• Reference Citation Analysis
  • v
  • v
  • Find an Article
Find an Article PDF (4637602)   Today's Articles (2470)   Subscriber (50134)
For: Che X, Murata K, Pan L, He QL, Yu G, Shao Q, Yin G, Deng P, Fan Y, Ma B, Liang X, Zhang B, Han X, Bi L, Yang QH, Zhang H, Wang KL. Proximity-Induced Magnetic Order in a Transferred Topological Insulator Thin Film on a Magnetic Insulator. ACS Nano 2018;12:5042-5050. [PMID: 29733577 DOI: 10.1021/acsnano.8b02647] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Number Cited by Other Article(s)
1
Qiu G, Yang HY, Chong SK, Cheng Y, Tai L, Wang KL. Manipulating Topological Phases in Magnetic Topological Insulators. NANOMATERIALS (BASEL, SWITZERLAND) 2023;13:2655. [PMID: 37836296 PMCID: PMC10574534 DOI: 10.3390/nano13192655] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/05/2023] [Revised: 09/21/2023] [Accepted: 09/25/2023] [Indexed: 10/15/2023]
2
Llacsahuanga Allcca AE, Pan XC, Miotkowski I, Tanigaki K, Chen YP. Gate-Tunable Anomalous Hall Effect in Stacked van der Waals Ferromagnetic Insulator-Topological Insulator Heterostructures. NANO LETTERS 2022;22:8130-8136. [PMID: 36215229 DOI: 10.1021/acs.nanolett.2c02571] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
3
Proximity-Induced Magnetism in a Topological Insulator/Half-Metallic Ferromagnetic Thin Film Heterostructure. COATINGS 2022. [DOI: 10.3390/coatings12060750] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/07/2022]
4
Bhattacharjee N, Mahalingam K, Fedorko A, Lauter V, Matzelle M, Singh B, Grutter A, Will-Cole A, Page M, McConney M, Markiewicz R, Bansil A, Heiman D, Sun NX. Topological Antiferromagnetic Van der Waals Phase in Topological Insulator/Ferromagnet Heterostructures Synthesized by a CMOS-Compatible Sputtering Technique. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022;34:e2108790. [PMID: 35132680 DOI: 10.1002/adma.202108790] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/01/2021] [Revised: 01/30/2022] [Indexed: 06/14/2023]
5
Riddiford LJ, Grutter AJ, Pillsbury T, Stanley M, Reifsnyder Hickey D, Li P, Alem N, Samarth N, Suzuki Y. Understanding Signatures of Emergent Magnetism in Topological Insulator/Ferrite Bilayers. PHYSICAL REVIEW LETTERS 2022;128:126802. [PMID: 35394317 DOI: 10.1103/physrevlett.128.126802] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/12/2021] [Revised: 01/21/2022] [Accepted: 02/23/2022] [Indexed: 06/14/2023]
6
Liu J, Hesjedal T. Magnetic Topological Insulator Heterostructures: A Review. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021:e2102427. [PMID: 34665482 DOI: 10.1002/adma.202102427] [Citation(s) in RCA: 11] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/29/2021] [Revised: 06/05/2021] [Indexed: 06/13/2023]
7
Bhattacharyya S, Akhgar G, Gebert M, Karel J, Edmonds MT, Fuhrer MS. Recent Progress in Proximity Coupling of Magnetism to Topological Insulators. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021;33:e2007795. [PMID: 34185344 DOI: 10.1002/adma.202007795] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/16/2020] [Revised: 01/11/2021] [Indexed: 05/08/2023]
8
Yang CY, Pan L, Grutter AJ, Wang H, Che X, He QL, Wu Y, Gilbert DA, Shafer P, Arenholz E, Wu H, Yin G, Deng P, Borchers JA, Ratcliff W, Wang KL. Termination switching of antiferromagnetic proximity effect in topological insulator. SCIENCE ADVANCES 2020;6:eaaz8463. [PMID: 32851159 PMCID: PMC7423361 DOI: 10.1126/sciadv.aaz8463] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/14/2019] [Accepted: 06/26/2020] [Indexed: 05/23/2023]
9
Pan L, Grutter A, Zhang P, Che X, Nozaki T, Stern A, Street M, Zhang B, Casas B, He QL, Choi ES, Disseler SM, Gilbert DA, Yin G, Shao Q, Deng P, Wu Y, Liu X, Kou X, Masashi S, Han X, Binek C, Chambers S, Xia J, Wang KL. Observation of Quantum Anomalous Hall Effect and Exchange Interaction in Topological Insulator/Antiferromagnet Heterostructure. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020;32:e2001460. [PMID: 32691882 DOI: 10.1002/adma.202001460] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/29/2020] [Revised: 06/15/2020] [Indexed: 06/11/2023]
10
Ng SM, Wang H, Liu Y, Wong HF, Yau HM, Suen CH, Wu ZH, Leung CW, Dai JY. High-Temperature Anomalous Hall Effect in a Transition Metal Dichalcogenide Ferromagnetic Insulator Heterostructure. ACS NANO 2020;14:7077-7084. [PMID: 32407078 DOI: 10.1021/acsnano.0c01815] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
11
Pan L, Liu X, He QL, Stern A, Yin G, Che X, Shao Q, Zhang P, Deng P, Yang CY, Casas B, Choi ES, Xia J, Kou X, Wang KL. Probing the low-temperature limit of the quantum anomalous Hall effect. SCIENCE ADVANCES 2020;6:eaaz3595. [PMID: 32596443 PMCID: PMC7299611 DOI: 10.1126/sciadv.aaz3595] [Citation(s) in RCA: 15] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/04/2019] [Accepted: 05/05/2020] [Indexed: 05/23/2023]
12
Che X, Pan Q, Vareskic B, Zou J, Pan L, Zhang P, Yin G, Wu H, Shao Q, Deng P, Wang KL. Strongly Surface State Carrier-Dependent Spin-Orbit Torque in Magnetic Topological Insulators. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2020;32:e1907661. [PMID: 32108391 DOI: 10.1002/adma.201907661] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/21/2019] [Revised: 01/28/2020] [Indexed: 06/10/2023]
13
Jeong K, Park H, Chae J, Sim KI, Yang WJ, Kim JH, Hong SB, Kim JH, Cho MH. Topological Phase Control of Surface States in Bi2Se3 via Spin-Orbit Coupling Modulation through Interface Engineering between HfO2-X. ACS APPLIED MATERIALS & INTERFACES 2020;12:12215-12226. [PMID: 32073823 DOI: 10.1021/acsami.9b17555] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
14
Yao X, Gao B, Han MG, Jain D, Moon J, Kim JW, Zhu Y, Cheong SW, Oh S. Record High-Proximity-Induced Anomalous Hall Effect in (BixSb1-x)2Te3 Thin Film Grown on CrGeTe3 Substrate. NANO LETTERS 2019;19:4567-4573. [PMID: 31185718 DOI: 10.1021/acs.nanolett.9b01495] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
15
Hou Y, Kim J, Wu R. Magnetizing topological surface states of Bi2Se3 with a CrI3 monolayer. SCIENCE ADVANCES 2019;5:eaaw1874. [PMID: 31172028 PMCID: PMC6544448 DOI: 10.1126/sciadv.aaw1874] [Citation(s) in RCA: 29] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/27/2018] [Accepted: 04/23/2019] [Indexed: 05/23/2023]
16
Li L, Wang Y, Wang Z, Liu Y, Wang B. Topological Insulator GMR Straintronics for Low-Power Strain Sensors. ACS APPLIED MATERIALS & INTERFACES 2018;10:28789-28795. [PMID: 30058327 DOI: 10.1021/acsami.8b09664] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
PrevPage 1 of 1 1Next
© 2004-2024 Baishideng Publishing Group Inc. All rights reserved. 7041 Koll Center Parkway, Suite 160, Pleasanton, CA 94566, USA