Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries

Molecular-level periodic arrays of long-chain poly(3-hexylthiophene-2,5-diyl) driven by an electric field

Two-dimensional (2D) periodic arrays of conductive polymers represent attractive platforms for wiring functional molecules into the integrated circuits of molecular electronics. However, the large-scale assembly of polymer periodic arrays at the molecular level faces challenges such as curling, twisting, and aggregation. Here, we assembled the periodic arrays of long-chain poly(3-hexylthiophene-2,5-diyl) (P3HT, Mw = 65 k) at the solid-liquid interface by applying an electric field, within which the charged chain segments were aligned. Atomic force microscopy (AFM) imaging revealed that individual P3HT chains assemble into monolayers featuring face-on orientation, extended chain conformation and isolated packing, which is thermodynamically more stable than folded chains in 2D polycrystals. The assembly process is initiated with the formation of disordered clusters and progresses through voltage-dependent nucleation and growth of extended-chain arrays, wherein continuous conformational adjustments along the nucleation pathway exhibit dependence on the cluster size.

Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes

The guiding pattern in the chemoepitaxially directed self-assembly (DSA) of block copolymers is often fabricated by periodically functionalizing homogeneously random copolymer brushes tethered on a substrate. The prepatterned copolymer brushes constitute a soft penetrable surface, and their two components can in principle locally segregate in response to the overlying self-assembly process of block copolymers. To reveal how the self-responsive behavior of the copolymer brushes affects the directing effect, we develop a dissipative particle dynamics model to explicitly include the prepatterned polymer brushes and implement it to simulate the DSA of a cylinder-forming diblock copolymer melt on the sparse pattern of polymer brushes. Through large-scale dynamic simulations, we identify the windows of the content of the random copolymer, the film thickness, and the diameter of the patterned spot, for the formation of perfectly ordered hexagonal patterns composed of perpendicular cylinders. Our dynamic simulations reveal that the random copolymer brushes grafted on the unpatterned area exhibit a remarkable self-responsive ability with respect to the self-assembly of the diblock copolymers overlying them, which may widen the effective window of the content of the random copolymer. Within the processing windows of these key parameters, defect-free patterns are successfully achieved both in simulations and in experiments with sizes as large as a few micrometers for 4-fold density multiplications. This work demonstrates that highly efficient computer simulations based on an effective model can provide helpful guidance for experiments to optimize the critical parameters and even may promote the application of DSA.

High-Density Packing of Spherical Microdomains from A(AB3)3 Dendron-like Miktoarm Star Copolymer

An A(AB3)3 dendron-like miktoarm star copolymer consisting of polystyrene (PS, A) and poly(2-vinylpyridine) (P2VP, B) was synthesized using a series of anionic polymerization, atom-transfer radical polymerization (ATRP), and click reaction. The morphology of A(AB3)3 changed greatly depending on the volume fraction of A and the chain asymmetry. Interestingly, a body-centered cubic spherical phase was found even at fA = 0.51 because the chain architecture of A(AB3)3 stabilizes the large interfacial curvature toward A domains. On the other hand, when the length difference between the end and middle A blocks decreased, a hexagonally packed cylindrical phase was formed at fA = 0.50. This is attributed to the fact that the middle A chains are arranged in a more relaxed way, resulting in a milder interfacial curvature toward A domains. The experimental observations are well-consistent with the predictions based on self-consistent-field theory.

Density Multiplication of Highly Periodic Sub-5 nm Supramolecular Dendrimer Cylinders on Block Copolymer Lamellar-Assisted High-Resolution Patterns

Density multiplication in nanopatterning is one of the most efficient techniques for increasing the resolution of the inherent patterns. Thus far, most of the density multiplication techniques integrate bottom-up (or top-down) patterning onto guide patterns prepared by the top-down approach. Although the bottom-up approach exhibits several advantages of cost-effectiveness and high resolution, very few studies have reported bottom-up patterning within a bottom-up template. In this study, the density multiplication of supramolecular cylinders into a block copolymer (BCP)-based guide lamellar pattern is demonstrated by the directed self-assembly (DSA) of a dendrimer and BCPs for the first time. Supramolecular cylinders of sub-5 nm scale are confined into trenches based on 50 and 100 nm scales of a lamellar polystyrene (PS)-poly(methyl methacrylate) (PMMA) BCP, which led to 10×-level to 20×-level density multiplication. Moreover, the orientation of the dendrimer is dependent on the dendrimer film thickness, and the corresponding mechanism is revealed. Notably, the strong guiding effect from the high-resolution guide patterns improved the ordering behavior in the highly curved pattern. Graphoepitaxy via the confinement of an ultrahigh-resolution dendrimer into the guide pattern based on BCP demonstrates promise as a density multiplication method for generating highly ordered nanostructures and complex structures.

Rapid Electrohydrodynamic-Driven Pattern Replication over a Large Area via Ultrahigh Voltage Pulses

Despite the prospects of electrohydrodynamic instability patterning (EHIP), poor process parameter controllability is a significant challenge in uniform large-scale nanopatterning. Herein, we introduce a EHIP process using an ultrahigh electric field (>108 V/m) to effectively accelerate the pattern growth evolution. Owing to the strong dependence on a temporal parameter (1/τm) of the field strength, our method not only reduces the completion time of pattern growth but also overcomes critical parametric restrictions on the pattern replication, thereby enhancing the replicated pattern quality in three dimensions. The pattern can be uniformly replicated over the entire film surface even without a perfectly uniform air gap, which has been severely difficult in the conventional method. To further demonstrate how straightforward yet versatile our approach is, we applied our EHIP approach to successfully replicate the densely packed nanostructures of cicada wings.

Wetting Behavior of A-block-(B-random-C) Copolymers with Equal Block Surface Energies on Surfaces Functionalized with B-random-C Copolymers

To form nanopatterns with self-assembled block copolymers (BCPs), it is desirable to have through-film domains that are oriented perpendicular to the substrate. The domain orientation is determined by the interfacial interactions of the BCP domains with the substrate and with the free surface. Here, we use thin films of two different sets of BCPs with A-block-(B-random-C) architecture matched with a corresponding B-random-C copolymer nanocoating on the substrate to demonstrate two distinct wetting behaviors. The two sets of A-b-(B-r-C) BCPs are made by using thiol-epoxy click chemistry to functionalize polystyrene-block-poly(glycidyl methacrylate) with trifluoroethanethiol (TFET) and either 2-mercaptopyridine (2MP) or methyl thioglycolate (MTG). For each set of BCPs, the composition ratio of the two thiols in the BCP (φ1) is found that results in the two blocks of the modified BCP having equal surface energies (Δγair = 0). The corresponding B-r-C random copolymers were synthesized and used to modify the substrate, and the composition ratio (φ2) values that resulted in the two blocks of the BCP having equal interfacial energy with the substrate (Δγsub = 0) were determined with scanning electron microscopy. The correlation between each block's γsub value and the interaction parameter, χ, is employed to explain the different wetting behaviors of the two sets of BCPs. For the thiol pair 2MP and TFET, the values of φ1 and φ2 that lead to Δγair = 0 and Δγsub = 0, respectively, are significantly different. A similar difference was observed between the φ1 and φ2 values that lead to Δγair = 0 and Δγsub = 0 for the BCPs made with the thiol pair MTG and TFET. In the latter case, for Δγsub = 0 two windows of φ2 are identified, which can be explained by the thermodynamic interactions of the specific thiol pair and the A-b-(B-r-C) architecture.

Non-Bulk Morphologies of Extremely Thin Block Copolymer Films Cast on Topographically Defined Substrates Featuring Deep Trenches: The Importance of Lateral Confinement

Directed self-assembly of block copolymers is evolving toward applications that are more defect-tolerant but still require high morphological control and could benefit from simple, inexpensive fabrication processes. Previously, we demonstrated that simply casting ultra-thin block copolymer films on topographically defined substrates leads to hierarchical structures with dual patterns in a controlled manner and unraveled the dependence of the local morphology on the topographic feature dimensions. In this article, we discuss the extreme of the ultraconfined thickness regime at the border of film dewetting. Additional non-bulk morphologies are observed at this extreme, which further elaborate the arsenal of dual patterns that could be obtained in coexistence with full placement control. It is shown that as the thickness confinement approaches its limit, lateral confinement imposed by the width of the plateaus becomes a critical factor influencing the local morphology.

Nanoarchitectonics beyond perfect order - not quite perfect but quite useful

Nanoarchitectonics, like architectonics, allows the design and building of structures, but at the nanoscale. Unlike those in architectonics, and even macro-, micro-, and atomic-scale architectonics, the assembled structures at the nanoscale do not always follow the projected design. In fact, they do follow the projected design but only for self-assembly processes producing structures with perfect order. Here, we look at nanoarchitectonics allowing the building of nanostructures without a perfect arrangement of building blocks. Here, fabrication of structures from molecules, polymers, nanoparticles, and nanosheets to polymer brushes, layer-by-layer assembly structures, and hydrogels through self-assembly processes is discussed, where perfect order is not necessarily the aim to be achieved. Both planar substrate and spherical template-based assemblies are discussed, showing the challenging nature of research in this field and the usefulness of such structures for numerous applications, which are also discussed here.

Methyl Methacrylate-Based Copolymers: Recent Developments in the Areas of Transparent and Stretchable Active Matrices

The recent advancements of poly(methyl methacrylate) (PMMA) as a transparent flexible polymer material have been utilized in numerous areas of engineering and materials science. PMMA-based copolymers demonstrate outstanding mechanical and optical properties owing to high transparency, lightweight nature, high impact resistance, and stress relaxation across glass transition temperature. These copolymers have unique characteristics of retaining optical and microstructural integrities during successive bending or elongations which make them an attractive choice for materials of stretchable electronics. In particular, there has been an escalated rise in the use of methyl methacrylate (MMA)-based transparent and stretchable copolymer films during the recent decades. Therefore, we have highlighted these recent developments into a comprehensive review in order to aid the future progress in these diverse fields. Herein, we have highlighted the scope of MMA as an important building block for the synthesis of highly transparent and flexible materials. The synthetic pathways of these copolymer materials and the resulting mechanical properties have been discussed. Moreover, the immense scope of these copolymer films has been highlighted by virtue of their applications in various industries.

Influence of Interpenetrating Chains on Rigid Domain Dimensions in Siloxane-Based Block-Copolymers

¹H spin-diffusion solid-state NMR was utilized to elucidate the domain size in multiblock-copolymers (BCPs) poly-(block poly(dimethylsiloxane)-block ladder-like poly(phenylsiloxane)) and poly-(block poly((3,3′,3″-trifluoropropyl-methyl)siloxane)-block ladder-like poly(phenylsiloxane). It was found that these BCPs form worm-like morphology with rigid cylinders dispersed in amorphous matrix. By using the combination of solid-state NMR techniques such as ¹³C CP/MAS, ¹³C direct-polarization MAS and 2D ¹H EXSY, it was shown that the main factor which governs the diameter value of these rigid domains is the presence of interpenetrating segments of soft blocks. The presence of such interpenetrating chains leads to an increase of rigid domain diameter.

Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature

The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.

Sub-5 nm Anisotropic Pattern Transfer via Colloidal Lithography of a Self-Assembled GdF3 Nanocrystal Monolayer

Patterning materials with nanoscale features opens many research opportunities ranging from fundamental science to technological applications. However, current nanofabrication methods are ill-suited for sub-5 nm patterning and pattern transfer. We demonstrate the use of colloidal lithography to transfer an anisotropic pattern of discrete features into substrates with a critical dimension below 5 nm. The assembly of monodisperse, anisotropic nanocrystals (NCs) with a rhombic-plate morphology spaced by dendrimer ligands results in a well-ordered monolayer that serves as a 2D anisotropic hard mask pattern. This pattern is transferred into the underlying substrate using dry etching followed by removal of the NC mask. We exemplify this approach by fabricating an array of pillars with a rhombic cross-section and edge-to-edge spacing of 4.4 ± 1.1 nm. The fabrication approach enables broader access to patterning materials at the deep nanoscale by implementing innovative processes into well-established fabrication methods while minimizing process complexity.

In Situ Grazing-Incidence SAXS Investigation of Thermal-Induced Self-Assembly Process of PS-b-PMMA Films Deposited on Surface-Modified Substrate

Directed self-assembly of block copolymers (BCPs) is widely investigated for its potential application in surface patterning. The self-assembly kinetics of BCP based on modified layers is the key to realizing structural control for obtaining highly ordered lamellar grains. In this study, morphological evolution of PS-b-PMMA films during the thermal-induced self-assembly process was investigated via the in situ grazing-incidence small-angle X-ray scattering (GISAXS) technique. In the first heating stage, reorientation of lamellar grains occurred as the temperature increased above the glass transition temperature. Then, a fast increase in the lamellar repeat period L₀ was observed, which is considered as a phase separation process. Whereas the size of the lamellar grain ξ was observed to have rapidly increased in the stage wherein the temperature was held at 230 °C, the L₀ was almost constant. This result indicates that the formation of ordered structure in PS-b-PMMA films was mainly determined by two periods: phase separation of block molecules followed by growth of grains in the nanodomain. In addition, it was interesting that the better-order nanodomains were obtained with thermal annealing at a faster heating rate. These findings suggest that accomplishing ordered structure control in a large area could be realized via the design of a proper heating profile.

Equilibrium phases and domain growth kinetics of calamitic liquid crystals

The anisotropic shape of calamitic liquid crystal (LC) particles results in distinct values of energy when the nematogens are placed side by side or end to end. This anisotropy in energy which is governed by a parameter κ^{'} has deep consequences on equilibrium and nonequilibrium properties. Using the Gay-Berne (GB) model, which exhibits the nematic (Nm) as well as the low-temperature smectic (Sm) order, we undertake large-scale Monte Carlo and molecular dynamics simulations to probe the effect of κ^{'} on the equilibrium phase diagram and the nonequilibrium domain growth following a quench in the temperature T or coarsening. There are two transitions in the GB model: (i) isotropic to Nm at T_{c}^{1} and (ii) Nm to Sm at T_{c}^{2}<T_{c}^{1}. κ^{'} decreases T_{c}^{1} significantly but has relatively little effect on T_{c}^{2}. Domain growth in the Nm phase exhibits the well-known Lifshitz-Allen-Cahn (LAC) law, L(t)∼t^{1/2} and the evolution is via annihilation of string defects. The system exhibits dynamical scaling that is also robust with respect to κ^{'}. We find that the Sm phase at the quench temperatures T (T>T_{c}^{1}→T<T_{c}^{2}) that we consider has SmB order with a hexatic arrangement of the LC molecules in the layers (SmB-H phase). Coarsening in this phase exhibits a striking two-timescale scenario: First, the LC molecules align and develop orientational order (or nematicity), followed by the emergence of the characteristic layering (or smecticity) along with the hexatic bond-orientational-order within the layers. Consequently, the growth follows the LAC law L(t)∼t^{1/2} at early times and then shows a sharp crossover to a slower growth regime at later times. Our observations strongly suggest that L(t)∼t^{1/4} in this regime. Interestingly, the correlation function shows dynamical scaling in both the regimes and the scaling function is universal. The dynamics is also robust with respect to changes in κ^{'}, but the smecticity is more pronounced at larger values. Further, the early-time dynamics is governed by string defects, while the late-time evolution is dictated by interfacial defects. We believe this scenario is generic to the Sm phase even with other kinds of local order within the Sm layers.

DPD Modelling of the Self- and Co-Assembly of Polymers and Polyelectrolytes in Aqueous Media: Impact on Polymer Science

This review article is addressed to a broad community of polymer scientists. We outline and analyse the fundamentals of the dissipative particle dynamics (DPD) simulation method from the point of view of polymer physics and review the articles on polymer systems published in approximately the last two decades, focusing on their impact on macromolecular science. Special attention is devoted to polymer and polyelectrolyte self- and co-assembly and self-organisation and to the problems connected with the implementation of explicit electrostatics in DPD numerical machinery. Critical analysis of the results of a number of successful DPD studies of complex polymer systems published recently documents the importance and suitability of this coarse-grained method for studying polymer systems.

Blending Linear and Cyclic Block Copolymers to Manipulate Nanolithographic Feature Dimensions

Block copolymers (BCPs) consist of two or more covalently bound chemically distinct homopolymer blocks. These macromolecules have emerging applications in photonics, membrane separations, and nanolithography stemming from their self-assembly into regular nanoscale structures. Theory suggests that cyclic BCPs should form features up to 40% smaller than their linear analogs while also exhibiting superior thin-film stability and assembly dynamics. However, the complex syntheses required to produce cyclic polymers mean that a need for pure cyclic BCPs would present a challenge to large-scale manufacturing. Here, we employ dissipative particle dynamics simulations to probe the self-assembly behavior of cyclic/linear BCP blends, focusing on nanofeature size and interfacial width as these qualities are critical to nanopatterning applications. We find that for mixtures of symmetric cyclic and linear polymers with equivalent lengths, up to 10% synthetic impurity has a minimal impact on cyclic BCP feature dimensions and interfacial roughness. On the other hand, blending with cyclic BCPs provides a route to "fine-tune" linear BCP feature sizes. We analyze simulated blend domain spacings within the context of strong segregation theory and find significant deviations between simulation and theory that arise from molecular-level packing motifs not included in theory. These insights into blend self-assembly will assist experimentalists in rationally designing BCP materials for advanced nanolithography applications.

Nanoscale self-assembly: concepts, applications and challenges

Self-assembly offers unique possibilities for fabricating nanostructures, with different morphologies and properties, typically from vapour or liquid phase precursors. Molecular units, nanoparticles, biological molecules and other discrete elements can spontaneously organise or form via interactions at the nanoscale. Currently, nanoscale self-assembly finds applications in a wide variety of areas including carbon nanomaterials and semiconductor nanowires, semiconductor heterojunctions and superlattices, the deposition of quantum dots, drug delivery, such as mRNA-based vaccines, and modern integrated circuits and nanoelectronics, to name a few. Recent advancements in drug delivery, silicon nanoelectronics, lasers and nanotechnology in general, owing to nanoscale self-assembly, coupled with its versatility, simplicity and scalability, have highlighted its importance and potential for fabricating more complex nanostructures with advanced functionalities in the future. This review aims to provide readers with concise information about the basic concepts of nanoscale self-assembly, its applications to date, and future outlook. First, an overview of various self-assembly techniques such as vapour deposition, colloidal growth, molecular self-assembly and directed self-assembly/hybrid approaches are discussed. Applications in diverse fields involving specific examples of nanoscale self-assembly then highlight the state of the art and finally, the future outlook for nanoscale self-assembly and potential for more complex nanomaterial assemblies in the future as technological functionality increases.

Nanometer-scale patterning of hard and soft interfaces: from photolithography to molecular-scale design

Many areas of modern materials chemistry, from nanoscale electronics to regenerative medicine, require design of precisely-controlled chemical environments at near-molecular scales on both hard and soft surfaces.

Distributions of Deuterated Polystyrene Chains in Perforated Layers of Blend Films of a Symmetric Polystyrene-block-poly(methyl methacrylate)

We have examined the spatial distributions of polymer chains in blend films of weakly segregated polystyrene-block-poly(methyl methacrylate) [P(S-b-MMA)] and deuterated polystyrene (dPS). By fine-tuning the composition (ϕ_PS+dPS = 63.8 vol %) of the total PS/dPS component and annealing temperature (230 and 270 °C), P(S-b-MMA)/dPS blend films mainly form perforated layers with a parallel orientation (hereafter PLs^//). The distributions of dPS in PLs^// were probed by grazing-incidence small-angle neutron scattering (GISANS) and time-of-flight neutron reflectivity (ToF-NR). GISANS and ToF-NR results offer evidence that dPS chains preferentially locate at the free surface and within the PS layers for blend films that were annealed at 230 °C. Upon annealing at 270 °C, dPS chains distribute within PS layers and perforated PMMA layers. Nevertheless, dPS chains still retain a surface preference for thin films. In contrast, such surface segregation of dPS chains is prohibited for thick films when annealed at 270 °C.

Phase behavior in thin films of weakly segregated block copolymer/homopolymer blends

We have demonstrated the phase behavior of substrate-supported films of a symmetric weakly segregated polystyrene-block-poly (methyl methacrylate), P(S-b-MMA), block copolymer and its blends with homopolymer polystyrene (PS) at different compositions. Upon increasing the content of added PS in the blends, lamellae (L), perforated layers (PL), double gyroid (DG) and cylinders (C) are obtained in sequence for films. Among these nanodomains, PL and DG only exist in a narrow ϕ_PS region (ϕ_PS denotes the volume fraction of PS). At ϕ_PS = 64%, tuning film thickness and annealing temperature can produce parallel PL or DG with {121}_DG lattice planes being parallel to the substrate surface. The effects of annealing temperature and film thickness on the formation of PL and DG are examined. In thin films with n ≈ 3 (n denotes the ratio of initial film thickness to inter-domain spacing), the PL phase solely exists regardless of temperature. However, for thick films with n ≈ 6 and 10, thermal annealing at the most accessible temperature produces films containing both PL and DG of various fractions, but a low temperature tends to favor a greater fraction of PL. The PL phase becomes the only discernible phase if thick films are shortly annealed at 230 °C.

Self-Aligned Assembly of a Poly(2-vinylpyridine)-b-Polystyrene-b-Poly(2-vinylpyridine) Triblock Copolymer on Graphene Nanoribbons

Directed self-assembly (DSA) of block copolymers is one of the most promising patterning techniques for patterning sub-10 nm features. However, at such small feature sizes, it is becoming increasingly difficult to fabricate the guiding pattern for the DSA process, and it is necessary to explore alternative guiding methods for DSA to achieve long-range ordered alignment. Here, we report the self-aligned assembly of a triblock copolymer, poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) (P2VP-b-PS-b-P2VP) on neutral graphene nanoribbons with the gap consisting of a P2VP-preferential silicon oxide (SiO₂) substrate via solvent vapor annealing. The assembled P2VP-b-PS-b-P2VP demonstrated long-range, one-dimensional alignment on the graphene substrate in a direction perpendicular to the boundary of the graphene and substrate with a half-pitch size of 8 nm, which greatly alleviates the lithography resolution required for traditional chemoepitaxy DSA. A wide processing window is demonstrated with the gap between graphene stripes varying from 10 to 100 nm, overcoming the restriction on widths of guiding patterns to have commensurate domain spacing. When the gap was reduced to 10 nm, P2VP-b-PS-b-P2VP formed a straight-line pattern on both the graphene and the substrate. Monte Carlo simulations showed that the self-aligned assembly of the triblock copolymer on the graphene nanoribbons is guided at the boundary of parallel and perpendicular lamellae on graphene and SiO₂, respectively. Simulations also indicate that the swelling of a system allows for rapid rearrangement of chains and quickly anneal any misaligned grains and defects. The effect of the interaction strength between SiO₂ and P2VP on the self-assembly is systematically investigated in simulations.

Graphoepitaxy of Symmetric Six-Arm Star-Shaped Poly(methyl methacrylate)-block-Polystyrene Copolymer Thin Film

The authors perform directed self-assembly based on graphoepitaxy of symmetric six-arm star-shaped poly(methyl methacrylate)-block-polystyrene copolymer [(PMMA-b-PS)₆ ] thin film. The affinity between each block and the trench wall is adjusted by using polymer brushes or selective gold (Au) deposition. When the surface of the trench is strongly selective for the PMMA block, (n+0.75)L₀ thick (n is the number of the lamellae, L₀ is lamellar domain spacing) lamellae parallel to the trench wall are formed at each side, while nanotubes are formed away from the trench wall. However, for a trench grafted with PS brushes, nanotubes are formed beside (n+0.25)L₀ thick lamellar layers. By adjusting the trench width (W) and the affinity between the block and the wall, various dual nanopatterns consisting of lines and nanotubes are fabricated. Moreover, when the trench wall is selectively deposited by Au, asymmetric dual nanopattern is formed, where different numbers of lines exist on each side wall, while nanotubes are formed in the middle of the trench. The observed morphologies depending on the commensurability condition between W and L₀ are consistent with predictions by self-consistent field theory.

Influence of Osmotic Pressure on Nanostructures in Thin Films of a Weakly-Segregated Block Copolymer and Its Blends with a Homopolymer

We studied the influence of osmotic pressure on nanostructures in thin films of a symmetric weakly-segregated polystyrene-block-poly (methyl methacrylate), P(S-b-MMA), block copolymer and its mixtures with a polystyrene (PS) homopolymer of various compositions. Thin films were deposited on substrates through surface neutralization. The surface neutralization results from the PS mats, which were oxidized and cross-linked by UV-light exposure. Thus, thermal annealing produced perpendicularly oriented lamellae and perforated layers, depending on the content of added PS chains. Nevertheless, a mixed orientation was obtained from cylinders in thin films, where a high content of PS was blended with the P(S-b-MMA). A combination of UV-light exposure and acetic acid rinsing was used to remove the PMMA block. Interestingly, the treatment of PMMA removal inevitably produced osmotic pressure and consequently resulted in surface wrinkling of perpendicular lamellae. As a result, a hierarchical structure with two periodicities was obtained for wrinkled films with perpendicular lamellae. The formation of surface wrinkling is due to the interplay between UV-light exposure and acetic acid rinsing. UV-light exposure resulted in different mechanical properties between the skin and the inner region of a film. Acetic acid rinsing produced osmotic pressure. It was found that surface wrinkling could be suppressed by reducing film thickness, increasing PS content and using high-molecular-weight P(S-b-MMA) BCPs.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Shear-Rolling Process for Unidirectionally and Perpendicularly Oriented Sub-10-nm Block Copolymer Patterns on the 4 in Scale

Shear alignment of the block copolymer (BCP) thin film is one of the promising directed self-assembly (DSA) methodologies for the unidirectional alignment of sub-10 nm microdomains of BCPs for next-generation nanolithography and nanowire-grid polarizers. However, because of the differences in the surface/interfacial energies at the top surface/bottom interface, the shear-induced ordering of BCP nanopatterns has been restricted to BCPs with spherical and cylindrical nanopatterns and cannot be realized for high-aspect-ratio perpendicular lamellar structures, which is essential for practical application to semiconductor pattern processes. It is still a difficult challenge to fabricate the unidirectional alignment in a short time over a large area. In this study, we propose an approach for combining the shear-rolling process with the filtered plasma treatment of BCP films for the fabrication of unidirectionally aligned and perpendicularly oriented lamellar nanostructures. This approach enables fabrication within 1 min on a 4 in scale. We treated filtered plasma on the BCP film for perpendicular orientation and executed the hot-rolling process with different roller and stage speeds. Large-scale shear was generated only at the location where the BCP film was in contact with both the roller and stage, effectively applying shear stress to a large area of the BCP film within a short time. The repeated application of this shear-rolling process can achieve a higher level of unidirectional alignment. Our aligned BCP vertical lamellae were used to fabricate a high-aspect-ratio sub-10-nm-wide metallic nanowire array via dry/wet processes. In addition, shear-rolling with chemoepitaxy patterns can achieve higher orientational order and lower defectivity.

Bending Behavior and Directed Self-Assembly of Rod-Coil Block Copolymers

The formation of zigzags, chevrons, Y-junctions, and line segments is demonstrated in thin films formed from cylindrical morphology silicon-containing conformationally asymmetric rod-coil diblock copolymers and triblock terpolymers under solvent annealing. Directed self-assembly of the block copolymers within trenches yields well-ordered cylindrical microdomains oriented either parallel or transverse to the sidewalls depending on the chemical functionalization of the sidewalls, and the location and structure of concentric bends in the cylinders is determined by the shape of the trenches. The innate etching contrast, the spontaneous sharp bends and junctions, and the range of demonstrated periodicity and line/space ratios make these conformationally asymmetric rod-coil polymers attractive for nanoscale pattern generation.

Photo-directing chemoepitaxy: the versatility of poly(aryl methacrylate) films in tuning block copolymer wetting

UV irradiated poly(aryl methacrylate) films can induce a change in the orientation of the domains of an overlayer of PS-b-PMMA from parallel to perpendicular lamellar structures.

Self-Directed Self-Assembly of 3D Tailored Block Copolymer Nanostructures

Directed self-assembly (DSA) of block copolymers (BCPs) provides a powerful tool to fabricate various 2D nanostructures. However, it still remains a challenge to extend DSA to make uniform and complex 3D nanostructures through BCP self-assembly. In this paper, we introduce a method to fabricate various nanostructures in 3D and test it using simulations. In particular, we employ dissipative particle dynamics (DPD) simulation to demonstrate that uniform multilayer nanostructures can be achieved by alternating the stacking of two "orthogonal" BCPs films, AB copolymer film and AC copolymer film, without the need to cross-link or etch any of the components. The assembly of a new layer occurs on top of the previous bottom layer, and thus the structural information from the substrate is propagated upward in the film, a process we refer to as self-directed self-assembly (SDSA). If this process is repeated many times, one can have tailored multilayer nanostructures. Furthermore, the natural (bulk) phases of the block copolymers in each layer do not need to be the same, so one can achieve complex 3D assemblies that are not possible with a single-phase 3D system. This method in conjunction with grapho (or chemo) epitaxy is able to evolve a surface pattern into a 3D nanostructure. Here we show several examples of nanostructures fabricated by this process, which include aligned cylinders, spheres on top of cylinders, and orthogonal nanomeshes. Our work should be useful for creating complex 3D nanostructures using self-assembly.

Symmetric Diblock Copolymers in Cylindrical Confinement: A Way to Chiral Morphologies?

We investigate the confinement-induced formation and stability of helix morphologies in lamella-forming AB diblock copolymers via large-scale, particle-based, single-chain-in-mean-field simulations. Such helix structures are rarely observed in bulk or thin films. Structure formation is induced by quenching incompatibility, χN, from a disordered morphology. If the surfaces of the cylindrical confinement do not prefer one component over the other, we observe that stacked lamellae, with their normals along the cylinder axis, are the preferred morphology. Kinetically, this morphology initially forms close to the cylinder surface, whereas the spontaneous, spinodal microphase separation in the cylinder's interior gives rise to a microemulsion-like morphology, riddled with defects and no directional order. Subsequently, the ordered morphology on the cylinder surface progresses inward, pervading the entire volume. In case that the cylindrical pore is only partially filled, the additional confinement along the cylinder axis generally gives rise to incommensurability between the equilibrium spacing of stacked lamellae and the cylinder height. To accommodate this mismatch, the lamella normals will tilt away from the cylinder axis and generate helices of lamellae on the surface of the cylinder. Again, this order progresses from the cylinder surface inward, generating a chiral morphology. Because the spacing between the internal AB interfaces decreases upon approaching the helix center, the concomitant stress results in a decrease in the number of lamellae and the formation of unique dislocation defects. This type of chiral defect morphology is reproducibly formed by the kinetics of structure formation in partly filled cylindrical pores with nonpreferential surfaces and may find applications in photonic applications.

Temperature dependence of the conductivity of filled diblock copolymers

We demonstrate that an insulating diblock copolymer system (DBC) filled with conductive fillers can be used as an electrically responsive soft composite that changes its conductivity in response to temperature-induced changes in its morphology. By combining the phase field model describing the morphology of the DBC system with the Monte Carlo simulations and the resistor network model describing electrical properties of the filler network, we calculate the conductivity of this composite. The calculated conductivity is found to essentially depend, in particular, on the temperature of the composite. Changing the temperature is shown to result in morphological changes in the DBC system causing the structural changes in the filler network. In particular, the order-disorder transition in the host DBC system is found to be accompanied by the conductor-insulator transition in the filler network. The effect of the difference between the affinities of the fillers for dissimilar copolymer blocks on the composite conductivity, as well as the effect of the repulsive and attractive interaction between fillers, is considered in detail.

Kinetic Pathways of Block Copolymer Directed Self-Assembly: Insights from Efficient Continuum Modeling

We introduce a computationally efficient continuum technique to simulate the complex kinetic pathways of block copolymer self-assembly. Subdiffusive chain dynamics is taken into account via nonlocal Onsager coefficients. An application to directed self-assembly of thin films of diblock copolymers on patterned substrates reveals the conditions under which experimentally observed metastable structures intervene in the desired thin-film morphology. The approach generalizes easily to multiblock copolymers and more complex guiding patterns on the substrate, and its efficiency allows for the systematic optimization of guiding patterns and process conditions.

Silk as a biodegradable resist for field-emission scanning probe lithography

The patterning of silk allows for manufacturing various structures with advanced functionalities for optical and tissue engineering and drug delivery applications. Here, we propose a high-resolution nanoscale patterning method based on field-emission scanning probe lithography (FE-SPL) that crosslinks the biomaterial silk on conductive indium tin oxide (ITO) promoting the use of a biodegradable material as resist and water as a developer. During the lithographic process, Fowler-Nordheim electron emission from a sharp tip was used to manipulate the structure of silk fibroin from random coil to beta sheet and the emission formed nanoscale latent patterns with a critical dimension (CD) of ∼50 nm. To demonstrate the versatility of the method, we patterned standard and complex shapes. This method is particularly attractive due to its ease of operation without relying on a vacuum or a special gaseous environment and without any need for complex electronics or optics. Therefore, this study paves a practical and cost-effective way toward patterning biopolymers at ultra-high level resolution.

Rapid access to discrete and monodisperse block co-oligomers from sugar and terpenoid toward ultrasmall periodic nanostructures

Discrete block co-oligomers (BCOs) are gaining considerable attention due to their potential to form highly ordered ultrasmall nanostructures suitable for lithographic templates. However, laborious synthetic routes present a major hurdle to the practical application. Herein, we report a readily available discrete BCO system that is capable of forming various self-assembled nanostructures with ultrasmall periodicity. Click coupling of propargyl-functionalized sugars (containing 1-7 glucose units) and azido-functionalized terpenoids (containing 3, 4, and 9 isoprene units) afforded the discrete and monodisperse BCOs with a desired total degree of polymerization and block ratio. These BCOs microphase separated into lamellar, gyroid, and cylindrical morphologies with the domain spacing (d) of 4.2-7.5 nm. Considering easy synthesis and rich phase behavior, presented BCO systems could be highly promising for application to diverse ~4-nm nanofabrications.

Effect of chain architectures on the domain spacing of block copolymers with equivalent segregation degrees

It is crucial to lower the domain spacing in the application of directed self-assembly (DSA) of block copolymers. Architectural design of block copolymers provides a possible route. However, the change of the segregation degree is always coupled with that of domain spacing. Therefore, we rescale the segregation degrees of different multiblock copolymers with reference to that of the AB diblock using self-consistent field theory (SCFT), including the [AB]n linear multiblock, AnBn multi-arm star and Ad,nBd,n dendron-like, such that the density profiles of the lamellar morphology are consistent. Then we compare the lamellar periods of these different copolymers under the condition of equivalent segregation degrees. We find that the star and dendron-like architectures can significantly lower the domain spacing relative to that of the AB diblock, especially when the arm number or the generation number is large. On one hand, our work presents a simple criterion for quantifying the reduction of domain spacing of a specific multiblock architecture relative to that of the AB diblock. On the other hand, our conclusion provides a useful guide for the application of directed self-assembly.

Boundary-directed epitaxy of block copolymers

Directed self-assembly of block copolymers (BCPs) enables nanofabrication at sub-10 nm dimensions, beyond the resolution of conventional lithography. However, directing the position, orientation, and long-range lateral order of BCP domains to produce technologically-useful patterns is a challenge. Here, we present a promising approach to direct assembly using spatial boundaries between planar, low-resolution regions on a surface with different composition. Pairs of boundaries are formed at the edges of isolated stripes on a background substrate. Vertical lamellae nucleate at and are pinned by chemical contrast at each stripe/substrate boundary, align parallel to boundaries, selectively propagate from boundaries into stripe interiors (whereas horizontal lamellae form on the background), and register to wide stripes to multiply the feature density. Ordered BCP line arrays with half-pitch of 6.4 nm are demonstrated on stripes >80 nm wide. Boundary-directed epitaxy provides an attractive path towards assembling, creating, and lithographically defining materials on sub-10 nm scales.

Conductivity of Insulating Diblock Copolymer System Filled with Conductive Particles Having Different Affinities for Dissimilar Copolymer Blocks

We investigate the electrical response of the insulating diblock copolymer system (DBC) filled with conductive spherical fillers depending on the affinities of these fillers for copolymer blocks and the interaction between fillers. We demonstrate that the contrast (difference) between the affinities of the fillers for dissimilar copolymer blocks is a decisive factor that determines the distribution of these fillers in the DBC system. The distribution of filler particles, in turn, is found to be directly related to the electrical response of the DBC-particle composite. In particular, increasing the affinity contrast above a certain threshold value results in the insulator-conductor transition. This transition is found to be caused by the preferential localization of the fillers in the microphases of the DBC system having larger affinity for these fillers. The effect of the interaction between fillers is found to be secondary to the described effect of the affinity contrast that dominates in determining the distribution of fillers in the composite. This effect of the inter-particle interactions is shown to be significant only when the affinity contrast and filler volume fraction are sufficiently large.

Adsorption and ordering of amphiphilic rod-coil block copolymers on a substrate: conditions for well-aligned stripe nanopatterns

Controlling the ordering of self-assembled nanostructures is vital in block copolymer nanotechnology but still presents a challenge. Here we demonstrated that the adsorption and ordering of amphiphilic rod-coil block copolymers on a substrate can generate well-aligned stripe nanopatterns by dissipative particle dynamics simulations. The effects of the copolymer concentration and the surface affinity on the formation of stripe nanopatterns were examined. The simulation results revealed that the well-aligned stripe nanopatterns with controllable thickness and stripe width can be obtained in the systems with higher copolymer concentration and surface affinity. An immersion coating experiment was designed to verify the simulation results, and an agreement is shown. The present work provides a strategy for constructing well-aligned stripe nanopatterns in a controllable way.