Axial SiGe heteronanowire tunneling field-effect transistors

On-wire bandgap engineering via a magnetic-pulled CVD approach and optoelectronic applications of one-dimensional nanostructures

Since the emergence of one-dimensional nanostructures, in particular the bandgap-graded semiconductor nanowires/ribbons or heterostructures, lots of attentions have been devoted to unraveling their intriguing properties and finding applications for future developments in optical communications and integrated optoelectronic devices. In particular, the ability to modulate the bandgap along a single nanostructure greatly enhances their functionalities in optoelectronics, and hence these studies are essential to pave the way for future high-integrated devices and circuits. Herein, we focus on a brief review on recent advances about the synthesis through a magnetic-pulled chemical vapor deposition approach, crystal structure and the unique optical and electronic properties of on-nanostructures semiconductors, including axial nanowire heterostructures, asymmetrical/symmetric bandgap gradient nanowires, lateral heterostructure nanoribbons, lateral bandgap graded ribbons. Moreover, recent developments in applications using low-dimensional bandgap modulated structures, especially in bandgap-graded nanowires and heterostructures, are summarized, including multicolor lasers, waveguides, white-light sources, photodetectors, and spectrometers, where the main strategies and unique features are addressed. Finally, future outlook and perspectives for the current challenges and the future opportunities of one-dimensional nanostructures with bandgap engineering are discussed to provide a roadmap future development in the field.

A Review of Sharp-Switching Band-Modulation Devices

This paper reviews the recently-developed class of band-modulation devices, born from the recent progress in fully-depleted silicon-on-insulator (FD-SOI) and other ultrathin-body technologies, which have enabled the concept of gate-controlled electrostatic doping. In a lateral PIN diode, two additional gates can construct a reconfigurable PNPN structure with unrivalled sharp-switching capability. We describe the implementation, operation, and various applications of these band-modulation devices. Physical and compact models are presented to explain the output and transfer characteristics in both steady-state and transient modes. Not only can band-modulation devices be used for quasi-vertical current switching, but they also show promise for compact capacitorless memories, electrostatic discharge (ESD) protection, sensing, and reconfigurable circuits, while retaining full compatibility with modern silicon processing and standard room-temperature low-voltage operation.

Ambipolar transport in Ni-catalyzed InGaAs nanowire field-effect transistors for near-infrared photodetection

Weak n-type characteristics or poor p-type characteristics are limiting the applications of binary semiconductors based on ambipolar field-effect transistors (FETs). In this work, a ternary alloy of In0.2Ga0.8As nanowires (NWs) is successfully prepared using a Ni catalyst during a typical solid-source chemical-vapor-deposition process to balance the weak n-type conduction behavior in ambipolar GaAs NWFETs and the poor p-type conduction behavior in ambipolar InAs NWFETs. The presence of ambipolar transport, contributed by a native oxide shell and the body defects of the prepared In0.2Ga0.8As NWs, is confirmed by the constructed back-gated NWFETs. As demonstrated by photoluminescence, the bandgap of the prepared In0.2Ga0.8As NWs is 1.28 eV, offering the promise of application in near-infrared (NIR) photodetection. Under 850 nm laser illumination, the fabricated ambipolar NWFETs show extremely low dark currents of 50 pA and 0.5 pA when positive and negative gate voltages are applied, respectively. All the results demonstrate that with careful design of the surface oxide layer and the body defects, NWs are suitable for use in next-generation optoelectronic devices.

Single-nanostructure bandgap engineering enabled by magnetic-pulling thermal evaporation growth

Realizing the substantial potential of bottom-up 1D semiconductor nanostructures in developing functional nanodevices calls for dedicated single-nanostructure bandgap engineering by various growth approaches. Although thermal evaporation has been advised as a facile approach for most semiconductors to form 1D nanostructures from bottom-up, its capability of achieving single-nanostructure bandgap engineering was considered a challenge. In 2011, we succeeded in the direct growth of composition-graded CdS1-x Se x (0 ≤ x ≤ 1) nanowires by upgrading the thermal-evaporation tube furnace with a home-made magnetic-pulling module. This report aims to provide a comprehensive review of the latest advances in the single-nanostructure bandgap engineering enabled by the magnetic-pulling thermal evaporation growth. The report begins with the description of different magnetic-pulling thermal evaporation strategies associated with diverse examples of composition-engineered 1D nanostructures. Following is an elaboration on their optoelectronic applications based on the resulting single-nanostructure bandgap engineering, including monolithic white-light sources, proof-of-concept asymmetric light propagation and wavelength splitters, monolithic multi-color and white-light lasers, broadband-response photodetectors, high-performance transistors, and recently the most exciting single-nanowire spectrometer. In the end, this report concludes with some personal perspectives on the directions toward which future research might be advanced.

Impact of droplet composition on the nucleation rate and morphology of vapor-liquid-solid GeSn nanowires

It is well-known that the chemical potential which drives the vapor-liquid-solid growth of semiconductor nanowires is strongly affected by the liquid phase composition. Here, we investigate theoretically how the droplet composition influences the nucleation of Au-catalyzed GeSn nanowires on Ge(111) and Si(111) substrates. We compare the chemical potentials in an Au-Ge-Sn catalyst droplet before and after adding Ga and/or Si atoms. It is found that the presence of these atoms enhances the nucleation rate of nanowires on both substrates. Theoretical results are compared to experimental data on GeSn nanowires grown in a hot-wall reduced pressure chemical vapor deposition reactor. It is shown that the intentional addition of Ga in the de-wetting step improves the uniformity of the nanowire dimensions and yields higher density of nanowires over Ge(111) substrates. The nanowire growth on Si(111) substrate occurs only when Ga and/or Si are added to Au droplets. These results show that controlling the composition of the catalyst droplet is crucial for improving the quality of GeSn nanowires.

Sub-60 mV per decade switching in ion-gel-gated In-Sn-O transistors with a nano-thick charge trapping layer

In this paper, we present a new method for reducing the subthreshold swing (SS) of ionic-modulated oxide field-effect transistors (FETs) below 60 mV per decade. The electrical performances of ion gel-gated In-Sn-O FETs with and without a nano-thick Al2O3 charge trapping layer are compared and studied. A significant SS reduction in the In-Sn-O FETs is observed when naturally oxidized Al2O3 and an ion gel are used as the gate stacking dielectric layer. The back sweep SS reaches as low as ∼27 mV per decade and extends over three orders of magnitude in drain current. A theoretical explanation for these results based on energy band diagrams is presented. The proposed devices described here have the potential to open up new avenues for further development of low power electronics, as well as for energy efficient memristive devices and synaptic electronics.

Vertical-Tunnel Field-Effect Transistor Based on a Silicon-MoS2 Three-Dimensional-Two-Dimensional Heterostructure

We present a tunneling field-effect transistor based on a vertical heterostructure of highly p-doped silicon and n-type MoS₂. The resulting p-n heterojunction shows a staggered band alignment in which the quantum mechanical band-to-band tunneling probability is enhanced. The device functions in both tunneling transistor and conventional transistor modes, depending on whether the p-n junction is forward or reverse biased, and exhibits a minimum subthreshold swing of 15 mV/dec, an average of 77 mV/dec for four decades of the drain current, a high on/off current ratio of approximately 10⁷ at a drain voltage of 1 V, and fully suppressed ambipolar behavior. Furthermore, low-temperature electrical measurements demonstrated that both trap-assisted and band-to-band tunneling contribute to the drain current. The presence of traps was attributed to defects within the interfacial oxide between silicon and MoS₂.

Cyclical Thinning of Black Phosphorus with High Spatial Resolution for Heterostructure Devices

A high spatial resolution, cyclical thinning method for realizing black phosphorus (BP) heterostructures is reported. This process utilizes a cyclic technique involving BP surface oxidation and vacuum annealing to create BP flakes as thin as 1.6 nm. The process also utilizes a spatially patternable mask created by evaporating Al that oxidizes to form Al₂O₃, which stabilizes the unetched BP regions and enables the formation of lateral heterostructures with spatial resolution as small as 150 nm. This thinning/patterning technique has also been used to create the first-ever lateral heterostructure BP metal oxide semiconductor field-effect transistor (MOSFET), in which half of a BP flake was thinned in order to increase its band gap. This heterostructure MOSFET showed an ON/OFF current ratio improvement of 1000× compared to homojunction MOSFETs.

Local electric field enhancement at the heterojunction of Si/SiGe axially heterostructured nanowires under laser illumination

We present a phenomenon concerning electromagnetic enhancement at the heterojunction region of axially heterostructured Si/SiGe nanowires when the nanowire is illuminated by a focused laser beam. The local electric field is sensed by micro Raman spectroscopy, which allows the enhancement of the Raman signal arising from the heterojunction region to be revealed; the Raman signal per unit volume increases at least ten times with respect to the homogeneous Si and SiGe nanowire segments. In order to explore the physical meaning of this phenomenon, a three-dimensional solution of the Maxwell equations of the interaction between the focused laser beam and the nanowire was carried out by finite element methods. A local enhancement of the electric field at the heterojunction was deduced. However, the magnitude of the electromagnetic field enhancement only approaches the experimental one when the free carriers are considered, showing enhanced absorption at the carrier depleted heterojunction region. The existence of this effect promises a way of improving photon harvesting using axially heterostructured semiconductor nanowires.

Towards promising modification of GeSi nanostructures via self-assembly on miscut Si(001) substrates

Self-assembled GeSi nanostructures on miscut Si(001) substrates are studied systematically with regard to the miscut angle and azimuth, the amount of Ge and the growth temperature. The comprehensive dependence of the spatial arrangement, which can exhibit one- and two-dimensional (1D and 2D) ordering, as well as the shape and density, of GeSi nanostructures on the miscut angle is observed. The orientation and side-walls of the 1D ordered in-plane GeSi nanowires on miscut Si(001) substrates are intimately associated with the miscut azimuth towards the 〈110〉 or 〈010〉 directions. Furthermore, the unique evolution of the GeSi nanostructures with the amount of Ge and the growth temperature on miscut Si (001) substrates towards the 〈010〉 direction is discovered. Such promising features of self-assembled GeSi nanostructures on miscut Si (001) substrates are explained in terms of the thermodynamics and growth kinetics, which are both affected significantly by the substrate vicinality. These results demonstrate that the miscut substrates offer a promising degree of freedom for the feasible modification of self-assembled nanostructures.

Solvent Vapor Growth of Axial Heterostructure Nanowires with Multiple Alternating Segments of Silicon and Germanium

Herein, we report the formation of multisegment Si-Ge axial heterostructure nanowires in a wet chemical synthetic approach. These nanowires are grown by the liquid injection of the respective silicon and germanium precursors into the vapor phase of an organic solvent in which a tin-coated stainless steel substrate is placed. The Si-Ge transition is obtained by sequential injection with the more difficult Ge-Si transition enabled by inclusion of a quench sequence in the reaction. This approach allows for alternating between pure Si and pure Ge segments along the entire nanowire length with good control of the respective segment dimensions. The multisegment heterostructure nanowires presented are Ge-Si, Si-Ge-Si, Ge-Si-Ge, Si-Ge-Si-Ge, and Si-Ge-Si-Ge-Si-Ge. The interfacial abruptness of the Ge to Si interface is also determined through the use of aberration corrected scanning transmission electron microscopy and electron energy loss spectroscopy.

Contact properties of field-effect transistors based on indium arsenide nanowires thinner than 16 nm

With the scaling down of field effect transistors (FETs) to improve performance, the contact between the electrodes and the channel becomes more and more important. Contact properties of FETs based on ultrathin InAs NWs (with the diameter ranging from sub-7 nm to 16 nm) are investigated here. Chromium (Cr) and nickel (Ni) are proven to form ohmic contact with the ultrathin InAs NWs, in contrast to a recent report (Razavieh A et al ACS Nano 8 6281). Furthermore, the contact resistance is found to depend on the NW diameter and the contact metals, which between Cr and InAs NWs increases more rapidly than that between Ni and InAs NWs when the NW diameter decreases. The origins of the contact resistance difference for the two kinds of metals are studied and NixInAs is believed to play an important role. Based on our results, it is advantageous to use Ni as contact metal for ultrathin NWs. We also observe that the FETs are still working in the diffusive regime even when the channel length is scaled down to 50 nm.

Unique features of laterally aligned GeSi nanowires self-assembled on the vicinal Si (001) surface misoriented toward the [100] direction

We demonstrate laterally aligned and catalyst-free GeSi nanowires (NWs) via self-assembly of Ge on miscut Si (001) substrates toward the [100] direction by an angle θ (θ < 11°). The NWs are bordered by (001) and (105) facets, which are thermodynamically stable. By tuning the miscut angle θ, the NW height can be easily modulated with a nearly constant width. The thickness of the wetting layer beneath the NWs also shows a peculiar behavior with a minimum at around 6°. An analytical model, considering the variation of both the surface energy and the strain energy of the epilayer on vicinal surfaces with the miscut angle and layer thickness, shows good overall agreement with the experimental results. It discloses that both the surface energy and stain energy of the epilayer on vicinal surfaces can be considerably affected in the same trend by the surface steps. Our results not only shed new light on the growth mechanism during heteroepitaxial growth, but also pave a prominent way to fabricate and meanwhile modulate laterally aligned and dislocation-free NWs.

Enhanced performance of ZnO piezotronic pressure sensor through electron-tunneling modulation of MgO nanolayer

Piezoelectric materials can be applied into electromechanical conversion and attract extensive attention with potential applications in various sensors. Here, we present two types of piezotronic pressure sensors based on ZnO nanoarrays. By introducing an insulating MgO (i-MgO) nanolayer, the "on/off" current ratio of the sensor is significantly improved up to 10(5). Furthermore, the sensor shows a high sensitivity of 7.1 × 10(4) gf(-1), a fast response time of 128 ms. The excellent properties are attributed to the combination of piezoelectric effect of ZnO nanoarrays and electron-tunneling modulation of MgO nanolayer, and the reversible potential barrier height controlled by piezoelectric potential. We further investigate the service behavior of the sensor, which can detect force varying from 3.2 to 27.2 gf. Our research provides a promising approach to boost the performance of nanodevices.

High performance tunnel field-effect transistor by gate and source engineering

As one of the most promising candidates for future nanoelectronic devices, tunnel field-effect transistors (TFET) can overcome the subthreshold slope (SS) limitation of MOSFET, whereas high ON-current, low OFF-current and steep switching can hardly be obtained at the same time for experimental TFETs. In this paper, we developed a new nanodevice technology based on TFET concepts. By designing the gate configuration and introducing the optimized Schottky junction, a multi-finger-gate TFET with a dopant-segregated Schottky source (mFSB-TFET) is proposed and experimentally demonstrated. A steeper SS can be achieved in the fabricated mFSB-TFET on the bulk Si substrate benefiting from the coupled quantum band-to-band tunneling (BTBT) mechanism, as well as a high I(ON)/I(OFF) ratio (∼ 10(7)) at V(DS) = 0.2 V without an area penalty. By compatible SOI CMOS technology, the fabricated Si mFSB-TFET device was further optimized with a high ION/IOFF ratio of ∼ 10(8) and a steeper SS of over 5.5 decades of current. A minimum SS of below 60 mV dec(-1) was experimentally obtained, indicating its dominant quantum BTBT mechanism for switching.

Multimode silicon nanowire transistors

The combined capabilities of both a nonplanar design and nonconventional carrier injection mechanisms are subject to recent scientific investigations to overcome the limitations of silicon metal oxide semiconductor field effect transistors. In this Letter, we present a multimode field effect transistors device using silicon nanowires that feature an axial n-type/intrinsic doping junction. A heterostructural device design is achieved by employing a self-aligned nickel-silicide source contact. The polymorph operation of the dual-gate device enabling the configuration of one p- and two n-type transistor modes is demonstrated. Not only the type but also the carrier injection mode can be altered by appropriate biasing of the two gate terminals or by inverting the drain bias. With a combined band-to-band and Schottky tunneling mechanism, in p-type mode a subthreshold swing as low as 143 mV/dec and an ON/OFF ratio of up to 10(4) is found. As the device operates in forward bias, a nonconventional tunneling transistor is realized, enabling an effective suppression of ambipolarity. Depending on the drain bias, two different n-type modes are distinguishable. The carrier injection is dominated by thermionic emission in forward bias with a maximum ON/OFF ratio of up to 10(7) whereas in reverse bias a Schottky tunneling mechanism dominates the carrier transport.

Composition-dependent interfacial abruptness in Au-catalyzed Si(1-x)Ge(x)/Si/Si(1-x)Ge(x) nanowire heterostructures

As MOSFETs are scaled down, power dissipation remains the most challenging bottleneck for nanoelectronic devices. To circumvent this challenge, alternative devices such as tunnel field effect transistors are potential candidates, where the carriers are injected by a much less energetically costly quantum band to band tunneling mechanism. In this context, axial nanowire heterointerfaces with well-controlled interfacial abruptness offer an ideal structure. We demonstrate here the effect of tuning the Ge concentration in a Si1-xGex part of the nanowire on the Si/Si1-xGex and Si1-xGex/Si interfacial abruptness in axial Si-Si1-xGex nanowire heterostructures grown by the Au-catalyzed vapor-liquid-solid method. The two heterointerfaces are always asymmetric irrespective of the Ge concentration or nanowire diameter. For a fixed diameter, the value of interface abruptness decreases with increasing the Ge content for the Si/Si1-xGex interface but shows no strong Ge dependence at the Si1-xGex/Si interface where it features a linear correlation with the nanowire diameter. To rationalize these findings, a kinetic model for the layer-by-layer growth of nanowire heterostructures from a ternary Au-Ge-Si alloy is established that predicts a discrepancy in Ge concentration in the layer and the catalyst droplet. The Ge concentration in each layer is predicted to be dependent on the composition of the preceding layer. The most abrupt heterointerface (∼5 nm) is achieved by growing Si1-xGex with x = 0.85 on Si in a 25 nm diameter nanowire.