reducing coercive fields to <10 kV cm-1 and improving switching times to <5 ns for a 20 µm diameter capacitor in a 100-nm-thick film). In devices integrated on flexible polymers, enhanced room-temperature dielectric permittivity with large mechanical tunability (a 90% change upon ±0.1% strain application) is demonstrated. This approach paves the way toward the fabrication of ultrafast CMOS-compatible ferroelectric memories and ultrasensitive flexible nanosensor devices, and it may also be leveraged for the stabilization of novel phases and functionalities not achievable via direct epitaxial growth.
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Affiliation(s)
- David Pesquera
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST, Campus UAB, Bellaterra, Barcelona, 08193, Spain
| | - Eric Parsonnet
- Department of Physics, University of California, Berkeley, CA, 94720, USA
| | - Alexander Qualls
- Department of Physics, University of California, Berkeley, CA, 94720, USA
| | - Ruijuan Xu
- Department of Applied Physics, Stanford University, Stanford, CA, 94305, USA
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, CA, 94025, USA
| | - Andrew J Gubser
- Department of Nuclear Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
| | - Jieun Kim
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
| | - Yizhe Jiang
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
| | - Gabriel Velarde
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
| | - Yen-Lin Huang
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
| | - Harold Y Hwang
- Department of Applied Physics, Stanford University, Stanford, CA, 94305, USA
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, CA, 94025, USA
| | - Ramamoorthy Ramesh
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
| | - Lane W Martin
- Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, CA, 94720, USA
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
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15
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Bitla Y, Chu YH. van der Waals oxide heteroepitaxy for soft transparent electronics. NANOSCALE 2020; 12:18523-18544. [PMID: 32909023 DOI: 10.1039/d0nr04219f] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
The quest for multifunctional, low-power and environment friendly electronics has brought research on materials to the forefront. For instance, as the emerging field of transparent flexible electronics is set to greatly impact our daily lives, more stringent requirements are being imposed on functional materials. Inherently flexible polymers and metal foil templates have yielded limited success due to their incompatible high-temperature growth and non-transparency, respectively. Although the epitaxial-transfer strategy has shown promising results, it suffers from tedious and complicated lift-off-transfer processes. The advent of graphene, in particular, and 2D layered materials, in general, with ultrathin scalability has revolutionized this field. Herein, we review the direct growth of epitaxial functional oxides on flexible transparent mica substrates via van der Waals heteroepitaxy, which mitigates misfit strain and substrate clamping for soft transparent electronics applications. Recent advances in practical applications of flexible and transparent electronic elements are discussed. Finally, several important directions, challenges and perspectives for commercialization are also outlined. We anticipate that this promising strategy to build transparent flexible optoelectronic devices and improve their performance will open up new avenues for researchers to explore.
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Affiliation(s)
- Yugandhar Bitla
- Department of Physics, School of Physical Sciences, Central University of Rajasthan, Ajmer 305817, India
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16
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Abstract
The fabrication and transfer of freestanding single-crystal ferroelectric membranes deserve intensive investigations as to their potential applications in flexible wearable devices, such as flexible data storage devices and varied sensors in E-skin configurations. In this report, we have shown a comprehensive study approach to the acquisition of a large-area freestanding single-crystal ferroelectric BaTiO3 by the Sr3Al2O6 scarification layer method. By controlling the thickness of the BaTiO3 and Sr3Al2O6, the exposed area of the Sr3Al2O6 interlayer, and the utilization of an additional electrode La2/3Sr1/3MnO3 layer, the crack density on the freestanding BaTiO3 can be dramatically decreased from 24.53% to almost none; then, a more than 700 × 530 μm2 area high-quality freestanding BaTiO3 membrane can be achieved. Our results offer a clear and repeatable technology routine for the acquisition of a flexible large-area ferroelectric membrane, which should be instructive to other transition metal oxides as well. Our study can confidently boost flexible device fabrication based on single-crystal transition metal oxides.
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17
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Large magnetoelectric coupling in multiferroic oxide heterostructures assembled via epitaxial lift-off. Nat Commun 2020; 11:3190. [PMID: 32581280 PMCID: PMC7314756 DOI: 10.1038/s41467-020-16942-x] [Citation(s) in RCA: 24] [Impact Index Per Article: 6.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/23/2019] [Accepted: 06/02/2020] [Indexed: 11/16/2022] Open
Abstract
Epitaxial films may be released from growth substrates and transferred to structurally and chemically incompatible substrates, but epitaxial films of transition metal perovskite oxides have not been transferred to electroactive substrates for voltage control of their myriad functional properties. Here we demonstrate good strain transmission at the incoherent interface between a strain-released film of epitaxially grown ferromagnetic La0.7Sr0.3MnO3 and an electroactive substrate of ferroelectric 0.68Pb(Mg1/3Nb2/3)O3-0.32PbTiO3 in a different crystallographic orientation. Our strain-mediated magnetoelectric coupling compares well with respect to epitaxial heterostructures, where the epitaxy responsible for strong coupling can degrade film magnetization via strain and dislocations. Moreover, the electrical switching of magnetic anisotropy is repeatable and non-volatile. High-resolution magnetic vector maps reveal that micromagnetic behaviour is governed by electrically controlled strain and cracks in the film. Our demonstration should inspire others to control the physical/chemical properties in strain-released epitaxial oxide films by using electroactive substrates to impart strain via non-epitaxial interfaces. Key properties of transition metal perovskite oxides are degraded after epitaxial growth on ferroelectric substrates due to lattice-mismatch strain. Here, the authors use epitaxial lift-off and transfer to overcome this problem and demonstrate electric field control of a bulk-like magnetization.
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18
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Bourlier Y, Bérini B, Frégnaux M, Fouchet A, Aureau D, Dumont Y. Transfer of Epitaxial SrTiO 3 Nanothick Layers Using Water-Soluble Sacrificial Perovskite Oxides. ACS APPLIED MATERIALS & INTERFACES 2020; 12:8466-8474. [PMID: 31971768 DOI: 10.1021/acsami.9b21047] [Citation(s) in RCA: 9] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
The integration of functional thin film materials with adaptable properties is essential for the development of new paradigms in information technology. Among them, complex oxides with perovskite structures have huge potential based on the particularly vast diversity of physical properties. Here, we demonstrate the possibility of transferring perovskite oxide materials like SrTiO3 onto a silicon substrate using an environmentally friendly process at the nanoscale by means of a water-soluble perovskite sacrificial layer, SrVO3. Based on in situ monitoring atomic force microscopy and photoemission studies, we reveal that the dissolution is initiated from a strontium-rich phase at the extreme surface of SrVO3. The nanothick SrTiO3-transferred layer onto silicon presents appropriate morphology and monocrystalline quality, providing a proof of concept for the integration and development of all-perovskite-oxide electronics or "oxitronics" onto any Si-based substrate.
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Affiliation(s)
- Yoan Bourlier
- Groupe d'Etude de la Matière Condensée (GEMaC) , Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS , 45 Avenue des Etats-Unis , 78035 Versailles , France
- Institut Lavoisier de Versailles (ILV) , Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS , 45 Avenue des Etats-Unis , 78035 Versailles , France
| | - Bruno Bérini
- Groupe d'Etude de la Matière Condensée (GEMaC) , Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS , 45 Avenue des Etats-Unis , 78035 Versailles , France
| | - Mathieu Frégnaux
- Institut Lavoisier de Versailles (ILV) , Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS , 45 Avenue des Etats-Unis , 78035 Versailles , France
| | - Arnaud Fouchet
- Normandie Univ, ENSICAEN, UNICAEN, CNRS, CRISMAT , 14000 Caen , France
| | - Damien Aureau
- Institut Lavoisier de Versailles (ILV) , Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS , 45 Avenue des Etats-Unis , 78035 Versailles , France
| | - Yves Dumont
- Groupe d'Etude de la Matière Condensée (GEMaC) , Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS , 45 Avenue des Etats-Unis , 78035 Versailles , France
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19
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Heterogeneous integration of single-crystalline complex-oxide membranes. Nature 2020; 578:75-81. [PMID: 32025010 DOI: 10.1038/s41586-020-1939-z] [Citation(s) in RCA: 108] [Impact Index Per Article: 27.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/30/2019] [Accepted: 12/04/2019] [Indexed: 01/27/2023]
Abstract
Complex-oxide materials exhibit a vast range of functional properties desirable for next-generation electronic, spintronic, magnetoelectric, neuromorphic, and energy conversion storage devices1-4. Their physical functionalities can be coupled by stacking layers of such materials to create heterostructures and can be further boosted by applying strain5-7. The predominant method for heterogeneous integration and application of strain has been through heteroepitaxy, which drastically limits the possible material combinations and the ability to integrate complex oxides with mature semiconductor technologies. Moreover, key physical properties of complex-oxide thin films, such as piezoelectricity and magnetostriction, are severely reduced by the substrate clamping effect. Here we demonstrate a universal mechanical exfoliation method of producing freestanding single-crystalline membranes made from a wide range of complex-oxide materials including perovskite, spinel and garnet crystal structures with varying crystallographic orientations. In addition, we create artificial heterostructures and hybridize their physical properties by directly stacking such freestanding membranes with different crystal structures and orientations, which is not possible using conventional methods. Our results establish a platform for stacking and coupling three-dimensional structures, akin to two-dimensional material-based heterostructures, for enhancing device functionalities8,9.
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20
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Lee HG, Wang L, Si L, He X, Porter DG, Kim JR, Ko EK, Kim J, Park SM, Kim B, Wee ATS, Bombardi A, Zhong Z, Noh TW. Atomic-Scale Metal-Insulator Transition in SrRuO 3 Ultrathin Films Triggered by Surface Termination Conversion. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1905815. [PMID: 31830343 DOI: 10.1002/adma.201905815] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/05/2019] [Revised: 11/12/2019] [Indexed: 06/10/2023]
Abstract
The metal-insulator transition (MIT) in transition-metal-oxide is fertile ground for exploring intriguing physics and potential device applications. Here, an atomic-scale MIT triggered by surface termination conversion in SrRuO3 ultrathin films is reported. Uniform and effective termination engineering at the SrRuO3 (001) surface can be realized via a self-limiting water-leaching process. As the surface termination converts from SrO to RuO2 , a highly insulating and nonferromagnetic phase emerges within the topmost SrRuO3 monolayer. Such a spatially confined MIT is corroborated by systematic characterizations on electrical transport, magnetism, and scanning tunneling spectroscopy. Density functional theory calculations and X-ray linear dichroism further suggest that the surface termination conversion breaks the local octahedral symmetry of the crystal field. The resultant modulation in 4d orbital occupancy stabilizes a nonferromagnetic insulating surface state. This work introduces a new paradigm to stimulate and tune exotic functionalities of oxide heterostructures with atomic precision.
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Affiliation(s)
- Han Gyeol Lee
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Lingfei Wang
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Liang Si
- Key Laboratory of Magnetic Materials and Devices & Zhejiang Province, Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201, P. R. China
- Institut für Festkörperphysik, Vienna, 1040, Austria
| | - Xiaoyue He
- Department of Physics, National University of Singapore, Singapore, 117542, Singapore
- Songshan Lake Materials Laboratory, Dongguan, 523808, P. R. China
| | - Daniel G Porter
- Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, OX11 0DE, UK
| | - Jeong Rae Kim
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Eun Kyo Ko
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Jinkwon Kim
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Sung Min Park
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Bongju Kim
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
| | - Andrew Thye Shen Wee
- Department of Physics, National University of Singapore, Singapore, 117542, Singapore
| | - Alessandro Bombardi
- Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire, OX11 0DE, UK
| | - Zhicheng Zhong
- Key Laboratory of Magnetic Materials and Devices & Zhejiang Province, Key Laboratory of Magnetic Materials and Application Technology, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201, P. R. China
- China Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Tae Won Noh
- Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea
- Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea
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21
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Bakaul SR, Kim J, Hong S, Cherukara MJ, Zhou T, Stan L, Serrao CR, Salahuddin S, Petford-Long AK, Fong DD, Holt MV. Ferroelectric Domain Wall Motion in Freestanding Single-Crystal Complex Oxide Thin Film. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020; 32:e1907036. [PMID: 31814190 DOI: 10.1002/adma.201907036] [Citation(s) in RCA: 16] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/27/2019] [Revised: 11/21/2019] [Indexed: 05/28/2023]
Abstract
Ferroelectric domain walls in single-crystal complex oxide thin films are found to be orders of magnitude slower when the interfacial bonds with the heteroepitaxial substrate are broken to create a freestanding film. This drastic change in domain wall kinetics does not originate from the alteration of epitaxial strain; rather, it is correlated with the structural ripples at mesoscopic length scale and associated flexoelectric effects induced in the freestanding films. In contrast, the effects of the bond-breaking on the local static ferroelectric properties of both top and bottom layers of the freestanding films, such as domain wall width and spontaneous polarization, are modest and governed by the change in epitaxy-induced compressive strain.
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Affiliation(s)
- Saidur R Bakaul
- Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Jaegyu Kim
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Seungbum Hong
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea
| | - Mathew J Cherukara
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Tao Zhou
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Liliana Stan
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Claudy R Serrao
- Electrical Engineering & Computer Sciences, University of California, Berkeley, CA, 94720, USA
| | - Sayeef Salahuddin
- Electrical Engineering & Computer Sciences, University of California, Berkeley, CA, 94720, USA
| | | | - Dillon D Fong
- Materials Science Division, Argonne National Laboratory, Lemont, IL, 60439, USA
| | - Martin V Holt
- Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL, 60439, USA
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22
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Dwivedi GD, Wu CM, Chen BY, Lin ST, Qiu WZ, Sun SJ, Xu G, Lynn JW, Chiou JW, Lee CH, Li WH, Yano S, Chou H. Magnon profile on SrRuO 3 films studied by inelastic neutron scattering. PHYSICAL REVIEW. B 2020; 101:10.1103/PhysRevB.101.054403. [PMID: 38855404 PMCID: PMC11160330 DOI: 10.1103/physrevb.101.054403] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2024]
Abstract
In this study, the inelastic neutron scattering probe of SIKA in ANSTO is employed to investigate the magnon dispersion curve in ferromagnetic SrRuO3 single crystal epitaxial films and to better understand the underlying mechanisms. This report presents the successful measurement of a magnon peak from the SrRuO3 films which contained an amount of material of only 0.9 mg. We reveal one significant magnon dispersion curve along [002] following the quadraticE ∝ Q 2 ) relation, which shows a magnon gap of 0.32 meV. We have discussed several possible mechanisms, such as the higher symmetry structure and the impurity levels, which may contribute to this smaller gap.
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Affiliation(s)
- G. D. Dwivedi
- Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan, 80424, R.O.C
| | - C.-M. Wu
- National Synchrotron Radiation Research Center, Hsinchu, Taiwan, 30076, R.O.C. and Australian Nuclear Science and Technology Organization, New South Wales, Australia
| | - Bo-Yu Chen
- Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan, 80424, R.O.C
| | - S. T. Lin
- Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan, 80424, R.O.C
| | - W.-Z. Qiu
- Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan, 80424, R.O.C
| | - S. J. Sun
- Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan, 80424, R.O.C
- Department of Applied Physics, National University of Kaohsiung, Kaohsiung, Taiwan, R.O.C
| | - Guangyong Xu
- NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - J. W. Lynn
- NIST Center for Neutron Research, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
| | - J. W. Chiou
- Department of Applied Physics, National University of Kaohsiung, Kaohsiung, Taiwan, R.O.C
| | - C.-H Lee
- Department of Physics, National Central University, Taoyuan City, Taiwan, R.O.C
| | - W.-H. Li
- Department of Physics, National Central University, Taoyuan City, Taiwan, R.O.C
| | - S. Yano
- National Synchrotron Radiation Research Center, Hsinchu, Taiwan, 30076, R.O.C. and Australian Nuclear Science and Technology Organization, New South Wales, Australia
| | - H. Chou
- Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan, 80424, R.O.C
- Department of Applied Physics, National University of Kaohsiung, Kaohsiung, Taiwan, R.O.C
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23
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Wang Y, Pan JA, Wu H, Talapin DV. Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials. ACS NANO 2019; 13:13917-13931. [PMID: 31609104 DOI: 10.1021/acsnano.9b05491] [Citation(s) in RCA: 43] [Impact Index Per Article: 8.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
Direct optical lithography of functional inorganic nanomaterials (DOLFIN) is a photoresist-free method for high-resolution patterning of inorganic nanocrystals (NCs) that has been demonstrated using deep UV (DUV, 254 nm) photons. Here, we expand the versatility of DOLFIN by designing a series of photochemically active NC surface ligands for direct patterning using various photon energies including DUV, near-UV (i-line, 365 nm), blue (h-line, 405 nm), and visible (450 nm) light. We show that the exposure dose for DOLFIN can be ∼30 mJ/cm2, which is small compared to most commercial photopolymer resists. Patterned nanomaterials can serve as highly robust optical diffraction gratings. We also introduce a general approach for resist-free direct electron-beam lithography of functional inorganic nanomaterials (DELFIN) which enables all-inorganic NC patterns with feature size down to 30 nm, while preserving the optical and electronic properties of patterned NCs. The designed ligand chemistries and patterning techniques offer a versatile platform for nano- and micron-scale additive manufacturing, complementing the existing toolbox for device fabrication.
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Affiliation(s)
- Yuanyuan Wang
- Department of Chemistry and James Franck Institute , University of Chicago , Chicago , Illinois 60637 , United States
| | - Jia-Ahn Pan
- Department of Chemistry and James Franck Institute , University of Chicago , Chicago , Illinois 60637 , United States
| | - Haoqi Wu
- Department of Chemistry and James Franck Institute , University of Chicago , Chicago , Illinois 60637 , United States
| | - Dmitri V Talapin
- Department of Chemistry and James Franck Institute , University of Chicago , Chicago , Illinois 60637 , United States
- Center for Nanoscale Materials , Argonne National Laboratory , Argonne , Illinois 60439 , United States
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24
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Luo ZD, Peters JJP, Sanchez AM, Alexe M. Flexible Memristors Based on Single-Crystalline Ferroelectric Tunnel Junctions. ACS APPLIED MATERIALS & INTERFACES 2019; 11:23313-23319. [PMID: 31181153 DOI: 10.1021/acsami.9b04738] [Citation(s) in RCA: 20] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Ferroelectric tunnel junction (FTJ) based memristors exhibiting continuous electric field controllable resistance states have been considered promising candidates for future high-density memories and advanced neuromorphic computational architectures. However, the use of rigid single crystal substrate and high temperature growth of the epitaxial FTJ thin films constitutes the main obstacles to using this kind of heterostructure in flexible computing devices. Here, we report the integration of centimeter-scale single crystalline FTJs on flexible plastic substrates, by water-etching based epitaxial oxide membrane lift-off and the following transfer. The resulting highly flexible FTJ membranes retain the single-crystalline structure along with stable and switchable ferroelectric polarization as the grown-on single crystal substrate state. We show that the obtained flexible memristors, i.e., FTJs on plastic substrates, present high speed and low voltage mediated memristive behaviors with resistance changes over 500% and are stable against shape change. This work is an essential step toward the realization of epitaxial ultrathin ferroelectric oxide film-based electronics on large-area, flexible, and affordable substrates.
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Affiliation(s)
- Zheng-Dong Luo
- Department of Physics , University of Warwick , CV4 7AL , Coventry , United Kingdom
| | - Jonathan J P Peters
- Department of Physics , University of Warwick , CV4 7AL , Coventry , United Kingdom
| | - Ana M Sanchez
- Department of Physics , University of Warwick , CV4 7AL , Coventry , United Kingdom
| | - Marin Alexe
- Department of Physics , University of Warwick , CV4 7AL , Coventry , United Kingdom
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25
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Freestanding crystalline oxide perovskites down to the monolayer limit. Nature 2019; 570:87-90. [PMID: 31168106 DOI: 10.1038/s41586-019-1255-7] [Citation(s) in RCA: 184] [Impact Index Per Article: 36.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/26/2018] [Accepted: 04/18/2019] [Indexed: 11/08/2022]
Abstract
Two-dimensional (2D) materials such as graphene and transition-metal dichalcogenides reveal the electronic phases that emerge when a bulk crystal is reduced to a monolayer1-4. Transition-metal oxide perovskites host a variety of correlated electronic phases5-12, so similar behaviour in monolayer materials based on transition-metal oxide perovskites would open the door to a rich spectrum of exotic 2D correlated phases that have not yet been explored. Here we report the fabrication of freestanding perovskite films with high crystalline quality almost down to a single unit cell. Using a recently developed method based on water-soluble Sr3Al2O6 as the sacrificial buffer layer13,14 we synthesize freestanding SrTiO3 and BiFeO3 ultrathin films by reactive molecular beam epitaxy and transfer them to diverse substrates, in particular crystalline silicon wafers and holey carbon films. We find that freestanding BiFeO3 films exhibit unexpected and giant tetragonality and polarization when approaching the 2D limit. Our results demonstrate the absence of a critical thickness for stabilizing the crystalline order in the freestanding ultrathin oxide films. The ability to synthesize and transfer crystalline freestanding perovskite films without any thickness limitation onto any desired substrate creates opportunities for research into 2D correlated phases and interfacial phenomena that have not previously been technically possible.
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26
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Dwivedi GD, Sun SJ, Kuo YK, Chou H. Role of electron-magnon interaction in non-Fermi liquid behavior of SrRuO 3. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2019; 31:125602. [PMID: 30625456 DOI: 10.1088/1361-648x/aafd0c] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
SrRuO3 is a popular material extensively used as a bottom electrode in various applications, however, a few problems which will certainly change the interface band structure and greatly alter the device's property are still not fully understood, such as the change of carrier types at a certain temperature and the quasiparticle scattering for non-Fermi liquid behavior below ferromagnetic transition temperature. In this study, magnetic, transport (electrical and thermal) properties and x-ray photoemission spectra have been used to understand the role of quasiparticle interactions in the SrRuO3 bulk system. At the Fermi level, the hybridization of Ru4dt 2g ↓ and O2p bands form a typical two band system. In order to explain the problems as mentioned, our present work reveals that there must be an impurity band that couples with the bands around Fermi level and serves as a charge reservoir. In the present case, the impurity is attributed to the Ru vacancies. As a result, the conduction electrons scatter strongly with the Ru vacancies and couple with the Ru magnons to give rise to a dominant electron-magnon coupling that overwhelms the electron-phonon coupling in the temperature range of 90-150 K.
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Affiliation(s)
- G D Dwivedi
- Department of Physics, National Sun Yat-sen University, Kaohsiung 80424, Taiwan, Republic of China
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27
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Huang G, Mei Y. Assembly and Self-Assembly of Nanomembrane Materials-From 2D to 3D. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2018; 14:e1703665. [PMID: 29292590 DOI: 10.1002/smll.201703665] [Citation(s) in RCA: 30] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/20/2017] [Revised: 11/19/2017] [Indexed: 06/07/2023]
Abstract
Nanoscience and nanotechnology offer great opportunities and challenges in both fundamental research and practical applications, which require precise control of building blocks with micro/nanoscale resolution in both individual and mass-production ways. The recent and intensive nanotechnology development gives birth to a new focus on nanomembrane materials, which are defined as structures with thickness limited to about one to several hundred nanometers and with much larger (typically at least two orders of magnitude larger, or even macroscopic scale) lateral dimensions. Nanomembranes can be readily processed in an accurate manner and integrated into functional devices and systems. In this Review, a nanotechnology perspective of nanomembranes is provided, with examples of science and applications in semiconductor, metal, insulator, polymer, and composite materials. Assisted assembly of nanomembranes leads to wrinkled/buckled geometries for flexible electronics and stacked structures for applications in photonics and thermoelectrics. Inspired by kirigami/origami, self-assembled 3D structures are constructed via strain engineering. Many advanced materials have begun to be explored in the format of nanomembranes and extend to biomimetic and 2D materials for various applications. Nanomembranes, as a new type of nanomaterials, allow nanotechnology in a controllable and precise way for practical applications and promise great potential for future nanorelated products.
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Affiliation(s)
- Gaoshan Huang
- Department of Materials Science, State Key Laboratory of ASIC and Systems, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Yongfeng Mei
- Department of Materials Science, State Key Laboratory of ASIC and Systems, Fudan University, 220 Handan Road, Shanghai, 200433, China
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28
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Lu D, Baek DJ, Hong SS, Kourkoutis LF, Hikita Y, Hwang HY. Synthesis of freestanding single-crystal perovskite films and heterostructures by etching of sacrificial water-soluble layers. NATURE MATERIALS 2016; 15:1255-1260. [PMID: 27618712 DOI: 10.1038/nmat4749] [Citation(s) in RCA: 187] [Impact Index Per Article: 23.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/09/2016] [Accepted: 08/08/2016] [Indexed: 05/28/2023]
Abstract
The ability to create and manipulate materials in two-dimensional (2D) form has repeatedly had transformative impact on science and technology. In parallel with the exfoliation and stacking of intrinsically layered crystals, atomic-scale thin film growth of complex materials has enabled the creation of artificial 2D heterostructures with novel functionality and emergent phenomena, as seen in perovskite heterostructures. However, separation of these layers from the growth substrate has proved challenging, limiting the manipulation capabilities of these heterostructures with respect to exfoliated materials. Here we present a general method to create freestanding perovskite membranes. The key is the epitaxial growth of water-soluble Sr 3Al 2O 6 on perovskite substrates, followed by in situ growth of films and heterostructures. Millimetre-size single-crystalline membranes are produced by etching the Sr 3Al 2O 6 layer in water, providing the opportunity to transfer them to arbitrary substrates and integrate them with heterostructures of semiconductors and layered compounds.
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Affiliation(s)
- Di Lu
- Department of Physics, Stanford University, Stanford, California 94305, USA
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
| | - David J Baek
- School of Electrical and Computer Engineering, Cornell University, Ithaca, New York 14853, USA
| | - Seung Sae Hong
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
- Department of Applied Physics, Stanford University, Stanford, California 94305, USA
| | - Lena F Kourkoutis
- School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, USA
- Kavli Institute at Cornell for Nanoscale Science, Cornell University, Ithaca, New York 14853, USA
| | - Yasuyuki Hikita
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
| | - Harold Y Hwang
- Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
- Department of Applied Physics, Stanford University, Stanford, California 94305, USA
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