Simultaneous In-Film Polymer Synthesis and Self-Assembly for Hierarchical Nanopatterns

Diblock copolymer pattern protection by silver cluster reinforcement

Pattern fabrication by self-assembly of diblock copolymers is of significant interest due to the simplicity in fabricating complex structures. In particular, polystyrene-block-poly-4-vinylpyridine (PS-b-P4VP) is a fascinating base material as it forms an ordered micellar structure on silicon surfaces. In this work, silver (Ag) is applied using direct current magnetron sputter deposition and high-power impulse magnetron sputter deposition on an ordered micellar PS-b-P4VP layer. The fabricated hybrid materials are structurally analyzed by field emission scanning electron microscopy, atomic force microscopy, and grazing incidence small angle X-ray scattering. When applying simple aqueous posttreatment, the pattern is stable and reinforced by Ag clusters, making micellar PS-b-P4VP ordered layers ideal candidates for lithography.

Direct synthesis of ordered mesoporous materials from thermoplastic elastomers

The ability to manufacture ordered mesoporous materials using low-cost precursors and scalable processes is essential for unlocking their enormous potential to enable advancement in nanotechnology. While templating-based methods play a central role in the development of mesoporous materials, several limitations exist in conventional system design, including cost, volatile solvent consumption, and attainable pore sizes from commercial templating agents. This work pioneers a new manufacturing platform for producing ordered mesoporous materials through direct pyrolysis of crosslinked thermoplastic elastomer-based block copolymers. Specifically, olefinic majority phases are selectively crosslinked through sulfonation reactions and subsequently converted to carbon, while the minority block can be decomposed to form ordered mesopores. We demonstrate that this process can be extended to different polymer precursors for synthesizing mesoporous polymer, carbon, and silica. Furthermore, the obtained carbons possess large mesopores, sulfur-doped carbon framework, with tailorable pore textures upon varying the precursor identities.

Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns

Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution approaches like electron beam lithography that cannot be readily scaled beyond prototyping demonstrations. Block copolymer thin film self-assembly offers an attractive alternative for producing periodic nanopatterns across large areas, yet the pattern feature sizes are fixed by the polymer molecular weight and composition. Here, a general strategy is reported which overcomes the limitation of the fixed feature size by treating the copolymer thin film as a hierarchical resist, in which the nanoscale pattern motif is defined by self-assembly. Feature sizes can then be tuned by thermal reflow controlled locally by irradiative cross-linking or chemical alteration using lithographic ultraviolet light or electron beam exposure. Using blends of polystyrene-block-poly(methylmethacrylate) (PS-b-PMMA) with PS and PMMA homopolymers, we demonstrate both self-assembled PS grating and hexagonal hole patterns; exposure-controlled reflow is then used to reduce the hole diameter by as much as 50% or increase the PS grating linewidth by more than 180%. Transferring these nanopatterns, or their inverse obtained by a lift-off approach, into silicon yields structural colors that may be prescriptively controlled based on the nanoscale feature size. Furthermore, patterned exposure enables area-selective feature size control, yielding uniform structural color patterns across centimeter square areas. Electron beam lithography is also used to show that the lithographic resolution of this selective-area control can be extended to the nanoscale dimensions of the self-assembled features. The exposure-controlled reflow approach demonstrated here takes a pivotal step toward fabricating complex, hierarchical optical metasurfaces using scalable self-assembly methods.

Thin film block copolymer self-assembly for nanophotonics

The nanophotonic engineering of light-matter interactions has profoundly changed research behind the design and fabrication of optical materials and devices. Metasurfaces-arrays of subwavelength nanostructures that interact resonantly with electromagnetic radiation-have emerged as an integral nanophotonic platform for a new generation of ultrathin lenses, displays, polarizers and other devices. Their success hinges on advances in lithography and nanofabrication in recent decades. While existing nanolithography techniques are suitable for basic research and prototyping, issues of cost, throughput, scalability, and substrate compatibility may preclude their use for many metasurface applications. Patterning via spontaneous self-assembly of block copolymer thin films offers an enticing alternative for nanophotonic manufacturing that is rapid, inexpensive, and applicable to large areas and diverse substrates. This review discusses the advantages and disadvantages of block copolymer-based nanopatterning and highlights recent progress in their use for broadband antireflection, surface enhanced Raman spectroscopy, and other nanophotonic applications. Recent advances in diversification of self-assembled block copolymer nanopatterns and improved processes for enhanced scalability of self-assembled nanopatterning using block copolymers are also discussed, with a spotlight on directions for future research that would enable a wider array of nanophotonic applications.

Fabrication of PCDTBT Conductive Network via Phase Separation

Poly[N-9'-hepta-decanyl-2,7-carbazole-alt-5-5-(4',7'-di-2-thienyl-2',1',3'-benzothiadiazole)] (PCDTBT) is a stable semiconducting polymer with high rigidity in its molecular chains, which makes it difficult to organize into an ordered structure and affects the device performance. Here, a PCDTBT network consisting of aggregates and nanofibers in thin films was fabricated through the phase separation of mixed PCDTBT and polyethylene glycol (PEG). Using atomic force microscopy (AFM), the effect of the blending conditions (weight ratio, solution concentration, and molecular weight) and processing conditions (substrate temperature and solvent) on the resulting phase-separated morphologies of the blend films after a selective washing procedure was studied. It was found that the phase-separated structure's transition from an island to a continuous structure occurred when the weight ratio of PCDTBT/PEG changed from 2:8 to 7:3. Increasing the solution concentration from 0.1 to 3.0 wt% led to an increase in both the height of the PCDTBT aggregate and the width of the nanofiber. When the molecular weight of the PEG was increased, the film exhibited a larger PCDTBT aggregate size. Meanwhile, denser nanofibers were found in films prepared using PCDTBT with higher molecular weight. Furthermore, the electrical characteristics of the PCDTBT network were measured using conductive AFM. Our findings suggest that phase separation plays an important role in improving the molecular chain diffusion rate and fabricating the PCDTBT network.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Photo-switchable smart superhydrophobic surface with controllable superwettability

An azobenzene-based smart superhydrophobic surface undergoes reversible transformations among multiple bioinspired superwetting states through photo-manipulation, demonstrating promising potential on a rewritable platform for droplet transportation.

Controlled Spacing between Nanopatterned Regions in Block Copolymer Films Obtained by Utilizing Substrate Topography for Local Film Thickness Differentiation

Various types of devices require hierarchically nanopatterned substrates, where the spacing between patterned domains is controlled. Ultraconfined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns and thus opens numerous possibilities for the hierarchical construction of multifunctional devices.

Hybrid patterns from directed self-assembly of diblock copolymers by chemical patterns

The surface affinity is a critical factor for controlling the formation of monolayer nanostructures in block copolymer thin films. In general, strong surface affinity tends to induce the formation of domains with low spontaneous curvature. Abiding by this principle, we propose a facile chemoepitaxial scheme for producing large-scale ordered hybrid patterns by the directed self-assembly of diblock copolymers. The guiding chemical pattern is designed as periodic stripes with alternately changing surface affinities. As a consequence, two different geometries of domains are formed on the stripes with different affinities. The self-assembly process of block copolymers guided by the stripe patterns is investigated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, and the kinetic stability diagram is estimated. Hybrid patterns are successfully achieved with both cylinder-forming and sphere-forming diblock copolymers. In the cylinder-forming system, the major hybrid pattern exhibiting a considerable stability window is composed of parallel cylinders and perforated lamellae, while it is composed of monolayer spheres and parallel cylinders in the other system. Encouragingly, the chemoepitaxial method is valid till the period of the guiding pattern is a large multiple of the domain spacing. The chemoepitaxial scheme demonstrated in this work serves as a nice supplement to the graphoepitaxial one proposed in our previous work.

Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate

Spatial control of the orientation of block copolymers (BCPs) in thin films offers enormous opportunities for practical nanolithography applications. In this study, we demonstrate the use of a substrate comprised of poly(4-acetoxystyrene) to spatially control interfacial interactions and block copolymer orientation over different length scales. Upon UV irradiation poly(4-acetoxystyrene) undergoes a photo-Fries rearrangement yielding phenolic groups available for further functionalization. The wetting behaviour of PS-b-PMMA deposited on the poly(4-acetoxystyrene) films could be precisely controlled through controlling the UV irradiation dose. After exposure, and a mild post-exposure treatment, the substrate switches from asymmetric, to neutral and then to symmetric wetting. Upon exposure through photomasks, a range of high fidelity micro-patterns consisting of perpendicularly oriented lamellar microdomains were generated. Furthermore, the resolution of chemically patterned poly(4-acetoxystyrene) substrate could be further narrowed to submicrometer scale using electron beam lithography. When the BCP was annealed on an e-beam modified poly(4-acetoxystyrene) surface, the interface between domains of parallel and perpendicular orientation of the BCPs was well defined, especially when compared with the substrates patterned using the photomask.

Fabrication of Carbohydrate Chips Based on Polydopamine for Real-Time Determination of Carbohydrate⁻Lectin Interactions by QCM Biosensor

A novel approach for preparing carbohydrate chips based on polydopamine (PDA) surface to study carbohydrate⁻lectin interactions by quartz crystal microbalance (QCM) biosensor instrument has been developed. The amino-carbohydrates were immobilized on PDA-coated quartz crystals via Schiff base reaction and/or Michael addition reaction. The resulting carbohydrate-chips were applied to QCM biosensor instrument with flow-through system for real-time detection of lectin⁻carbohydrate interactions. A series of plant lectins, including wheat germ agglutinin (WGA), concanavalin A (Con A), Ulex europaeus agglutinin I (UEA-I), soybean agglutinin (SBA), and peanut agglutinin (PNA), were evaluated for the binding to different kinds of carbohydrate chips. Clearly, the results show that the predicted lectin selectively binds to the carbohydrates, which demonstrates the applicability of the approach. Furthermore, the kinetics of the interactions between Con A and mannose, WGA and N-Acetylglucosamine were studied, respectively. This study provides an efficient approach to preparing carbohydrate chips based on PDA for the lectin⁻carbohydrate interactions study.