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Jo JS, Lee J, Choi C, Jang JW. Tip-based Lithography with a Sacrificial Layer. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2309484. [PMID: 38287738 DOI: 10.1002/smll.202309484] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/19/2023] [Revised: 12/07/2023] [Indexed: 01/31/2024]
Abstract
The fabrication of a highly controlled gold (Au) nanohole (NH) array via tip-based lithography is improved by incorporating a sacrificial layer-a tip-crash buffer layer. This inclusion mitigates scratches during the nano-indentation process by employing a 300 nm thick poly(methyl methacrylate) layer as a sacrificial layer on top of the Au film. Such a precaution ensures minimal scratches on the Au film, facilitating the creation of sub-50 nm Au NHs with a 15 nm gap between the Au NHs. The precision of this method exceeds that of fabricating Au NHs without a sacrificial layer. Demonstrating its versatility, this Au NH array is utilized in two distinct applications: as a dry etching mask to form a molybdenum disulfide hole array and as a catalyst in metal-assisted chemical etching, resulting in conical-shaped silicon nanostructures. Additionally, a significant electric field is generated when Au nanoparticles (NPs) are placed within the Au NHs. This effect arises from coupling electromagnetic waves, concentrated by the Au NHs and amplified by the Au NPs. A notable result of this configuration is the enhancement factor of surface-enhanced Raman scattering, which is an order of magnitude greater than that observed with just Au NHs and Au NPs alone.
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Affiliation(s)
- Jeong-Sik Jo
- Division of Physics and Semiconductor Science, Dongguk University, Seoul, 04620, Republic of Korea
| | - Jinho Lee
- Division of Physics and Semiconductor Science, Dongguk University, Seoul, 04620, Republic of Korea
| | - Chiwon Choi
- Division of Physics and Semiconductor Science, Dongguk University, Seoul, 04620, Republic of Korea
| | - Jae-Won Jang
- Division of Physics and Semiconductor Science, Dongguk University, Seoul, 04620, Republic of Korea
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Surdo S, Barillaro G. Voltage- and Metal-assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024:e2400499. [PMID: 38644330 DOI: 10.1002/smll.202400499] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/22/2024] [Revised: 03/12/2024] [Indexed: 04/23/2024]
Abstract
Sculpting silicon at the micro and nano scales has been game-changing to mold bulk silicon properties and expand, in turn, applications of silicon beyond electronics, namely, in photonics, sensing, medicine, and mechanics, to cite a few. Voltage- and metal-assisted chemical etching (ECE and MaCE, respectively) of silicon in acidic electrolytes have emerged over other micro and nanostructuring technologies thanks to their unique etching features. ECE and MaCE have enabled the fabrication of novel structures and devices not achievable otherwise, complementing those feasible with the deep reactive ion etching (DRIE) technology, the gold standard in silicon machining. Here, a comprehensive review of ECE and MaCE for silicon micro and nano machining is provided. The chemistry and physics ruling the dissolution of silicon are dissected and similarities and differences between ECE and MaCE are discussed showing that they are the two sides of the same coin. The processes governing the anisotropic etching of designed silicon micro and nanostructures are analyzed, and the modulation of etching profile over depth is discussed. The preparation of micro- and nanostructures with tailored optical, mechanical, and thermo(electrical) properties is then addressed, and their applications in photonics, (bio)sensing, (nano)medicine, and micromechanical systems are surveyed. Eventually, ECE and MaCE are benchmarked against DRIE, and future perspectives are highlighted.
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Affiliation(s)
- Salvatore Surdo
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, via G. Caruso 16, Pisa, 56122, Italy
| | - Giuseppe Barillaro
- Dipartimento di Ingegneria dell'Informazione, Università di Pisa, via G. Caruso 16, Pisa, 56122, Italy
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Ahn J, Jang H, Jeong Y, Choi S, Ko J, Hwang SH, Jeong J, Jung YS, Park I. Illuminating Recent Progress in Nanotransfer Printing: Core Principles, Emerging Applications, and Future Perspectives. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2303704. [PMID: 38032705 PMCID: PMC10767444 DOI: 10.1002/advs.202303704] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/07/2023] [Revised: 08/20/2023] [Indexed: 12/01/2023]
Abstract
As the demand for diverse nanostructures in physical/chemical devices continues to rise, the development of nanotransfer printing (nTP) technology is receiving significant attention due to its exceptional throughput and ease of use. Over the past decade, researchers have attempted to enhance the diversity of materials and substrates used in transfer processes as well as to improve the resolution, reliability, and scalability of nTP. Recent research on nTP has made continuous progress, particularly using the control of the interfacial adhesion force between the donor mold, target material, and receiver substrate, and numerous practical nTP methods with niche applications have been demonstrated. This review article offers a comprehensive analysis of the chronological advancements in nTP technology and categorizes recent strategies targeted for high-yield and versatile printing based on controlling the relative adhesion force depending on interfacial layers. In detail, the advantages and challenges of various nTP approaches are discussed based on their working mechanisms, and several promising solutions to improve morphological/material diversity are presented. Furthermore, this review provides a summary of potential applications of nanostructured devices, along with perspectives on the outlook and remaining challenges, which are expected to facilitate the continued progress of nTP technology and to inspire future innovations.
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Affiliation(s)
- Junseong Ahn
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Hanhwi Jang
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Yongrok Jeong
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
- Radioisotope Research DivisionKorea Atomic Energy Research Institute (KAERI)Daejeon34057Republic of Korea
| | - Seongsu Choi
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Jiwoo Ko
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Soon Hyoung Hwang
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Jun‐Ho Jeong
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Yeon Sik Jung
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Inkyu Park
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
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Park TW, Kang YL, Kang EB, Jung H, Lee S, Hwang G, Lee JW, Choi S, Nahm S, Kwon S, kim KH, Park WI. Direct Printing of Ultrathin Block Copolymer Film with Nano-in-Micro Pattern Structures. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2023; 10:e2303412. [PMID: 37607117 PMCID: PMC10582423 DOI: 10.1002/advs.202303412] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/26/2023] [Revised: 07/23/2023] [Indexed: 08/24/2023]
Abstract
Nanotransfer printing (nTP) is one of the most promising nanopatterning methods given that it can be used to produce nano-to-micro patterns effectively with functionalities for electronic device applications. However, the nTP process is hindered by several critical obstacles, such as sub-20 nm mold technology, reliable large-area replication, and uniform transfer-printing of functional materials. Here, for the first time, a dual nanopatterning process is demonstrated that creates periodic sub-20 nm structures on the eight-inch wafer by the transfer-printing of patterned ultra-thin (<50 nm) block copolymer (BCP) film onto desired substrates. This study shows how to transfer self-assembled BCP patterns from the Si mold onto rigid and/or flexible substrates through a nanopatterning method of thermally assisted nTP (T-nTP) and directed self-assembly (DSA) of Si-containing BCPs. In particular, the successful microscale patternization of well-ordered sub-20 nm SiOx patterns is systematically presented by controlling the self-assembly conditions of BCP and printing temperature. In addition, various complex pattern geometries of nano-in-micro structures are displayed over a large patterning area by T-nTP, such as angular line, wave line, ring, dot-in-hole, and dot-in-honeycomb structures. This advanced BCP-replicated nanopatterning technology is expected to be widely applicable to nanofabrication of nano-to-micro electronic devices with complex circuits.
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Affiliation(s)
- Tae Wan Park
- Department of Materials Science and EngineeringKorea UniversitySeoul02841Republic of Korea
- Department of Materials Science and EngineeringPukyong National University (PKNU)45 Yongso‐ro, Nam‐guBusan48513Republic of Korea
| | - Young Lim Kang
- Department of Materials Science and EngineeringPukyong National University (PKNU)45 Yongso‐ro, Nam‐guBusan48513Republic of Korea
| | - Eun Bin Kang
- Department of Materials Science and EngineeringPukyong National University (PKNU)45 Yongso‐ro, Nam‐guBusan48513Republic of Korea
| | - Hyunsung Jung
- Nano Convergence Materials CenterKorea Institute of Ceramic Engineering & Technology (KICET)Jinju52851Republic of Korea
| | - Seoung‐Ki Lee
- School of Materials Science and EngineeringPusan National University (PNU)Busan46241Republic of Korea
| | - Geon‐Tae Hwang
- Department of Materials Science and EngineeringPukyong National University (PKNU)45 Yongso‐ro, Nam‐guBusan48513Republic of Korea
| | - Jung Woo Lee
- School of Materials Science and EngineeringPusan National University (PNU)Busan46241Republic of Korea
| | - Si‐Young Choi
- Department of Materials Science and EngineeringPohang University of Science and Technology (POSTECH)Pohang37673Republic of Korea
| | - Sahn Nahm
- Department of Materials Science and EngineeringKorea UniversitySeoul02841Republic of Korea
| | - Se‐Hun Kwon
- School of Materials Science and EngineeringPusan National University (PNU)Busan46241Republic of Korea
| | - Kwang Ho kim
- School of Materials Science and EngineeringPusan National University (PNU)Busan46241Republic of Korea
- Global Frontier R&D Center for Hybrid Interface Materials (HIM)Pusan National UniversityBusan46241Republic of Korea
| | - Woon Ik Park
- Department of Materials Science and EngineeringPukyong National University (PKNU)45 Yongso‐ro, Nam‐guBusan48513Republic of Korea
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Bok M, Zhao ZJ, Hwang SH, Ahn J, Ko J, Jung JY, Lee J, Jeon S, Jeong JH. Functional Asymmetry-Enabled Self-Adhesive Film via Phase Separation of Binary Polymer Mixtures for Soft Bio-Integrated Electronics. ACS NANO 2022; 16:18157-18167. [PMID: 36240045 DOI: 10.1021/acsnano.2c05159] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
Biocompatible adhesive films are important for many applications (e.g., wearable devices, implantable devices, and attachable sensors). In particular, achieving self-adhesion on one side of a film with biocompatible materials is a compelling goal in adhesion science. Herein, we report a simple and easy manufacturing process using water-soluble hyaluronic acid (HA) that allows adhesiveness on only one side using binary polymer mixtures based on a phase-separation strategy with an elastomer. HA influx allows for the entangled polymer chains of the elastomer to spontaneously deform, permitting tunable mechanical elasticity, conformability, and adhesion. The proposed adhesive film enables the transfer of nanopatterning and the attachment of various surfaces without the use of additional chemicals. In addition, the film can be used for measuring epidermal biopotential and for skin fixation of drug devices. Therefore, the developed facile asymmetric adhesion can block the interferences of other materials on the unnecessary adhesion side, providing considerable potential for the development of functional, multifunctional, and smart bioadhesives.
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Affiliation(s)
- Moonjeong Bok
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Zhi-Jun Zhao
- Institute of Smart City and Intelligent Transportation, Southwest Jiaotong University, Pidu District, Chengdu, Sichuan 610097, China
| | - Soon Hyoung Hwang
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Junseong Ahn
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Jiwoo Ko
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Joo-Yun Jung
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Jihye Lee
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Sohee Jeon
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
| | - Jun-Ho Jeong
- Nano-Convergence Manufacturing Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea
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