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Qu S, Sun L, Zhang S, Liu J, Li Y, Liu J, Xu W. An artificially-intelligent cornea with tactile sensation enables sensory expansion and interaction. Nat Commun 2023; 14:7181. [PMID: 37935671 PMCID: PMC10630301 DOI: 10.1038/s41467-023-42240-3] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/25/2023] [Accepted: 10/03/2023] [Indexed: 11/09/2023] Open
Abstract
We demonstrate an artificially-intelligent cornea that can assume the functions of the native human cornea such as protection, tactile perception, and light refraction, and possesses sensory expansion and interactive functions. These functions are realized by an artificial corneal reflex arc that is constructed to implement mechanical and light information coding, information processing, and the regulation of transmitted light. Digitally-aligned, long and continuous zinc tin oxide (ZTO) semiconductor fabric patterns were fabricated as the active channels of the artificial synapse, which are non-toxic, heavy-metal-free, low-cost, and ensure superior comprehensive optical properties (transmittance >99.89%, haze <0.36%). Precisely-tuned crystal-phase structures of the ZTO fibers enabled reconfigurable synaptic plasticity, which is applicable to encrypted communication and associative learning. This work suggests new strategies for the tuning of synaptic plasticity and the design of visual neuroprosthetics, and has important implications for the development of neuromorphic electronics and for visual restoration.
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Affiliation(s)
- Shangda Qu
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China
| | - Lin Sun
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China
| | - Song Zhang
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China
| | - Jiaqi Liu
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China
| | - Yue Li
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China
| | - Junchi Liu
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China
| | - Wentao Xu
- Institute of Photoelectronic Thin Film Devices and Technology, Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, College of Electronic Information and Optical Engineering, Engineering Research Center of Thin Film Photoelectronic Technology of Ministry of Education, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, China.
- Shenzhen Research Institute of Nankai University, Shenzhen, 518000, China.
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Lee J, Choi CH, Kim T, Hur J, Kim MJ, Kim EH, Lim JH, Kang Y, Jeong JK. Hydrogen-Doping-Enabled Boosting of the Carrier Mobility and Stability in Amorphous IGZTO Transistors. ACS APPLIED MATERIALS & INTERFACES 2022; 14:57016-57027. [PMID: 36511797 DOI: 10.1021/acsami.2c18094] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
This study investigated the effect of hydrogen (H) on the performance of amorphous In-Ga-Zn-Sn oxide (a-In0.29Ga0.35Zn0.11Sn0.25O) thin-film transistors (TFTs). Ample H in plasma-enhanced atomic layer deposition (PEALD)-derived SiO2 can diffuse into the underlying a-IGZTO film during the postdeposition annealing (PDA) process, which affects the electrical properties of the resulting TFTs due to its donor behavior in the a-IGZTO. The a-In0.29Ga0.35Zn0.11Sn0.25O TFTs at the PDA temperature of 400 °C exhibited a remarkably higher field-effect mobility (μFE) of 85.9 cm2/Vs, a subthreshold gate swing (SS) of 0.33 V/decade, a threshold voltage (VTH) of -0.49 V, and an ION/OFF ratio of ∼108; these values are superior compared to those of unpassivated a-In0.29Ga0.35Zn0.11Sn0.25O TFTs (μFE = 23.3 cm2/Vs, SS = 0.36 V/decade, and VTH = -3.33 V). In addition, the passivated a-In0.29Ga0.35Zn0.11Sn0.25O TFTs had good stability against the external gate bias duration. This performance change can be attributed to the substitutional H doping into oxygen sites (HO) leading to a boost in ne and μFE. In contrast, the beneficial HO effect was barely observed for amorphous indium gallium zinc oxide (a-IGZO) TFTs, suggesting that the hydrogen-doping-enabled boosting of a-IGZTO TFTs is strongly related to the existence of Sn cations. Electronic calculations of VO and HO using density functional theory (DFT) were performed to explain this disparity. The introduction of SnO2 in a-IGZO is predicted to cause a conversion from shallow VO to deep VO due to the lower formation energy of deep VO, which is effectively created around Sn cations. The formation of HO by H doping in the IGZTO facilitates the efficient connection of atomic states forming the conduction band more smoothly. This reduces the effective mass and enhances the carrier mobility.
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Affiliation(s)
- Jeonga Lee
- Department of Electronic Engineering, Hanyang University, Seoul04763, Korea
| | - Cheol Hee Choi
- Department of Electronic Engineering, Hanyang University, Seoul04763, Korea
| | - Taikyu Kim
- Department of Electronic Engineering, Hanyang University, Seoul04763, Korea
| | - Jaeseok Hur
- Department of Electronic Engineering, Hanyang University, Seoul04763, Korea
| | - Min Jae Kim
- Department of Electronic Engineering, Hanyang University, Seoul04763, Korea
| | - Eun Hyun Kim
- Samsung Display Co., Ltd., Yongin446-711, Republic of Korea
| | - Jun Hyung Lim
- Samsung Display Co., Ltd., Yongin446-711, Republic of Korea
| | - Youngho Kang
- Department of Materials Science and Engineering, Incheon National University, Incheon22012, Korea
| | - Jae Kyeong Jeong
- Department of Electronic Engineering, Hanyang University, Seoul04763, Korea
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Zhussupbekova A, Caffrey D, Zhussupbekov K, Smith CM, Shvets IV, Fleischer K. Low-Cost, High-Performance Spray Pyrolysis-Grown Amorphous Zinc Tin Oxide: The Challenge of a Complex Growth Process. ACS APPLIED MATERIALS & INTERFACES 2020; 12:46892-46899. [PMID: 32955846 DOI: 10.1021/acsami.0c12148] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Transparent conductive oxides (TCOs) are important materials for a wide range of optoelectronic devices. Amorphous zinc tin oxide (a-ZTO) is a TCO and one of the best nontoxic, low-cost replacements for more expensive amorphous indium-gallium-zinc oxide. Here, we employ spray pyrolysis (SP), an inexpensive and versatile chemical vapor deposition-based technique, to synthesize a-ZTO with an as-deposited conductivity of ≈300 S/cm-the highest value hitherto among the reported solution-processed films. Compositional analysis via X-ray photoelectron spectroscopy reveals a nonstoichiometric transfer of Zn and Sn from the dissolved precursors into the film, with the best electrical properties achieved at a film composition of xfilm = 0.38 ± 0.04 ((ZnO)x(SnO2)1-x (0 < x < 1)). The morphology of these films is compared to films synthesized by physical vapor deposition (PVD), and a strong correlation between morphology and electrical properties is revealed. The granular nature of the SP-grown films, which seems like a drawback at first glance, brings about the prospect of using a-ZTO in ink-jet-printed films from a nanoparticle suspension for the room-temperature deposition. Brief post-anneal cycles in N2 gas improve the conductivity of the films by means of grain boundary (GB) passivation.
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Affiliation(s)
- Ainur Zhussupbekova
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
| | - David Caffrey
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
| | - Kuanysh Zhussupbekov
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
| | - Christopher M Smith
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
| | - Igor V Shvets
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
| | - Karsten Fleischer
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
- School of Physics, Dublin City University, Dublin 9, Ireland
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Zhussupbekova A, Kaisha A, Vijayaraghavan RK, Fleischer K, Shvets IV, Caffrey D. Importance of Local Bond Order to Conduction in Amorphous, Transparent, Conducting Oxides: The Case of Amorphous ZnSnO y. ACS APPLIED MATERIALS & INTERFACES 2019; 11:44399-44405. [PMID: 31638369 DOI: 10.1021/acsami.9b06210] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
In this report, reactive and nonreactive sputtering of amorphous ZnSnOy (a-ZnSnOy) was investigated, and extensive composition maps have been measured by X-ray photoelectron spectroscopy. The comprehensive analysis of the ((ZnO)x(SnO2)1-x) composition reveals that the best Zn/Sn ratio for high conductivity of the material can vary depending on the deposition technique utilized. Best conductivities of 225 S/cm were found to occur at x = 0.32 for reactive sputtering of a Sn target and x = 0.27 for nonreactive sputtering of a SnO2 target. These values correspond to unstable polymorphs of a-ZnSnOy, ZnSn2O5, and ZnSn3O7. Distinct local bonding arrangements have been confirmed by Raman spectroscopy.
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Affiliation(s)
- Ainur Zhussupbekova
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) , Trinity College Dublin , Dublin 2 , Ireland
| | - Aitkazy Kaisha
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) , Trinity College Dublin , Dublin 2 , Ireland
| | | | - Karsten Fleischer
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) , Trinity College Dublin , Dublin 2 , Ireland
- School of Physics , Dublin City University , Dublin 9 , Ireland
| | - Igor V Shvets
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) , Trinity College Dublin , Dublin 2 , Ireland
| | - David Caffrey
- School of Physics and Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) , Trinity College Dublin , Dublin 2 , Ireland
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Garlapati SK, Divya M, Breitung B, Kruk R, Hahn H, Dasgupta S. Printed Electronics Based on Inorganic Semiconductors: From Processes and Materials to Devices. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2018; 30:e1707600. [PMID: 29952112 DOI: 10.1002/adma.201707600] [Citation(s) in RCA: 28] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/29/2017] [Revised: 03/20/2018] [Indexed: 06/08/2023]
Abstract
Following the ever-expanding technological demands, printed electronics has shown palpable potential to create new and commercially viable technologies that will benefit from its unique characteristics, such as, large-area and wide range of substrate compatibility, conformability and low-cost. Through the last few decades, printed/solution-processed field-effect transistors (FETs) and circuits have witnessed immense research efforts, technological growth and increased commercial interests. Although printing of functional inks comprising organic semiconductors has already been initiated in early 1990s, gradually the attention, at least partially, has been shifted to various forms of inorganic semiconductors, starting from metal chalcogenides, oxides, carbon nanotubes and very recently to graphene and other 2D semiconductors. In this review, the entire domain of printable inorganic semiconductors is considered. In fact, thanks to the continuous development of materials/functional inks and novel design/printing strategies, the inorganic printed semiconductor-based circuits today have reached an operation frequency up to several hundreds of kilohertz with only a few nanosecond time delays at the individual FET/inverter levels; in this regard, often circuits based on hybrid material systems have been found to be advantageous. At the end, a comparison of relative successes of various printable inorganic semiconductor materials, the remaining challenges and the available future opportunities are summarized.
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Affiliation(s)
- Suresh Kumar Garlapati
- Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), D-76344, Eggenstein-Leopoldshafen, Germany
| | - Mitta Divya
- Department of Materials Engineering, Indian Institute of Science, Bangalore, 560012, India
| | - Ben Breitung
- Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), D-76344, Eggenstein-Leopoldshafen, Germany
| | - Robert Kruk
- Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), D-76344, Eggenstein-Leopoldshafen, Germany
| | - Horst Hahn
- Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), D-76344, Eggenstein-Leopoldshafen, Germany
- KIT-TUD Joint Research Laboratory Nanomaterials, Technische Universität Darmstadt (TUD), Institute of Materials Science, Jovanka-Bontschits-Str. 2, ,64287, Darmstadt, Germany
| | - Subho Dasgupta
- Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), D-76344, Eggenstein-Leopoldshafen, Germany
- Department of Materials Engineering, Indian Institute of Science, Bangalore, 560012, India
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Marette A, Poulin A, Besse N, Rosset S, Briand D, Shea H. Flexible Zinc-Tin Oxide Thin Film Transistors Operating at 1 kV for Integrated Switching of Dielectric Elastomer Actuators Arrays. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2017; 29:1700880. [PMID: 28603892 DOI: 10.1002/adma.201700880] [Citation(s) in RCA: 29] [Impact Index Per Article: 4.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/13/2017] [Revised: 03/26/2017] [Indexed: 05/19/2023]
Abstract
Flexible high-voltage thin-film transistors (HVTFTs) operating at more than 1 kV are integrated with compliant dielectric elastomer actuators (DEA) to create a flexible array of 16 independent actuators. To allow for high-voltage operation, the HVTFT implements a zinc-tin oxide channel, a thick dielectric stack, and an offset gate. At a source-drain bias of 1 kV, the HVTFT has a 20 µA on-current at a gate voltage bias of 30 V. Their electrical characteristics enable the switching of DEAs which require drive voltages of over 1 kV, making control of an array simpler in comparison to the use of external high-voltage switching. These HVTFTs are integrated in a flexible haptic display consisting of a 4 × 4 matrix of DEAs and HVTFTs. Using a single 1.4 kV supply, each DEA is independently switched by its associated HVTFT, requiring only a 30 V gate voltage for full DEA deflection. The 4 × 4 display operates well even when bent to a 5 mm radius of curvature. By enabling DEA switching at low voltages, flexible metal-oxide HVTFTs enable complex flexible systems with dozens to hundreds of independent DEAs for applications in haptics, Braille displays, and soft robotics.
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Affiliation(s)
- Alexis Marette
- Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000, Neuchâtel, Switzerland
| | - Alexandre Poulin
- Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000, Neuchâtel, Switzerland
| | - Nadine Besse
- Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000, Neuchâtel, Switzerland
| | - Samuel Rosset
- Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000, Neuchâtel, Switzerland
| | - Danick Briand
- Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000, Neuchâtel, Switzerland
| | - Herbert Shea
- Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, CH-2000, Neuchâtel, Switzerland
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7
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Wei J, Yin Z, Chen SC, Zheng Q. Low-Temperature Solution-Processed Zinc Tin Oxide Film as a Cathode Interlayer for Organic Solar Cells. ACS APPLIED MATERIALS & INTERFACES 2017; 9:6186-6193. [PMID: 28117970 DOI: 10.1021/acsami.6b13724] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
In this study, Sn-doped ZnO (ZTO) is prepared by a sol-gel method and is employed as an electron transport material for organic solar cells (OSCs). After Sn modification, the fabricated ZTO films exhibited better charge transport properties and smoother surface morphology, especially for those processed at a low temperature of 120 °C. By incorporation of the high-temperature (200 °C) processed ZTO films, inverted OSCs showed the highest power conversion efficiency (PCE) of 9.32%, which is higher than those based on the same temperature processed ZnO films. For the devices based on the low-temperature processed ZTO, a high PCE over 9.0% with long-term stability was achieved, which is much better than those based on the same temperature processed ZnO (8.46% PCE). Here, the ZTO films can be fabricated without high-temperature annealing, demonstrating their great potential as electron transport layers for efficient flexible OSCs.
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Affiliation(s)
- Jiajun Wei
- State Key Laboratory of Structure Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences , 155 Yangqiao West Road, Fuzhou, Fujian 350002, P. R. China
- University of Chinese Academy of Sciences , Beijing 100049, P. R. China
| | - Zhigang Yin
- State Key Laboratory of Structure Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences , 155 Yangqiao West Road, Fuzhou, Fujian 350002, P. R. China
- University of Chinese Academy of Sciences , Beijing 100049, P. R. China
| | - Shan-Ci Chen
- State Key Laboratory of Structure Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences , 155 Yangqiao West Road, Fuzhou, Fujian 350002, P. R. China
| | - Qingdong Zheng
- State Key Laboratory of Structure Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences , 155 Yangqiao West Road, Fuzhou, Fujian 350002, P. R. China
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Bitter S, Schlupp P, Bonholzer M, von Wenckstern H, Grundmann M. Influence of the Cation Ratio on Optical and Electrical Properties of Amorphous Zinc-Tin-Oxide Thin Films Grown by Pulsed Laser Deposition. ACS COMBINATORIAL SCIENCE 2016; 18:188-94. [PMID: 27004935 DOI: 10.1021/acscombsci.5b00179] [Citation(s) in RCA: 15] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Abstract
Continuous composition spread (CCS) methods allow fast and economic exploration of composition dependent properties of multielement compounds. Here, a CCS method was applied for room temperature pulsed laser deposition (PLD) of amorphous zinc-tin-oxide to gain detailed insight into the influence of the zinc-to-tin cation ratio on optical and electrical properties of this ternary compound. Our CCS approach for a large-area offset PLD process utilizes a segmented target and thus makes target exchange or movable masks in the PLD chamber obsolete. Cation concentrations of 0.08-0.82 Zn/(Zn + Sn) were achieved across single 50 × 50 mm(2) glass substrates. The electrical conductivity increases for increasing tin content, and the absorption edge shifts to lower energies. The free carrier concentration can be tuned from 10(20) to 10(16) cm(-3) by variation of the cation ratio from 0.1 to 0.5 Zn/(Zn + Sn).
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Affiliation(s)
- Sofie Bitter
- Universität Leipzig Institut für Experimentelle Physik II, Linnéstraße 5, 04103 Leipzig, Germany
| | - Peter Schlupp
- Universität Leipzig Institut für Experimentelle Physik II, Linnéstraße 5, 04103 Leipzig, Germany
| | - Michael Bonholzer
- Universität Leipzig Institut für Experimentelle Physik II, Linnéstraße 5, 04103 Leipzig, Germany
| | - Holger von Wenckstern
- Universität Leipzig Institut für Experimentelle Physik II, Linnéstraße 5, 04103 Leipzig, Germany
| | - Marius Grundmann
- Universität Leipzig Institut für Experimentelle Physik II, Linnéstraße 5, 04103 Leipzig, Germany
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