1
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Krysztofik A, Pula P, Pochylski M, Zaleski K, Gapinski J, Majewski P, Graczykowski B. Fast Photoactuation and Environmental Response of Humidity-Sensitive pDAP-Silicon Nanocantilevers. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2403114. [PMID: 38781555 DOI: 10.1002/adma.202403114] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/29/2024] [Revised: 04/26/2024] [Indexed: 05/25/2024]
Abstract
Multi-responsive nanomembranes are a new class of advanced materials that can be harnessed in complex architectures for micro and nano-manipulators, artificial muscles, energy harvesting, soft robotics, and sensors. The design and fabrication of responsive membranes must meet such challenges as trade-offs between responsiveness and mechanical durability, volumetric low-cost production ensuring low environmental impact, and compatibility with standard technologies or biological systems This work demonstrates the fabrication of multi-responsive, mechanically robust poly(1,3-diaminopropane) (pDAP) nanomembranes and their application in fast photoactuators. The pDAP films are developed using a plasma-assisted polymerization technique that offers large-scale production and versatility of potential industrial relevance. The pDAP layers exhibit high elasticity with the Young's modulus of ≈7 GPa and remarkable mechanical durability across 20-80 °C temperatures. Notably, pDAP membranes reveal immediate and reversible contraction triggered by light, rising temperature, or reducing relative humidity underpinned by a reversible water sorption mechanism. These features enable the fabrication of photoactuators composed of pDAP-coated Si nanocantilevers, demonstrating ms timescale response to light, tens of µm deflections, and robust performance up to kHz frequencies. These results advance fundamental research on multi-responsive nanomembranes and hold the potential to boost versatile applications in light-to-motion conversion and sensing toward the industrial level.
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Affiliation(s)
- Adam Krysztofik
- Faculty of Physics, Adam Mickiewicz University, Uniwersytetu Poznańskiego 2, Poznań, 61-614, Poland
| | - Przemyslaw Pula
- Faculty of Chemistry, University of Warsaw, Pasteur 1, Warsaw, 02-093, Poland
| | - Mikolaj Pochylski
- Faculty of Physics, Adam Mickiewicz University, Uniwersytetu Poznańskiego 2, Poznań, 61-614, Poland
| | - Karol Zaleski
- NanoBioMedical Centre, Adam Mickiewicz University, Wszechnicy Piastowskiej 3, Poznan, 61-614, Poland
| | - Jacek Gapinski
- Faculty of Physics, Adam Mickiewicz University, Uniwersytetu Poznańskiego 2, Poznań, 61-614, Poland
| | - Pawel Majewski
- Faculty of Chemistry, University of Warsaw, Pasteur 1, Warsaw, 02-093, Poland
| | - Bartlomiej Graczykowski
- Faculty of Physics, Adam Mickiewicz University, Uniwersytetu Poznańskiego 2, Poznań, 61-614, Poland
- Max Planck Institute for Polymer Research, Ackermannweg 10, 55128, Mainz, Germany
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2
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Hu XH, Zhang R, Zhang X, Wu Z, Zhou J, Li W, Xiong S. Focused solar annealing for block copolymer fast self-assembly. Heliyon 2024; 10:e24016. [PMID: 38293481 PMCID: PMC10825308 DOI: 10.1016/j.heliyon.2024.e24016] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/08/2023] [Revised: 12/23/2023] [Accepted: 01/02/2024] [Indexed: 02/01/2024] Open
Abstract
Block copolymer (BCP) self-assembly has tremendous potential applications in next-generation nanolithography. It offers significant advantages, including high resolution and cost-effectiveness, effectively overcoming the limitations associated with conventional optical lithography. In this work, we demonstrate a focused solar annealing (FSA) technique that is facile, eco-friendly, and energy-efficient for fast self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films. The FSA principle involves utilizing a common biconvex lens to converge incident solar radiation into a high-temperature spot, which is directly used to drive the microphase separation of PS-b-PMMA thin films. As a result, PS-b-PMMA undergoes self-assembly, forming ordered nanostructures in a vertical orientation at seconds timescales on silicon substrates with a neutral layer. In addition, the FSA technique can be employed for grafting neutral polymer brushes onto the silicon substrate. Furthermore, the FSA's compatibility with graphoepitaxy-directed self-assembly (DSA) of BCP is also demonstrated in the patterning of contact holes. The results of contact hole shrinking show that contact hole prepatterns of ∼60.4 nm could be uniformly shrunk to ∼20.5 nm DSA hole patterns with a hole open yield (HOY) of 100 %. For contact hole multiplication, doublet DSA holes were successfully generated on elliptical templates, revealing an average DSA hole size of ∼21.3 nm. Most importantly, due to the direct use of solar energy, the FSA technique provides many significant advantages such as simplicity, environmental friendliness, solvent-free, low cost, and net-zero carbon emissions, and will open up a new direction for BCP lithography that is sustainable, pollution-free, and carbon-neutral.
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Affiliation(s)
- Xiao-Hua Hu
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Rui Zhang
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Xiaohui Zhang
- Department of Macromolecular Science, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Zhiyong Wu
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Jing Zhou
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Weihua Li
- Department of Macromolecular Science, Fudan University, 220 Handan Road, Shanghai, 200433, China
| | - Shisheng Xiong
- School of Information Science and Technology, Fudan University, 220 Handan Road, Shanghai, 200433, China
- Zhangjiang Laboratory, 100 Haike Road, Shanghai, 201204, China
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3
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Pula P, Leniart AA, Krol J, Gorzkowski MT, Suster MC, Wrobel P, Lewera A, Majewski PW. Block Copolymer-Templated, Single-Step Synthesis of Transition Metal Oxide Nanostructures for Sensing Applications. ACS APPLIED MATERIALS & INTERFACES 2023; 15:57970-57980. [PMID: 37644616 PMCID: PMC10739603 DOI: 10.1021/acsami.3c10439] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/17/2023] [Accepted: 08/18/2023] [Indexed: 08/31/2023]
Abstract
The synthesis of transition metal oxide nanostructures, thanks to their high surface-to-volume ratio and the resulting large fraction of surface atoms with high catalytic activity, is of prime importance for the development of new sensors and catalytic materials. Here, we report an economical, time-efficient, and easily scalable method of fabricating nanowires composed of vanadium, chromium, manganese, iron, and cobalt oxides by employing simultaneous block copolymer (BCP) self-assembly and selective sequestration of metal-organic acetylacetonate complexes within one of the BCP blocks. We discuss the mechanism and the primary factors that are responsible for the sequestration and conformal replication of the BCP template by the inorganic material that is obtained after the polymer template is removed. X-ray photoelectron spectroscopy (XPS) and powder X-ray diffraction (PXRD) studies indicate that the metal oxidation state in the nanowires produced by plasma ashing the BCP template closely matches that of the precursor complex and that their structure is amorphous, thus requiring high-temperature annealing in order to sinter them into a crystalline form. Finally, we demonstrate how the developed nanowire array fabrication scheme can be used to rapidly pattern a multilayered iron oxide nanomesh, which we then used to construct a prototype volatile organic compound sensor.
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Affiliation(s)
- Przemyslaw Pula
- Department
of Chemistry, University of Warsaw, Warsaw 02093, Poland
- Biological
and Chemical Research Centre, University
of Warsaw, Warsaw 02089, Poland
| | | | - Julia Krol
- Department
of Chemistry, University of Warsaw, Warsaw 02093, Poland
| | - Maciej T. Gorzkowski
- Biological
and Chemical Research Centre, University
of Warsaw, Warsaw 02089, Poland
| | - Mihai C. Suster
- Department
of Physics, University of Warsaw, Warsaw 02093, Poland
| | - Piotr Wrobel
- Department
of Physics, University of Warsaw, Warsaw 02093, Poland
| | - Adam Lewera
- Department
of Chemistry, University of Warsaw, Warsaw 02093, Poland
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4
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Cho J, Oh J, Bang J, Koh JH, Jeong HY, Chung S, Son JG. Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns. Nat Commun 2023; 14:8412. [PMID: 38110407 PMCID: PMC10728125 DOI: 10.1038/s41467-023-43766-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/19/2023] [Accepted: 11/18/2023] [Indexed: 12/20/2023] Open
Abstract
The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub-10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 °C at which the chain mobility significantly increases. This method can be utilized for various high-χ block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process.
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Affiliation(s)
- Junghyun Cho
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Jinwoo Oh
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Joona Bang
- Department of Chemical and Biological Engineering, Korea University, Seongbuk-gu, Seoul, 02841, Republic of Korea
| | - Jai Hyun Koh
- Clean Energy Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Hoon Yeub Jeong
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
| | - Seungjun Chung
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seongbuk-gu, Seoul, 02841, Republic of Korea
| | - Jeong Gon Son
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 02792, Republic of Korea.
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seongbuk-gu, Seoul, 02841, Republic of Korea.
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5
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Szustakiewicz P, Powała F, Szepke D, Lewandowski W, Majewski PW. Unrestricted Chiral Patterning by Laser Writing in Liquid Crystalline and Plasmonic Nanocomposite Thin Films. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023:e2310197. [PMID: 37905376 DOI: 10.1002/adma.202310197] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/02/2023] [Indexed: 11/02/2023]
Abstract
Obtaining hierarchical structures with arbitrarily controlled chirality remains a challenge. Here, thin films featuring chiroptically bipolar patterns are produced by a device utilizing microscale photothermal re-melting of materials exhibiting chirality synchronization. This device operates autonomously, guided by an algorithm that facilitates the homochiral growth of supramolecular organic helices through controlling their re-melting. The chirality synchronization phenomena of constitutionally achiral molecules grants availability of both handednesses of the helices, enabling unrestricted chiral writing in the film. The collective chiroptical response of assembled molecules is utilised to guide the patterning process, creating a foundation for optically secured information. The established methodology enables achieving dissymmetry factor values for circular dichroism (CD) a magnitude higher than previously reported, as confirmed with state-of-the-art, synchrotron-based Mueller matrix polarimetry (MMP). Moreover, the developed method is extended to nanocomposites comprising gold nanoparticles, providing the opportunity to tune the CD toward the plasmonic region. This strategic application of photothermal processing, specifically laser-directed melting, uncovers the potential to broaden the selection of nanostructured materials with precisely designed functionalities for photonic applications.
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Affiliation(s)
| | - Filip Powała
- Department of Chemistry, University of Warsaw, Warsaw, 02089, Poland
| | - Dorota Szepke
- Department of Chemistry, University of Warsaw, Warsaw, 02089, Poland
| | | | - Pawel W Majewski
- Department of Chemistry, University of Warsaw, Warsaw, 02089, Poland
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6
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Diodati LE, Liu S, Rinaldi-Ramos CM, Sumerlin BS. Magnetic Nanoparticles Improve Flow Rate and Enable Self-Healing in Covalent Adaptable Networks. ACS APPLIED MATERIALS & INTERFACES 2023. [PMID: 37384942 DOI: 10.1021/acsami.3c06329] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/01/2023]
Abstract
Covalent adaptable networks (CANs) combine the mechanical and chemical stability of thermosets with the reprocessability of thermoplastics through the incorporation of stimuli-responsive dynamic crosslinks. To allow for processing through induction heating, we have created associative CANs that include fillers in the polymer matrix for efficient heat transfer. While the inclusion of inorganic fillers often decreases flow rate in CANs and complicates reprocessing of the material, the presence of Fe3O4 nanoparticles had no detrimental effect on flow behavior in a vinylogous urethane vitrimer, an observation we attribute to the catalytic nature of nanoparticles on the dynamic exchange chemistry. We employed two methods of nanoparticle incorporation: blending bare nanoparticles and crosslinking chemically modified nanoparticles. The vitrimers with covalently crosslinked nanoparticles exhibited a decreased relaxation time compared to those with blended nanoparticles. The magnetic character of the Fe3O4 nanoparticles enabled self-healing of the vitrimer composite materials upon exposure to an alternating electromagnetic field during induction heating.
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Affiliation(s)
- Lily E Diodati
- George and Josephine Butler Polymer Research Laboratory, Center of Macromolecular Science and Engineering, Department of Chemistry, University of Florida, Gainesville, Florida 32611, United States
| | - Sitong Liu
- Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, United States
| | - Carlos M Rinaldi-Ramos
- Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, United States
- J. Crayton Pruitt Family Department of Biomedical Engineering, University of Florida, Gainesville, Florida 32611, United States
| | - Brent S Sumerlin
- George and Josephine Butler Polymer Research Laboratory, Center of Macromolecular Science and Engineering, Department of Chemistry, University of Florida, Gainesville, Florida 32611, United States
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7
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Thedford RP, Yu F, Tait WRT, Shastri K, Monticone F, Wiesner U. The Promise of Soft-Matter-Enabled Quantum Materials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2203908. [PMID: 35863756 DOI: 10.1002/adma.202203908] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/30/2022] [Revised: 07/14/2022] [Indexed: 06/15/2023]
Abstract
The field of quantum materials has experienced rapid growth over the past decade, driven by exciting new discoveries with immense transformative potential. Traditional synthetic methods to quantum materials have, however, limited the exploration of architectural control beyond the atomic scale. By contrast, soft matter self-assembly can be used to tailor material structure over a large range of length scales, with a vast array of possible form factors, promising emerging quantum material properties at the mesoscale. This review explores opportunities for soft matter science to impact the synthesis of quantum materials with advanced properties. Existing work at the interface of these two fields is highlighted, and perspectives are provided on possible future directions by discussing the potential benefits and challenges which can arise from their bridging.
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Affiliation(s)
- R Paxton Thedford
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York, 14853, USA
- Smith School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York, 14853, USA
| | - Fei Yu
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York, 14853, USA
- Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York, 14853, USA
| | - William R T Tait
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York, 14853, USA
- Smith School of Chemical and Biomolecular Engineering, Cornell University, Ithaca, New York, 14853, USA
| | - Kunal Shastri
- Department of Electrical and Computer Engineering, Cornell University, Ithaca, New York, 14853, USA
| | - Francesco Monticone
- Department of Electrical and Computer Engineering, Cornell University, Ithaca, New York, 14853, USA
| | - Ulrich Wiesner
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York, 14853, USA
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8
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Angelopoulou PP, Moutsios I, Manesi GM, Ivanov DA, Sakellariou G, Avgeropoulos A. Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach. Prog Polym Sci 2022. [DOI: 10.1016/j.progpolymsci.2022.101625] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/19/2022]
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9
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Yun HS, Kim DH, Kwon HG, Choi HK. Centrifugal Force-Induced Alignment in the Self-Assembly of Block Copolymers. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00325] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Hyun Su Yun
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Dong Hwan Kim
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Hong Gu Kwon
- Division of Advanced Materials Engineering, Kongju National University, Cheonan 31080, Republic of Korea
| | - Hong Kyoon Choi
- Center for Advanced Materials and Parts of Powder, Kongju National University, Cheonan 31080, Republic of Korea
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10
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Zenati A. Triblock Azo copolymers: RAFT synthesis, properties, thin film self-assembly and applications. POLYM-PLAST TECH MAT 2022. [DOI: 10.1080/25740881.2021.2015779] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/17/2023]
Affiliation(s)
- Athmen Zenati
- Refining and Petrochemistry, Division of Method and Operation, Sonatrach, Arzew, Algeria
- Central Directorate of Research and Development, Sonatrach, Boumerdes, Algeria
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11
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Kulkarni AA, Doerk GS. Thin film block copolymer self-assembly for nanophotonics. NANOTECHNOLOGY 2022; 33:292001. [PMID: 35358955 DOI: 10.1088/1361-6528/ac6315] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/19/2021] [Accepted: 03/31/2022] [Indexed: 06/14/2023]
Abstract
The nanophotonic engineering of light-matter interactions has profoundly changed research behind the design and fabrication of optical materials and devices. Metasurfaces-arrays of subwavelength nanostructures that interact resonantly with electromagnetic radiation-have emerged as an integral nanophotonic platform for a new generation of ultrathin lenses, displays, polarizers and other devices. Their success hinges on advances in lithography and nanofabrication in recent decades. While existing nanolithography techniques are suitable for basic research and prototyping, issues of cost, throughput, scalability, and substrate compatibility may preclude their use for many metasurface applications. Patterning via spontaneous self-assembly of block copolymer thin films offers an enticing alternative for nanophotonic manufacturing that is rapid, inexpensive, and applicable to large areas and diverse substrates. This review discusses the advantages and disadvantages of block copolymer-based nanopatterning and highlights recent progress in their use for broadband antireflection, surface enhanced Raman spectroscopy, and other nanophotonic applications. Recent advances in diversification of self-assembled block copolymer nanopatterns and improved processes for enhanced scalability of self-assembled nanopatterning using block copolymers are also discussed, with a spotlight on directions for future research that would enable a wider array of nanophotonic applications.
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Affiliation(s)
- Ashish A Kulkarni
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, United States of America
| | - Gregory S Doerk
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY 11973, United States of America
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12
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Singh M, Agrawal A, Wu W, Masud A, Armijo E, Gonzalez D, Zhou S, Terlier T, Zhu C, Strzalka J, Matyjaszewski K, Bockstaller M, Douglas JF, Karim A. Soft-Shear-Aligned Vertically Oriented Lamellar Block Copolymers for Template-Free Sub-10 nm Patterning and Hybrid Nanostructures. ACS APPLIED MATERIALS & INTERFACES 2022; 14:12824-12835. [PMID: 35245016 DOI: 10.1021/acsami.1c23865] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
The template-free unidirectional alignment of lamellar block copolymers (l-BCPs) for sub-10 nm high-resolution patterning and hybrid multicomponent nanostructures is important for technological applications. We demonstrate a modified soft-shear-directed self-assembly (SDSA) approach for aligning pristine l-BCPs and l-BCPs with incorporated polymer-grafted nanoparticles (PGNPs), as well as the l-BCP conversion to aligned gold nanowires, and hybrid of metallic gold nanowire and dielectric silica nanoparticle in the form of line-dot nanostructures. The smallest patterns have a half-pitch as small as 9.8 nm. In all cases, soft-shear is achieved using a high-molecular-mass polymer topcoat layer, with support on a neutral bottom layer. We also show that the hybrid line-dot nanostructures have a red-shifted plasmonic response in comparison to neat gold nanowires. These template-free aligned BCPs and nanowires have potential use in nanopatterning applications, and the line-dot nanostructures should be useful in the sensing of biomolecules and other molecular species based on the plasmonic response of the nanowires.
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Affiliation(s)
- Maninderjeet Singh
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Aman Agrawal
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Wenjie Wu
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Ali Masud
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Edward Armijo
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Damian Gonzalez
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
| | - Shenghui Zhou
- Materials Science Program, University of Houston, Houston, Texas 77204, United States
| | - Tanguy Terlier
- SIMS Laboratory, Shared Equipment Authority, Rice University, Houston, Texas 77005, United States
| | - Chenhui Zhu
- Advanced Light Source, Lawrence Berkeley National Lab, Berkeley, California 94720, United States
| | - Joseph Strzalka
- X-Ray Science Division, Argonne National Laboratory, Lemont, Illinois 60439, United States
| | - Krzysztof Matyjaszewski
- Department of Chemistry, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, United States
| | - Michael Bockstaller
- Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, United States
| | - Jack F Douglas
- Material Science and Engineering Division, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, United States
| | - Alamgir Karim
- Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204, United States
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13
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Jin HM, Lee SE, Kim S, Kim JY, Han Y, Kim BH. Directed high‐χ block copolymer
self‐assembly
by laser writing on silicon substrate. J Appl Polym Sci 2022. [DOI: 10.1002/app.52291] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
Affiliation(s)
- Hyeong Min Jin
- Department of Organic Materials Engineering Chungnam National University Daejeon Republic of Korea
- Neutron Science Center Korea Atomic Energy Research Institute (KAERI) Daejeon Republic of Korea
| | - Su Eon Lee
- Department of Robotics and Mechatronics Engineering Daegu Gyeongbuk Institute of Science and Technology (DGIST) Daegu Republic of Korea
| | - Simon Kim
- Department of Robotics and Mechatronics Engineering Daegu Gyeongbuk Institute of Science and Technology (DGIST) Daegu Republic of Korea
| | - Ju Young Kim
- Reality Devices Research Division Electronics and Telecommunications Research Institute (ETRI) Daejeon Republic of Korea
| | - Young‐Soo Han
- Neutron Science Center Korea Atomic Energy Research Institute (KAERI) Daejeon Republic of Korea
| | - Bong Hoon Kim
- Department of Robotics and Mechatronics Engineering Daegu Gyeongbuk Institute of Science and Technology (DGIST) Daegu Republic of Korea
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14
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Leniart A, Pula P, Style RW, Majewski PW. Pathway-Dependent Grain Coarsening of Block Copolymer Patterns under Controlled Solvent Evaporation. ACS Macro Lett 2022; 11:121-126. [PMID: 35574792 PMCID: PMC8772373 DOI: 10.1021/acsmacrolett.1c00677] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/02/2021] [Accepted: 12/27/2021] [Indexed: 11/28/2022]
Abstract
Solvent evaporation annealing (SEA) is a straightforward, single-step casting and annealing method of block copolymers (BCP) processing yielding large-grained morphologies in a very short time. Here, we present a quantitative analysis of BCP grain-coarsening in thin films under controlled evaporation of the solvent. Our study is aimed at understanding time and BCP concentration influence on the rate of the lateral growth of BCP grains. By systematically investigating the coarsening kinetics at various BCP concentrations, we observed a steeply decreasing exponential dependence of the kinetics power-law time exponent on polymer concentration. We used this dependence to formulate a mathematical model of BCP ordering under nonstationary conditions and a 2D, time- and concentration-dependent coarsening rate diagram, which can be used as an aid in engineering the BCP processing pathway in SEA and also in other directed self-assembly methods that utilize BCP-solvent interactions such as solvent vapor annealing.
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Affiliation(s)
| | - Przemyslaw Pula
- Department
of Chemistry, University of Warsaw, Warsaw 02089, Poland
| | - Robert W. Style
- Department
of Materials, Soft and Living Materials, ETH Zürich, Vladimir-Prelog-Weg 10, 8093 Zürich, Switzerland
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15
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Tu WH, Seah GL, Li Y, Wang X, Tan KW. Transient Laser-Annealing-Induced Mesophase Transitions of Block Copolymer-Resol Thin Films. ACS POLYMERS AU 2021; 2:42-49. [PMID: 36855749 PMCID: PMC9954231 DOI: 10.1021/acspolymersau.1c00040] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Abstract
Block copolymer self-assembly-derived thin films provide direct access to two- and three-dimensional periodically ordered mesostructures as enablers for many nanotechnology applications. This report describes laser-annealing-induced disorder-order mesophase transitions of polystyrene-block-poly(ethylene oxide)/resol hybrid thin films over a range of laser temperatures (∼45 to 525 °C) and short dwell times (0.25 to 100 ms), revealing the non-equilibrium ordering and disordering kinetics and behaviors. We found that a combination of transient laser temperature of ∼275 °C and annealing dwell time of 100 ms provided the most optimal kinetic and thermodynamic control of the diffusivities of hybrid mesophases and photothermal-induced resol polymerization, yielding long-range ordered films resembling an in-plane body-centered cubic sphere morphology. A clear understanding of hybrid thin film mesophase self-assembly under non-equilibrium laser annealing could open new avenues to introduce novel chemistries and rapidly achieve nanoscale periodic order suitable for the patterning of complex structures, electronics, sensing, and emerging quantum materials.
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Affiliation(s)
- Wei Han Tu
- School
of Materials Science and Engineering, Nanyang
Technological University, Singapore 639798, Singapore
| | - Geok Leng Seah
- School
of Materials Science and Engineering, Nanyang
Technological University, Singapore 639798, Singapore
| | - Yun Li
- School
of Materials Science and Engineering, Nanyang
Technological University, Singapore 639798, Singapore
| | - Xinghui Wang
- College
of Physics and Information Engineering, Institute of Micro-Nano Devices
and Solar Cells, Fuzhou University, Fujian 350108, China
| | - Kwan W. Tan
- School
of Materials Science and Engineering, Nanyang
Technological University, Singapore 639798, Singapore,
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16
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Merekalov AS, Derikov YI, Artemov VV, Ezhov AA, Kudryavtsev YV. Vertical Cylinder-to-Lamella Transition in Thin Block Copolymer Films Induced by In-Plane Electric Field. Polymers (Basel) 2021; 13:3959. [PMID: 34833258 PMCID: PMC8622010 DOI: 10.3390/polym13223959] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/15/2021] [Revised: 11/10/2021] [Accepted: 11/11/2021] [Indexed: 11/16/2022] Open
Abstract
Morphological transition between hexagonal and lamellar patterns in thin polystyrene-block-poly(4-vinyl pyridine) films simultaneously exposed to a strong in-plane electric field and saturated solvent vapor is studied with atomic force and scanning electron microscopy. In these conditions, standing cylinders made of 4-vinyl pyridine blocks arrange into threads up to tens of microns long along the field direction and then partially merge into standing lamellas. In the course of rearrangement, the copolymer remains strongly segregated, with the minor component domains keeping connectivity between the film surfaces. The ordering tendency becomes more pronounced if the cylinders are doped with Au nanorods, which can increase their dielectric permittivity. Non-selective chloroform vapor works particularly well, though it causes partial etching of the indium tin oxide cathode. On the contrary, 1,4-dioxane vapor selective to polystyrene matrix does not allow for any morphological changes.
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Affiliation(s)
- Alexey S. Merekalov
- Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, 119991 Moscow, Russia; (A.S.M.); (Y.I.D.); (A.A.E.)
| | - Yaroslav I. Derikov
- Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, 119991 Moscow, Russia; (A.S.M.); (Y.I.D.); (A.A.E.)
| | - Vladimir V. Artemov
- Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics”, Russian Academy of Sciences, 119333 Moscow, Russia;
| | - Alexander A. Ezhov
- Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, 119991 Moscow, Russia; (A.S.M.); (Y.I.D.); (A.A.E.)
- Faculty of Physics, Lomonosov Moscow State University, 119991 Moscow, Russia
| | - Yaroslav V. Kudryavtsev
- Topchiev Institute of Petrochemical Synthesis, Russian Academy of Sciences, 119991 Moscow, Russia; (A.S.M.); (Y.I.D.); (A.A.E.)
- Frumkin Institute of Physical Chemistry and Electrochemistry, Russian Academy of Sciences, 119071 Moscow, Russia
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17
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Robertson M, Zhou Q, Ye C, Qiang Z. Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications. Macromol Rapid Commun 2021; 42:e2100300. [PMID: 34272778 DOI: 10.1002/marc.202100300] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/10/2021] [Revised: 06/23/2021] [Indexed: 01/03/2023]
Abstract
Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.
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Affiliation(s)
- Mark Robertson
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
| | - Qingya Zhou
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Changhuai Ye
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Zhe Qiang
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
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18
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Ginige G, Song Y, Olsen BC, Luber EJ, Yavuz CT, Buriak JM. Solvent Vapor Annealing, Defect Analysis, and Optimization of Self-Assembly of Block Copolymers Using Machine Learning Approaches. ACS APPLIED MATERIALS & INTERFACES 2021; 13:28639-28649. [PMID: 34100583 DOI: 10.1021/acsami.1c05056] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Self-assembly of block copolymers (BCPs) is an alternative patterning technique that promises high resolution and density multiplication with lower costs. The defectivity of the resulting nanopatterns remains too high for many applications in microelectronics and is exacerbated by small variations of processing parameters, such as film thickness, and fluctuations of solvent vapor pressure and temperature, among others. In this work, a solvent vapor annealing (SVA) flow-controlled system is combined with design of experiments (DOE) and machine learning (ML) approaches. The SVA flow-controlled system enables precise optimization of the conditions of self-assembly of the high Flory-Huggins interaction parameter (χ) hexagonal dot-array forming BCP, poly(styrene-b-dimethylsiloxane) (PS-b-PDMS). The defects within the resulting patterns at various length scales are then characterized and quantified. The results show that the defectivity of the resulting nanopatterned surfaces is highly dependent upon very small variations of the initial film thicknesses of the BCP, as well as the degree of swelling under the SVA conditions. These parameters also significantly contribute to the quality of the resulting pattern with respect to grain coarsening, as well as the formation of different macroscale phases (single and double layers and wetting layers). The results of qualitative and quantitative defect analyses are then compiled into a single figure of merit (FOM) and are mapped across the experimental parameter space using ML approaches, which enable the identification of the narrow region of optimum conditions for SVA for a given BCP. The result of these analyses is a faster and less resource intensive route toward the production of low-defectivity BCP dot arrays via rational determination of the ideal combination of processing factors. The DOE and machine learning-enabled approach is generalizable to the scale-up of self-assembly-based nanopatterning for applications in electronic microfabrication.
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Affiliation(s)
- Gayashani Ginige
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
| | - Youngdong Song
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
| | - Brian C Olsen
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
| | - Erik J Luber
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
| | - Cafer T Yavuz
- Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
- KAUST Catalysis Center (KCC), Physical Sciences and Engineering (PSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia
- Advanced Membranes and Porous Materials Center (AMPM), Physical Sciences and Engineering (PSE), King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia
| | - Jillian M Buriak
- Department of Chemistry, University of Alberta, 11227-Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
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19
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Mullen E, Morris MA. Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective. NANOMATERIALS (BASEL, SWITZERLAND) 2021; 11:1085. [PMID: 33922231 PMCID: PMC8146645 DOI: 10.3390/nano11051085] [Citation(s) in RCA: 14] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/28/2021] [Revised: 04/06/2021] [Accepted: 04/09/2021] [Indexed: 12/24/2022]
Abstract
The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.
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Affiliation(s)
- Eleanor Mullen
- CRANN and AMBER Research Centres, School of Chemistry, Trinity College Dublin, D02 W085 Dublin, Ireland
| | - Michael A. Morris
- CRANN and AMBER Research Centres, School of Chemistry, Trinity College Dublin, D02 W085 Dublin, Ireland
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20
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Recent Advances in Sequential Infiltration Synthesis (SIS) of Block Copolymers (BCPs). NANOMATERIALS 2021; 11:nano11040994. [PMID: 33924480 PMCID: PMC8069880 DOI: 10.3390/nano11040994] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/08/2021] [Revised: 04/01/2021] [Accepted: 04/04/2021] [Indexed: 12/15/2022]
Abstract
In the continuous downscaling of device features, the microelectronics industry is facing the intrinsic limits of conventional lithographic techniques. The development of new synthetic approaches for large-scale nanopatterned materials with enhanced performances is therefore required in the pursuit of the fabrication of next-generation devices. Self-assembled materials as block copolymers (BCPs) provide great control on the definition of nanopatterns, promising to be ideal candidates as templates for the selective incorporation of a variety of inorganic materials when combined with sequential infiltration synthesis (SIS). In this review, we report the latest advances in nanostructured inorganic materials synthesized by infiltration of self-assembled BCPs. We report a comprehensive description of the chemical and physical characterization techniques used for in situ studies of the process mechanism and ex situ measurements of the resulting properties of infiltrated polymers. Finally, emerging optical and electrical properties of such materials are discussed.
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21
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Gu J, Zhang R, Zhang L, Lin J. Epitaxial Assembly of Nanoparticles in a Diblock Copolymer Matrix: Precise Organization of Individual Nanoparticles into Regular Arrays. Macromolecules 2021. [DOI: 10.1021/acs.macromol.1c00028] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Jiabin Gu
- Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Runrong Zhang
- Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Liangshun Zhang
- Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Jiaping Lin
- Shanghai Key Laboratory of Advanced Polymeric Materials, Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
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22
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Leniart A, Pula P, Tsai EHR, Majewski PW. Large-Grained Cylindrical Block Copolymer Morphologies by One-Step Room-Temperature Casting. Macromolecules 2020; 53:11178-11189. [PMID: 33380751 PMCID: PMC7759006 DOI: 10.1021/acs.macromol.0c02026] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/03/2020] [Revised: 11/13/2020] [Indexed: 12/11/2022]
Abstract
We report a facile method of ordering block copolymer (BCP) morphologies in which the conventional two-step casting and annealing steps are replaced by a single-step process where microphase separation and grain coarsening are seamlessly integrated within the casting protocol. This is achieved by slowing down solvent evaporation during casting by introducing a nonvolatile solvent into the BCP casting solution that effectively prolongs the duration of the grain-growth phase. We demonstrate the utility of this solvent evaporation annealing (SEA) method by producing well-ordered large-molecular-weight BCP thin films in a total processing time shorter than 3 min without resorting to any extra laboratory equipment other than a basic casting device, i.e., spin- or blade-coater. By analyzing the morphologies of the quenched samples, we identify a relatively narrow range of polymer concentration in the wet film, just above the order-disorder concentration, to be critical for obtaining large-grained morphologies. This finding is corroborated by the analysis of the grain-growth kinetics of horizontally oriented cylindrical domains where relatively large growth exponents (1/2) are observed, indicative of a more rapid defect-annihilation mechanism in the concentrated BCP solution than in thermally annealed BCP melts. Furthermore, the analysis of temperature-resolved kinetics data allows us to calculate the Arrhenius activation energy of the grain coarsening in this one-step BCP ordering process.
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Affiliation(s)
| | - Przemyslaw Pula
- Department
of Chemistry, University of Warsaw, Warsaw 02089, Poland
| | - Esther H. R. Tsai
- Center
for Functional Nanomaterials, Brookhaven
National Laboratory, Upton, New York 11973, United States
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23
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Kang H, Kim K, Sohn BH. Shearing with solvent vapor annealing on block copolymer thin films for templates with macroscopically aligned nanodomains. NANOTECHNOLOGY 2020; 31:455302. [PMID: 32702675 DOI: 10.1088/1361-6528/aba8bf] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
A template with macroscopically aligned nanopatterns can be an effective vehicle for arranging nanoscale particles or rods in a particular orientation to achieve their anisotropic properties. A room-temperature process is also desirable for nanoscale patterning of heat-sensitive functional molecules such as organic fluorophores. Here, large-area orientation of nanodomains of block copolymers is demonstrated by simultaneous shearing and solvent vapor annealing at room temperature. The shear-aligned nanodomains are applied to a chemical template for nanoscale patterning of green fluorescent molecules. In addition, the grooved nanochannels obtained from the macroscopically aligned nanodomains work as a physical template for guiding Au nanorods to end-to-end assemblies which exhibit the polarization-dependent plasmonic extinction.
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Affiliation(s)
- Heejung Kang
- Department of Chemistry, Seoul National University, Seoul 08826, Korea
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