Fast assembly of ordered block copolymer nanostructures through microwave annealing

Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes

The guiding pattern in the chemoepitaxially directed self-assembly (DSA) of block copolymers is often fabricated by periodically functionalizing homogeneously random copolymer brushes tethered on a substrate. The prepatterned copolymer brushes constitute a soft penetrable surface, and their two components can in principle locally segregate in response to the overlying self-assembly process of block copolymers. To reveal how the self-responsive behavior of the copolymer brushes affects the directing effect, we develop a dissipative particle dynamics model to explicitly include the prepatterned polymer brushes and implement it to simulate the DSA of a cylinder-forming diblock copolymer melt on the sparse pattern of polymer brushes. Through large-scale dynamic simulations, we identify the windows of the content of the random copolymer, the film thickness, and the diameter of the patterned spot, for the formation of perfectly ordered hexagonal patterns composed of perpendicular cylinders. Our dynamic simulations reveal that the random copolymer brushes grafted on the unpatterned area exhibit a remarkable self-responsive ability with respect to the self-assembly of the diblock copolymers overlying them, which may widen the effective window of the content of the random copolymer. Within the processing windows of these key parameters, defect-free patterns are successfully achieved both in simulations and in experiments with sizes as large as a few micrometers for 4-fold density multiplications. This work demonstrates that highly efficient computer simulations based on an effective model can provide helpful guidance for experiments to optimize the critical parameters and even may promote the application of DSA.

Deposition patterns formed by the evaporation of linear diblock copolymer solution nanodroplets on solid surfaces

The evaporation-induced deposition pattern of the linear diblock copolymer solution has attracted attention in recent years. Given its critical applications, we study deposition patterns of the linear diblock copolymer solution nanodroplet on a solid surface (the wall) by molecular dynamics simulations. This study focuses on the influence of the nonbonded interaction strength, including the interaction between the wall and polymer blocks (ɛAW and ɛBW), the interaction between the solvent and the wall (ɛSW), and the interaction between polymer blocks (ɛAB). Conditions leading to diverse deposition patterns are explored, including the coffee-ring and the volcano-like structures. The formation of the coffee-ring structure is attributed to receding interfaces, the heterogeneity inside the droplet, and the self-assembly of polymer chains. This study contributes to the establishment of guidelines for designing deposition patterns of the linear diblock copolymer solution nanodroplet, which facilitates practical applications such as inkjet printing.

Focused solar annealing for block copolymer fast self-assembly

Block copolymer (BCP) self-assembly has tremendous potential applications in next-generation nanolithography. It offers significant advantages, including high resolution and cost-effectiveness, effectively overcoming the limitations associated with conventional optical lithography. In this work, we demonstrate a focused solar annealing (FSA) technique that is facile, eco-friendly, and energy-efficient for fast self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films. The FSA principle involves utilizing a common biconvex lens to converge incident solar radiation into a high-temperature spot, which is directly used to drive the microphase separation of PS-b-PMMA thin films. As a result, PS-b-PMMA undergoes self-assembly, forming ordered nanostructures in a vertical orientation at seconds timescales on silicon substrates with a neutral layer. In addition, the FSA technique can be employed for grafting neutral polymer brushes onto the silicon substrate. Furthermore, the FSA's compatibility with graphoepitaxy-directed self-assembly (DSA) of BCP is also demonstrated in the patterning of contact holes. The results of contact hole shrinking show that contact hole prepatterns of ∼60.4 nm could be uniformly shrunk to ∼20.5 nm DSA hole patterns with a hole open yield (HOY) of 100 %. For contact hole multiplication, doublet DSA holes were successfully generated on elliptical templates, revealing an average DSA hole size of ∼21.3 nm. Most importantly, due to the direct use of solar energy, the FSA technique provides many significant advantages such as simplicity, environmental friendliness, solvent-free, low cost, and net-zero carbon emissions, and will open up a new direction for BCP lithography that is sustainable, pollution-free, and carbon-neutral.

Preparation, Properties, and Bioapplications of Block Copolymer Nanopatterns

Block copolymer (BCP) self-assembly has emerged as a feasible method for large-scale fabrication with remarkable precision - features that are not common for most of the nanofabrication techniques. In this review, recent advancements in the molecular design of BCP along with state-of-the-art processing methodologies based on microphase separation alone or its combination with different lithography methods are presented. Furthermore, the bioapplications of the generated nanopatterns in the development of protein arrays, cell-selective surfaces, and antibacterial coatings are explored. Finally, the current challenges in the field are outlined and the potential breakthroughs that can be achieved by adopting BCP approaches already applied in the fabrication of electronic devices are discussed.

Direct Printing of Ultrathin Block Copolymer Film with Nano-in-Micro Pattern Structures

Nanotransfer printing (nTP) is one of the most promising nanopatterning methods given that it can be used to produce nano-to-micro patterns effectively with functionalities for electronic device applications. However, the nTP process is hindered by several critical obstacles, such as sub-20 nm mold technology, reliable large-area replication, and uniform transfer-printing of functional materials. Here, for the first time, a dual nanopatterning process is demonstrated that creates periodic sub-20 nm structures on the eight-inch wafer by the transfer-printing of patterned ultra-thin (<50 nm) block copolymer (BCP) film onto desired substrates. This study shows how to transfer self-assembled BCP patterns from the Si mold onto rigid and/or flexible substrates through a nanopatterning method of thermally assisted nTP (T-nTP) and directed self-assembly (DSA) of Si-containing BCPs. In particular, the successful microscale patternization of well-ordered sub-20 nm SiOx patterns is systematically presented by controlling the self-assembly conditions of BCP and printing temperature. In addition, various complex pattern geometries of nano-in-micro structures are displayed over a large patterning area by T-nTP, such as angular line, wave line, ring, dot-in-hole, and dot-in-honeycomb structures. This advanced BCP-replicated nanopatterning technology is expected to be widely applicable to nanofabrication of nano-to-micro electronic devices with complex circuits.

Hiking down the Free Energy Landscape Using Sequential Solvent and Thermal Processing for Versatile Ordering of Block Copolymer Films

The kinetics and morphology of the ordering of block copolymer (BCP) films are highly dependent on the processing pathway, as the enthalpic and entropic forces driving the ordering processes can be quite different depending on process history. We may gain some understanding and control of this variability of BCP morphology with processing history through a consideration of the free energy landscape of the BCP material and a consideration of how the processing procedure moves the system through this energy landscape in a way that avoids having the system becoming trapped into well-defined metastable minima having a higher free energy than the target low free energy ordered structure. It is well known that standard thermal annealing (TA) of BCPs leads to structures corresponding to a well-defined stable free energy minimum; however, the BCP must be annealed for a very long time before the target low free energy structures can be achieved. Herein, we show that the same target low-energy structure can be achieved relatively quickly by subjecting as-cast films to an initial solvent annealing [direct immersion annealing (DIA) or solvent vapor annealing (SVA)] procedure, followed by a short period of TA. This process relies on lowering the activation energy barrier by reducing the glass-transition temperature through DIA (or SVA), followed by a multi-interface chain rearrangement through sequential TA. This energy landscape approach to ordering should be applicable to the process design for ordering many other complex materials.

Processive Pathways to Metastability in Block Copolymer Thin Films

Block copolymers (BCPs) self-assemble into intricate nanostructures that enhance a multitude of advanced applications in semiconductor processing, membrane science, nanopatterned coatings, nanocomposites, and battery research. Kinetics and thermodynamics of self-assembly are crucial considerations in controlling the nanostructure of BCP thin films. The equilibrium structure is governed by a molecular architecture and the chemistry of its repeat units. An enormous library of materials has been synthesized and they naturally produce a rich equilibrium phase diagram. Non-equilibrium phases could potentially broaden the structural diversity of BCPs and relax the synthetic burden of creating new molecules. Furthermore, the reliance on synthesis could be complicated by the scalability and the materials compatibility. Non-equilibrium phases in BCPs, however, are less explored, likely due to the challenges in stabilizing the metastable structures. Over the past few decades, a variety of processing techniques were introduced that influence the phase transformation of BCPs to achieve a wide range of morphologies. Nonetheless, there is a knowledge gap on how different processive pathways can induce and control the non-equilibrium phases in BCP thin films. In this review, we focus on different solvent-induced and thermally induced processive pathways, and their potential to control the non-equilibrium phases with regards to their unique aspects and advantages. Furthermore, we elucidate the limitations of these pathways and discuss the potential avenues for future investigations.

Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films

This work aims to demonstrate a facile method for the controlled orientation of nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system, polystyrene-block-polydimethylsiloxane (PS-b-PDMS), is chosen to demonstrate vacuum-driven orientation for solving the notorious low-surface-energy problem of silicon-based BCP nanopatterning. By taking advantage of the pressure dependence of the surface tension of polymeric materials, a neutral air surface for the PS-b-PDMS thin film can be formed under a high vacuum degree (∼10^-4 Pa), allowing the formation of the film-spanning perpendicular cylinders and lamellae upon thermal annealing. In contrast to perpendicular lamellae, a long-range lateral order for forming perpendicular cylinders can be efficiently achieved through the self-alignment mechanism for induced ordering from the top and bottom of the free-standing thin film.

Preparation and Characterization of Strongly Sulfonated Acid Block and Random Copolymer Membranes for Acetic Acid Esterification with 2-Propanol

In this paper, we report the synthesis of block and random copolymers of 2-acrylamido-2-methyl-1-propane sulfonic acid (AMPS) and methyl methacrylate (MMA), with different AMPS feed ratios. These solution-processable copolymers with strongly sulfonated acid groups resulted in membranes with tunable ion exchange (IEC) and water absorption capacities. AFM images confirmed the microphase separation of PAMPS-b-PMMA-1:1 block copolymer membrane, annealed under the appropriate conditions. The resulting copolymers from the random combination of a 1:1 molar ratio of AMPS and MMA monomers are effective at enhancing the esterification conversion of acetic acid, when compared with a reaction catalyzed by PAMPS-b-PMMA block copolymers and the previously studied catalytic membranes. With the PAMPS-co-PMMA-1:1 membrane, the esterification reaction using acetic acid achieved 85% isopropyl acetate. These results are closely correlated with the increase in IEC (2.63 mmol H⁺g⁻¹) and the relationship between weight loss (20.3%) and swelling degree (68%) in 2-propanol.

Solvent-assisted self-assembly of block copolymer thin films

Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.

Block Copolymer Nanopatterning for Nonsemiconductor Device Applications

Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication tool for semiconductor devices and other applications, because of its ability to organize well-defined, periodic nanostructures with a critical dimension of 5-100 nm. While the most promising application field of BCP nanopatterning has been semiconductor devices, the versatility of BCPs has also led to enormous interest from a broad spectrum of other application areas. In particular, the intrinsically low cost and straightforward processing of BCP nanopatterning have been widely recognized for their large-area parallel formation of dense nanoscale features, which clearly contrasts that of sophisticated processing steps of the typical photolithographic process, including EUV lithography. In this Review, we highlight the recent progress in the field of BCP nanopatterning for various nonsemiconductor applications. Notable examples relying on BCP nanopatterning, including nanocatalysts, sensors, optics, energy devices, membranes, surface modifications and other emerging applications, are summarized. We further discuss the current limitations of BCP nanopatterning and suggest future research directions to open up new potential application fields.

Transient Laser-Annealing-Induced Mesophase Transitions of Block Copolymer-Resol Thin Films

Block copolymer self-assembly-derived thin films provide direct access to two- and three-dimensional periodically ordered mesostructures as enablers for many nanotechnology applications. This report describes laser-annealing-induced disorder-order mesophase transitions of polystyrene-block-poly(ethylene oxide)/resol hybrid thin films over a range of laser temperatures (∼45 to 525 °C) and short dwell times (0.25 to 100 ms), revealing the non-equilibrium ordering and disordering kinetics and behaviors. We found that a combination of transient laser temperature of ∼275 °C and annealing dwell time of 100 ms provided the most optimal kinetic and thermodynamic control of the diffusivities of hybrid mesophases and photothermal-induced resol polymerization, yielding long-range ordered films resembling an in-plane body-centered cubic sphere morphology. A clear understanding of hybrid thin film mesophase self-assembly under non-equilibrium laser annealing could open new avenues to introduce novel chemistries and rapidly achieve nanoscale periodic order suitable for the patterning of complex structures, electronics, sensing, and emerging quantum materials.

Ionic Liquid Containing Block Copolymer Dielectrics: Designing for High-Frequency Capacitance, Low-Voltage Operation, and Fast Switching Speeds

Polymerized ionic liquids (PILs) are a potential solution to the large-scale production of low-power consuming organic thin-film transistors (OTFTs). When used as the device gating medium in OTFTs, PILs experience a double-layer capacitance that enables thickness independent, low-voltage operation. PIL microstructure, polymer composition, and choice of anion have all been reported to have an effect on device performance, but a better structure property relationship is still required. A library of 27 well-defined, poly(styrene)-b-poly(1-(4-vinylbenzyl)-3-butylimidazolium-random-poly(ethylene glycol) methyl ether methacrylate) (poly(S)-b-poly(VBBI+[X]-r-PEGMA)) block copolymers, with varying PEGMA/VBBI+ ratios and three different mobile anions (where X = TFSI-, PF6 - or BF4 -), were synthesized, characterized and integrated into OTFTs. The fraction of VBBI+ in the poly(VBBI+[X]-r-PEGMA) block ranged from to 100 mol % and led to glass transition temperatures (T g) between -7 and 55 °C for that block. When VBBI+ composition was equal or above 50 mol %, the block copolymer self-assembled into well-ordered domains with sizes between 22 and 52 nm, depending on the composition and choice of anion. The block copolymers double-layer capacitance (C DL) and ionic conductivity (σ) were found to correlate to the polymer self-assembly and the T g of the poly(VBBI+[X]-r-PEGMA) block. Finally, the block copolymers were integrated into OTFTs as the gating medium that led to n-type devices with threshold voltages of 0.5-1.5 V while maintaining good electron mobilities. We also found that the greater the σ of the PIL, the greater the OTFT operating frequency could reach. However, we also found that C DL is not strictly proportional to OTFT output currents.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Smart Nanocages as a Tool for Controlling Supramolecular Aggregation

An important aspect in the field of supramolecular chemistry is the control of the composition and aggregation state of supramolecular polymers and the possibility of stabilizing out-of-equilibrium states. The ability to freeze metastable systems and release them on demand, under spatiotemporal control, to allow their thermodynamic evolution toward the most stable species is a very attractive concept. Such temporal blockage could be realized using stimuli-responsive "boxes" able to trap and redirect supramolecular polymers. In this work, we report the use of a redox responsive nanocontainer, an organosilica nanocage (OSCs), for controlling the dynamic self-assembly pathway of supramolecular aggregates of a luminescent platinum compound (Pt_AC). The aggregation of the complexes leads to different photoluminescent properties that allow visualization of the different assemblies and their evolution. We discovered that the nanocontainers can encapsulate kinetically trapped species characterized by an orange emission, preventing their evolution into the thermodynamically stable aggregation state characterized by blue-emitting fibers. Interestingly, the out-of-equilibrium trapped Pt species (Pt_AC@OSCs) can be released on demand by the redox-triggered degradation of OSCs, re-establishing their self-assembly toward the thermodynamically stable state. To demonstrate that control of the self-assembly pathway occurs also in complex media, we followed the evolution of the supramolecular aggregates inside living cells, where the destruction of the cages allows the intracellular release of Pt_AC aggregates, followed by the formation of microscopic blue emitting fibers. Our approach highlights the importance of "ondemand" confinement as a tool to temporally stabilize transient species which modulate complex self-assembly pathways in supramolecular polymerization.

Large-Grained Cylindrical Block Copolymer Morphologies by One-Step Room-Temperature Casting

We report a facile method of ordering block copolymer (BCP) morphologies in which the conventional two-step casting and annealing steps are replaced by a single-step process where microphase separation and grain coarsening are seamlessly integrated within the casting protocol. This is achieved by slowing down solvent evaporation during casting by introducing a nonvolatile solvent into the BCP casting solution that effectively prolongs the duration of the grain-growth phase. We demonstrate the utility of this solvent evaporation annealing (SEA) method by producing well-ordered large-molecular-weight BCP thin films in a total processing time shorter than 3 min without resorting to any extra laboratory equipment other than a basic casting device, i.e., spin- or blade-coater. By analyzing the morphologies of the quenched samples, we identify a relatively narrow range of polymer concentration in the wet film, just above the order-disorder concentration, to be critical for obtaining large-grained morphologies. This finding is corroborated by the analysis of the grain-growth kinetics of horizontally oriented cylindrical domains where relatively large growth exponents (1/2) are observed, indicative of a more rapid defect-annihilation mechanism in the concentrated BCP solution than in thermally annealed BCP melts. Furthermore, the analysis of temperature-resolved kinetics data allows us to calculate the Arrhenius activation energy of the grain coarsening in this one-step BCP ordering process.

Strain-Dependent Nanowrinkle Confinement of Block Copolymers

This paper describes an all-soft, templated assembly of block copolymers (BCPs) with programmable alignment. Using polymeric nanowrinkles as a confining scaffold, poly(styrene)-block-poly(dimethylsiloxane) (PS-b-PDMS) BCPs were assembled to be parallel or perpendicular to the wrinkle orientation by manipulating the substrate strain. Self-consistent field theory modeling revealed that wrinkle curvature and surface affinity govern the BCP structural formation. Furthermore, control of BCP alignment was demonstrated for complex wrinkle geometries, various copolymer molecular weights, and functional wrinkle skin layers. This integration of BCP patterning with flexible 3D architectures offers a promising nanolithography approach for next-generation soft electronics.

Effect of Trapped Solvent on the Interface between PS-b-PMMA Thin Films and P(S-r-MMA) Brush Layers

The orientation of block copolymer (BCP) features in thin films can be obtained by spin-coating a BCP solution on a substrate surface functionalized by a polymer brush layer of the appropriate random copolymer (RCP). Although this approach is well established, little work reporting the amount and distribution of residual solvent in the polymer film after the spin-coating process is available. Moreover, no information can be found on the effect of trapped solvent on the interface between the BCP film and RCP brush. In this work, systems consisting of poly(styrene)-b-poly(methyl methacrylate) thin films deposited on poly(styrene-r-methyl methacrylate) brush layers are investigated by combining neutron reflectivity (NR) experiments with simulation techniques. An increase in the amount of trapped solvent is observed by NR as the BCP film thickness increases accompanied by a significant decrease of the interpenetration length between the BCP and RCP, thus suggesting that the interpenetration between grafted chains and block copolymer chains is hampered by the solvent. Hybrid particle-field molecular dynamics simulations of the analyzed system confirm the experimental observations and demonstrate a clear correlation between the interpenetration length and the amount of trapped solvent.

Real-time and in situ observation of structural evolution of giant block copolymer thin film under solvent vapor annealing by atomic force microscopy

An instrumentation technique for real-time, in situ and real space observation of microphase separation was proposed for ultra-high molecular weight block copolymer thin films (1010 kg mol⁻¹, domain spacing of 180 nm) under high solvent vapor swelling conditions. This is made possible by a combination of a homebuilt chamber which is capable of supplying sufficient amount of vapor, and force–distance curve measurements which gives real-time swollen film thickness and allow active feedback for controlling the degree of swelling. We succeeded in monitoring the domain coarsening of perpendicular lamellar structures in polystyrene-block-poly(methyl methacrylate) thin films for eight hours via tapping mode imaging. During the annealing process, the thickness reached a maximum of 8.5 times that of the original film. The series of temporal real space topographic images obtained via this method allowed us to study, for the first time, the growth exponent of the correlation length under solvent vapor annealing.

Real-time and in situ observation technique was proposed for ultra high molecular weight block copolymer thin films under solvent vapor annealing.

Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block Copolymers

Directed self-assembly (DSA) of high-χ block copolymer thin films is a promising approach for nanofabrication of features with length scale below 10 nm. Recent work has highlighted that kinetics are of crucial importance in determining whether a block copolymer film can self-assemble into a defect-free ordered state. In this work, different strategies for improving the rate of defect annihilation in the DSA of a silicon-containing, high-χ block copolymer film were explored. Chemo-epitaxial DSA of poly(4-methoxystyrene-block-4-trimethylsilylstyrene) with 5× density multiplication was implemented on 300 mm wafers by using production level nanofabrication tools, and the influence of different processes and material parameters on dislocation defect density was studied. It was observed that only at sufficiently low χN can the block copolymer assemble into well-aligned patterns within a practical time frame. In addition, there is a clear correlation between the rate of the lamellar grain coarsening in unguided self-assembly and the rate of dislocation annihilation in DSA. For a fixed chemical pattern, the density of kinetically trapped dislocation defects can be predicted by measuring the correlation length of the unguided self-assembly under the same process conditions. This learning enables more efficient screening of block copolymers and annealing conditions by rapid analysis of block copolymer films that were allowed to self-assemble into unguided (commonly termed fingerprint) patterns.

Automated solvent vapor annealing with nanometer scale control of film swelling for block copolymer thin films

Molecular self-assembly of block copolymers has been pursued as a next generation high-resolution, low-cost lithography technique. Solvent vapor annealing is a promising way of achieving self-assembled patterns from polymers with high interaction parameters, χ, or high molecular weights. Compared to thermal annealing, the assembly in a solvated state can be much faster, but the film swelling process is typically challenging to control and reproduce. We report the design and implementation of an automated solvent annealing system that addresses these issues. In this system the film swelling is controlled via local heating or cooling, which enables exceptionally fast and precise modulation of the swelling. The swelling of the polymer films follows preprogrammed annealing profiles with the help of a feedback loop that compares and tunes the film thickness with respect to the set point. The system therefore enables complex annealing profiles such as rapid cyclic swelling and deswelling. We show that the orientation of the pattern morphology and the amount of lattice defects are influenced by the used annealing profile. We demonstrate that optimized profiles significantly shorten the annealing time (<15 min) of high-χ and high-molecular weight poly(styrene-b-2-vinylpyridine).

Hierarchical multi-level block copolymer patterns by multiple self-assembly

Uniform, well-ordered sub-20 nm patterns can be generated by the templated self-assembly of block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ). However, the self-assembled BCP monolayers remain limited in the possible structural geometries. Here, we introduce a multiple self-assembly method which uses di-BCPs to produce diverse morphologies, such as dot, dot-in-honeycomb, line-on-dot, double-dot, pondering, dot-in-pondering, and line-on-pondering patterns. To improve the diversity of BCP morphological structures, we employed sphere-forming and cylinder-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) BCPs with a high χ. The self-assembled mono-layer and double-layer SiOx dot patterns were modified at a high temperature (∼800 °C), showing hexagonally arranged (dot) and double-hexagonally arranged (pondering) SiOx patterns, respectively. We successfully obtained additional new nanostructures (big-dot, dot-in-honeycomb, line-on-dot, pondering, dot-in-pondering, and line-on-pondering types) through a second self-assembly of cylinder-forming BCPs using the dot and pondering patterns as guiding templates. This simple approach can likely be extended to the multiple self-assembly of many other BCPs with good functionality, significantly contributing to the development of various nanodevices.

Rapid solvo-microwave annealing for optimizing ordered nanostructures and crystallization of regioregular polythiophene-based block copolymers

Solvo-microwave annealing is an effective method for producing thin films of polythiophene-based block copolymers with ordered structures and high crystallinity in a very short processing time (∼3 min).

Shear-induced parallel and transverse alignments of cylinders in thin films of diblock copolymers

Coarse-grained Langevin dynamics simulations were performed to investigate the alignment behavior of monolayer films of cylinder-forming diblock copolymers under steady shear, a structure of significant importance for many technical applications such as nanopatterning. The influences of shear conditions, the interactions involved in the films, and the initial morphology of the cylinder-forming phase were examined. Our results showed that above a critical shear rate, the cylinders can align either along the shearing direction or transverse (log-rolling) to the shearing direction depending on the relative strength between the interchain attraction in the cylinders (εAA) and the surface attraction of the confining walls with the film (εBW). To understand the underlying mechanism, the microscopic properties of the films under shear were systematically investigated. It was found that at low εAA/εBW, the majority blocks of the diblock polymer that are adsorbed on the confining walls prefer to move synchronously with the walls, inducing the cylinder-forming blocks to align along the flow direction. When εAA/εBW is above a threshold value, a strong attraction between the cylinder-forming blocks restrains their movement during shear, leading to the log-rolling motions of the cylinders. To predict the threshold εAA/εBW, we developed an approach based on equilibrium thermodynamics data and found good agreement with our shear simulations.

Hierarchically organized honeycomb films through block copolymer directed self-assembly in "breath figure" templating and soft microwave-triggered annealing

Hierarchically organized polymer films are produced with a high level of order from the combination of block copolymer nanophase segregation, "breath figure" methodology and microwave irradiation. A block copolymer based on poly(methyl methacrylate) and poly(n-butylacrylate) featuring cylindrical nanopatterns is involved in the "breath figure" process to create a microporous honeycomb structure. These films are submitted to microwave annealing to enhance the degree of ordering of the nano-segregation without the destruction of the honeycomb microstructure, which is not possible by classical thermal or solvent annealing. Ellipsometry, optical and atomic force microscopy are used to study three key parameters; the substrate nature, the film thickness and the microwave irradiation power. The silicon wafer is the substrate of choice to efficiently act as the heating transfer element and 60 seconds at 10 watts are enough to nicely order the 1 μm thick copolymer films. These conditions are eventually applied on hierarchically organized polymer films to obtain a hexagonal array of 100 nm deep holes within a matrix of perpendicularly aligned nano-cylinders.

High-Precision Solvent Vapor Annealing for Block Copolymer Thin Films

Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple parameters play in solvent vapor annealing has not been fully established. In solvent vapor annealing a thin polymer film is exposed to a vapor of solvent(s) thus forming a swollen and mobile layer to direct the self-assembly process at the nanoscale. Recent developments in both theory and experiments have directly identified critical parameters that govern this process, but controlling them in any systematic way has proven non-trivial. These identified parameters include vapor pressure, solvent concentration in the film, and the solvent evaporation rate. To explore their role, a purpose-built solvent vapor annealing chamber was designed and constructed. The all-metal chamber is designed to be inert to solvent exposure. Computer-controlled, pneumatically actuated valves allow for precision timing in the introduction and withdrawal of solvent vapor from the film. The mass flow controller-regulated inlet, chamber pressure gauges, in situ spectral reflectance-based thickness monitoring, and low flow micrometer relief valve give real-time monitoring and control during the annealing and evaporation phases with unprecedented precision and accuracy. The reliable and repeatable alignment of polylactide cylinders formed from polystyrene-b-polylactide, where cylinders stand perpendicular to the substrate and span the thickness of the film, provides one illustrative example.

Transformation of Block Copolymer Nanoparticles from Ellipsoids with Striped Lamellae into Onionlike Spheres and Dynamical Control via Coupled Cahn-Hilliard Equations

Annealing of block copolymers has become a tool of great importance for the reconfiguration of nanoparticles. Here, we present the experimental results of annealing block copolymer nanoparticles and a theoretical model to describe the morphological transformation of ellipsoids with striped lamellae into onionlike spheres. A good correspondence between the experimental findings and predictions of the model was observed. The model based on finding the steepest direction of descent of an appropriate free energy leads to a set of Cahn-Hilliard equations that correctly describe the dynamical transformation of striped ellipsoids into onionlike spheres and reverse onionlike particles, regardless of the nature of the annealing process. This universality makes it possible to describe a variety of experimental conditions involving nanoparticles underlying a heating process. A notable advantage of the proposed approach is that it enables selective control of the interaction between the confined block copolymer and the surrounding medium. This feature endows the model with a great versatility to enable the reproduction of several combined effects of surfactants in diverse conditions, including cases with reverse affinities for the block copolymer segments. A phase diagram to describe a variety of morphologies is presented. We employ the relationship between the temperature-dependent Flory-Huggins parameter and the width of the interfaces to account for changes in temperature due to the heating process. Simulation results correctly show how the transformation evolves as the temperature increases. This increment in temperature corresponds to progressively smaller values of the interfacial width. We anticipate that the proposed approach will facilitate the design and more precise control of experiments involving various kinds of annealing processes.

Rapid Ordering in "Wet Brush" Block Copolymer/Homopolymer Ternary Blends

The ubiquitous presence of thermodynamically unfavored but kinetically trapped topological defects in nanopatterns formed via self-assembly of block copolymer thin films may prevent their use for many envisioned applications. Here, we demonstrate that lamellae patterns formed by symmetric polystyrene-block-poly(methyl methacrylate) diblock copolymers self-assemble and order extremely rapidly when the diblock copolymers are blended with low molecular weight homopolymers of the constituent blocks. Being in the "wet brush" regime, the homopolymers uniformly distribute within their respective self-assembled microdomains, preventing increases in domain widths. An order-of-magnitude increase in topological grain size in blends over the neat (unblended) diblock copolymer is achieved within minutes of thermal annealing as a result of the significantly higher power law exponent for ordering kinetics in the blends. Moreover, the blends are demonstrated to be capable of rapid and robust domain alignment within micrometer-scale trenches, in contrast to the corresponding neat diblock copolymer. These results can be attributed to the lowering of energy barriers associated with domain boundaries by bringing the system closer to an order-disorder transition through low molecular weight homopolymer blending.

Pathway-engineering for highly-aligned block copolymer arrays

While the ultimate driving force in self-assembly is energy minimization and the corresponding evolution towards equilibrium, kinetic effects can also play a very strong role. These kinetic effects, such as trapping in metastable states, slow coarsening kinetics, and pathway-dependent assembly, are often viewed as complications to be overcome. Here, we instead exploit these effects to engineer a desired final nano-structure in a block copolymer thin film, by selecting a particular ordering pathway through the self-assembly energy landscape. In particular, we combine photothermal shearing with high-temperature annealing to yield hexagonal arrays of block copolymer cylinders that are aligned in a single prescribed direction over macroscopic sample dimensions. Photothermal shearing is first used to generate a highly-aligned horizontal cylinder state, with subsequent thermal processing used to reorient the morphology to the vertical cylinder state in a templated manner. Finally, we demonstrate the successful transfer of engineered morphologies into inorganic replicas.

Microwave-annealing-induced nanowetting of block copolymers in cylindrical nanopores

Block copolymers have attracted great attention because of their abilities to self-assemble into well-ordered microphase-separated structures. To generate nanopatterns of block copolymers with long-range ordering and low-defect densities in shorter time scales, microwave annealing has recently been applied. Microwave annealing, however, has so far only been used for block copolymer bulks and thin films. In this work, we discover that microwave annealing can be successfully applied to three-dimensional block copolymer nanostructures by studying the infiltration and microphase separation of block copolymers in cylindrical nanopores upon microwave irradiation. Cylinder-forming and lamella-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) are introduced into the nanopores of anodic aluminum oxide (AAO) templates. In addition, AAO templates with different pore sizes are used to study the effect of the commensurabilities between the pore diameters and the repeating periods of the block copolymers on the morphologies of the block copolymer nanostructures.

Carbohydrate-Based Block Copolymer Thin Films: Ultrafast Nano-Organization with 7 nm Resolution Using Microwave Energy

Block copolymers (BCP) can self-assemble into nanoscale patterns with a wide variety of applications in the semiconductor industry. The self-assembly of BCPs is commonly accomplished by solvent vapor or thermal annealing, but generally these methods require long time (few hours) to obtain nanostructured thin films. In this contribution, a new and ultrafast method (using microwaves) is proposed-high temperature solvent vapor annealing (HTSVA), combining solvent vapor annealing with thermal annealing, to achieve fast and controllable self-assembly of amphiphilic BCP thin films. A promising carbohydrate-based BCP capable of forming cylindrical patterns with some of the smallest feature sizes is used for demonstrating how to obtain a highly ordered vertical cylindrical pattern with sub-10 nm feature sizes in few seconds by HTSVA. HTSVA provides not only a simple way to achieve BCP fast self-assembly in practical applications but also a tool to study the self-assembly behavior of BCPs under extreme conditions.

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning

One of the fundamental challenges encountered in successful incorporation of directed self-assembly in sub-10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory-Huggins interaction parameter (χ). Herein, reliable, fab-compatible, and ultrafast directed self-assembly of high-χ block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 °C) by flash light irradiation enables large grain growth of sub-10 nm scale self-assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self-assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self-assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self-assembly of sub-10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light-absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll-to-roll processability.

Thickness-dependence of block copolymer coarsening kinetics

Despite active research, many fundamental aspects of block copolymer ordering remain unresolved. We studied the thickness-dependence of block copolymer grain coarsening kinetics, and find that thinner films order more rapidly than thicker films. Bilayer films, or monolayers with partial layers of islands, order more slowly than monolayers because of the greater amount of material that must rearrange in a coordinated fashion. Sub-monolayer films order much more rapidly than monolayers, exhibiting considerably smaller activation energies, as well as larger exponents for the time-growth power-law. Using molecular dynamics simulations, we directly study the motion of defects in these film regimes. We attribute the enhanced grain growth in sub-monolayers to the film boundaries, where defects can be spontaneously eliminated. The boundaries thus act as efficient sinks for morphological defects, pointing towards methods for engineering rapid ordering of self-assembling thin films.

Selective molecular annealing: in situ small angle X-ray scattering study of microwave-assisted annealing of block copolymers

A new experimental set-up facilitating in situ SAXS during microwave annealing of polymers.

UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films

The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f _PS = 68%, M _n = 53 kg mol^-1), the other with PDMS block as majority (f _PDMS = 67%, M _n = 44 kg mol^-1). A 5 min UV irradiation was applied during solvent vapor annealing which led to both partial crosslinking of the polymer and a small increase in the temperature of the annealing chamber. This approach was effective for improving the correlation length of the self-assembled microdomain arrays and in limiting subsequent flow of the PDMS in the PDMS-majority BCP to preserve the post-anneal morphology. Ordering and orientation of microdomains were controlled by directed self-assembly of the BCPs in trench substrates. Highly-ordered perpendicular nanochannel arrays were obtained in the PDMS-majority BCP.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.